EP0925196A1 - Verfahren zum herstellen einer gewebebahn, insbesondere für eine siebdruckform, sowie gewebe, insbesondere siebdruckgewebe - Google Patents
Verfahren zum herstellen einer gewebebahn, insbesondere für eine siebdruckform, sowie gewebe, insbesondere siebdruckgewebeInfo
- Publication number
- EP0925196A1 EP0925196A1 EP97941985A EP97941985A EP0925196A1 EP 0925196 A1 EP0925196 A1 EP 0925196A1 EP 97941985 A EP97941985 A EP 97941985A EP 97941985 A EP97941985 A EP 97941985A EP 0925196 A1 EP0925196 A1 EP 0925196A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- fabric
- layer
- screen printing
- metal coating
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/24—Stencils; Stencil materials; Carriers therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/24—Stencils; Stencil materials; Carriers therefor
- B41N1/247—Meshes, gauzes, woven or similar screen materials; Preparation thereof, e.g. by plasma treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
- Y10T442/259—Coating or impregnation provides protection from radiation [e.g., U.V., visible light, I.R., micscheme-change-itemave, high energy particle, etc.] or heat retention thru radiation absorption
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/30—Woven fabric [i.e., woven strand or strip material]
- Y10T442/3382—Including a free metal or alloy constituent
- Y10T442/3398—Vapor or sputter deposited metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/30—Woven fabric [i.e., woven strand or strip material]
- Y10T442/3382—Including a free metal or alloy constituent
- Y10T442/3415—Preformed metallic film or foil or sheet [film or foil or sheet had structural integrity prior to association with the woven fabric]
Definitions
- the invention relates to a method for producing a fabric web, in particular for use as a screen printing form made of a plastic fabric.
- the invention relates to a fabric of intersecting strands, in particular a screen printing fabric made primarily of plastic threads.
- a screen printing cloth over a printing frame made of light metal, wood or the like. stretched and glued in its tensioned position to the printing frame. Cleaning the fabric enables the subsequent application of a light-sensitive emulsion, for example using a coating trough manually or mechanically with an automatic coating machine. Since the coating cannot be created exactly up to the inside of the frame, the remaining surface must be subsequently sealed with a screen filler. Now the coated surface is exposed by means of a copy template (film) corresponding to the print image. The unexposed areas of the printed image are washed out. After drying the The template is retouched and the edges covered with a screen filler.
- a copy template film
- the fabric especially a plastic fabric, is vapor-coated with a metallic jacket layer and then galvanically coated.
- the tissue can also be prepared for electroplating by so-called sputtering - by cathode sputtering.
- sputtering by cathode sputtering.
- all vapor deposition materials can be freely selected and adapted to the subsequent electroplating.
- nickel is preferred above all because of its chemical resistance; other substances advantageously used here are gold, silver, copper, steel or a light metal - in particular aluminum - alone or as an alloy.
- the vapor deposition or sputtering process should be carried out on both sides, and it can also be repeated several times for special requirements.
- Layer thicknesses of about 5 to over 200 nanometers - above all over 50 nm - are produced which, depending on the type of fabric and type of vapor deposition, can have surface resistances of about 0.2 ohm / 2 to over a hundred ohm / 2.
- Cathode sputtering - i.e. the sputtering mentioned - or plasma spraying in vacuum is used to produce the electrical conductivity of the tissue.
- the mechanical properties of the metallized tissue are mainly determined by the galvanization; the elongation is markedly reduced with increased strength of the fabric and - regardless of the type of starting fabric - the sliding resistance of the fabric is increased extraordinarily.
- the metallizing substances primarily contribute to the strength at the binding points of the fabric made of plastic base materials and form a conductive surface. This makes it possible to replace expensive metallic fabrics with metallized plastic fabrics with similar properties.
- the basis for the - ready-made and coated - screen printing form is therefore a metallized plastic fabric is used, preferably with a metal coating made of nickel because of its general strength.
