FI851954L - Ljuskaenslig blandning och medelst denna framstaellt 2-komponent-diazotypimaterial. - Google Patents

Ljuskaenslig blandning och medelst denna framstaellt 2-komponent-diazotypimaterial.

Info

Publication number
FI851954L
FI851954L FI851954A FI851954A FI851954L FI 851954 L FI851954 L FI 851954L FI 851954 A FI851954 A FI 851954A FI 851954 A FI851954 A FI 851954A FI 851954 L FI851954 L FI 851954L
Authority
FI
Finland
Prior art keywords
acid
stabilizer
diazotypimaterial
handling
procedure
Prior art date
Application number
FI851954A
Other languages
English (en)
Finnish (fi)
Other versions
FI851954A0 (fi
Inventor
Siegfried Scheler
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI851954A0 publication Critical patent/FI851954A0/fi
Publication of FI851954L publication Critical patent/FI851954L/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/58—Coupling substances therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Developers In Electrophotography (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
  • Reinforcement Elements For Buildings (AREA)
  • Inorganic Insulating Materials (AREA)
FI851954A 1984-05-18 1985-05-16 Ljuskaenslig blandning och medelst denna framstaellt 2-komponent-diazotypimaterial. FI851954L (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843418469 DE3418469A1 (de) 1984-05-18 1984-05-18 Lichtempfindliches gemisch und hiermit hergestelltes zweikomponenten-diazotypiematerial

Publications (2)

Publication Number Publication Date
FI851954A0 FI851954A0 (fi) 1985-05-16
FI851954L true FI851954L (fi) 1985-11-19

Family

ID=6236196

Family Applications (1)

Application Number Title Priority Date Filing Date
FI851954A FI851954L (fi) 1984-05-18 1985-05-16 Ljuskaenslig blandning och medelst denna framstaellt 2-komponent-diazotypimaterial.

Country Status (13)

Country Link
EP (1) EP0161655B1 (xx)
JP (1) JPS60256140A (xx)
AT (1) ATE39771T1 (xx)
AU (1) AU578094B2 (xx)
BR (1) BR8502350A (xx)
CA (1) CA1270142A (xx)
DE (2) DE3418469A1 (xx)
DK (1) DK161113C (xx)
ES (1) ES8607574A1 (xx)
FI (1) FI851954L (xx)
IE (1) IE56665B1 (xx)
NO (1) NO168213C (xx)
ZA (1) ZA853737B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US10034690B2 (en) 2014-12-09 2018-07-31 John A. Heflin Spine alignment system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3203803A (en) * 1964-01-20 1965-08-31 Tecnifax Corp Light-sensitive diazo hexafluoro-phosphate compositions
US3591381A (en) * 1967-07-31 1971-07-06 Eastman Kodak Co Stabilized diazotype composition
US3857896A (en) * 1967-09-13 1974-12-31 R Desjarlais Substituted diresorcyl sulfide and sulfoxide compounds
US3619191A (en) * 1967-09-13 1971-11-09 Tecnifax Corp The Diazo-type materials
DE2747412A1 (de) * 1976-10-22 1978-04-27 Scott Paper Co Lichtempfindliche diazomasse fuer die diazotypie
DE2652942C3 (de) * 1976-11-22 1979-05-31 Hoechst Ag, 6000 Frankfurt Zweikomponenten-Diazotypiematerial
DE2811981A1 (de) * 1978-03-18 1979-09-27 Hoechst Ag 2-hydroxy-3-naphthoesaeureamide
DE2907446A1 (de) * 1979-02-26 1980-09-04 Hoechst Ag Zweikomponenten-diazotypiematerial

Also Published As

Publication number Publication date
JPS60256140A (ja) 1985-12-17
NO168213C (no) 1992-01-22
FI851954A0 (fi) 1985-05-16
EP0161655B1 (de) 1989-01-04
DK219485A (da) 1985-11-19
DE3567291D1 (en) 1989-02-09
DK219485D0 (da) 1985-05-17
DE3418469A1 (de) 1985-11-21
ES543035A0 (es) 1986-06-01
BR8502350A (pt) 1986-01-21
EP0161655A3 (en) 1987-05-27
AU4262685A (en) 1985-11-21
NO168213B (no) 1991-10-14
AU578094B2 (en) 1988-10-13
CA1270142A (en) 1990-06-12
NO851973L (no) 1985-11-19
IE56665B1 (en) 1991-10-23
IE851243L (en) 1985-11-18
DK161113B (da) 1991-05-27
EP0161655A2 (de) 1985-11-21
ES8607574A1 (es) 1986-06-01
ZA853737B (en) 1986-01-29
ATE39771T1 (de) 1989-01-15
DK161113C (da) 1991-11-11

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Legal Events

Date Code Title Description
FD Application lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT