EP1163827A1 - Verfahren zum erzeugen von lötfähigen und funktionellen oberflächen auf schaltungsträgern - Google Patents
Verfahren zum erzeugen von lötfähigen und funktionellen oberflächen auf schaltungsträgernInfo
- Publication number
- EP1163827A1 EP1163827A1 EP01927633A EP01927633A EP1163827A1 EP 1163827 A1 EP1163827 A1 EP 1163827A1 EP 01927633 A EP01927633 A EP 01927633A EP 01927633 A EP01927633 A EP 01927633A EP 1163827 A1 EP1163827 A1 EP 1163827A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- functional
- areas
- solderable
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0391—Using different types of conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49144—Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion
Definitions
- the invention relates to a method for producing at least one solderable surface in selected soldering areas and at least one functional surface in functional areas different from the soldering areas on circuit boards provided with copper surfaces, and corresponding circuit boards.
- Circuit carriers are used to hold active and passive components.
- a basic distinction is made between conventional printed circuit boards and chip carriers. While the former are equipped with passive components, for example capacitors and resistors, and packaged semiconductor components, the chip carriers are used to assemble unpackaged semiconductor components. In some cases, several unhoused and possibly also housed semiconductor components are combined on a chip carrier. Hybrid circuits of this type are referred to as multichip modules. For some time now, unhoused semiconductor components have been assembled directly on a circuit carrier together with passive components without prior assembly. Such circuit carriers are so-called COB (Chip-On-Board) circuit boards.
- COB Chip-On-Board
- circuit carriers which are intended to be fitted with passive components and unhoused semiconductor components.
- the copper circuit pattern required for this is formed using known methods.
- layers of gold deposited are deposited.
- these layers serve to form solderable surfaces, which are required for fitting with passive components.
- the gold surfaces are also suitable for bonding packaged and unpackaged semiconductor components.
- US-A-5,364,460 states that gold layers are electrolessly deposited on, among other things, printed circuit boards and cards for integrated circuits.
- the coating of copper structures on circuit board material is in
- parts of the printed circuit board surface are initially coated with gold, palladium, indium, rhodium, nickel, tin, lead or alloys of these elements, preferably with palladium, in the areas that are not to be provided with a solderable surface.
- the surface areas to be provided with the solderable surface are previously provided with a mask. The mask is then removed again. Then a solderable metal surface is formed from a tin / lead alloy in an electroless manner.
- Gold layers are also formed for producing releasable electrical contacts, for example plug contacts for inserting the assembled circuit carriers into contact plugs and contact surfaces for the production of push buttons.
- DE-OS 1 690 338 mentions a process for the production of plug-in terminal strips with gold surfaces, in which a printed circuit board material coated over the entire surface with a copper layer in the area of the plug-in connections and on the other conductor lines is first galvanically one Lead / tin alloy is deposited, then nickel and gold are deposited in the connector area on the lead / tin alloy layer and the exposed copper layer is etched after removal of the electroplating lacquer.
- the document states that the relatively soft layer underneath the nickel / gold layer interferes and that etching through of the conductor tracks is observed at the transition zone between the gold contacts and the lead / tin alloy.
- Gold layers produced by electroplating are not applied directly to the copper surfaces. Rather, according to US Pat. No. 5,364,460, a nickel-containing layer is first deposited and the gold layer on the nickel-containing layer. An electrolessly deposited Ni / B or Ni / P layer is preferably formed as the layer containing nickel. According to US Pat. No. 5,470,381, a layer containing nickel is deposited first and then a gold layer.
- DE 42 01 129 A1 describes a method for producing a wiring board, in which the electroless plating on the copper parts of the
- a palladium coating is formed on the plate, the palladium surfaces being produced on double-sided wiring plates in order to fasten surface-mounting type components (SMT: Surface Mounting Technology) by soldering.
- SMT Surface Mounting Technology
- US-A-4,424,241 specifies an electroless palladium plating process, the palladium layers formed being used to produce conductor track structures in electrical circuits, such as integrated circuits.
- a method was developed in which the areas which are intended to be used for soldering components are first covered with a suitable mask, for example a photostructurable resist, and then in the areas which are still exposed Nickel / gold layer combination is applied. The mask is then removed from the circuit carrier surface again.
- An organic protective layer is then formed, for example with an aqueous acidic solution of alkylimidazole or alkylbenzimidazole compounds. This protective layer prevents the oxidation of the copper surfaces and maintains the solderability of the copper surfaces.
- the nickel / gold combination layer is formed with this method only in those areas in which components are attached by bonding or in which electrical contact areas are required.
- the problem that arises when soldering with BGA technology is eliminated.
- soldering has been found that problems arise during soldering: repeated soldering at connection points for the components is practically impossible. Every soldering process after the first soldering leads to an increase in the reject rate. Soldering operations at the connection points can only be carried out several times by a complex remelting process under protective gas (for example nitrogen), in which expensive remelting devices are used. In addition, wetting problems sometimes occur on the copper surfaces provided with the organic protective layer.
- protective gas for example nitrogen
- the present invention is therefore based on the problem of avoiding the disadvantages of the known methods and in particular of a method find with which both bonded components and soldered components can be attached to a circuit carrier surface.
- the method should be inexpensive and can be implemented with little effort.
- the method is also intended to be able to form the finest conductor structures, in particular conductor tracks and connection locations for electronic components, the structures being intended to be reproducible with steep flanks.
- the method according to the invention is used to generate at least one solderable surface in selected soldering areas and at least one functional surface in functional areas different from the soldering areas on surfaces of copper structures on circuit carriers.
- a bondable surface is preferably produced as the functional surface.
- the functional surfaces can also be suitable for the production of detachable electrical contacts.
- solderable surfaces are then produced by depositing a solderable metal layer
- soldering compared to the method in which organic protective layers are used for the copper surfaces is particularly advantageous.
- reject rate with regard to the solderability during manufacture and also when equipping the circuit carriers is lower than in the known methods.
- Repeated remelting or soldering of individual connection locations for the components is also possible without problems. It has been found, for example, that the solder wetting of the solderable surfaces formed according to the invention is still within the required tolerance even after three remeltings.
- a very good shelf life of the circuit carriers produced according to the invention was found without the solderability in the soldering areas being significantly impaired.
- the appearance of gold layers as a functional layer is not impaired when the method according to the invention is carried out.
- the electrical contact resistance of these layers is suitable for being able to form detachable electrical contact surfaces.
- Another advantage over the method described in DE-OS 1 690 338 is that the method according to the invention can be used to form conductor runs and connection locations for electronic components which are very small, for example with a pitch of 100 ⁇ m and smaller.
- the flanks the conductors and connection points are very even, ie they have very steep flanks and a uniform width.
- no etching errors can be identified, for example under-etching, constrictions in the conductor runs or even interruptions in the conductor runs.
- At least one metal is preferably deposited, selected from the group comprising tin, silver, bismuth, palladium and their alloys. These metals can be deposited without current, i.e. on a chemically reductive or cementative route, so that even electrically insulated structures on the circuit carrier surface can be coated with the solderable layer without any problems.
- an electrolytic metal deposition process can also be used. This is the case, for example, when the individual structures are initially still connected to the so-called galvano edge, a larger copper conductive layer at the edge of the circuit carrier material. This edge is removed in the course of the method for producing the circuit carrier, so that the conductor structures are electrically insulated from one another.
- the flanks of the structures can also be covered by the solder layer and the functional layer. This provides additional protection against corrosion and other harmful influences. If, for example, the conductor structures were formed by etching only after the solderable and the functional layers had been applied, for example as in DE-OS 1 690 338, the unprotected flanks of the conductor lines would be attacked during the etching process, so that the conductor structures are not included uniform flanks arise. This problem does not exist in the method according to the invention. It is therefore possible to form very uniform conductor structures even with the smallest dimensions.
- the copper surfaces on the circuit carrier are preferably first cleaned, in particular with a (acidic, wetting agent-containing) cleaner. Then residues of the cleaning liquid are removed from the surfaces by rinsing. The copper surfaces are then preferably etched in order to ensure adequate adhesive strength of the subsequently applied metal layers.
- a commercially available etching cleaner can be used for this purpose, for example an aqueous sulfuric acid solution of hydrogen peroxide or a caroate salt or an aqueous solution of sodium peroxodisulfate.
- the copper surfaces are rinsed again and then preferably pre-immersed by treatment with a solution of acid, in particular sulfuric acid.
- the copper surfaces can be catalyzed with a solution containing precious metal ions in the acidic solution prior to the preliminary immersion treatment, so that tin can be deposited more easily.
- a conventional treatment solution can be used for the tin deposition.
- a cement-based tin deposition bath is preferably used.
- Such baths contain, in addition to at least one tin (II) compound, acid and usually thiourea or a thiourea derivative.
- these baths contain 15 g of stannous fluoroborate, 100 ml of fluoroboric acid, 100 g of thiourea and 2 mg of sodium lauryl sulfate in 1 l of aqueous solution or 5 g
- Tin (II) chloride 55 g N-methylthiourea, 20 g sulfuric acid, conc., 500 ml isopropanol and 500 ml water or 20 g tin (II) chloride, 25 ml hydrochloric acid (37% by weight), 50 ml Sulfuric acid (50% by weight), 16 g sodium hypophosphite, 200 g thiourea and 0.5 g phenolsulfonic acid in 1 l aqueous solution.
- the treatment temperature is 40 - 90 ° C.
- the treatment time is 30 seconds to 60 minutes.
- compositions specified in these documents are hereby included as compositions which can be used in the process according to the invention.
- the circuit carrier surfaces are generally first cleaned, then rinsed, then treated with a gloss etching solution (for example H 2 SO 4 / H 2 O 2 solution) and then rinsed again.
- a gloss etching solution for example H 2 SO 4 / H 2 O 2 solution
- the surfaces are then preferably pretreated with a pre-dip solution containing sulfuric acid.
- the silver layer is applied.
- a bath with the following composition can be used: 200 g sodium thiosulfate, 20 g sodium sulfite, 0.1 g disodium EDTA, 3 g silver as silver thiosulfate / sulfite complex, 5 g glycine in 11 aqueous solution.
- the pH can be adjusted to about 7.5 and the treatment temperature preferably to 50-95 ° C.
- the treatment time is 15 minutes, for example. Further examples are given, inter alia, in US Pat. No. 5,318,621.
- the compositions specified in this document are also hereby included as compositions which can be used in the process according to the invention.
- the surfaces are preferably treated with an inorganic salt solution and then rinsed.
- a solution containing 0.05 mol of palladium acetate, 0.1 mol of ethylenediamine, 0.2 mol of sodium formate and 0.15 mol of succinic acid in 1 l of aqueous solution can be used.
- the pH of this bath is preferably set to 5.5 and the temperature to about 70 ° C.
- Other possible compositions are, for example: 0.01 mol of palladium chloride, 0.08 mol of ethylenediamine, 20 mg of thiodiglycolic acid and 0.06 mol of sodium hypophosphite in 1 l of aqueous solution (pH 8, 60 ° C.).
- compositions specified in these documents are hereby included as compositions which can be used in the process according to the invention.
- a cover mask is formed in accordance with method step (c), the solderable regions being covered with the cover mask.
- the functional areas remain free so that the functional surfaces can then be created in the functional areas (method step (d)).
- a photostructured mask is preferably formed on the circuit carrier surface. This is created using the following process steps using a photoresist:
- the mask covering the soldering areas and not covering the functional areas can also be formed using a screen printing method.
- the solderable metal layer in the functional areas is preferably removed again with an acidic etching solution before carrying out process step (d).
- An etching solution containing nitric acid and inhibitors preferably imidazole derivatives
- Palladium and silver and their alloys as a solderable metal layer do not have to be removed.
- the functional In this case, the layer can be deposited on the palladium, silver or an alloy layer of these metals.
- the functional surfaces are preferably formed from at least one metal selected from the group comprising gold, palladium, silver and their alloys.
- the surfaces are formed in particular by chemical reductive or cementative deposition.
- the deposition of a combination layer comprising a nickel layer and a gold layer applied thereon is particularly preferred.
- the circuit carrier according to the invention preferably has at least one solderable surface made of at least one metal, selected from the group comprising tin, silver, palladium and their alloys, and at least one functional surface made of gold, the gold surface being formed by a combination layer of nickel and gold applied thereon is formed.
- a nickel / phosphorus layer is preferably chemically reductively deposited.
- a nickel / boron or a pure nickel layer can also be deposited.
- the circuit carriers can first be brought into contact with a solution containing wetting agents in order to completely wet the surfaces with liquid. This is followed by a rinsing step.
