EP0751233B1 - Kupferband oder -blech mit brauner Deckschicht und Verfahren zu seiner Herstellung - Google Patents
Kupferband oder -blech mit brauner Deckschicht und Verfahren zu seiner Herstellung Download PDFInfo
- Publication number
- EP0751233B1 EP0751233B1 EP96109446A EP96109446A EP0751233B1 EP 0751233 B1 EP0751233 B1 EP 0751233B1 EP 96109446 A EP96109446 A EP 96109446A EP 96109446 A EP96109446 A EP 96109446A EP 0751233 B1 EP0751233 B1 EP 0751233B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- copper
- layer
- semi
- strip
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010949 copper Substances 0.000 title claims abstract description 63
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 230000008569 process Effects 0.000 title description 6
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000010438 heat treatment Methods 0.000 claims abstract description 21
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 4
- 239000010953 base metal Substances 0.000 claims abstract description 3
- 150000001451 organic peroxides Chemical class 0.000 claims abstract description 3
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 claims abstract 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 9
- 238000011282 treatment Methods 0.000 claims description 8
- 238000005253 cladding Methods 0.000 claims description 7
- 239000000243 solution Substances 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 150000002978 peroxides Chemical class 0.000 claims description 2
- NHYCGSASNAIGLD-UHFFFAOYSA-N Chlorine monoxide Chemical class Cl[O] NHYCGSASNAIGLD-UHFFFAOYSA-N 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 159000000011 group IA salts Chemical class 0.000 abstract description 2
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical class ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 abstract 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 13
- 241001184547 Agrostis capillaris Species 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 241001311547 Patina Species 0.000 description 5
- 238000004040 coloring Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000011265 semifinished product Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 239000005749 Copper compound Substances 0.000 description 1
- WGKMWBIFNQLOKM-UHFFFAOYSA-N [O].[Cl] Chemical compound [O].[Cl] WGKMWBIFNQLOKM-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 1
- 239000003830 anthracite Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- PTVDYARBVCBHSL-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu] PTVDYARBVCBHSL-UHFFFAOYSA-N 0.000 description 1
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Definitions
- the invention relates on the one hand to a copper strip or sheet with a reddish brown to dark brown top layer for the Application in construction.
- the invention is based on preferred method for producing a brown top layer on a band-shaped semi-finished product made of copper, especially on rolled strips and sheets for the Roof covering and facade cladding, directed.
- the formation of the brown top layer can, however, differ certain atmospheric conditions in places considerably delay but also accelerate, so that usually relatively must be waited for a long time until a uniform discoloration the copper surface is reached. Deviations from one Uniform tints are especially in the early stages to watch the weathering. On the copper surface In many cases, uneven dark spots are formed and / or strips. In the further course of weathering these color differences disappear due to atmospheric influences however watch.
- a process for making even layers Copper (I) oxide on the surface of copper wire or ribbon is, for example, in Chemical Abstracts, Volume 83, No. 2, July 1975, page 258, abstract No. 32184t mentioned.
- an oxidizing heat treatment at a temperature range formed from 300 to 1000 ° C temperature is, for example, in Chemical Abstracts, Volume 83, No. 2, July 1975, page 258, abstract No. 32184t mentioned.
- the invention is based on the object, on the one hand, a copper strip available or sheet of the type mentioned to put that on the surface a uniform and adheres to brown top layer (brown patina) and this simply with reduced solubility of copper ions handle and process.
- the object of the invention is a method for the production of a brown top layer made of copper to create existing ribbon-shaped semi-finished products.
- the two-layer cover layer then consists of a first layer of Cu 2 O adhering to the base metal with a thickness in the range from 0.05 to 5 ⁇ m, preferably in the range of 0.1 to 1 ⁇ m, and a second layer of CuO with a layer arranged above it Thickness between 1 and 100 nm, preferably with a thickness between 10 and 50 nm.
- the improved adhesive strength of the top layer and the even more uniform brown coloring of the pre-patinated copper surface can be achieved by carrying out a second heat treatment under oxidizing conditions immediately after the first heat treatment under a defined oxygen-containing mixed gas atmosphere to form a CuO layer.
- the Cu 2 O intermediate layer serves as an adhesion promoter for the CuO layer.
- the Cu 2 O layer protects the copper sheet from local corrosion, while the CuO layer is responsible for the reduction of surface corrosion (copper ion solubility) due to acid rainwater or other media aggressive to copper.
- a cold-rolled and possibly degreased strip of SF copper according to DIN 1787 with a thickness of 0.6 mm and a width of 100 mm (sample 1) was roughened uniformly by means of a rough work roll. The average roughness of the surface of the copper strip was 5 ⁇ m.
- the copper strip was then fed to a laboratory furnace for heat treatment, the operating temperature of which was set at about 480 ° C.
- a controlled gas atmosphere made of nitrogen with 2% by volume oxygen was set in the furnace chamber and the copper strip was held for 5 minutes under these conditions.
- sample 1 was cooled to room temperature in a cooling chamber under protective gas, for example argon.
- the heat-treated copper strip showed a regular red Cu 2 O oxide layer about 1 ⁇ m thick, the crystals of which had an average grain size of 0.05 ⁇ m.
- sample 1 was subjected to a second heat treatment at a temperature of 300 ° C. in a mixed gas atmosphere with a higher oxygen content than in the first heat treatment, for example atmospheric air.
- a second heat treatment a thin dark brown CuO oxide layer with a thickness of approximately 0.05 ⁇ m (50 nm) grew on the surface of the Cu 2 O intermediate layer.
- CuO layers on copper surfaces are usually black and consist of tenorite crystals. However, if a thin CuO layer is built up on a red Cu 2 O intermediate layer through a targeted second heat treatment or through chemical post-oxidation, the color values of the two oxide layers add up to the desired red-brown to dark-brown top layer.
- the thickness of the Cu 2 O intermediate layer is below 0.05 ⁇ m, the proportion of the red color is too small to obtain a dark brown color of the cover layer together with the CuO layer.
- the thickness of the Cu 2 O intermediate layer (cuprite) is greater than 5 ⁇ m, the adhesion of this intermediate layer is disadvantageously reduced and the deformability of the layer is no longer guaranteed.
- the best properties with regard to color, adhesion and deformability occur in the thickness range of the intermediate layer from 0.2 to 0.7 ⁇ m.
- a copper sheet referred to as sample 3 was first used to form the Cu 2 O intermediate layer for 1.5 minutes at 550 ° C. and then to form a thin CuO layer for 10 minutes at 350 ° C. under oxidizing conditions of a heat treatment subjected. After these two heat treatments, sample 3 was cold worked to increase strength by about 10%.
- a cold-rolled strip of SF-Cu (hard as rolled) in accordance with DIN 1787 with a thickness of 0.63 mm and a width of 1000 mm was subjected to recrystallization annealing in a continuous furnace with simultaneous surface oxidation.
- the heat treatment took place above the recrystallization temperature of the copper strip in a controlled gas atmosphere with about 5% oxygen.
- the copper strip was passed through an oxidation bath heated to about 70 ° C., which consists of a mixture of about 40 g / l sodium hydroxide solution and about 20 g / l potassium peroxodisulfate.
- the copper strip was then rinsed with water and dried with hot air.
- the dwell times of the copper strip in the continuous furnace and in the chemical oxidation bath can be determined by the time required for soft annealing. After these treatment steps, the copper tape had a uniform, red-brown to dark-brown top layer.
- the thickness of the Cu 2 O layer was determined to be 0.7 ⁇ m by scanning electron microscopy, while the thickness of the CuO layer was approximately 0.05 ⁇ m.
- the copper tape can then be used to increase the strength still be rolled half hard. Neither here nor with supplementary ones Bending or folding operations showed damage or peeling of the top layer.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Treatment Of Metals (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
Description
Claims (15)
- Kupferband oder -blech mit einer rotbraunen bis dunkelbraunen Deckschicht für die Anwendung im Baubereich, dadurch gekennzeichnet, daß die Deckschicht aus einer am Basismetall haftenden ersten Schicht aus Cu2O mit einer im Bereich von 0,05 bis 5 µm, vorzugsweise im Bereich von 0,1 bis 1 µm liegenden Dicke und einer darüber angeordneten zweiten Schicht aus CuO mit einer Dicke zwischen 1 und 100 nm, vorzugsweise mit einer Dicke zwischen 10 und 50 nm, besteht.
- Kupferband oder -blech nach Anspruch 1, dadurch gekennzeichnet, daß die Cu2O-Kristalle eine im Bereich von 0,005 bis 0,5 µm liegende Korngröße, vorzugsweise eine mittlere Korngröße von etwa 0,05 µm aufweisen.
