EP0607119B1 - Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchführung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten - Google Patents
Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchführung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten Download PDFInfo
- Publication number
- EP0607119B1 EP0607119B1 EP90914695A EP90914695A EP0607119B1 EP 0607119 B1 EP0607119 B1 EP 0607119B1 EP 90914695 A EP90914695 A EP 90914695A EP 90914695 A EP90914695 A EP 90914695A EP 0607119 B1 EP0607119 B1 EP 0607119B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- lead
- electrolyte
- derivatives
- acid
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000003792 electrolyte Substances 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims abstract description 36
- 230000002378 acidificating effect Effects 0.000 title claims abstract description 11
- 239000004094 surface-active agent Substances 0.000 title description 2
- 239000002253 acid Substances 0.000 claims abstract description 36
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 239000003093 cationic surfactant Substances 0.000 claims abstract description 14
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 14
- 150000007513 acids Chemical class 0.000 claims abstract description 12
- 230000008021 deposition Effects 0.000 claims abstract description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 24
- 229920000151 polyglycol Polymers 0.000 claims description 12
- 239000010695 polyglycol Substances 0.000 claims description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 11
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 150000003935 benzaldehydes Chemical class 0.000 claims description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 claims description 2
- 125000003282 alkyl amino group Chemical group 0.000 claims description 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 claims 2
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 claims 2
- 150000001565 benzotriazoles Chemical class 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 150000002825 nitriles Chemical class 0.000 claims 2
- 150000003248 quinolines Chemical class 0.000 claims 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 claims 2
- 150000003918 triazines Chemical class 0.000 claims 2
- 239000003929 acidic solution Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000002280 amphoteric surfactant Substances 0.000 abstract 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 9
- -1 alkyl sulfonic acid Chemical class 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- JBIROUFYLSSYDX-UHFFFAOYSA-M benzododecinium chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 JBIROUFYLSSYDX-UHFFFAOYSA-M 0.000 description 4
- XOYUVEPYBYHIFZ-UHFFFAOYSA-L diperchloryloxylead Chemical compound [Pb+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O XOYUVEPYBYHIFZ-UHFFFAOYSA-L 0.000 description 4
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229940104869 fluorosilicate Drugs 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- BWHOZHOGCMHOBV-UHFFFAOYSA-N Benzalacetone Natural products CC(=O)C=CC1=CC=CC=C1 BWHOZHOGCMHOBV-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 239000001888 Peptone Substances 0.000 description 1
- 108010080698 Peptones Proteins 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- AIUDWMLXCFRVDR-UHFFFAOYSA-N dimethyl 2-(3-ethyl-3-methylpentyl)propanedioate Chemical class CCC(C)(CC)CCC(C(=O)OC)C(=O)OC AIUDWMLXCFRVDR-UHFFFAOYSA-N 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical class C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 235000019319 peptone Nutrition 0.000 description 1
- 229940066779 peptones Drugs 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- BWHOZHOGCMHOBV-BQYQJAHWSA-N trans-benzylideneacetone Chemical compound CC(=O)\C=C\C1=CC=CC=C1 BWHOZHOGCMHOBV-BQYQJAHWSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/34—Electroplating: Baths therefor from solutions of lead
- C25D3/36—Electroplating: Baths therefor from solutions of lead characterised by the organic bath constituents used
Definitions
- the present invention relates to a method according to claim 1 for acidic, electrolytic deposition of lead and predominantly layers containing lead on surfaces of an electrolyte, the lead salts and acids, in particular Alkanesulfonic acid, borofluorohydric acid or Contains hydrofluoric acid. Furthermore concerns the present invention for performing an electrolyte of the process and the use of surfactants in acidic lead electrolytes.
- Acid lead electrolytes are known from US Pat. No. 2,525,942 the base of the alkanesulfonate is known.
- the disadvantage of electrolytes mentioned there is that the deposited therefrom Lead an amorphous, non-dense, porous layer of lead results. Furthermore, this electrolyte can only be used in be deposited in a very narrow current density range.
- US-A-4,701,244 discloses an electrolytic bath for Tin and lead deposition in the presence of an excess of lower alkyl sulfonic acid or acid salt, the following Additives contains: additives such as benzal acetone, benzaldehydes and aromatic pyridines, surface-active Substances such as betaines, alkylene oxide, polymers, imidazolinium compounds and quaternary ammonium salts and Formaldeyd. Nowhere will the combination of Nio- and cationic surfactants in an electrolyte for deposition of lead and mostly lead-containing layers disclosed.