- the exposed copper surfaces are then preferably etched using a commercially available etching cleaner. Excess etchant is then removed in a further rinsing step.
- the surfaces can then be treated with a pre-dip solution containing sulfuric acid and then treated in an activation solution which contains palladium sulfate with a palladium content of 80-120 mg / l and sulfuric acid with a content of about 50 ml / l.
- an activation solution which contains palladium sulfate with a palladium content of 80-120 mg / l and sulfuric acid with a content of about 50 ml / l.
- a nickel, nickel / phosphorus or nickel / boron layer is deposited.
- Nickel baths are known per se. Usually these bakeries which operates at a temperature of 85 - 90 ° C. It has been found that the solderability of tin layers is particularly advantageous when the temperature load during nickel deposition is low. Therefore, nickel baths are preferably used which are operated at a temperature below 85 ° C., in particular below 80 ° C. and particularly preferably below 75 ° C. It has been found that particularly favorable conditions are achieved when a temperature in the electroless nickel deposition of 70 to 75 ° C is set.
- Baths with the following composition can be used for electroless gold plating: 0.015 mol sodium tetrachloroaurate (III), 0.1 mol sodium thiosulfate, 0.04 mol thiourea, 0.3 mol sodium sulfite and 0.1 mol sodium tetraborate in 1 l aqueous solution (pH 8 , 0, 90 ⁇ C) or 3 g sodium gold (I) sulfite, 70 g sodium sulfite, 110 g sodium ethylenediaminetetra (methylene phosphonate) and 10 g hydrazine hydrate in 1 I aqueous solution (pH 7, 60 ° C).
- compositions specified in these documents are hereby included as compositions which can be used in the process according to the invention.
- the gold layer is deposited directly onto a palladium layer that can be used as a solderable metal layer
- the following composition can be used, for example: 3 g of sodium gold (I) cyanide, 20 g of sodium formate, 20 g of ⁇ -alaninediacetic acid in 1 I of aqueous solution (pH 3, 5.89 ° C).
- I sodium gold
- cyanide sodium formate
- ⁇ -alaninediacetic acid in 1 I of aqueous solution (pH 3, 5.89 ° C).
- Other examples of this use case are included in
- compositions specified in this document are hereby included as compositions which can be used in the process according to the invention.
- the gold layer is deposited with an additional nickel layer on a palladium layer used as a solderable metal layer, the following procedure is followed: First, the circuit carriers provided with the palladium surfaces are brought into contact with a solution containing wetting agent in order to be able to safely wet the entire surface with liquid. Excess wetting agent solution is then rinsed off again and then a nickel layer is deposited in a manner known per se. After rinsing, the gold layer is formed.
- the circuit carriers provided with the silver layer are preferably first treated with a wetting solution, then rinsed and then treated in a pre-immersion solution containing inorganic salts and finally with a silver activation solution. After a further rinsing step, the nickel layer and after rinsing again the gold layer can be applied.
- the circuit carriers provided with the copper surfaces are preferably provided with a solder mask before carrying out method step (b).
- the method shown can be carried out in a conventional manner in an immersion system, the circuit carriers being attached to racks and immersed vertically hanging with them one after the other in the individual treatment baths. It is advantageous to treat the circuit carriers in a continuous system known per se, in which the circuit carriers are guided through the system in a horizontal transport direction and in a horizontal or vertical operating position and are brought into contact with the individual treatment solutions one after the other. For this purpose these solutions are conveyed via nozzles to the circuit carrier surfaces. In these systems, however, the circuit carriers can also be passed through a pent-up liquid bed without nozzles being provided for conveying the treatment solutions.
- FIG. 1 The steps of the method according to the invention are shown schematically in FIG. 1:
- the initial state is shown, copper structures 2 and 4 being shown on a substrate 1 of the circuit carrier.
- the connection locations formed from the copper structures 2 serve for the assembly of components which are fastened by soldering.
- the connection locations formed from the copper structures 4 serve for the assembly of components which are attached by bonding.
- the copper structures 4 can also be used to produce contact surfaces. Solder mask areas 3 can be seen between the copper structures 2 and 4.
- a tin layer 5 is deposited on all copper surfaces of structures 2 and 4 (method step B).
- a mask 6 is then applied over the areas on the circuit carrier which are to be given a solderable surface (method step C).
- a photostructurable resist layer is applied, which is formed by laminating a commercially available dry film resist, then exposing the resist layer to the desired pattern for the bond pads and developing the exposed resist layer.
- the tin layer 5 is then completely removed from the copper structures 4 again using a tin stripper.
- a nickel / phosphor layer 7 is then deposited on the exposed surfaces of the copper structures 4 and a gold layer 8 on the nickel / phosphor layer 7 (method step E).
- a finished structured printed circuit board which has conductor tracks, solder pads, bond pads, switch structures and metallized holes, was coated with a solderable tin layer in accordance with the following procedure I:
- the tin deposition solution had the following composition:
- the plate was then covered with a mask by laminating a dry film resist (W140 from DuPont de Nemours, DE) to the printed circuit board surfaces in accordance with the instructions for use, exposing the resist layer formed to the desired pattern and then developing the exposed resist layer. After carrying out the structuring process, some areas were covered by the resist (soldering areas), others were exposed (functional areas).
- a dry film resist W140 from DuPont de Nemours, DE
- the tin layers exposed in the functional areas and the intermetallic tin / copper phase on the copper structures were then removed using a tin stripper containing nitric acid.
- the electroless nickel plating solution had the following composition:
- a nickel / phosphorus layer with a thickness of 3 - 6 ⁇ m was deposited.
- the solution for the electroless deposition of gold had the following composition: 2 g / l Au + a gold complex salt 40 g / l ethylenediaminetetraacetic acid
- a gold layer with a thickness of 0.05-0.10 ⁇ m was deposited.
- the photostructured resist layer was removed from the circuit board surface using a method known per se, the plate was rinsed intensively and dried.
- the finished printed circuit board thus had areas which were coated with a nickel / gold combination layer for a soldering process with tin, for carrying out bonding processes and as a functional layer for other purposes, for example as electrical contact surfaces.
- the wetting angle was determined indirectly after wetting by measuring the size of a molten solder ball and calculating the wetting angle from it. Wetting was particularly good when a small contact angle could be determined.
- the contact angle should be less than 10 ° on average, whereby the standard deviation should not be greater than 1 °.
- the solution for electroless deposition of palladium had the following composition:
- a nickel / gold combination layer was then applied directly to the palladium layer in accordance with process sequence IV.
- a solution containing wetting agents was used to wet the circuit carrier surfaces.
- the solutions for electroless plating of nickel or gold had the same compositions as the nickel or gold plating solutions given in Example 1.
- a nickel layer with a thickness of 3-6 ⁇ m and a gold layer with a thickness of 0.05-0.10 ⁇ m were deposited.
- Example 3 In addition to soldering areas with palladium surfaces, the plate had areas with gold surfaces for high-quality functions.
- a circuit board structured according to Example 2 and coated with a solder mask was electrolessly coated with silver according to process sequence V:
- an acidic solution containing wetting agents was used, a solution containing H 2 ⁇ 2 / H 2 S0 4 as a gloss etching solution, a solution containing inorganic salts as a pre-immersion solution and also a solution containing an inorganic salt as the post-immersion solution.
- a silver layer with a thickness of 0.10-0.20 ⁇ m was deposited.
- a mask was then applied to the printed circuit board surface and structured, the conditions and materials used being identical to those of Example 1. This left some of the silver surfaces open. These surfaces were subsequently prepared with an activation process for a nickel / gold deposition and then coated with a nickel / gold combination layer. The silver layer was not removed.
- the process sequence VI used for this is shown below:
- compositions used in Examples 1 and 2 were again used for the wetting solution and the preliminary dipping solution.
- the solution for activation with silver contained Pd (N0 3 ) 2 .
- the solutions for electroless plating of nickel or gold had the same compositions as the nickel or gold plating solutions given in Example 1.
- a nickel layer with a thickness of 3-6 ⁇ m and a gold layer with a thickness of 0.05-0.10 ⁇ m were deposited.
- a circuit board provided with a solder mask with conductor tracks, solder pads, bond pads, switch structures and metallized holes was treated according to the following procedure VII:
- the conditions and materials for applying, exposing, developing and removing the dry film resist after the deposition of the nickel / gold combination layer were identical to the conditions and materials according to Example 1.
- the process conditions and bath compositions for depositing the nickel layer and the gold layer were also identical to the conditions and bath compositions according to Example 1.
