EP0161655B1 - Lichtempfindliches Gemisch und hiermit hergestelltes Zweikomponenten-Diazotypiematerial - Google Patents

Lichtempfindliches Gemisch und hiermit hergestelltes Zweikomponenten-Diazotypiematerial Download PDF

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Publication number
EP0161655B1
EP0161655B1 EP85105849A EP85105849A EP0161655B1 EP 0161655 B1 EP0161655 B1 EP 0161655B1 EP 85105849 A EP85105849 A EP 85105849A EP 85105849 A EP85105849 A EP 85105849A EP 0161655 B1 EP0161655 B1 EP 0161655B1
Authority
EP
European Patent Office
Prior art keywords
carbon atoms
mixture
acid
diazonium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP85105849A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0161655A3 (en
EP0161655A2 (de
Inventor
Siegfried Dr. Dipl.-Chem. Scheler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Priority to AT85105849T priority Critical patent/ATE39771T1/de
Publication of EP0161655A2 publication Critical patent/EP0161655A2/de
Publication of EP0161655A3 publication Critical patent/EP0161655A3/de
Application granted granted Critical
Publication of EP0161655B1 publication Critical patent/EP0161655B1/de
Expired legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/58Coupling substances therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/60Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Definitions

  • the invention relates to a light-sensitive mixture of diazonium salt, coupler, resin binder, acid stabilizer, customary additives and a liquid phase and two-component diazotype material produced therewith.
  • the couplers of formula B yellow dyes are obtained which absorb only very weakly in the visual spectral range, but absorb very strongly in the ultraviolet spectral range between 330 and 450 nm. Because of this absorption behavior, the azo components of the formula B are particularly suitable for the production of two-component diazo type intermediate original materials.
  • the compounds of the formulas C, D, E and F which couple to form red or blue azo dyes can be added to the azo components of the formula B.
  • plastics containing acid groups with an acid number of at least 100 are used as resin binders. They are known from German Patent 2,652,942 and are copolymers, such as poly (methyl vinyl ether / maleic anhydride), poly (methyl vinyl ether / maleic acid) monoethyl ester, monoisopropyl ester, monobutyl ester or poly (styrene / maleic anhydride).
  • Suitable solvents are, for example, lower alcohols, such as methanol, ethanol, isopropanol, n-butanol and / or glycol ethers, such as methyl glycol, ethyl glycol, propyl glycol, methyl triglycol, butyl triglycol, methoxybutanol, and also ketones, such as acetone, methyl ethyl ketone, methyl propyl ketone, diethyl ketone and others. and mixtures of these solvents and water.
  • lower alcohols such as methanol, ethanol, isopropanol, n-butanol and / or glycol ethers, such as methyl glycol, ethyl glycol, propyl glycol, methyl triglycol, butyl triglycol, methoxybutanol
  • ketones such as acetone, methyl ethyl ketone, methyl propyl ket
  • a stock solution with the following composition is divided into 12 paint samples, each 50 g.
  • Example 2 Is coated and dried as described in Example 1.
  • the layer weight is 7.6 g / m 2 .
  • the pre-coupling can be significantly reduced.
  • the disadvantage of the film sample (G) thus produced is that the storage of the unprocessed film material and its development under moist, warm conditions (40 ° C./80% relative humidity of the unprocessed film and approx. 70 ° C./80% relative humidity) development) forms a clearly visible coating on the surface of the layer ("sweating").
  • a glass plate is sensitized on one side with a coating composition of the following composition:
  • the layer weight of each diazofilm pattern is 8 to 9 g / m 2 .

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Developers In Electrophotography (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
  • Reinforcement Elements For Buildings (AREA)
  • Inorganic Insulating Materials (AREA)
EP85105849A 1984-05-18 1985-05-13 Lichtempfindliches Gemisch und hiermit hergestelltes Zweikomponenten-Diazotypiematerial Expired EP0161655B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT85105849T ATE39771T1 (de) 1984-05-18 1985-05-13 Lichtempfindliches gemisch und hiermit hergestelltes zweikomponenten-diazotypiematerial.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19843418469 DE3418469A1 (de) 1984-05-18 1984-05-18 Lichtempfindliches gemisch und hiermit hergestelltes zweikomponenten-diazotypiematerial
DE3418469 1984-05-18

Publications (3)

Publication Number Publication Date
EP0161655A2 EP0161655A2 (de) 1985-11-21
EP0161655A3 EP0161655A3 (en) 1987-05-27
EP0161655B1 true EP0161655B1 (de) 1989-01-04

Family

ID=6236196

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85105849A Expired EP0161655B1 (de) 1984-05-18 1985-05-13 Lichtempfindliches Gemisch und hiermit hergestelltes Zweikomponenten-Diazotypiematerial

Country Status (13)

Country Link
EP (1) EP0161655B1 (xx)
JP (1) JPS60256140A (xx)
AT (1) ATE39771T1 (xx)
AU (1) AU578094B2 (xx)
BR (1) BR8502350A (xx)
CA (1) CA1270142A (xx)
DE (2) DE3418469A1 (xx)
DK (1) DK161113C (xx)
ES (1) ES8607574A1 (xx)
FI (1) FI851954L (xx)
IE (1) IE56665B1 (xx)
NO (1) NO168213C (xx)
ZA (1) ZA853737B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US10034690B2 (en) 2014-12-09 2018-07-31 John A. Heflin Spine alignment system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3203803A (en) * 1964-01-20 1965-08-31 Tecnifax Corp Light-sensitive diazo hexafluoro-phosphate compositions
US3591381A (en) * 1967-07-31 1971-07-06 Eastman Kodak Co Stabilized diazotype composition
US3857896A (en) * 1967-09-13 1974-12-31 R Desjarlais Substituted diresorcyl sulfide and sulfoxide compounds
US3619191A (en) * 1967-09-13 1971-11-09 Tecnifax Corp The Diazo-type materials
DE2747412A1 (de) * 1976-10-22 1978-04-27 Scott Paper Co Lichtempfindliche diazomasse fuer die diazotypie
DE2652942C3 (de) * 1976-11-22 1979-05-31 Hoechst Ag, 6000 Frankfurt Zweikomponenten-Diazotypiematerial
DE2811981A1 (de) * 1978-03-18 1979-09-27 Hoechst Ag 2-hydroxy-3-naphthoesaeureamide
DE2907446A1 (de) * 1979-02-26 1980-09-04 Hoechst Ag Zweikomponenten-diazotypiematerial

Also Published As

Publication number Publication date
JPS60256140A (ja) 1985-12-17
NO168213C (no) 1992-01-22
FI851954A0 (fi) 1985-05-16
DK219485A (da) 1985-11-19
DE3567291D1 (en) 1989-02-09
DK219485D0 (da) 1985-05-17
DE3418469A1 (de) 1985-11-21
ES543035A0 (es) 1986-06-01
BR8502350A (pt) 1986-01-21
EP0161655A3 (en) 1987-05-27
AU4262685A (en) 1985-11-21
NO168213B (no) 1991-10-14
AU578094B2 (en) 1988-10-13
CA1270142A (en) 1990-06-12
NO851973L (no) 1985-11-19
IE56665B1 (en) 1991-10-23
IE851243L (en) 1985-11-18
DK161113B (da) 1991-05-27
EP0161655A2 (de) 1985-11-21
ES8607574A1 (es) 1986-06-01
ZA853737B (en) 1986-01-29
FI851954L (fi) 1985-11-19
ATE39771T1 (de) 1989-01-15
DK161113C (da) 1991-11-11

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