EP0770710B1 - Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen - Google Patents
Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen Download PDFInfo
- Publication number
- EP0770710B1 EP0770710B1 EP96116639A EP96116639A EP0770710B1 EP 0770710 B1 EP0770710 B1 EP 0770710B1 EP 96116639 A EP96116639 A EP 96116639A EP 96116639 A EP96116639 A EP 96116639A EP 0770710 B1 EP0770710 B1 EP 0770710B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrolyte
- process according
- adducts
- operated
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000009713 electroplating Methods 0.000 title abstract 2
- 239000003792 electrolyte Substances 0.000 claims abstract description 48
- 239000000203 mixture Substances 0.000 claims abstract description 8
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 6
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 11
- -1 2-sulphobenzoic acid imide Chemical class 0.000 claims description 6
- 150000001447 alkali salts Chemical class 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical class C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 150000003456 sulfonamides Chemical class 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- 238000004458 analytical method Methods 0.000 claims description 2
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 claims 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 abstract description 2
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 238000011179 visual inspection Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 239000000839 emulsion Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 230000004313 glare Effects 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 239000005711 Benzoic acid Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 101100453960 Drosophila melanogaster klar gene Proteins 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- DIKJULDDNQFCJG-UHFFFAOYSA-M sodium;prop-2-ene-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC=C DIKJULDDNQFCJG-UHFFFAOYSA-M 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- the invention relates to a method for galvanic Separation of glare-free nickel deposits on one metallic surface.
- nickel precipitation also includes nickel alloy precipitation.
- metallic surface also includes metallized surfaces of non-metallic objects.
- the deposition is operated so that the electrolyte has a temperature in the Has a range of 40 to 75 ° C.
- the adducts are like this selected that the adducts in the working electrolyte form a finely dispersed emulsion that turns out to be turbidity expresses.
- the droplets of the emulsion are the reason for this viewed that a glare-free surface forms.
- the Glare-free is in need of improvement.
- nonionic surfactant can be used can, because the cloud point, that is, the electrolyte temperature, at which the surfactant precipitates, from which chemical structure and concentration of substances in the Electrolyte depends.
- the drop of emulsion increases the risk of agglomeration unsuitably large conglomerates of emulsion drops that satin-like deposition disturb, so large that special Measures are mandatory to complete the procedure to be able to use it permanently in practice.
- the invention is based on the technical problem that Procedure of the structure described at the beginning and of the beginning described purpose so that reproducibly a much improved defined Glare-free is achieved.
- the usual basic gloss agents used are "sulfonic acids such as benzenesulfonic acid, naphthalenetrisulfonic acid, alkanesulfonic acids or also sulfonamides or sulfonimides or the corresponding alkali salts" or mixtures thereof, in an amount of 0.5 to 10 g / l.
- a substance from the group "the unsaturated aliphatic sulfonic acids or their alkali metal salts" or mixtures thereof are used for the purpose of producing the glare-free nickel deposits.
- the concentration of the adducts added is expediently chosen in the range from 0.5 to 10 g / l.
- the electrolyte is preferably operated in a temperature range of 50 to 65 ° C during the electrolytic deposition. Wetting agents and organic sulfinic acids or their alkali salts can also be added to the electrolyte.
- the invention is based on the knowledge that even without Formation of a visible, cloudy emulsion and corresponding organic foreign matter in the electrolyte high quality glare control is achieved when after the teaching of the invention is proceeded.
- the invention applied nickel layer has a completely different structure than the known method described above generated. That is related below Exemplary embodiments explained. It can be left open remain whether according to the invention are still teardrop-shaped at all Precipitations occur. Drop-shaped precipitates are in the Precipitation mainly related to the surface tension is stabilized as drops. In any case, the effects occur for the qualitative high-quality, reproducible glare control is required - and surprisingly, disruptive conglomerates that disturb the glare-free and have to be filtered, not observed.
- the current densities can largely be adapted to the operating conditions. It has proven useful to operate the electrolyte with a current density of 0.1 to 10 A / dm 2 .
- the electrolyte is preferably operated with a current density of approximately 4 A / dm 2 .
- the treatment time for the nickel deposition is largely arbitrary and can be adapted to the operating conditions, in particular also the layer thickness. Within the scope of the invention, the treatment time for the nickel deposition is preferably 1 to 120 min., Preferably about 10 min. is.
- the electrolyte can always be operated without secondary circulation. Secondary circuit free means that a secondary circuit with filter devices or cooling devices is not required.