- the metallic surface of the screen printing plate reduces the wear of the stencil, making it possible to achieve very long print runs.
- the conductive surface of the screen printing plate prevents static charges. Restrictions regarding substrates or inks due to structural problems can practically be excluded.
- the metallized plastic fabric according to the invention ensures minimal stretching with a sufficient basic strength and has the effect that there are barely measurable register differences on the template, regardless of the tensioning set.
- the full-surface coating of the limited flexible, metallized fabric results in a high, reproducible stencil quality with excellent edge sharpness and exact color metering. Any protective film that is applied reduces incorrect manipulation, which could result in a loss of coating quality. Since the coating is carried out on the endless fabric roll, there is no need for masking work, as is common today.
- any plastic base materials can be used for metallic evaporation or sputtering, for example PET, PA, PE, HPPE or the like ;
- the vaporization materials are also practically freely selectable and can e.g. be coordinated with a subsequent electroplating process
- the galvanic metal deposition which can be freely determined in terms of its thickness, can be carried out directly on the cladding layer;
- the meshes of the fabric can no longer be pushed or deformed, ie pulling in one thread direction does not lead to a deformation of the fabric - very open-meshed fabrics retain their mesh geometry when subjected to mechanical stress.
- the invention serves primarily to produce a screen printing stencil, fabrics for other uses can also be treated in the manner described, in particular filter fabrics or surface elements for shielding in the field of electronics.
- FIG. 3 an enlarged detail from FIG. 2 with an oblique view of a binding of two crossing threads.
- a fabric 10 for producing screen printing stencils is produced from intersecting warp threads 12 and weft threads 14, according to FIG. 1 in a so-called plain weave, in which a repeat unit - a repetition unit 16 defined by a certain number of binding points 16 - two warp threads 12 and two weft threads 14 each.
- These threads 12, 14 can consist of any plastic base materials, such as polyamide (PA), polyethylene (PE), polyethylene terephthalate (PET) or the like more.
- the plastic fabric 10 is continuously subjected to an evaporation process as a roll, the maximum web length being determined by the highest possible winding diameter in the evaporation system.
- This dry coating process can also lead to material accumulations in the region of each bond 16, one of which is indicated at 20 in FIG. 2 between the crossing threads 12, 14.
- Direct galvanic metal deposition can now be carried out on the plastic fabric prepared by vapor deposition in the manner described. Any metals may be used, such as Cu, Ni or the like.
- the evaporation material and the evaporation thickness must be matched to the subsequent electroplating process in order to avoid that the cladding layer 18 is degraded by the electroplating bath, as a result of which the conductivity of the evaporation would be reduced or eliminated during longer exposure times.
- Combinations for galvanic metallization include:
- the galvanic metallization can be carried out as a continuous process with practically any roll length and leads to a closed metal coating 22 of selectable layer thickness e - of preferably 2 ⁇ m to 20 ⁇ m and more - over the entire fabric 10; this metal coating 22 ensures both high mechanical stability, above all sliding resistance, and chemical resistance of the metallized fabric 10; its strength is - as I said - significantly increased with a significant reduction in elasticity.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Textile Engineering (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Physical Vapour Deposition (AREA)
- Printing Plates And Materials Therefor (AREA)
- Coloring (AREA)
- Electroplating Methods And Accessories (AREA)
- Treatment Of Fiber Materials (AREA)
- Woven Fabrics (AREA)
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19637267 | 1996-09-13 | ||
DE19637267 | 1996-09-13 | ||
PCT/EP1997/004844 WO1998010940A1 (de) | 1996-09-13 | 1997-09-06 | Verfahren zum herstellen einer gewebebahn, insbesondere für eine siebdruckform, sowie gewebe, insbesondere siebdruckgewebe |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0925196A1 true EP0925196A1 (de) | 1999-06-30 |
EP0925196B1 EP0925196B1 (de) | 2000-11-15 |
Family
ID=7805493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97941985A Expired - Lifetime EP0925196B1 (de) | 1996-09-13 | 1997-09-06 | Verfahren zum herstellen einer gewebebahn, insbesondere für eine siebdruckform, sowie gewebe, insbesondere siebdruckgewebe |
Country Status (16)
Country | Link |
---|---|
US (1) | US6284679B1 (de) |
EP (1) | EP0925196B1 (de) |
JP (1) | JP2001500080A (de) |
KR (1) | KR20000036100A (de) |
CN (1) | CN1230148A (de) |
AT (1) | ATE197575T1 (de) |
AU (1) | AU4382697A (de) |
BR (1) | BR9712045A (de) |
CA (1) | CA2265677A1 (de) |
CZ (1) | CZ80799A3 (de) |
DE (3) | DE19738872A1 (de) |
ES (1) | ES2154471T3 (de) |
ID (1) | ID18271A (de) |
PT (1) | PT925196E (de) |
TW (1) | TW424055B (de) |
WO (1) | WO1998010940A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10639913B2 (en) | 2015-12-11 | 2020-05-05 | Ms Printing Solutions S.R.L | Printing on sheet fibrous material |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030134558A1 (en) * | 2002-01-16 | 2003-07-17 | Lien Jung Shen | Metallized fiber structure and its manufacturing method |
US7514030B2 (en) * | 2002-12-30 | 2009-04-07 | Albany International Corp. | Fabric characteristics by flat calendering |
DE102008055973A1 (de) * | 2008-08-05 | 2010-02-11 | Sefar Ag | Flächenstück sowie Verfahren zu dessen Herstellung |
DE102009033510A1 (de) | 2008-11-13 | 2010-05-20 | Sefar Ag | Gewebe, Vorrichtung mit Gewebe sowie Herstellungsverfahren für Gewebe |
DE102008057303A1 (de) | 2008-11-13 | 2010-05-20 | Sefar Ag | Elektrisch leitend beschichtetes Siebdruckgewebe sowie Siebdruckanordnung |
BR112012012159A2 (pt) * | 2009-11-13 | 2016-04-12 | Dsm Ip Assets Bv | fios de hppe monofilamento ou multifilamentos |
TWI532537B (zh) * | 2011-08-10 | 2016-05-11 | 太陽誘電化學技術股份有限公司 | 包含底質薄膜之印刷用構造體、印刷用孔版及該印刷用構造體之製造方法 |
DE102011052792B4 (de) * | 2011-08-18 | 2014-05-22 | HARTING Electronics GmbH | Isolierkörper mit Schirmkreuz |
DE102012022004B3 (de) | 2012-11-12 | 2014-02-06 | HARTING Electronics GmbH | Isolierkörper mit Schirmkreuz |
DE102013009462A1 (de) * | 2013-06-06 | 2014-12-11 | Gallus Ferd. Rüesch AG | Verfahren zum Herstellen einer Siebstruktur |
DE102014213822A1 (de) * | 2014-07-16 | 2016-01-21 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, und Verfahren zur Herstellung desselben |
DE102014110340A1 (de) * | 2014-07-22 | 2016-01-28 | Haver & Boecker Ohg | Drahtgewebeeinheit |
US20180201010A1 (en) * | 2017-01-18 | 2018-07-19 | Microsoft Technology Licensing, Llc | Screen printing liquid metal |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7416897A (nl) * | 1974-12-27 | 1976-06-29 | Stork Brabant Bv | Werkwijze voor het vervaardigen van een geme- talliseerd zeefgaas, alsmede zeefgaas verkregen onder toepassing van deze werkwijze. |
NL9302238A (nl) * | 1993-12-22 | 1995-07-17 | Stork Screens Bv | Metallisch zeefmateriaal met draad- of vezelstruktuur en werkwijze voor de vervaardiging van een dergelijk materiaal. |
-
1997
- 1997-09-05 DE DE19738872A patent/DE19738872A1/de not_active Withdrawn
- 1997-09-05 DE DE19738874A patent/DE19738874A1/de not_active Ceased
- 1997-09-06 EP EP97941985A patent/EP0925196B1/de not_active Expired - Lifetime