- Verfahren zur Herstellung einer braunen Deckschicht auf aus Kupfer bestehendem bandförmigem Halbzeug, insbesondere gewalzten Bändern oder Blechen für die Dachabdekkung und Fassadenbekleidung, gekennzeichnet durch die Kombination folgender Verfahrensschritte:a) Das bandförmige Kupferhalbzeug wird bei einer im Temperaturbereich von 250 bis 750 °C liegenden Temperatur für eine Dauer von 0,1 bis 5 Minuten in einer bis zu 15 Vol.% Sauerstoff enthaltenden Mischgasatmosphäre einer ersten Wärmebehandlung zur Bildung einer Cu2O-Schicht unterzogen.b) Im Anschluß an die erste Wärmebehandlung nach Verfahrensschritt a) wird das bandförmige Kupferhalbzeug einer zweiten Wärmebehandlung unter oxidierenden Bedingungen zur Bildung einer CuO-Schicht unterzogen, wobei die zweite Wärmebehandlung für eine Dauer von 1 bis 30 Minuten im Temperaturbereich von 200 bis 450 °C durchgeführt wird und wobei die Mischgasatmosphäre einen Sauerstoffgehalt zwischen 10 und 21 Vol.% aufweist.
- Verfahren zur Herstellung einer braunen Deckschicht auf aus Kupfer bestehendem bandförmigem Halbzeug, insbesondere gewalzten Bändern oder Blechen für die Dachabdekkung und Fassadenbekleidung, gekennzeichnet durch die Kombination folgender Verfahrensschritte:c) Das bandförmige Kupferhalbzeug wird bei einer im Temperaturbereich von 250 bis 750 °C liegenden Temperatur für eine Dauer von 0,1 bis 5 Minuten in einer Sauerstoff enthaltenden Mischgasatmosphäre wärmebehandelt, deren Sauerstoffgehalt 1 bis 21 Vol.% beträgt.d) Im Anschluß an die Wärmebehandlung nach Verfahrensschritt c) wird das bandförmige Kupferhalbzeug mit einer wässerigen Lösung aus einem alkalisch reagierenden Salz allein oder in Verbindung mit mindestens einem Salz aus der anorganische Peroxide, organische Peroxide und Chlorsauerstoffsäuren umfassenden Gruppe behandelt.
- Verfahren nach Anspruch 3 oder 4, dadurch gekennzeichnet, daß mindestens eine Oberfläche des bandförmigen Kupferhalbzeugs vor dem Verfahrensschritt a) oder c) mittels texturierter Walzen strukturiert wird.
- Verfahren nach einem der Ansprüche 3 bis 5, dadurch gekennzeichnet, daß die Wärmebehandlung nach Verfahrensschritt a) oder c) bei einer Temperatur zwischen 450 und 600 °C durchgeführt wird.
- Verfahren nach einem der Ansprüche 3 bis 6, dadurch gekennzeichnet, daß der Sauerstoffgehalt der Mischgasatmosphäre nach Verfahrensschritt a) oder c) 3 bis 10 Vol.% beträgt.
- Verfahren nach mindestens einem der Ansprüche 4 bis 7, dadurch gekennzeichnet, daß die wässerige Behandlungslösung einen pH-Wert größer als 8 aufweist.
- Verfahren nach Anspruch 8, dadurch gekennzeichnet, daß der pH-Wert der Behandlungslösung zwischen 10 und 14 beträgt.
- Verfahren nach mindestens einem der Ansprüche 4 bis 9, dadurch gekennzeichnet, daß die Behandlungslösung nach Verfahrensschritt d) eine Temperatur von 30 bis 90 °C aufweist und die Behandlung für einen Zeitraum zwischen 15 und 120 Sekunden erfolgt.
- Verfahren nach mindestens einem der Ansprüche 4 bis 10, dadurch gekennzeichnet, daß das bandförmige Kupferhalbzeug in der wässerigen Lösung zusätzlich elektrolytisch behandelt wird, wobei das Kupferhalbzeug als Anode geschaltet ist.
- Verfahren nach Anspruch 11, dadurch gekennzeichnet, daß durch die Anode ein elektrischer Strom mit einer Stromdichte von 1 bis 20 A/dm2 fließt.
- Verfahren nach einem der Ansprüche 3 bis 9, dadurch gekennzeichnet, daß das bandförmige Kupferhalbzeug nach dem Verfahrensschritt a) oder c) und/oder nach dem Verfahrensschritt b) oder d) einer mechanischen Verformung um bis zu 40 % unterzogen wird.
- Verfahren nach Anspruch 13, dadurch gekennzeichnet, daß die Verformung zwischen 5 und 7 % beträgt.
