EP1349678B1 - Procede de nettoyage d'une surface solide par elimination de salissures organiques et/ou minerales au moyen d'une microemulsion - Google Patents
Procede de nettoyage d'une surface solide par elimination de salissures organiques et/ou minerales au moyen d'une microemulsion Download PDFInfo
- Publication number
- EP1349678B1 EP1349678B1 EP02710948A EP02710948A EP1349678B1 EP 1349678 B1 EP1349678 B1 EP 1349678B1 EP 02710948 A EP02710948 A EP 02710948A EP 02710948 A EP02710948 A EP 02710948A EP 1349678 B1 EP1349678 B1 EP 1349678B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- process according
- organic solvent
- mixture
- mfc
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 21
- 239000007787 solid Substances 0.000 title claims abstract description 19
- 229910052500 inorganic mineral Inorganic materials 0.000 title description 9
- 239000004530 micro-emulsion Substances 0.000 title description 9
- 239000011707 mineral Substances 0.000 title description 9
- 239000002689 soil Substances 0.000 title description 5
- 239000000203 mixture Substances 0.000 claims abstract description 55
- 239000003960 organic solvent Substances 0.000 claims abstract description 43
- 238000009835 boiling Methods 0.000 claims abstract description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 23
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 22
- -1 alkyl radical Chemical class 0.000 claims description 15
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 claims description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- FRCHKSNAZZFGCA-UHFFFAOYSA-N 1,1-dichloro-1-fluoroethane Chemical compound CC(F)(Cl)Cl FRCHKSNAZZFGCA-UHFFFAOYSA-N 0.000 claims description 5
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 claims description 3
- WZLFPVPRZGTCKP-UHFFFAOYSA-N 1,1,1,3,3-pentafluorobutane Chemical compound CC(F)(F)CC(F)(F)F WZLFPVPRZGTCKP-UHFFFAOYSA-N 0.000 claims description 3
- 150000001768 cations Chemical class 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 2
- 239000003039 volatile agent Substances 0.000 claims description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 2
- PGISRKZDCUNMRX-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-(trifluoromethoxy)butane Chemical compound FC(F)(F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)F PGISRKZDCUNMRX-UHFFFAOYSA-N 0.000 claims 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 claims 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 239000002904 solvent Substances 0.000 description 10
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 7
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 4
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 4
- 239000003791 organic solvent mixture Substances 0.000 description 4
- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 229960001484 edetic acid Drugs 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 2
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 0 C*=ICO[N+](NN(*)[N+]([O-])OC(C)=N)[O-] Chemical compound C*=ICO[N+](NN(*)[N+]([O-])OC(C)=N)[O-] 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 241001080024 Telles Species 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000003139 biocide Substances 0.000 description 2
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000002304 perfume Substances 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- WZEOZJQLTRFNCU-UHFFFAOYSA-N trifluoro(trifluoromethoxy)methane Chemical compound FC(F)(F)OC(F)(F)F WZEOZJQLTRFNCU-UHFFFAOYSA-N 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- NKJOXAZJBOMXID-UHFFFAOYSA-N 1,1'-Oxybisoctane Chemical compound CCCCCCCCOCCCCCCCC NKJOXAZJBOMXID-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- ODCMOZLVFHHLMY-UHFFFAOYSA-N 1-(2-hydroxyethoxy)hexan-2-ol Chemical compound CCCCC(O)COCCO ODCMOZLVFHHLMY-UHFFFAOYSA-N 0.000 description 1
- BWPAALSUQKGDBR-UHFFFAOYSA-N 1-hexoxypropan-2-ol Chemical compound CCCCCCOCC(C)O BWPAALSUQKGDBR-UHFFFAOYSA-N 0.000 description 1
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- DZXCTSZZNHMZML-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;1-propoxypropane Chemical compound CCCOCCC.CC(O)COC(C)CO DZXCTSZZNHMZML-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 241000252505 Characidae Species 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- AQEFLFZSWDEAIP-UHFFFAOYSA-N di-tert-butyl ether Chemical compound CC(C)(C)OC(C)(C)C AQEFLFZSWDEAIP-UHFFFAOYSA-N 0.000 description 1