- 1997-09-06 AU AU43826/97A patent/AU4382697A/en not_active Abandoned
- 1997-09-06 JP JP10513223A patent/JP2001500080A/ja active Pending
- 1997-09-06 AT AT97941985T patent/ATE197575T1/de not_active IP Right Cessation
- 1997-09-06 PT PT97941985T patent/PT925196E/pt unknown
- 1997-09-06 CA CA002265677A patent/CA2265677A1/en not_active Abandoned
- 1997-09-06 KR KR1019997002119A patent/KR20000036100A/ko not_active Application Discontinuation
- 1997-09-06 WO PCT/EP1997/004844 patent/WO1998010940A1/de not_active Application Discontinuation
- 1997-09-06 DE DE59702649T patent/DE59702649D1/de not_active Expired - Fee Related
- 1997-09-06 CN CN97197815A patent/CN1230148A/zh active Pending
- 1997-09-06 CZ CZ99807A patent/CZ80799A3/cs unknown
- 1997-09-06 US US09/254,835 patent/US6284679B1/en not_active Expired - Fee Related
- 1997-09-06 ES ES97941985T patent/ES2154471T3/es not_active Expired - Lifetime
- 1997-09-06 BR BR9712045A patent/BR9712045A/pt not_active Application Discontinuation
- 1997-09-15 ID IDP973196A patent/ID18271A/id unknown
-
1998
- 1998-02-20 TW TW086113095A patent/TW424055B/zh not_active IP Right Cessation
Non-Patent Citations (1)
Title |
---|
See references of WO9810940A1 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10639913B2 (en) | 2015-12-11 | 2020-05-05 | Ms Printing Solutions S.R.L | Printing on sheet fibrous material |
Also Published As
Publication number | Publication date |
---|---|
US6284679B1 (en) | 2001-09-04 |
ATE197575T1 (de) | 2000-12-15 |
DE59702649D1 (de) | 2000-12-21 |
DE19738874A1 (de) | 1998-04-23 |
DE19738872A1 (de) | 1998-04-23 |
EP0925196B1 (de) | 2000-11-15 |
BR9712045A (pt) | 1999-08-24 |
TW424055B (en) | 2001-03-01 |
KR20000036100A (ko) | 2000-06-26 |
CN1230148A (zh) | 1999-09-29 |
CZ80799A3 (cs) | 1999-07-14 |
CA2265677A1 (en) | 1998-03-19 |
ES2154471T3 (es) | 2001-04-01 |
AU4382697A (en) | 1998-04-02 |
WO1998010940A1 (de) | 1998-03-19 |
ID18271A (id) | 1998-03-19 |
JP2001500080A (ja) | 2001-01-09 |
PT925196E (pt) | 2001-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0925196B1 (de) | Verfahren zum herstellen einer gewebebahn, insbesondere für eine siebdruckform, sowie gewebe, insbesondere siebdruckgewebe | |
DE3789301T2 (de) | Verfahren und Vorrichtung zur Herstellung von leitfähigen siebgedruckten Durchleitlöchern unter Verwendung von metallisch plattierten Dickpolymerfilmen. | |
DE2728084A1 (de) | Verfahren zum herstellen einer nahtlosen zylindrischen schablone sowie unter anwendung des verfahrens hergestellte siebdruckschablone | |
DE102010021062A1 (de) | Flächiges Siebmaterial und Sieb | |
EP0925195B1 (de) | Druckvorrichtung mit einer flexiblen siebdruckform in einem druckrahmen sowie siebdruckform dafür | |
DE3441593A1 (de) | Verfahren und vorrichtung zum herstellen von siebdruckgeweben fuer siebdruckzylinder | |
DE2918063C3 (de) | Verfahren zur Herstellung einer Siebtrommel für den Rotationssiebdruck | |
DE102018004838A1 (de) | Ecran de serigraphie et procede d'obtention de vitrages munis de motifs electroconducteurs | |
EP2810778B1 (de) | Verfahren zum Herstellen einer Siebstruktur | |
DE3231831A1 (de) | Verfahren zur herstellung eines rotationsdrucksiebs | |
DE4123702C2 (de) | ||
DE2945778A1 (de) | Nahtloser siebdruckzylinder und herstellungsverfahren dafuer | |
DE2225826C3 (de) | Verfahren zum Herstellen einer Vielzahl von jeweils ein Loch enthaltenden Elektroden für Elektronenstrahlsysteme | |
DE2502466B2 (de) | WechselschuB-Papiermaschinensieb | |
DE1461088A1 (de) | Metallgewebe fuer Papiermaschinen sowie Verfahren zur Herstellung derselben | |
DE2032644C3 (de) | Verfahren zur Herstellung von Siebdruckschablonen und Gitter zur Durchführung dieses Verfahrens | |
DE2936693A1 (de) | Rotations-filmdruck-walze und herstellungsverfahren dafuer | |
DE2051728A1 (de) | Verfahren zum Herstellen einer Metall schablone | |
EP1149189A2 (de) | Verfahren zur herstellung einer selbsttragenden metallfolie | |