- Verfahren nach Anspruch 13 oder 14, dadurch gekennzeichnet, daß die Verformung mittels texturierter Arbeitswalzen durchgeführt wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19523646 | 1995-06-29 | ||
DE19523646A DE19523646A1 (de) | 1995-06-29 | 1995-06-29 | Kupferband oder -blech mit brauner Deckschicht und Verfahren zu seiner Herstellung |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0751233A1 EP0751233A1 (de) | 1997-01-02 |
EP0751233B1 true EP0751233B1 (de) | 1999-01-07 |
EP0751233B2 EP0751233B2 (de) | 2005-12-07 |
Family
ID=7765548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96109446A Expired - Lifetime EP0751233B2 (de) | 1995-06-29 | 1996-06-13 | Kupferband oder -blech mit brauner Deckschicht und Verfahren zu seiner Herstellung |
Country Status (8)
Country | Link |
---|---|
US (1) | US5962116A (de) |
EP (1) | EP0751233B2 (de) |
AT (1) | ATE175450T1 (de) |
CA (1) | CA2179097C (de) |
DE (2) | DE19523646A1 (de) |
DK (1) | DK0751233T4 (de) |
ES (1) | ES2128810T5 (de) |
GR (1) | GR3029669T3 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9988713B2 (en) * | 2013-03-12 | 2018-06-05 | Arizona Board Of Regents On Behalf Of Arizona State University | Thin film devices and methods for preparing thin film devices |
DE102014010711B4 (de) * | 2014-07-19 | 2019-08-29 | Wieland-Werke Ag | Verfahren zur Glühbehandlung von zinkhaltigen Kupferlegierungsbändern |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB309966A (en) * | 1927-12-14 | 1929-04-15 | Hanovia Chemical & Mfg Co | Improvements in and relating to processes for the production of crystalline cuprous oxide upon copper surfaces |
CA734897A (en) † | 1960-02-11 | 1966-05-24 | Aktiebolaget Svenska Metallverken | Method for applying green patina to objects, preferably made from copper or copper alloys |
US3398028A (en) * | 1965-03-31 | 1968-08-20 | Olin Mathieson | Process of forming a red, cuprous oxide coating on copper |
US3434889A (en) * | 1965-12-27 | 1969-03-25 | Budd Co | Copper foil surface treatment |
JPS5841349B2 (ja) * | 1976-10-08 | 1983-09-12 | 古河電気工業株式会社 | 熱伝導性に優れた低温用導電材料の製造方法 |
US4189331A (en) * | 1978-06-22 | 1980-02-19 | Canada Wire And Cable Limited | Oxidation resistant barrier coated copper based substrate and method for producing the same |
SE8303976L (sv) * | 1983-10-05 | 1985-04-06 | Thermacore Ab | Patineringsforfarande |
JPH03260074A (ja) * | 1990-03-12 | 1991-11-20 | Mitsubishi Electric Corp | 銅系金属材料の製造方法 |
DE4034249A1 (de) * | 1990-10-27 | 1992-04-30 | Kabelmetal Ag | Verfahren zur herstellung von braunen deckschichten auf kupfer |
EP0488299B1 (de) * | 1990-11-30 | 1995-08-16 | Toppan Printing Co., Ltd. | Verfahren zur Herstellung einer Mehrschichtverdrahtungsplatine |
JPH05222471A (ja) * | 1991-12-16 | 1993-08-31 | Toshiba Corp | 装飾用銅鉄合金 |
-
1995
- 1995-06-29 DE DE19523646A patent/DE19523646A1/de not_active Withdrawn
-
1996
- 1996-06-13 ES ES96109446T patent/ES2128810T5/es not_active Expired - Lifetime
- 1996-06-13 DE DE59601100T patent/DE59601100D1/de not_active Expired - Lifetime
- 1996-06-13 DK DK96109446T patent/DK0751233T4/da active
- 1996-06-13 EP EP96109446A patent/EP0751233B2/de not_active Expired - Lifetime
- 1996-06-13 CA CA002179097A patent/CA2179097C/en not_active Expired - Fee Related
- 1996-06-13 AT AT96109446T patent/ATE175450T1/de not_active IP Right Cessation
- 1996-06-25 US US08/668,675 patent/US5962116A/en not_active Expired - Lifetime
-
1999
- 1999-03-12 GR GR990400753T patent/GR3029669T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
ATE175450T1 (de) | 1999-01-15 |
DK0751233T3 (da) | 1999-08-30 |
DE59601100D1 (de) | 1999-02-18 |
DK0751233T4 (da) | 2006-04-18 |
US5962116A (en) | 1999-10-05 |
CA2179097C (en) | 2001-01-23 |
EP0751233A1 (de) | 1997-01-02 |
CA2179097A1 (en) | 1996-12-30 |
DE19523646A1 (de) | 1997-01-02 |
ES2128810T5 (es) | 2006-06-16 |
EP0751233B2 (de) | 2005-12-07 |
GR3029669T3 (en) | 1999-06-30 |
ES2128810T3 (es) | 1999-05-16 |
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