- USPLDBATMHXKKD-UHFFFAOYSA-N dichloromethane;pentane Chemical compound ClCCl.CCCCC USPLDBATMHXKKD-UHFFFAOYSA-N 0.000 description 1
- IPKKHRVROFYTEK-UHFFFAOYSA-N dipentyl phthalate Chemical compound CCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCC IPKKHRVROFYTEK-UHFFFAOYSA-N 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- OJTDGPLHRSZIAV-UHFFFAOYSA-N propane-1,2-diol Chemical compound CC(O)CO.CC(O)CO OJTDGPLHRSZIAV-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/123—Sulfonic acids or sulfuric acid esters; Salts thereof derived from carboxylic acids, e.g. sulfosuccinates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
- C11D17/0017—Multi-phase liquid compositions
- C11D17/0021—Aqueous microemulsions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5036—Azeotropic mixtures containing halogenated solvents
- C11D7/5068—Mixtures of halogenated and non-halogenated solvents
- C11D7/5077—Mixtures of only oxygen-containing solvents
- C11D7/5081—Mixtures of only oxygen-containing solvents the oxygen-containing solvents being alcohols only
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/44—Multi-step processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Definitions
- the present invention relates to a cleaning method, more specifically it relates to a method of removing dirt organic and / or inorganic of a solid surface (or substrate).
- microemulsion-type cleaning composition used according to the invention has the advantage of being able to effectively eliminate the solid surface to clean all organic and / or mineral soil.
- microemulsion-type cleaning composition is described in patent application FR 2 795 088.
- Step a) of cleaning can be carried out in a tank with immersion or a shower bath in combination with waves ultrasonic, vibration or mechanical shaking.
- the microemulsion-type cleaning composition will be used at a temperature ranging from room temperature (about 20 ° C) to At 60 ° C. and preferably at a temperature of between 20 ° C. and 40 ° C.
- the cleaning time of the solid surface - step a) - is depending on the type of soiling and its adherence to the solid surface.
- This cleaning time does not exceed 5 minutes and, preferably, is between 1 and 3 minutes.
- the organic solvent (s) (B) contained in the composition Microemulsion-type cleaning used in step a) are chosen preferably from the aliphatic hydrocarbons, the monoethers of the alkylene glycols and monoethers of dialkylene glycols.
- the monoethers of the alkylenes glycols may in particular be C 4 -C 25 propylene glycol monoethers, such as propylene glycol monomethyl ether (PM), propylene glycol monoethyl ether (PE) or mono-n ether.
- Monoethers from dialkylene glycols can be for example dipropylene glycol monomethyl ether (DPM), mono-n-propyl ether dipropylene glycol (DPNP), the mono-tert-butyl ether of dipropylene glycol (DPTB), the mono-n-butyl ether of dipropylene glycol (DPNB) and the monohexyl ether of dipropylene glycol; and ether n-butyl diethylene glycol (Butyl Diglycol Ether - BDG), ether hexyl ether of diethylene glycol and the octyl ether of diethylene glycol.
- DPM dipropylene glycol monomethyl ether
- DPNP mono-n-propyl ether dipropylene glycol
- DPTB mono-tert-butyl ether of dipropylene glycol
- DPNB mono-n-butyl ether of dipropylene glycol
- the cleaned solid surface is subjected to a step b) dewatering which consists in removing said cleaned solid surface from the cleaning composition and drip it at room temperature for a period ranging from 30 seconds to 1 minute.
- the drained solid surface is subjected to a step of rinsing c) which is carried out with an organic solvent or a mixture of organic solvents, inert, preferably non-flammable and low boiling point.
- This rinsing step is carried out at a lower temperature of 10 to 15 ° C, preferably 5 ° C lower than the boiling point of organic solvent or the most volatile compound of the solvent mixture organic agents used for said rinsing step.
