EP0737760B1 - Galvanisches Platinbad - Google Patents
Galvanisches Platinbad Download PDFInfo
- Publication number
- EP0737760B1 EP0737760B1 EP96102799A EP96102799A EP0737760B1 EP 0737760 B1 EP0737760 B1 EP 0737760B1 EP 96102799 A EP96102799 A EP 96102799A EP 96102799 A EP96102799 A EP 96102799A EP 0737760 B1 EP0737760 B1 EP 0737760B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- acid
- platinum
- electroplating bath
- complex
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims description 57
- 229910052697 platinum Inorganic materials 0.000 title claims description 29
- 238000009713 electroplating Methods 0.000 title claims 5
- 239000002253 acid Substances 0.000 claims description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 7
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims description 7
- 239000003792 electrolyte Substances 0.000 claims description 6
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 5
- 239000000080 wetting agent Substances 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 235000011149 sulphuric acid Nutrition 0.000 claims 1
- 239000001117 sulphuric acid Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000001447 alkali salts Chemical class 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- -1 platinum amine Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GKNWQHIXXANPTN-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JKPSQSMDEZAAQY-UHFFFAOYSA-N [Pt+2].[Pt+4] Chemical class [Pt+2].[Pt+4] JKPSQSMDEZAAQY-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical class OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- OPUAWDUYWRUIIL-UHFFFAOYSA-N methanedisulfonic acid Chemical compound OS(=O)(=O)CS(O)(=O)=O OPUAWDUYWRUIIL-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- VYECFMCAAHMRNW-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O.NS(O)(=O)=O VYECFMCAAHMRNW-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Definitions
- the invention relates to a galvanic platinum bath, especially for the deposition of thick layers, the 5 to 30 Contains g / l of platinum as an amine sulfamato complex and a pH value less than 1.
- Electrodeposition of platinum acidic and alkaline baths based on platinum (II) - and Platinum (IV) compounds are used.
- the main types of bath contain diamminodinitritoplatinum (II) (P salt), Sulfatodinitritoplatinic acid (DNA) or Hexahydroxoplatinic acid, or its alkali salts.
- the types of baths mentioned are mainly only suitable for Deposition of thin platinum layers of a few ⁇ m.
- the Deposition of thick layers for technical applications a general problem with platinum. Either the layers have high internal tensions, become cracked and burst even on, or the electrolytes are insufficient stable and decompose during the long electrolysis times relatively quickly.
- From DE-PS 11 82 924 is an acid bath for galvanic Deposition of platinum coatings known from a aqueous solution of a complex dinitroplatinate (II) compound exists and has a pH below 2.
- complex platinum compound can also Dinitrosulfamato complex can be used. After own Information can only be obtained with these platinum baths Layer thicknesses up to 25 ⁇ m. Layers over 25 ⁇ m tend to Tear and are therefore not suitable for many applications.
- the P salt is reacted with a large excess of sulfamic acid, NH 2 SO 3 H, so that a diluted bath with 6-20 g / l platinum and 20 Contains -100 g / l sulfamic acid (amidosulfuric acid).
- this electrolyte is only stable as long as the bath is in operation. Thick layers can only be obtained without cracks with a matt surface.
- Galvanic platinum bath especially for thicker deposition Develop layers that are 5 to 30 g / l platinum Contains amminsulfamato complex and a pH of has less than 1, with which also layer thicknesses over 100 ⁇ m can be deposited without cracks, smooth and shiny and that is stable even when not in use.
- Electrolyte at most 5 g / l free amidosulfuric acid (Sulfamic acid) and 20 to 400 g / l of a strong acid contains a pH of less than 1.
- the strong acid is sulfuric acid, Methanesulfonic acid or perchloric acid used.
- Besides can also use other mineral acids, such as fluorosulfuric acid or fluoroboric acid, alkanesulfonic acids, such as Methane disulfonic acid, ethanesulfonic acid, Hydroxiethan sulfonic acid and homologues, or perfluorinated Alkanesulfonic acids, such as trifluoromethanesulfonic acid or Pentafluoroethanesulfonic acid, and perfluorocarboxylic acids, such as Trifluoroacetic acid can be used.
