ES2128135T5 - Procedimiento para el deposito galvanico de precipitados de niquel antideslumbrantes. - Google Patents

Procedimiento para el deposito galvanico de precipitados de niquel antideslumbrantes.

Info

Publication number
ES2128135T5
ES2128135T5 ES96116639T ES96116639T ES2128135T5 ES 2128135 T5 ES2128135 T5 ES 2128135T5 ES 96116639 T ES96116639 T ES 96116639T ES 96116639 T ES96116639 T ES 96116639T ES 2128135 T5 ES2128135 T5 ES 2128135T5
Authority
ES
Spain
Prior art keywords
electrolyte
adducts
procedure
galvanic deposit
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96116639T
Other languages
English (en)
Other versions
ES2128135T3 (es
Inventor
Carmen Elligsen
Gerd Schongen
Detlef Kowczyk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LPW Chemie GmbH
Original Assignee
LPW Chemie GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7775920&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2128135(T5) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by LPW Chemie GmbH filed Critical LPW Chemie GmbH
Publication of ES2128135T3 publication Critical patent/ES2128135T3/es
Application granted granted Critical
Publication of ES2128135T5 publication Critical patent/ES2128135T5/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Abstract

PROCEDIMIENTO PARA EL DEPOSITO GALVANICO DE PRECIPITACIONES DE NIQUEL O DE ALEACIONES DE NIQUEL SIN BRILLO SOBRE UNA SUPERFICIE METALICA CON LAS SIGUIENTES CARACTERISTICAS. SE TRABAJA PREFERENTEMENTE CON UN ELECTROLITO DE WATT, AL CUAL SE LE HA AÑADIDO UN ABRILLANTADOR NORMAL DE BASE. PARA FORMAR LAS PRECIPITACIONES DE NIQUEL SIN BRILLO SE UTILIZAN ADUCTOS DE OXIDO DE ETILENO O DE OXIDO DE PROPILENO O DE OXIDO DE ETILENO Y PROPILENO SUSTITUIDOS Y/O SIN SUSTITUIR, Y SE LE AÑADE EL ELECTROLITO, ELIGIENDOSE LA CONCENTRACION DE LOS ADUCTOS AÑADIDOS EN UN INTERVALO DESDE MAYOR QUE CERO HASTA 5 MG/L. SE FUNCIONA DURANTE LA PRECIPITACION GALVANICA CON EL ELECTROLITO CON UNA TEMPERATURA ENTRE 40 A 75 RACION Y LA TEMPERATURA, QUE EL ELECTROLITO TRABAJANDO TENGA A OJO UN ASPECTO CLARO Y QUE NO MUESTRE PRACTICAMENTE NINGUNA DISPERSION DIFUSA AL PASO DE LA LUZ.
ES96116639T 1995-10-27 1996-10-17 Procedimiento para el deposito galvanico de precipitados de niquel antideslumbrantes. Expired - Lifetime ES2128135T5 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19540011A DE19540011C2 (de) 1995-10-27 1995-10-27 Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen

Publications (2)

Publication Number Publication Date
ES2128135T3 ES2128135T3 (es) 1999-05-01
ES2128135T5 true ES2128135T5 (es) 2003-03-01

Family

ID=7775920

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96116639T Expired - Lifetime ES2128135T5 (es) 1995-10-27 1996-10-17 Procedimiento para el deposito galvanico de precipitados de niquel antideslumbrantes.

Country Status (6)

Country Link
US (1) US5897763A (es)
EP (1) EP0770710B2 (es)
JP (1) JPH09202987A (es)
AT (1) ATE175453T1 (es)
DE (2) DE19540011C2 (es)
ES (1) ES2128135T5 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6248228B1 (en) * 1999-03-19 2001-06-19 Technic, Inc. And Specialty Chemical System, Inc. Metal alloy halide electroplating baths
US6251253B1 (en) * 1999-03-19 2001-06-26 Technic, Inc. Metal alloy sulfate electroplating baths
KR100840451B1 (ko) * 1999-03-19 2008-06-20 테크닉,인코포레이티드 수성 전기도금욕, 수성 전기도금욕의 제조 방법, 및 그 수성 전기도금욕을 이용한 도금 방법
US6797141B1 (en) * 1999-11-25 2004-09-28 Enthone Inc. Removal of coagulates from a non-glare electroplating bath
US6306275B1 (en) * 2000-03-31 2001-10-23 Lacks Enterprises, Inc. Method for controlling organic micelle size in nickel-plating solution
DE10025552C1 (de) 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
DE10222962A1 (de) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
JP4811880B2 (ja) * 2006-01-06 2011-11-09 エントン インコーポレイテッド 艶消し金属層を堆積するための電解液および工程
PL2620529T3 (pl) * 2012-01-25 2014-09-30 Atotech Deutschland Gmbh Sposób wytwarzania matowych warstw miedzianych
JP6760166B2 (ja) 2017-03-23 2020-09-23 トヨタ自動車株式会社 ニッケル皮膜の形成方法及び当該方法に使用するためのニッケル溶液
US11505867B1 (en) 2021-06-14 2022-11-22 Consolidated Nuclear Security, LLC Methods and systems for electroless plating a first metal onto a second metal in a molten salt bath, and surface pretreatments therefore

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2238861A (en) * 1938-07-06 1941-04-15 Harshaw Chem Corp Electrodeposition of metals
DE1134258B (de) * 1959-05-06 1962-08-02 Dehydag Gmbh Saures galvanisches Nickelbad
DE1621085C3 (de) * 1967-05-16 1980-02-14 Henkel Kgaa, 4000 Duesseldorf Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage
US3839166A (en) * 1967-05-16 1974-10-01 Henkel & Cie Gmbh Method for obtaining nickel deposits with satin finish
US3839165A (en) * 1967-08-26 1974-10-01 Henkel & Cie Gmbh Nickel electroplating method
BE794695A (fr) * 1972-01-29 1973-05-16 W Kampschulte & Cie K G Dr Bain galvanique de nickel pour la separation de revetements de nickel satines mats
DE2327881B2 (de) * 1973-06-01 1978-06-22 Langbein-Pfanhauser Werke Ag, 4040 Neuss Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge
JPS56152988A (en) * 1980-04-30 1981-11-26 Nobuyuki Koura Nickel satin finish plating bath of heavy ruggedness
JPS61238993A (ja) * 1985-04-16 1986-10-24 Dai Ichi Kogyo Seiyaku Co Ltd 電気メツキ浴用添加剤
JPS62205041A (ja) * 1986-03-05 1987-09-09 Nisso Yuka Kogyo Kk １，４−ブチンジオ−ルのヒドロキシアルキルエ−テル化物の製造方法およびこれを用いたニツケルメツキ処理液

Also Published As

Publication number Publication date
EP0770710B2 (de) 2002-08-14
EP0770710B1 (de) 1999-01-07
ATE175453T1 (de) 1999-01-15
DE19540011C2 (de) 1998-09-10
US5897763A (en) 1999-04-27
JPH09202987A (ja) 1997-08-05
ES2128135T3 (es) 1999-05-01
DE59601103D1 (de) 1999-02-18
DE19540011A1 (de) 1997-04-30
EP0770710A1 (de) 1997-05-02

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