- mixtures of organic solvents all particularly azeotropic or azeotropic mixtures.
- organic solvent or mixture of organic solvents of stockings boiling point an organic solvent or mixture of organic solvents having a boiling point at more than 90 ° C and preferably between 25 ° C and 70 ° C.
- Azeotropic or quasi-mixtures are preferably used. azeotropic of at least two of the aforementioned compounds.
- the drying step d) is carried out in exposing the rinsed solid surface, to the steam produced by the heating organic solvent or mixture of organic solvents used in the rinsing step c).
- the rinsed surface will be dried by the vapor of the compound more volatile.
- the drying time is at least 20 seconds and, preferably between 30 seconds and 1 minute.
- the method according to the present invention applies particularly for the removal of organic soiling and / or minerals from solid surfaces of metal parts, ceramics, glasses, plastics, printed circuits (parts electronics, semiconductor parts).
- the method of the present invention makes it possible to obtain clean solid surfaces, free of all organic soils and / or minerals and traces of water. Parts cleaned using the according to the invention can be used immediately for other processing operations such as for example, painting, electrodeposition.
- the rinsing-drying steps are preferably performed in a commercial machine comprising at least two tanks equipped with heating and condensation means.
- a first tank possibly equipped with means of production of ultrasound
- the part is rinsed by its immersion in a bath of organic solvent or a mixture of organic solvents heated to a temperature as defined previously. Then, the piece is removed from said bath and conveyed to the second tank to be dried.
- This second tank contains the organic solvent or the mixture of organic solvents used in the previous rinse tank which is brought to its boiling point.
- the part is thus dried by the vapors of the organic solvent or organic solvent mixture used for rinsing. These vapors are condensed by means of a refrigerated condensing coil and recycled in the liquid rinse tank.
- the cleaning sequence is carried out according to the scheme above on the plates and the grid coated with the soiling mentioned above.
- the bath temperature of the cleaning tank is 40 ° C.
- the rinsing temperature is equal to Te-5 ° C, Te being the boiling point of the organic solvent, the azeotrope or the almost azeotropic.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Drying Of Solid Materials (AREA)
Description
- R1 et R2 représentent chacun indépendamment un radical alkyle, linéaire ou ramifié, en C5-C20 ;
- M est un cation choisi parmi N⊕, K⊕ et NR4 ⊕ les R représentant chacun indépendamment hydrogène ou un radical alkyle en C1-C4 ;
- les NORPAR™ 12, 13 et 15 (solvants paraffiniques normaux disponibles auprès de la Société "EXXON CORPORATION") ;
- les ISOPAR™ G, H, K, L, M, V (solvants isoparaffiniques disponibles auprès de la Société "EXXON CORPORATION") ;
- les solvants SHELLSOL™ (disponibles auprès de la Société "SHELL CHEMICAL COMPANY") ;
- les PETROSOLV™ de CEPSA D-15/20, D-19/22, D-20/26, D-24/27, D-28/31 (solvants paraffiniques et isoparaffiniques disponibles aurpès de la Société "CEPSA") ;
- les solvants hydrocarbonés EXXSOL™ commercialisés par la Société "EXXON CORPORATION" ;
- les coupes kérosènes telles que les KETRUL 211, 212, D80, D85, commercialisées par la Société TOTALFINAELF.
- au moins un agent séquestrant, tel que l'acide éthylène diamine tétra acétique (EDTA) et ses sels, à raison notament de 0,01 à 0,1 partie en poids pour 100 parties en poids de (A) + (B) + (C) ; et/ou
- au moins un agent anti-corrosion choisi notamment parmi les acide organiques de type RCOOH, R étant un radical hydrocarboné en C4-C24, et les amines, à raison notamment de 0,01 à 0,5 partie en poids pour 100 parties en poids de (A) + (B) + (C) ; et/ou
- au moins un additif, dans les quantités usuelles, choisi parmi les désinfectants, les fongicides (sels d'ammonium quaternaires) et les biocides (peroxydes organiques, peroxyde d'hydrogène, composés à halogène actif, sels inorganiques phénoliques, sels d'ammonium quaternaires, dérivés organométalliques, dérivés organosoufrés) ; et/ou
- au moins un parfum.
- les alcools aliphatiques tels que le méthanol, l'éthanol, l'isopropanol, le butanol ;
- les esters aliphatiques tels que l'acétate d'éthyle, de butyle ; le formiate de méthyle ;
- les hydrocarbures saturés linéaires, ramifiés ou cycliques qui contiennent de 5 à 7 atomes de carbone, tels que : le pentane, l'hexane, l'heptane, le cyclopentane, le cyclohexane ;
- les cétones aliphatiques tels que l'acétone, la méthyléthylcétone ;
- les éthers aliphatiques tels que le tétrahydrofurane (THF), le diéthyléther, le dipropyléther, le dibutyléther ;
- les acétals tels que le diméthoxyméthane (méthylal) ;
- les hydrocarbures aliphatiques halogènes tels que le chlorure de méthylène, le trichloroéthylène, les perfluoroalcanes CnF2n+2 avec n allant de 4 à 8, les hydrofluorocarbones (HFC) tels que le 1,1,1,2,3,4,4,5,5,5-décafluoropentane (4310 mee), le 1,1,1,3,3-pentafluorobutane (365 mfc) ;
- les hydrofluorochlorocarbones (HCFC) tels que le 1,1-dichloro-1-fluoroéthane (141 b), les hydrofluoroéthers tels que le perfluorométhyléther (C4F9OCH3) ;
- les azéotropes mentionnés dans la demande de brevet FR 2 781 499-A1 tels que l'azéotrope binaire 4310 mee / 365 mfc (9/91), (les chiffres entre parenthèses indiquent les pourcentages en poids respectivement des constituants de l'azéotrope), l'azéotrope ternaire 4310 mee / 365 mfc / CH3OH (12/8315) ;
- les azéotropes mentionnés dans la demande de brevet FR 2 792 648 tels que l'azéotrope binaire 4310 mee / trichloroéthylène (89/11), l'azéotrope ternaire 4310 mee / trichloroéthylène / CH3OH (84,5/9,5/6), l'azéotrope ternaire 4310 mee / trichloroéthylène /isopropanol (88,2/9,6/2,2), l'azéotrope ternaire 4310 mee /trichloroéthylène / méthylal (87/9/4) ;
- les azétropes mentionnés dans la demande de brevet FR 2 792 649 tels que l'azéotrope quaternaire 4310 mee / CH2Cl2 / cyclopentane /CH3OH (47,5/32,7/17/2,8) ;
- les azéotropes mentionnés dans la demande de brevet FR 2 792 647 tels que l'azéotrope quaternaire 365 mfc / CH2Cl2 / CH3OH / 4310 mee (56,2/39,8/3,5/0,5) ;
- les azéotropes ou quasi azéotropes mentionnés dans la demande de brevet FR 2 766 836 tels que le quasi azéotrope ternaire 365 mfc /CH2Cl2 / CH3OH (89/7/4) ;
- les azéotropes mentionnés dans la demande de brevet FR 2 759 090 tels que l'azéotrope binaire 4310 mee / CH2Cl2 (50/50).
- Une première cuve dans laquelle s'effectue le nettoyage de la surface solide avec la composition type microémulsion. Cette cuve peut être munie de moyens de chauffage et de moyens permettant de produire des ultra-sons. La pièce (ou les pièces) à nettoyer, disposée sur un panier, est immergée dans un bain de la composition type microémulsion à une température et pendant une durée telles que définies précédemment.
- La pièce est ensuite retirée du bain puis égouttée, de préférence au dessus d'un plan incliné qui permet le retour de la composition type microémulsion dans la cuve de nettoyage puis elle est dirigée vers le cycle de rinçage/séchage.
- une cuve de nettoyage contenant 5 litres d'une composition type microémulsion,
- un plan incliné d'égouttage de la microémulsion avec retour dans la cuve de nettoyage, et
- une machine 2 cuves type B125 (commercialisée par la Société BRANSON ULTRASONIC S.A.).