- Example 1 The anti-glare of the coating according to Example 1 is compared to the embodiment of Example 2 clearly improved.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims (10)
- Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen auf einer metallischen Oberfläche mit den Merkmalen:mit der Maßgabe, daß die Konzentration gemäß 1.3) und die Temperatur gemäß 1.4) so gewählt werden, daß der arbeitende Elektrolyt bei Augeninspektion klar erscheint und bei Lichtdurchfall eine diffuse Streuung praktisch nicht zeigt.1.1) es wird mit einem Elektrolyten der Gruppe "Watts'scher Elektrolyt, Elektrolyte auf Basis von Sulfamat, Sulfonat, Fluoroborat" oder Mischungen davon gearbeitet, dem ein übliches Grundglanzmittel beigegeben worden ist,1.2) es werden zum Zwecke der Erzeugung der blendfreien Nickelniederschläge substituierte und/oder unsubstituierte Äthylenoxid-Addukte oder Propylenoxid-Addukte oder Äthylenoxid-Propylenoxid-Addukte verwendet und dem Elektrolyten beigegeben,1.3) die Konzentration der gemäß 1.2) beigegebenen Addukte wird in einen Bereich von größer Null bis 5 mg/l gewählt,1.4) bei der galvanischen Abscheidung wird der Elektrolyt in einem Temperaturbereich von 40 bis 75° C betrieben,
- Verfahren nach Anspruch 1, wobei mit einem Watts'schen Elektrolyten gearbeitet wird, der eine Richtanalyse mitund im Rest das Grundglanzmittel und die Addukte sowie Wasser aufweist.70 bis 140 g/l Nickel,1 bis 20 g/l Chlorid,30 bis 50 g/l H3BO3
- Verfahren nach einem der Ansprüche 1 oder 2, wobei als Grundglanzmittel eine Substanz der Gruppe "2-Sulfobenzoesäureimid, 1,3-Benzoldisulfonsäure und Naphthalintrisulfonsäure bzw. deren Alkalisalze" oder Mischungen davon bzw. "Arylsulfonsäuren, Alkylsulfonsäuren, Sulfonamide und Sulfonimide bzw. deren Alkalisalze" oder Mischungen davon verwendet werden, und zwar in einer Menge von 0,5 bis 10 g/l.
- Verfahren nach einem der Ansprüche 1 bis 3, wobei als Grundglanzmittel eine Substanz der Gruppe "ungesättigte aliphatische Sulfonsäuren bzw. deren Alkalisalze" oder Mischungen davon verwendet werden.
- Verfahren nach Anspruch 4, wobei die Konzentration des Grundglanzmittels in einem Bereich von 0,5 bis 10 g/l gewählt wird.
- Verfahren nach einem der Ansprüche 1 bis 5, wobei bei der galvanischen Abscheidung der Elektrolyt in einem Temperaturbereich von 50 bis 65° C betrieben wird.
- Verfahren nach einem der Ansprüche 1 bis 6, wobei der Elektrolyt mit einer Stromdichte von 0,1 bis 10 A/dm2 betrieben wird.
- Verfahren nach einem der Ansprüche 1 bis 7, wobei der Elektrolyt mit einer Stromdichte von etwa 4 A/dm2 betrieben wird.
- Verfahren nach einem der Ansprüche 1 bis 8, wobei mit einer Behandlungszeit für die Nickelabscheidung gearbeitet wird, die 1 bis 120 min., vorzugsweise etwa 10 min., beträgt.