- the exposed copper surfaces were previously treated with an etching solution containing KHS0 5 and H 2 S0 4 . treated.
- the aging resistance of the solderable surfaces was determined on the printed circuit boards produced in this way (samples referred to as "OSP"). The results obtained were compared with the results obtained on tin surfaces produced by the process according to the invention according to Example 1 (samples labeled "formerly Sn").
- the conditions of the reflow process were as follows: A certain amount of the RP10 solder paste from Multicore was printed in a thickness of 120 ⁇ m on the surfaces to be examined and then heated in a reflow oven to above the melting point. The solder of the paste became liquid and spread on the wettable surfaces.
- the wetting time t ⁇ [sec], the wetting force F 2 [mN / mm] after 2 sec and the wetting force F 6 [mN / mm] after 6 sec were measured with a soldering balance (Menisto ST-50 from Metronelec, FR). The lower the wetting time and the greater the wetting force, the greater the solderability of the surfaces examined.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10018025 | 2000-04-04 | ||
DE10018025A DE10018025A1 (de) | 2000-04-04 | 2000-04-04 | Verfahren zum Erzeugen von lötfähigen Oberflächen und funktionellen Oberflächen auf Schaltungsträgern |
PCT/DE2001/001232 WO2001076334A1 (de) | 2000-04-04 | 2001-03-28 | Verfahren zum erzeugen von lötfähigen und funktionellen oberflächen auf schaltungsträgern |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1163827A1 true EP1163827A1 (de) | 2001-12-19 |
Family
ID=7638400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01927633A Withdrawn EP1163827A1 (de) | 2000-04-04 | 2001-03-28 | Verfahren zum erzeugen von lötfähigen und funktionellen oberflächen auf schaltungsträgern |
Country Status (7)
Country | Link |
---|---|
US (1) | US6698648B2 (de) |
EP (1) | EP1163827A1 (de) |
KR (1) | KR20020042524A (de) |
CA (1) | CA2365701A1 (de) |
DE (1) | DE10018025A1 (de) |
HK (1) | HK1040880A1 (de) |
WO (1) | WO2001076334A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006080493A (ja) * | 2004-08-12 | 2006-03-23 | Ricoh Microelectronics Co Ltd | 電極基板 |
GB2417127A (en) * | 2004-08-12 | 2006-02-15 | Vetco Gray Controls Ltd | Surface metallization of contact pads |
US7626829B2 (en) * | 2004-10-27 | 2009-12-01 | Ibiden Co., Ltd. | Multilayer printed wiring board and manufacturing method of the multilayer printed wiring board |
KR100660889B1 (ko) * | 2005-11-14 | 2006-12-26 | 삼성전자주식회사 | 반도체 패키지의 위스커 결함을 억제하는 인쇄회로기판 및이를 이용한 반도체 패키지 탑재방법 |
US8834729B2 (en) * | 2009-11-30 | 2014-09-16 | Eastman Kodak Company | Method of making bondable printed wiring member |
US8394713B2 (en) * | 2010-02-12 | 2013-03-12 | Freescale Semiconductor, Inc. | Method of improving adhesion of bond pad over pad metallization with a neighboring passivation layer by depositing a palladium layer |
EP2709160B1 (de) * | 2012-09-14 | 2016-03-30 | ATOTECH Deutschland GmbH | Verfahren zur Metallisierung von Solarzellensubstraten |
US10051746B2 (en) * | 2014-12-16 | 2018-08-14 | Amphenol Corporation | High-speed interconnects for printed circuit boards |
US11470727B2 (en) * | 2016-10-24 | 2022-10-11 | Jaguar Land Rover Limited | Apparatus and method relating to electrochemical migration |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1690338A1 (de) * | 1968-01-17 | 1971-05-13 | Telefunken Patent | Verfahren zur Herstellung gedruckter Leiterplatten |
US4104111A (en) * | 1977-08-03 | 1978-08-01 | Mack Robert L | Process for manufacturing printed circuit boards |