- une plaque inox 316L de dimensions 100x100x1 mm est revêtue d'huile de coupe MOBIL CUT 151 ou d'huile d'usinage MOBIL 766,
- une grille inox de dimensions 100x100 (40 brins par cm) est enduite des mêmes salissures.
- Composition de nettoyage type microémulsion (% exprimés en poids)
- eau:42%
- coupe pétrolière KETRUL 211 : 32 %
- tensio actif "EMPIMIN OP 070 commercialisé par la Société "Albrigth et Wilson Iberica": 18 %
- l'éther mono-n-butylique du dipropylene glycol (DPNB) : 8 %
- additifs anti-corrosion : 0,15% par rapport à la somme eau, coupe
pétrolière, tension actif, DPNB soit :
- acide heptanoïque (0,063 %)
- acide undécyclique (0,0435 %)
- IRGAMET 42 (amine cyclique) (0,0435 %)
- Solvants organiques ou mélanges de solvants organiques utilisés sont reportés dans le tableau 1 ci-après avec leur température d'ébullition.
Essai | Solvant de rinçage et de séchage | Te (C) | Aspect des plaques et grilles nettoyées |
1 | Azéotrope 4310 mee / 365 mfc (9/91) | 36,5 | Ne présentent plus aucune salissure Les surfaces sont parfaitement propres et sèches. |
2 | Azéotrope 4310 mee / 365 mfc / CH3OH (12/83/5) | 33,2 | |
3 | Quasi-azéotrope 365 mfc / CH2Cl2 / CH3OH (89/7/4) | 35,7 | |
4 | Azéotrope 4310 mee / CH2Cl2 (50/50) | 34,2 | |
5 | CH2Cl2 stabilisé | 40 | |
6 | Azéotrope 1,1-dichloro-1-fluoroéthane/méthanol (96/4) | 29 | |
7 | Trichloroéthylène stabilisé | 86,7 | |
8 | Azéotrope 365 mfc / CH2Cl2 / CH3OH (57/39/3,5) | 32,1 | |
9 | Azéotrope 365 mfc / CH2Cl2 (56,6/43,4) | 33,6 |
Claims (13)
- . Procédé de nettoyage d'une surface solide, comprenanta) une étape de nettoyage de ladite surface solide au moyen d'une composition de nettoyage de type microémulsion, caractérisé en ce qu'il comprend les étapes suivantes :b) égouttage de ladite surface nettoyée,c) rinçage de ladite surface égouttée avec un solvant organique ou un mélange de solvants organiques de point d'ébullition au plus égal à 90°C, etd) séchage de ladite surface rincée avec le solvant organique ou le mélange de solvants organiques utilisé en c).
- Procédé selon la revendication 1, caractérisé en ce que la composition de nettoyage de type microémulsion est utilisée à une température allant de la température ambiante à 60°C et, de préférence, à une température comprise entre 20°C et 40°C.
- Procédé selon l'une des revendications 1 ou 2, caractérisé en ce que la durée du nettoyage (étape a)) ne dépasse pas 5 minutes.
- Procédé selon la revendication 1, caractérisé en ce que la durée de l'égouttage va de 30 secondes à 1 minute.
- Procédé selon la revendication 1, caractérisé en ce que l'étape de rinçage c) est effectuée à une température inférieure de 10 à 15°C, de préférence inférieure de 5°C du point d'ébullition du solvant organique ou du composé le plus volatile du mélange de solvants organiques utilisés dans ladite étape de rinçage.
- Procédé selon la revendication 1, caractérisé en ce que l'étape de séchage d) est réalisée en exposant la surface solide rincée à la vapeur produite par le chauffage du solvant organique ou du mélange de solvants organiques utilisés dans l'étape de rinçage c).
- Procédé selon l'une des revendications 1, 5 ou 6 caractérisé en ce que le solvant organique ou le mélange de solvants organiques ont une température d'ébullition comprise entre 25°C et 70°C.