- mineral acids such as fluorosulfuric acid or fluoroboric acid
- alkanesulfonic acids such as Methane disulfonic acid, ethanesulfonic acid, Hydroxiethan sulfonic acid and homologues
- perfluorinated Alkanesulfonic acids such as trifluoromethanesulf
- electrolyte is additional Contains 0.01 to 0.2 g / l of a fluorosurfactant as a wetting agent.
- amminsulfamato complex Product from the reaction of 1 mol of P salt (Platinum diamminodinitrito complex) with 4 to 6 mol Amidosulfuric acid is used.
- the bath may also contain 0.01-0.2 g / l of a fluorosurfactant to suppress spray. It is operated at a temperature between 60 and 90 ° C and at current densities of 1-4 A / dm 2 .
- the platinum amine sulfamato complex solution was found in the strongly acidic bath without free amidosulfuric acid as surprisingly stable.
- the bathroom showed even with long ones Electrolysis times no precipitation. In the Separation of the platinum liberated sulfamate becomes rapid does not hydrolyze and accumulate in the electrolyte.
- the platinum coatings deposited from these baths are crack-free, glossy and ductile even with layer thicknesses above 100 ⁇ m.
- a galvanic platinum bath is prepared as follows: 80 ml of sulfuric acid (97%) are diluted in approx. 600 ml of water. 16 g of platinum in the form of the platinum amine sulfamato complex solution and 0.1 g of a fluorosurfactant are added to this solution. After filling with water, 1 l of the finished bath is obtained. At a bath temperature of 80 ° C and a current density of 2 A / dm 2 , a part made of silver is coated while rotating. After approx. 13 hours, an approx. 120 ⁇ m thick, shiny platinum layer has deposited evenly. After removing the silver with nitric acid, diluted 1: 1, a stable, crack-free platinum foil is obtained.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
80 ml Schwefelsäure (97 %) werden in ca. 600 ml Wasser verdünnt. Dieser Lösung werden 16 g Platin in Form der Platinamminsulfamato-Komplexlösung und 0,1 g eines Fluortensids zugegeben. Nach Auffüllen mit Wasser erhält man 1 l fertiges Bad. Bei einer Badtemperatur von 80° C und einer Stromdichte von 2 A/dm2 wird ein Teil aus Silber bei rotierender Bewegung beschichtet. Nach ca. 13 Stunden hat sich eine ca. 120 µm dicke, glänzende Platinschicht gleichmäßig abgeschieden. Nach Ablösen des Silbers mit Salpetersäure, verdünnt 1:1, erhält man eine stabile, rißfreie Platinfolie.
Claims (4)
- Galvanisches Platinbad, insbesondere zur Abscheidung dicker Schichten, das 5 bis 30 g/l Platin als Amminsulfamato-Komplex enthält und einen pH-Wert von weniger als 1 aufweist,
dadurch gekennzeichnet,
daß der Elektrolyt höchstens 5 g/l freie Amidoschwefelsäure und 20 bis 400 g/l einer starken Säure mit einem pH-Wert kleiner 1 enthält. - Galvanisches Platinbad gemäß Anspruch 1,
dadurch gekennzeichnet,
daß als starke Säure Schwefelsäure, Methansulfonsäure oder Perchlorsäure eingesetzt wird. - Galvanisches Platinbad gemäß Anspruch 1 oder 2,
dadurch gekennzeichnet,
daß es 0,01 bis 0,2 g/l eines Fluortensids als Netzmittel enthält. - Galvanisches Platinbad gemäß Anspruch 1,
dadurch gekennzeichnet,
daß als Ammin-sulfamato-Komplex das Produkt aus der Umsetzung von 1 Mol Diamminodinitritoplatin(II) mit 4 bis 6 Mol Amidoschwefelsäure eingesetzt wird.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19514253 | 1995-04-15 | ||
| DE19514253 | 1995-04-15 | ||
| DE19547900 | 1995-12-21 | ||
| DE19547900A DE19547900C2 (de) | 1995-04-15 | 1995-12-21 | Galvanisches Platinbad |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0737760A1 EP0737760A1 (de) | 1996-10-16 |