DE2324635C3 (de) | Schablonendruckverfahren und Drucksiebanordnung | |
DE1436928A1 (de) | Verfahren und Vorrichtung zum Formen von Papierstoff u.dgl. | |
DE1934410C3 (de) | Verfahren zur Herstellung von Flachschablonen für den Schablonendruck | |
DE1920458A1 (de) | Verfahren zur Herstellung eines freitragenden Druckrasters | |
DE1909863A1 (de) | Schablonenzylinder,insbesondere fuer Rotationsfilmdruckmaschinen sowie Verfahren zu dessen Herstellung | |
MXPA99002289A (es) | Proceso para la produccion de una cinta de tela,en particular, para una forma de impresion por serigrafia y una tela, en particular una tela paraimpresion por serigrafia |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19990323 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE ES FR GB IE IT LI NL PT |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
17Q | First examination report despatched |
Effective date: 19991027 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH DE ES FR GB IE IT LI NL PT |
|
REF | Corresponds to: |
Ref document number: 197575 Country of ref document: AT Date of ref document: 20001215 Kind code of ref document: T |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: GERMAN |
|
REF | Corresponds to: |
Ref document number: 59702649 Country of ref document: DE Date of ref document: 20001221 |
|
ITF | It: translation for a ep patent filed |
Owner name: DE DOMINICIS & MAYER S.R.L. |
|
ET | Fr: translation filed | ||
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20010216 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: HIEBSCH & PEEGE AG PATENTANWAELTE |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2154471 Country of ref document: ES Kind code of ref document: T3 |
|
REG | Reference to a national code |
Ref country code: PT Ref legal event code: SC4A Free format text: AVAILABILITY OF NATIONAL TRANSLATION Effective date: 20010212 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20010823 Year of fee payment: 5 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: PT Payment date: 20010827 Year of fee payment: 5 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20010921 Year of fee payment: 5 Ref country code: ES Payment date: 20010921 Year of fee payment: 5 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20010924 Year of fee payment: 5 Ref country code: AT Payment date: 20010924 Year of fee payment: 5 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20010925 Year of fee payment: 5 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IE Payment date: 20011001 Year of fee payment: 5 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20011003 Year of fee payment: 5 |
|
26N | No opposition filed | ||
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20011116 Year of fee payment: 5 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020906 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020906 Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020906 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020907 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020930 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020930 Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020930 |
|
BERE | Be: lapsed |
Owner name: *SEFAR A.G. Effective date: 20020930 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030331 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030401 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030401 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20020906 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030603 |
|
REG | Reference to a national code |
Ref country code: PT Ref legal event code: MM4A Free format text: LAPSE DUE TO NON-PAYMENT OF FEES Effective date: 20030331 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20031011 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050906 |