- Procédé selon l'une des revendications 1 ou 6, caractérisé en ce que la durée de l'étape de séchage d) est d'au moins 20 secondes et, de préférence, comprise entre 30 secondes et 1 minute.
- . Procédé selon la revendication 1, caractérisé en ce que la composition de nettoyage de type microémulsion comprend :(A) 30 à 70 parties en poids, en particulier 35 à 60 parties en poids, d'eau ;(B) 20 à 60 parties en poids, en particulier 25 à 55 parties en poids, d'au moins un solvant organique liquide à la température ambiante ; etR1 et R2 représentent chacun indépendamment un radical alkyle, linéaire ou ramifié, en C5-C20 ;M est un cation choisi parmi Na⊕, K⊕ et NR4 ⊕ les R représentant chacun indépendamment hydrogène ou un radical alkyle en C1-C4 ;
- Procédé selon la revendication 9, caractérisé en ce que le ou les solvant(s) organique(s) (B) contenu(s) dans la composition de nettoyage de type microémulsion utilisée dans l'étape a) est (sont) choisi(s) parmi les hydrocarbures aliphatiques, les monoéthers des alkylène glycols et les monoéthers des dialkylène glycols.
- . Procédé selon l'une quelconque des revendications 1 à 9; caractérisé en ce que le solvant organique ou le mélange de solvants organiques utilisés dans les étapes c) et d) sont choisis parmi les alcools aliphatiques, de préférence le méthanol ou l'isopropanol ; les esters aliphatiques, de préférence l'acétate d'éthyle ; les hydrocarbures saturés linéaires, ramifiés ou cycliques, contenant de 5 à 7 atomes de carbone ; les cétones aliphatiques ; les éthers aliphatiques ; le diméthoxyméthane, le chlorure de méthylène, le trichloroéthylène, les perfluoroalcanes CnF2n+2 avec n allant de 4 à 8 ; les hydrofluorocarbones (HFC) de préférence le 1,1,1,2,3,4,4,5,5,5-décafluoropentane (4310 mee) ou le 1,1,1,3,3-pentafluorobutane (365 mfc) ; les hydroflurochlorocarbones (HCFC) de préférence le 1,1-dichloro-1-fluroéthane (141 b), le perfluorométhyléther (C4F9OCH3) ou le mélange d'au moins deux des composés précités.
- Procédé selon la revendication 11, caractérisé en ce que les mélanges de solvants organiques sont des mélanges azéotropiques ou quasi azéotropiques des composés mentionnés.
- . Procédé selon la revendication 12, caractérisé en ce que les mélanges azéotropiques ou quasi azéotropiques utilisés dans les étapes c) et d) sont l'azéotrope binaire 4310 mee / 365 mfc /(9/91), l'azéotrope ternaire 4310 mee / 365 mfc / CH3OH (12/83/5), le quasi azéotrope ternaire 365 mfc / CH2Cl2 / (50/50), l'azéotrope binaire 1,1-dichloro-1-fluoroéthane / méthanol (96/4), l'azéotrope ternaire 365 mfc / CH2Cl2 / CF3OH (57/39,5/3,5), l'azéotrope binaire 365 mfc / CH2Cl2 (56,6/43,4).