| EP0737760B1 true EP0737760B1 (de) | 2000-04-19 |
Family
ID=26014434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP96102799A Expired - Lifetime EP0737760B1 (de) | 1995-04-15 | 1996-02-24 | Galvanisches Platinbad |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5620583A (de) |
| EP (1) | EP0737760B1 (de) |
| JP (1) | JPH08319595A (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6294425B1 (en) | 1999-10-14 | 2001-09-25 | Samsung Electronics Co., Ltd. | Methods of forming integrated circuit capacitors by electroplating electrodes from seed layers |
| US20020000380A1 (en) * | 1999-10-28 | 2002-01-03 | Lyndon W. Graham | Method, chemistry, and apparatus for noble metal electroplating on a microelectronic workpiece |
| KR100331570B1 (ko) | 2000-06-13 | 2002-04-06 | 윤종용 | 전기도금법을 이용한 반도체 메모리 소자의 커패시터제조방법 |
| US7150820B2 (en) * | 2003-09-22 | 2006-12-19 | Semitool, Inc. | Thiourea- and cyanide-free bath and process for electrolytic etching of gold |
| US20050230262A1 (en) * | 2004-04-20 | 2005-10-20 | Semitool, Inc. | Electrochemical methods for the formation of protective features on metallized features |
| FR2974582A1 (fr) * | 2011-04-27 | 2012-11-02 | Commissariat Energie Atomique | Procede de croissance de particules metalliques par electrodeposition avec inhibition in situ |
| GB201200482D0 (en) * | 2012-01-12 | 2012-02-22 | Johnson Matthey Plc | Improvements in coating technology |
| US10612149B1 (en) | 2019-09-05 | 2020-04-07 | Chow Sang Sang Jewellery Company Limited | Platinum electrodeposition bath and uses thereof |
| DE102020007789A1 (de) | 2020-12-18 | 2022-06-23 | Umicore Galvanotechnik Gmbh | Stabilisierung der Abscheiderate von Platinelektrolyten |
| JP7695086B2 (ja) * | 2021-01-08 | 2025-06-18 | Eeja株式会社 | 白金電解めっき浴および白金めっき製品 |
| TWI784601B (zh) * | 2021-01-08 | 2022-11-21 | 日商Eeja股份有限公司 | 鉑電鍍浴及鍍鉑製品 |
| DE102021107826A1 (de) * | 2021-03-29 | 2022-09-29 | Umicore Galvanotechnik Gmbh | Platinelektrolyt |
| TWI876427B (zh) * | 2022-08-04 | 2025-03-11 | 英商強生麥特公司 | 製造包含鉑(ii)錯合物之電鍍溶液之方法及藉由其生產之鉑電鍍溶液 |
| DE102024113591A1 (de) | 2024-05-15 | 2025-11-20 | Umicore Galvanotechnik Gmbh | Verfahren zur Herstellung einer Platinlösung zur elektrolytischen Abscheidung von Platin und Platinlegierungen, Elektrolyt und dessen Verwendung |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL123540C (de) * | 1958-08-06 | |||
| GB8821005D0 (en) * | 1988-09-07 | 1988-10-05 | Johnson Matthey Plc | Improvements in plating |
| JPH04297592A (ja) * | 1991-03-25 | 1992-10-21 | Tanaka Kikinzoku Kogyo Kk | 白金電気メッキ浴 |
-
1996
- 1996-02-24 EP EP96102799A patent/EP0737760B1/de not_active Expired - Lifetime
- 1996-03-27 US US08/624,806 patent/US5620583A/en not_active Expired - Fee Related
- 1996-04-11 JP JP8089750A patent/JPH08319595A/ja not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP0737760A1 (de) | 1996-10-16 |
| US5620583A (en) | 1997-04-15 |
| JPH08319595A (ja) | 1996-12-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0737760B1 (de) | Galvanisches Platinbad | |
| DE69127394T2 (de) | Zinn-Elektroplattierung bei hoher Geschwindigkeit | |
| DE3428345C2 (de) | ||
| EP2937450B1 (de) | Galvanisches bad oder mischung zur verwendung in einem galvanischen bad zur abscheidung einer glanznickelschicht sowie verfahren zur herstellung eines artikels mit einer glanznickelschicht | |
| DE3001879C2 (de) | Wäßriges saures Bad und Verfahren zur galvanischen Abscheidung von glänzenden und eingeebneten Nickel-Eisen-Schichten | |
| DE362981T1 (de) | Waesseriges elektroplattierungsbad und verfahren zum elektroplattieren von zinn und/oder blei. | |
| DE3402554C2 (de) | ||