DE3011697A1 (de) | 1980-03-26 | 1981-10-01 | Shipley Co., Inc., Newton, Mass. | Saures chemisches verzinnungsbad |
US4424241A (en) * | 1982-09-27 | 1984-01-03 | Bell Telephone Laboratories, Incorporated | Electroless palladium process |
DE3312725A1 (de) * | 1983-04-08 | 1984-10-11 | Siemens AG, 1000 Berlin und 8000 München | Bond- und loetbare duennschichtleiterbahnen mit durchkontaktierungen |
US4487654A (en) * | 1983-10-27 | 1984-12-11 | Ael Microtel Limited | Method of manufacturing printed wiring boards |
US4816070A (en) | 1985-08-29 | 1989-03-28 | Techo Instruments Investments Ltd. | Use of immersion tin and alloys as a bonding medium for multilayer circuits |
US4720324A (en) * | 1985-10-03 | 1988-01-19 | Hayward John S | Process for manufacturing printed circuit boards |
US5202151A (en) * | 1985-10-14 | 1993-04-13 | Hitachi, Ltd. | Electroless gold plating solution, method of plating with gold by using the same, and electronic device plated with gold by using the same |
DE3704547A1 (de) * | 1987-02-13 | 1988-08-25 | Bbc Brown Boveri & Cie | Verfahren zur herstellung von loetpads und bondpads auf duennschichthybridschaltungen |
US5235139A (en) * | 1990-09-12 | 1993-08-10 | Macdermid, Incorprated | Method for fabricating printed circuits |
JPH0828561B2 (ja) * | 1991-01-18 | 1996-03-21 | 石原薬品株式会社 | プリント配線板の製造法 |
US5250105A (en) * | 1991-02-08 | 1993-10-05 | Eid-Empresa De Investigacao E Desenvolvimento De Electronica S.A. | Selective process for printing circuit board manufacturing |
DE4311266A1 (de) * | 1992-04-13 | 1993-10-14 | Mitsubishi Electric Corp | Stromlos lötbeschichtete Leiterplatte und Verfahren zur Herstellung einer solchen |
US5311404A (en) * | 1992-06-30 | 1994-05-10 | Hughes Aircraft Company | Electrical interconnection substrate with both wire bond and solder contacts |
GB2273257B (en) | 1992-06-30 | 1996-03-27 | Hughes Aircraft Co | Electrical interconnection substrate with both wire bond and solder contacts |
DE69224914T2 (de) * | 1992-11-25 | 1998-10-22 | Kanto Kagaku | Stromloses goldbeschichtungsbad |
US5536908A (en) * | 1993-01-05 | 1996-07-16 | Schlumberger Technology Corporation | Lead-free printed circuit assembly |
US5364460A (en) * | 1993-03-26 | 1994-11-15 | C. Uyemura & Co., Ltd. | Electroless gold plating bath |
US5318621A (en) * | 1993-08-11 | 1994-06-07 | Applied Electroless Concepts, Inc. | Plating rate improvement for electroless silver and gold plating |
EP0697805A1 (de) | 1994-08-05 | 1996-02-21 | LeaRonal, Inc. | Herstellung von Leiterplatten unter Verwendung stromloser Palladiumplattierung |
WO1996008037A1 (en) * | 1994-09-06 | 1996-03-14 | Sheldahl, Inc. | Printed circuit substrate having unpackaged integrated circuit chips directly mounted thereto and method of manufacture |
EP0762813A1 (de) * | 1995-08-25 | 1997-03-12 | Macdermid Incorporated | Verfahren zur Herstellung von Leiterplatten |
US6044550A (en) * | 1996-09-23 | 2000-04-04 | Macdermid, Incorporated | Process for the manufacture of printed circuit boards |
DE19745602C1 (de) * | 1997-10-08 | 1999-07-15 | Atotech Deutschland Gmbh | Verfahren und Lösung zur Herstellung von Goldschichten |
DE19745601C2 (de) | 1997-10-08 | 2001-07-12 | Fraunhofer Ges Forschung | Lösung und Verfahren zum stromlosen Abscheiden von Goldschichten sowie Verwendung der Lösung |
KR20010042625A (ko) | 1998-04-23 | 2001-05-25 | 그레고루 후렝크, 디터 베크베르트 | 주석 또는 주석 합금층으로 구리 또는 구리 합금의 표면을피복하는 방법 |
US6242078B1 (en) * | 1998-07-28 | 2001-06-05 | Isola Laminate Systems Corp. | High density printed circuit substrate and method of fabrication |
US6278153B1 (en) * | 1998-10-19 | 2001-08-21 | Nec Corporation | Thin film capacitor formed in via |