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0100228 | 2001-01-09 | ||
FR0100228A FR2819201B1 (fr) | 2001-01-09 | 2001-01-09 | Procede de nettoyage d'une surface solide par elimination de salissures organiques et/ou minerales au moyen d'une microemulsion |
PCT/FR2002/000035 WO2002055223A1 (fr) | 2001-01-09 | 2002-01-07 | Procede de nettoyage d'une surface solide par elimination de salissures organiques et/ou minerales au moyen d'une microemulsion |
Publications (2)
Publication Number | Publication Date |
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EP1349678A1 EP1349678A1 (fr) | 2003-10-08 |
EP1349678B1 true EP1349678B1 (fr) | 2005-12-21 |
Family
ID=8858628
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP02710948A Expired - Lifetime EP1349678B1 (fr) | 2001-01-09 | 2002-01-07 | Procede de nettoyage d'une surface solide par elimination de salissures organiques et/ou minerales au moyen d'une microemulsion |
Country Status (12)
Country | Link |
---|---|
US (1) | US7417018B2 (fr) |
EP (1) | EP1349678B1 (fr) |
JP (1) | JP2004525753A (fr) |
KR (1) | KR100502532B1 (fr) |
CN (1) | CN1236866C (fr) |
AT (1) | ATE313390T1 (fr) |
AU (1) | AU2002229853B2 (fr) |
CA (1) | CA2434183C (fr) |
DE (1) | DE60208154D1 (fr) |
ES (1) | ES2253518T3 (fr) |
FR (1) | FR2819201B1 (fr) |
WO (1) | WO2002055223A1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4663891B2 (ja) * | 2001-02-19 | 2011-04-06 | 東燃化学株式会社 | 熱可塑性樹脂成形体の洗浄方法およびこれを利用した熱可塑性樹脂微多孔膜の製造方法 |
CN1690120A (zh) * | 2004-03-01 | 2005-11-02 | 三菱瓦斯化学株式会社 | 具有高减震能力的树脂组合物 |
FR2873689B1 (fr) * | 2004-07-29 | 2006-10-13 | Arkema Sa | Composition a base de 1,1,1,3,3,-pentafluorobutane |
JP3994992B2 (ja) * | 2004-08-13 | 2007-10-24 | 三菱瓦斯化学株式会社 | シリコン微細加工に用いる異方性エッチング剤組成物及びエッチング方法 |
AU2005316930B2 (en) * | 2004-12-17 | 2009-06-18 | Ventana Medical Systems, Inc. | Methods and compositions for a microemulsion-based tissue treatment |
JP6023641B2 (ja) | 2013-04-25 | 2016-11-09 | Jxエネルギー株式会社 | 洗浄剤組成物 |
CN112404026B (zh) * | 2020-09-11 | 2022-03-01 | 上海金堂轻纺新材料科技有限公司 | 一种除油污废水循环利用的工艺 |
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US5213624A (en) * | 1991-07-19 | 1993-05-25 | Ppg Industries, Inc. | Terpene-base microemulsion cleaning composition |
MX9206771A (es) * | 1991-12-02 | 1993-06-01 | Allied Signal Inc | Mejoras en sistema de limpieza por solventes multiples |
FR2691473B1 (fr) * | 1992-05-21 | 2002-05-17 | Atochem Elf Sa | Compositions pour le démouillage ou le dégraissage de surfaces solides. |
JPH08508536A (ja) * | 1993-04-02 | 1996-09-10 | ザ ダウ ケミカル カンパニー | 微小エマルジョン及びエマルジョン洗剤組成物 |
US5464480A (en) * | 1993-07-16 | 1995-11-07 | Legacy Systems, Inc. | Process and apparatus for the treatment of semiconductor wafers in a fluid |
US5911837A (en) * | 1993-07-16 | 1999-06-15 | Legacy Systems, Inc. | Process for treatment of semiconductor wafers in a fluid |
US5571337A (en) * | 1994-11-14 | 1996-11-05 | Yieldup International | Method for cleaning and drying a semiconductor wafer |
US5634978A (en) * | 1994-11-14 | 1997-06-03 | Yieldup International | Ultra-low particle semiconductor method |
AU5883396A (en) * | 1995-06-02 | 1996-12-18 | Ashland Inc. | Stable microemulsion cleaners having low volatile organic co ntent |
US6030754A (en) * | 1996-02-05 | 2000-02-29 | Texas Instruments Incorporated | Photoresist removal without organic solvent following ashing operation |