- the object of the present invention is a method for acidic, electrolytic deposition of lead and to provide predominantly lead-containing layers on surfaces, the advantages of which with electrolysis Lead perchlorate resembles without the extraordinary danger to have the same procedure.
- the method according to the invention can now smooth, dense and fine crystalline lead deposits can be achieved even on strongly deformed base materials.
- the polarization phenomena of the previously used Electrolytes in both the anode and cathode reactions reduced.
- the applicable cathodic current densities are higher. So can with much lower lead contents be worked in the electrolyte. Hence, too the rinse water is less contaminated with lead. Overall will thus the disposal of both the leaded electrolyte as well as the rinse water significantly simplified.
- the present invention accordingly relates to a process according to claim 1 for the acidic, electrolytic deposition of lead and predominantly lead-containing layers on surfaces by means of an electrolyte which contains lead salts and acids, in particular alkanesulfonic acid, borofluoric acid or silicic acid.
- an electrolyte which contains lead salts and acids, in particular alkanesulfonic acid, borofluoric acid or silicic acid.
- a temperature of 20 to 80 ° C., preferably 30 to 50 ° C. is used.
- a free acid content of 50 to 150 g / l is preferred.
- the lead content is preferably 10 to 200 g / l.
- a lead content of 10 to 60 g / l is particularly preferred.
- the concentration of the non-ionic and cationic surfactants should total 1 to 15 g / l.
- the concentration of cationic surfactants is preferably 0.1 to 3 g / l.
- the soluble lead salt and the optionally further metal salts are preferably fluoroborates, fluorosilicates and / or alkanesulfonates.
- a copper and / or tin salt is particularly preferred as a further soluble metal salt.
- the nonionic surfactant is preferably an alkanol, alkylphenol, alkylamino, arylphenol polyglycol ether or block polymer of ethylene oxide or propylene oxide. If the nonionic surfactant is a polyglycol ether, it preferably has 7 to 30 mol ethylene oxide / mol.
- the polyglycol ether preferably has a C 5 -C 20 alkanol or alkyl radical.
- a cationic surfactant preferably a quaternary ammonium compound, is present in addition to the nonionic surfactant.
- Another object of the present invention is the use of non-ionic and cationic surfactants in acidic Lead electrolytes for the electrolytic deposition of Lead and mostly lead-containing layers on surfaces according to claim 16.
- Electrolyte I (state of the art) 110.0 g / l Lead as lead fluoroborate 50.0 g / l free borofluoric acid 0.2 g / l Glue.
- Electrolyte II (state of the art) 20.0 g / l Lead as lead alkanesulfonate 5.0 g / l free alkanesulfonic acid 0.2 g / l Glue.
- Electrolyte III (state of the art) 15.0 g / l Lead as lead fluoroborate 50.0 g / l free borofluoric acid 3.0 g / l Nonylphenol polyglycol ether with 10 mol ethylene oxide / mol
- Electrolyte IV (according to the invention) 15.0 g / l Lead as lead fluoroborate 50.0 g / l free borofluoric acid 3.0 g / l Nonylphenol polyglycol ether with 10 mol ethylene oxide / mol 0.5 g / l Dodecyl dimethyl benzyl ammonium chloride
- Electrolyte V (according to the invention) 20.0 g / l Lead as lead fluorosilicate 50.0 g / l free silica hydrofluoric acid 5.0 g / l Coconut fatty alcohol polyglycol ether with 13 mol ethylene oxide / mol 1.0 g / l Ditallow
- the above electrolytes were in a Hull cell subjected to electrolysis with brass sheets. It was with a cell current of 1.5 amp. 10 minutes at room temperature with gentle stirring by a magnetic stirrer electrolyzed.
- electrolytes could only do dark and gray lead deposits be preserved. That was also the case with electrolyte I. Sheet burned amorphously in the high current density range. With electrolyte II only the first 2 cm covered with a dark amorphous layer. From approx. 5 cm there was no separation. The electrolyte III showed a burn in in the high current density range Dark amorphous deposition.
- the process according to the invention is advantageously suitable for providing solderable layers on surfaces by means of co-deposition of, for example, tin and / or copper (lead with proportions of 5 to 15% tin).