US6383401B1 (en) * | 2000-06-30 | 2002-05-07 | International Flex Technologies, Inc. | Method of producing flex circuit with selectively plated gold |
-
2000
- 2000-04-04 DE DE10018025A patent/DE10018025A1/de not_active Withdrawn
-
2001
- 2001-03-28 WO PCT/DE2001/001232 patent/WO2001076334A1/de not_active Application Discontinuation
- 2001-03-28 CA CA002365701A patent/CA2365701A1/en not_active Abandoned
- 2001-03-28 KR KR1020017011206A patent/KR20020042524A/ko not_active Application Discontinuation
- 2001-03-28 EP EP01927633A patent/EP1163827A1/de not_active Withdrawn
- 2001-03-28 US US09/937,363 patent/US6698648B2/en not_active Expired - Fee Related
-
2002
- 2002-04-04 HK HK02102552.4A patent/HK1040880A1/zh unknown
Non-Patent Citations (1)
Title |
---|
See references of WO0176334A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20030052157A1 (en) | 2003-03-20 |
CA2365701A1 (en) | 2001-10-11 |
HK1040880A1 (zh) | 2002-06-21 |
DE10018025A1 (de) | 2001-10-18 |
WO2001076334A1 (de) | 2001-10-11 |
US6698648B2 (en) | 2004-03-02 |
KR20020042524A (ko) | 2002-06-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69125233T2 (de) | Verfahren zur Herstellung von gedruckten Schaltungen | |
DE69509116T2 (de) | Beschichtung mit silber | |
DE69728812T2 (de) | Verfahren zur Erhöhung der Lötbarkeit einer Oberfläche | |
DE102005037321B4 (de) | Verfahren zur Herstellung von Halbleiterbauteilen mit Leiterbahnen zwischen Halbleiterchips und einem Schaltungsträger | |
DE797690T1 (de) | Herstellung von gedruckten schaltungen | |
DE69317033T2 (de) | Verfahren zum Bilden eines Lotfilms | |
DE3421988C2 (de) | ||
DE3016132C2 (de) | Verfahren zur Herstellung von gegen Hitzeschockeinwirkung widerstandsfähigen gedruckten Schaltungen | |
DE2728465A1 (de) | Verfahren zur herstellung von elektrisch leitenden und loetbaren anordnungen | |
DE69934379T2 (de) | Verbundmaterial zur Verwendung in der Herstellung von gedruckten Leiterplatten | |
DE19740431C1 (de) | Verfahren zum Metallisieren eines elektrisch nichtleitende Oberflächenbereiche aufweisenden Substrats | |
DE10261460A1 (de) | Halbleitervorrichtung | |
EP1021593B1 (de) | Verfahren und lösung zur herstellung von goldschichten | |
WO2001076334A1 (de) | Verfahren zum erzeugen von lötfähigen und funktionellen oberflächen auf schaltungsträgern | |
DE3828700C2 (de) | Kupferplattierter Leiterrahmen für Halbleiter-Kunststoff-Gehäuse | |
US5766492A (en) | Method of metal-plating electrode portions of printed-wiring board | |
WO1999055935A1 (de) | Verfahren zum überziehen von oberflächen auf kupfer oder einer kupferlegierung mit einer zinn- oder zinnlegierungsschicht | |
DE69023816T2 (de) | Verfahren zur Herstellung gedruckter Schaltungsplatten. | |
DE19631565A1 (de) | Verfahren zum Herstellen von Palladiumkontaktbumps auf Halbleiterschaltungsträgern | |
DE19716044C2 (de) | Verfahren zum selektiven galvanischen Aufbringen von Lotdepots auf Leiterplatten | |
DE102004030800B4 (de) | Verfahren zur Herstellung einer keramischen Leiterplatte | |
DE19540122C2 (de) | Verfahren zur stromlosen Metallisierung und seine Anwendung | |
DE102005061799B4 (de) | Verfahren zur Metallisierung von Silberoberflächen und seine Verwendung | |
DE10126734B4 (de) | Umverdrahtungsverfahren und damit hergestelltes Bauelement | |
DE3885286T2 (de) | Filmträger und Verfahren zur Herstellung desselben. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20010731 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20041012 |
|
REG | Reference to a national code |
Ref country code: HK Ref legal event code: WD Ref document number: 1040880 Country of ref document: HK |