| DE2610705C3 (de) | Saure galvanische Kupferbäder | |
| DE3223698A1 (de) | Bad fuer die galvanische abscheidung einer nickelhaltigen schicht fuer einen mehrschichtigen ueberzug und verfahren zur galvanischen abscheidung eines dreischichtigen nickelueberzugs unter verwendung dieses bades | |
| DE2608644C3 (de) | Glanzzinkbad | |
| DE3149043A1 (de) | "bad zur galvanischen abscheidung duenner weisser palladiumueberzuege und verfahren zur herstellung solcher ueberzuege unter verwendung des bades" | |
| DE19547900C2 (de) | Galvanisches Platinbad | |
| DE3108467C2 (de) | Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung | |
| DE3121016C2 (de) | Polymeres Zusatzmittel für galvanische Zinkbäder auf Basis von Polyalkyleniminen, Verfahren zur Herstellung desselben sowie wäßrig-alkalisches, cyanidfreies Zinkbad enthaltend dasselbe | |
| DE3108508C2 (de) | Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung | |
| DE3139815A1 (de) | "verfahren zur erhaltung eines goldueberzuges mit verbesserter korrosionsbestaendigkeit auf einem substrat" | |
| DE3108466C2 (de) | Verwendung eines Acetylenalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung | |
| DE3228911C2 (de) | ||
| DE1952218A1 (de) | Verfahren und Mittel zum galvanischen Verzinnen | |
| US4411744A (en) | Bath and process for high speed nickel electroplating | |
| DE3619386C2 (de) | ||
| DE3232735C2 (de) | Verwendung einer als Glanzbildnerzusatz zu Nickelbädern bekannten Verbindung als Korrosionsschutzadditiv | |
| DE957615C (de) | Mehrstufige galvanische Glanzvernickelung | |
| DE2333096A1 (de) | Elektroplattierung aus nickel und eisen | |
| EP1630258B1 (de) | Verfahren zur elektrolytischen Abscheidung von Kupfer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): CH DE FR GB IT LI |
|
| 17P | Request for examination filed |
Effective date: 19960905 |
|
| 17Q | First examination report despatched |
Effective date: 19971014 |
|
| GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: DEGUSSA-HUELS AKTIENGESELLSCHAFT |
|
| GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
| GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
| RAP3 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: DEGUSSA-HUELS AKTIENGESELLSCHAFT |
|
| GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): CH DE FR GB IT LI |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: BOVARD AG PATENTANWAELTE Ref country code: CH Ref legal event code: EP |
|
| ITF | It: translation for a ep patent filed | ||
| REF | Corresponds to: |
Ref document number: 59604983 Country of ref document: DE Date of ref document: 20000525 |
|
| GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20000609 |
|
| ET | Fr: translation filed | ||
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed | ||
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: 732E |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20040130 Year of fee payment: 9 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20040203 Year of fee payment: 9 Ref country code: CH Payment date: 20040203 Year of fee payment: 9 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20040209 Year of fee payment: 9 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20050224 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050224 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050228 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050228 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050901 |
|
| GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20050223 |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20051031 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20051031 |