- an electrolyte of the following composition was used for the electrolytic coating of a brass sheet under the same conditions as in the comparative experiment: 20.0 g / l Lead as lead fluoroborate 2.0 g / l Tin as tin fluoroborate 50.0 g / l free borofluoric acid 2.0 g / l ⁇ -naphthol polyglycol ether with 12 mol ethylene oxide / mol 0.5 g / l Dodecyl dimethyl benzyl ammonium chloride
- the fine crystalline and bright precipitate turned out to be as excellent solderable.
- An analysis of the detached and analyzed precipitation showed a content of 88% by weight of lead and 12% by weight of tin.
- Lead-containing run-in layers on slide bearings (lead with 10% tin and 3% copper) are also of particular interest.
- an electrolyte of the following composition at a current density of approx. 10 amp./dm 2 was used to coat bearing shells with an approx. 30 ⁇ m thick running-in layer.
- the electrolysis produced a fine crystalline and bright precipitate. Analysis of the precipitation showed: Lead 85%, Tin 11%, Copper 4%
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Description
Elektrolyt I (Stand der Technik) | |
110,0 g/l | Blei als Bleifluorborat |
50,0 g/l | freie Borfluorwasserstoffsäure |
0,2 g/l | Leim. |
Elektrolyt II (Stand der Technik) | |
20,0 g/l | Blei als Bleialkansulfonat |
5,0 g/l | freie Alkansulfonsäure |
0,2 g/l | Leim. |
Elektrolyt III (Stand der Technik) | |
15,0 g/l | Blei als Bleifluoborat |
50,0 g/l | freie Borfluorwasserstoffsäure |
3,0 g/l | Nonylphenolpolyglykoläther mit 10 mol Ethylenoxid/mol |
Elektrolyt IV (erfindungsgemäß) | |
15,0 g/l | Blei als Bleifluoborat |
50,0 g/l | freie Borfluorwasserstoffsäure |
3,0 g/l | Nonylphenolpolyglykoläther mit 10 mol Ethylenoxid/mol |
0,5 g/l | Dodecyl-dimethyl-benzyl-ammoniumchlorid |
Elektrolyt V (erfindungsgemäß) | |
20,0 g/l | Blei als Bleifluorosilicat |
50,0 g/l | freie Kieselfluorwasserstoffsäure |
5,0 g/l | Cocosfettalkoholpolyglykoläther mit 13 mol Ethylenoxid/mol |
1,0 g/l | Ditalgfettalkyl-dimethylammoniumchlorid |
Elektrolyt VI (erfindungsgemäß) | |
60,0 g/l | Blei als Bleialkansulfonat |
100,0 g/l | freie Alkansulfonsäure |
7,0 g/l | Synthesealkoholpolyglykoläther mit 15 mol Ethylenoxid/mol |
1,0 g/l | Dodecyl-dimethyl-benzyl-ammoniumchlorid |
20,0 g/l | Blei als Bleifluoroborat |
2,0 g/l | Zinn als Zinnfluoroborat |
50,0 g/l | freie Borfluorwasserstoffsäure |
2,0 g/l | β-Naphtholpolyglykoläther mit 12 mol Ethylenoxid/mol |
0,5 g/l | Dodecyl-dimethyl-benzyl-ammoniumchlorid |
50,0 g/l | Blei als Bleialkansulfonat |
10,0 g/l | Zinn als Zinnalkansulfonat |
4,0 g/l | Kupfer als Kupferalkansulfonat |
70,0 g/l | freie Alkansulfonsäure |
8,0 g/l | Nonylphenolpolyglykoläther mit 14 mol Ethylenoxid/mol |
1,5 g/l | Dodecyl-dimethyl-benzyl-ammoniumchlorid |
Blei 85 %, | Zinn 11 %, | Kupfer 4 % |
Claims (16)
- Verfahren zur elektrolytischen Abscheidung von glatten, dichten und feinkristallinen Blei- und überwiegend bleihaltigen Schichten aus saurer Lösung auf Oberflächen mittels eines Elektrolyten ohne Nivellierungsmittel wie Alkoylidensulfonaminsäuren, Chinolinderivate, Benzotriazolderivate, Dialkoyliden-o-phenyldiamine, Derivate des Benzaldehyds, Derivate des Triazins, Derivate der Salicylsäure und Nitrile, wobei der Elektrolyt Bleisalze und Säuren, insbesondere Alkansulfonsäure, Borfluorwasserstoffsäure oder Kieselfluorwasserstoffsäure und Niotenside und Kationtenside enthält.