US5888308A (en) * | 1997-02-28 | 1999-03-30 | International Business Machines Corporation | Process for removing residue from screening masks with alkaline solution |
US5938856A (en) * | 1997-06-13 | 1999-08-17 | International Business Machines Corporation | Process of removing flux residue from microelectronic components |
US6165962A (en) * | 1997-07-31 | 2000-12-26 | E. I. Du Pont De Nemours And Comapny | Aqueous microemulsions |
US5908822A (en) * | 1997-10-28 | 1999-06-01 | E. I. Du Pont De Nemours And Company | Compositions and processes for drying substrates |
US6120613A (en) * | 1998-04-30 | 2000-09-19 | Micell Technologies, Inc. | Carbon dioxide cleaning and separation systems |
US6159827A (en) * | 1998-04-13 | 2000-12-12 | Mitsui Chemicals, Inc. | Preparation process of semiconductor wafer |
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FR2795088B1 (fr) * | 1999-06-21 | 2002-05-24 | Atofina | Compositions de nettoyage a froid du type microemulsions |
US6593283B2 (en) * | 2000-04-28 | 2003-07-15 | Ecolab Inc. | Antimicrobial composition |
US6730595B2 (en) * | 2000-12-12 | 2004-05-04 | Mitsui Chemicals, Inc. | Protecting method for semiconductor wafer and surface protecting adhesive film for semiconductor wafer used in said method |
DE60137229D1 (de) * | 2001-10-22 | 2009-02-12 | Viroblock Sa | Non-phospholipid Vesikel (npLV) und ihre Verwendung in kosmetischen, therapeutischen und prophylaktischen Anwendungen |
BR0213309B1 (pt) * | 2001-10-26 | 2013-02-19 | processo seqÜencial para limpeza a seco de artigos de roupa para lavar. | |
KR100480606B1 (ko) * | 2002-08-01 | 2005-04-06 | 삼성전자주식회사 | 아이피에이 증기 건조 방식을 이용한 반도체 웨이퍼 건조장치 |
-
2001
- 2001-01-09 FR FR0100228A patent/FR2819201B1/fr not_active Expired - Fee Related
-
2002
- 2002-01-07 US US10/250,914 patent/US7417018B2/en not_active Expired - Fee Related
- 2002-01-07 EP EP02710948A patent/EP1349678B1/fr not_active Expired - Lifetime
- 2002-01-07 WO PCT/FR2002/000035 patent/WO2002055223A1/fr active IP Right Grant
- 2002-01-07 KR KR10-2003-7009194A patent/KR100502532B1/ko active IP Right Grant
- 2002-01-07 AU AU2002229853A patent/AU2002229853B2/en not_active Ceased
- 2002-01-07 CN CNB028062698A patent/CN1236866C/zh not_active Expired - Fee Related
- 2002-01-07 ES ES02710948T patent/ES2253518T3/es not_active Expired - Lifetime
- 2002-01-07 AT AT02710948T patent/ATE313390T1/de not_active IP Right Cessation
- 2002-01-07 CA CA002434183A patent/CA2434183C/fr not_active Expired - Fee Related
- 2002-01-07 JP JP2002555945A patent/JP2004525753A/ja active Pending
- 2002-01-07 DE DE60208154T patent/DE60208154D1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2434183A1 (fr) | 2002-07-18 |
JP2004525753A (ja) | 2004-08-26 |
DE60208154D1 (de) | 2006-01-26 |
CA2434183C (fr) | 2009-10-06 |
FR2819201A1 (fr) | 2002-07-12 |
US20040092420A1 (en) | 2004-05-13 |
KR20030070099A (ko) | 2003-08-27 |
CN1496288A (zh) | 2004-05-12 |
US7417018B2 (en) | 2008-08-26 |
WO2002055223A1 (fr) | 2002-07-18 |
ES2253518T3 (es) | 2006-06-01 |
ATE313390T1 (de) | 2006-01-15 |
KR100502532B1 (ko) | 2005-07-20 |
CN1236866C (zh) | 2006-01-18 |
AU2002229853B2 (en) | 2007-08-02 |
AU2002229853B8 (en) | 2002-07-24 |
EP1349678A1 (fr) | 2003-10-08 |
FR2819201B1 (fr) | 2003-02-21 |
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