- Verfahren nach einem der Ansprüche 1 bis 9, wobei der Elektrolyt nebenkreislauffrei betrieben wird.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19540011 | 1995-10-27 | ||
| DE19540011A DE19540011C2 (de) | 1995-10-27 | 1995-10-27 | Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen |
| DE9540011U | 1995-10-27 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0770710A1 EP0770710A1 (de) | 1997-05-02 |
| EP0770710B1 true EP0770710B1 (de) | 1999-01-07 |
| EP0770710B2 EP0770710B2 (de) | 2002-08-14 |
Family
ID=7775920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP96116639A Expired - Lifetime EP0770710B2 (de) | 1995-10-27 | 1996-10-17 | Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5897763A (de) |
| EP (1) | EP0770710B2 (de) |
| JP (1) | JPH09202987A (de) |
| AT (1) | ATE175453T1 (de) |
| DE (2) | DE19540011C2 (de) |
| ES (1) | ES2128135T5 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6251253B1 (en) * | 1999-03-19 | 2001-06-26 | Technic, Inc. | Metal alloy sulfate electroplating baths |
| US6248228B1 (en) * | 1999-03-19 | 2001-06-19 | Technic, Inc. And Specialty Chemical System, Inc. | Metal alloy halide electroplating baths |
| WO2000056952A1 (en) * | 1999-03-19 | 2000-09-28 | Technic, Incorporated | Electroplating baths |
| US6797141B1 (en) * | 1999-11-25 | 2004-09-28 | Enthone Inc. | Removal of coagulates from a non-glare electroplating bath |
| US6306275B1 (en) * | 2000-03-31 | 2001-10-23 | Lacks Enterprises, Inc. | Method for controlling organic micelle size in nickel-plating solution |
| DE10025552C1 (de) | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
| DE10222962A1 (de) | 2002-05-23 | 2003-12-11 | Atotech Deutschland Gmbh | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| JP4811880B2 (ja) * | 2006-01-06 | 2011-11-09 | エントン インコーポレイテッド | 艶消し金属層を堆積するための電解液および工程 |
| EP2620529B1 (de) * | 2012-01-25 | 2014-04-30 | Atotech Deutschland GmbH | Verfahren zur Herstellung von matten Kupferablagerungen |
| JP6760166B2 (ja) | 2017-03-23 | 2020-09-23 | トヨタ自動車株式会社 | ニッケル皮膜の形成方法及び当該方法に使用するためのニッケル溶液 |
| US11505867B1 (en) | 2021-06-14 | 2022-11-22 | Consolidated Nuclear Security, LLC | Methods and systems for electroless plating a first metal onto a second metal in a molten salt bath, and surface pretreatments therefore |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2238861A (en) * | 1938-07-06 | 1941-04-15 | Harshaw Chem Corp | Electrodeposition of metals |
| DE1134258B (de) * | 1959-05-06 | 1962-08-02 | Dehydag Gmbh | Saures galvanisches Nickelbad |
| DE1621085C3 (de) * | 1967-05-16 | 1980-02-14 | Henkel Kgaa, 4000 Duesseldorf | Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage |
| US3839166A (en) * | 1967-05-16 | 1974-10-01 | Henkel & Cie Gmbh | Method for obtaining nickel deposits with satin finish |
| US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
| BE794695A (fr) * | 1972-01-29 | 1973-05-16 | W Kampschulte & Cie K G Dr | Bain galvanique de nickel pour la separation de revetements de nickel satines mats |
| DE2327881B2 (de) * | 1973-06-01 | 1978-06-22 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge |
| JPS56152988A (en) * | 1980-04-30 | 1981-11-26 | Nobuyuki Koura | Nickel satin finish plating bath of heavy ruggedness |
| JPS61238993A (ja) * | 1985-04-16 | 1986-10-24 | Dai Ichi Kogyo Seiyaku Co Ltd | 電気メツキ浴用添加剤 |
| JPS62205041A (ja) * | 1986-03-05 | 1987-09-09 | Nisso Yuka Kogyo Kk | 1,4−ブチンジオ−ルのヒドロキシアルキルエ−テル化物の製造方法およびこれを用いたニツケルメツキ処理液 |
-
1995
- 1995-10-27 DE DE19540011A patent/DE19540011C2/de not_active Expired - Lifetime
-
1996
- 1996-10-17 EP EP96116639A patent/EP0770710B2/de not_active Expired - Lifetime
- 1996-10-17 DE DE59601103T patent/DE59601103D1/de not_active Expired - Lifetime
- 1996-10-17 AT AT96116639T patent/ATE175453T1/de not_active IP Right Cessation
- 1996-10-17 ES ES96116639T patent/ES2128135T5/es not_active Expired - Lifetime
- 1996-10-25 JP JP8284052A patent/JPH09202987A/ja active Pending
- 1996-10-25 US US08/736,906 patent/US5897763A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0770710B2 (de) | 2002-08-14 |
| ES2128135T3 (es) | 1999-05-01 |
| DE59601103D1 (de) | 1999-02-18 |
| ES2128135T5 (es) | 2003-03-01 |
| EP0770710A1 (de) | 1997-05-02 |
| ATE175453T1 (de) | 1999-01-15 |
| DE19540011A1 (de) | 1997-04-30 |
| DE19540011C2 (de) | 1998-09-10 |
| JPH09202987A (ja) | 1997-08-05 |
| US5897763A (en) | 1999-04-27 |
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