- Verfahren gemäß Anspruch 1, dadurch gekennzeichnet, daß mit Stromdichten von 0,5 bis 20 A/dm2 und bei einem pH-Wert unter 1 gearbeitet wird.
- Verfahren gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, daß bei einer Temperatur von 20 bis 80°C, vorzugsweise 30 bis 50°C, gearbeitet wird.
- Verfahren gemäß einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß der freie Säuregehalt auf 50 bis 150 g/l eingestellt wird.
- Verfahren gemäß einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß bei Bleigehalten von 10 bis 200 g/l gearbeitet wird.
- Verfahren gemäß Anspruch 5, dadurch gekennzeichnet, daß bei Bleigehalten von 10 bis 60 g/l gearbeitet wird.
- Verfahren gemäß einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß die Konzentration der Niotenside und Kationtenside zusammen auf 1 bis 15 g/l eingestellt wird.
- Verfahren gemäß einem der Ansprüche 1 bis 7, dadurch gekennzeichnet, daß die Konzentration an Kationtensid auf 0,1 bis 3 g/l eingestellt wird.
- Elektrolyt zur sauren, elektrolytischen Abscheidung von glatten, dichten und feinkristallinen Blei- und überwiegend bleihaltigen Schichten auf Oberflächen zur Verwendung in einem Verfahren gemäß einem der Ansprüche 1 bis 8, enthaltenda) ein lösliches Bleisalz, gegebenenfalls neben geringeren Mengen weiterer löslicher Metallsalze,b) freie Säuren, wie Alkansulfonsäuren, Borfluorwasserstoffsäure oder Kieselfluorwasserstoffsäure,c) Niotenside und Kationtenside.
- Elektrolyt gemäß Anspruch 9, dadurch gekennzeichnet, daß das lösliche Bleisalz und die gegebenenfalls weiteren Metallsalze Fluoroborate, Fluorosilikate und/oder Alkansulfonate sind.
- Elektrolyt gemäß Anspruch 9 oder 10, dadurch gekennzeichnet, daß das weitere lösliche Metallsalz ein Kupferund/oder Zinnsalz ist.
- Elektrolyt gemäß einem der Ansprüche 9 bis 11, dadurch gekennzeichnet, daß das Niotensid ein Alkanol-, Alkylphenol-, Alkylamino-, Arylphenol-Polyglykolether oder Blockpolymerisat des Ethylenoxids bzw. Propylenoxids ist.
- Elektrolyt gemäß Anspruch 12, dadurch gekennzeichnet, daß das Niotensid ein Polyglykolether mit 7 bis 30 mol Ethylenoxid/mol ist.
- Elektrolyt gemäß Anspruch 12 oder 13, dadurch gekennzeichnet, daß der Polyglykolether einen C5-C20 Alkanol- oder Alkylrest aufweist.
- Elektrolyt gemäß einem der Ansprüche 9 bis 14, dadurch gekennzeichnet, daß neben dem Niotensid ein Kationtensid, vorzugsweise eine quartäre Ammoniumverbindung, vorliegt.
- Verwendung von Niotensiden und Kationtensiden, in sauren Bleielektrolyten zur elektrolytischen Abscheidung von glatten, dichten und feinkristallinen Blei- und überwiegend bleihaltigen Schichten auf Oberflächen, wobei der Elektrolyt keine Nivellierungsmittel wie Alkoylidensulfonaminsäuren, Chinolinderivate, Benzotriazolderivate, Dialkoyliden-o-phenyldiamino, Derivate des Benzaldehyds, Derivate des Triazins, Derivate der Salicylsäure und Nitrile, aber Bleisalze und Säuren enthält.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3934866 | 1989-10-19 | ||
DE3934866A DE3934866A1 (de) | 1989-10-19 | 1989-10-19 | Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchfuehrung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten |
PCT/EP1990/001670 WO1991005890A1 (de) | 1989-10-19 | 1990-10-05 | Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchführung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0607119A1 EP0607119A1 (de) | 1994-07-27 |
EP0607119B1 true EP0607119B1 (de) | 1998-01-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP90914695A Expired - Lifetime EP0607119B1 (de) | 1989-10-19 | 1990-10-05 | Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchführung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten |
Country Status (8)
Country | Link |
---|---|
US (1) | US5443714A (de) |
EP (1) | EP0607119B1 (de) |
JP (1) | JPH05502475A (de) |
KR (1) | KR0185204B1 (de) |
AT (1) | ATE162856T1 (de) |
DE (2) | DE3934866A1 (de) |
ES (1) | ES2113350T3 (de) |
WO (1) | WO1991005890A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1408141B1 (de) * | 2002-10-11 | 2014-12-17 | Enthone Inc. | Verfahren und Elektrolyt zur galvanischen Abscheidung von Bronzen |
JP2005060822A (ja) * | 2003-08-08 | 2005-03-10 | Rohm & Haas Electronic Materials Llc | 複合基体の電気メッキ |
US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2525942A (en) * | 1945-06-29 | 1950-10-17 | Standard Oil Co | Electrodepositing bath and process |
US3661730A (en) * | 1969-09-22 | 1972-05-09 | Kazuo Nishihara | Process for the formation of a super-bright solder coating |
US3850765A (en) * | 1973-05-21 | 1974-11-26 | Oxy Metal Finishing Corp | Bright solder plating |
US4053372A (en) * | 1975-10-09 | 1977-10-11 | Amp Incorporated | Tin-lead acidic plating bath |
US4033835A (en) * | 1975-10-14 | 1977-07-05 | Amp Incorporated | Tin-nickel plating bath |
US4139425A (en) * | 1978-04-05 | 1979-02-13 | R. O. Hull & Company, Inc. | Composition, plating bath, and method for electroplating tin and/or lead |
US4384930A (en) * | 1981-08-21 | 1983-05-24 | Mcgean-Rohco, Inc. | Electroplating baths, additives therefor and methods for the electrodeposition of metals |
US4599149A (en) * | 1981-09-11 | 1986-07-08 | Learonal, Inc. | Process for electroplating tin, lead and tin-lead alloys and baths therefor |
JPS5967387A (ja) * | 1982-10-08 | 1984-04-17 | Hiyougoken | すず、鉛及びすず―鉛合金メッキ浴 |
US4701244A (en) * | 1983-12-22 | 1987-10-20 | Learonal, Inc. | Bath and process for electroplating tin, lead and tin/alloys |
US4565609A (en) * | 1983-12-22 | 1986-01-21 | Learonal, Inc. | Bath and process for plating tin, lead and tin-lead alloys |
US4717460A (en) * | 1983-12-22 | 1988-01-05 | Learonal, Inc. | Tin lead electroplating solutions |
US4565610A (en) * | 1983-12-22 | 1986-01-21 | Learonal, Inc. | Bath and process for plating lead and lead/tin alloys |
US4617097A (en) * | 1983-12-22 | 1986-10-14 | Learonal, Inc. | Process and electrolyte for electroplating tin, lead or tin-lead alloys |
US4681670A (en) * | 1985-09-11 | 1987-07-21 | Learonal, Inc. | Bath and process for plating tin-lead alloys |
-
1989
- 1989-10-19 DE DE3934866A patent/DE3934866A1/de active Granted
-
1990
- 1990-10-05 EP EP90914695A patent/EP0607119B1/de not_active Expired - Lifetime
- 1990-10-05 DE DE59010802T patent/DE59010802D1/de not_active Expired - Fee Related
- 1990-10-05 US US07/848,952 patent/US5443714A/en not_active Expired - Fee Related
- 1990-10-05 WO PCT/EP1990/001670 patent/WO1991005890A1/de active IP Right Grant
- 1990-10-05 JP JP2513610A patent/JPH05502475A/ja active Pending
- 1990-10-05 KR KR1019920700882A patent/KR0185204B1/ko not_active IP Right Cessation
- 1990-10-05 AT AT90914695T patent/ATE162856T1/de not_active IP Right Cessation
- 1990-10-05 ES ES90914695T patent/ES2113350T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO1991005890A1 (de) | 1991-05-02 |
US5443714A (en) | 1995-08-22 |
KR0185204B1 (ko) | 1999-05-01 |
JPH05502475A (ja) | 1993-04-28 |
DE3934866C2 (de) | 1993-03-04 |
KR927003882A (ko) | 1992-12-18 |
EP0607119A1 (de) | 1994-07-27 |
ATE162856T1 (de) | 1998-02-15 |
DE3934866A1 (de) | 1991-04-25 |
DE59010802D1 (de) | 1998-03-05 |
ES2113350T3 (es) | 1998-05-01 |
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