ZA853737B - Light-sensitive mixture and two-component diazotype material prepared with this mixture - Google Patents

Light-sensitive mixture and two-component diazotype material prepared with this mixture

Info

Publication number
ZA853737B
ZA853737B ZA853737A ZA853737A ZA853737B ZA 853737 B ZA853737 B ZA 853737B ZA 853737 A ZA853737 A ZA 853737A ZA 853737 A ZA853737 A ZA 853737A ZA 853737 B ZA853737 B ZA 853737B
Authority
ZA
South Africa
Prior art keywords
mixture
light
acid
material prepared
sensitive
Prior art date
Application number
ZA853737A
Other languages
English (en)
Inventor
Siegfried Scheler
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA853737B publication Critical patent/ZA853737B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/58Coupling substances therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/60Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Liquid Developers In Electrophotography (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
  • Reinforcement Elements For Buildings (AREA)
  • Inorganic Insulating Materials (AREA)
ZA853737A 1984-05-18 1985-05-17 Light-sensitive mixture and two-component diazotype material prepared with this mixture ZA853737B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843418469 DE3418469A1 (de) 1984-05-18 1984-05-18 Lichtempfindliches gemisch und hiermit hergestelltes zweikomponenten-diazotypiematerial

Publications (1)

Publication Number Publication Date
ZA853737B true ZA853737B (en) 1986-01-29

Family

ID=6236196

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA853737A ZA853737B (en) 1984-05-18 1985-05-17 Light-sensitive mixture and two-component diazotype material prepared with this mixture

Country Status (13)

Country Link
EP (1) EP0161655B1 (xx)
JP (1) JPS60256140A (xx)
AT (1) ATE39771T1 (xx)
AU (1) AU578094B2 (xx)
BR (1) BR8502350A (xx)
CA (1) CA1270142A (xx)
DE (2) DE3418469A1 (xx)
DK (1) DK161113C (xx)
ES (1) ES8607574A1 (xx)
FI (1) FI851954L (xx)
IE (1) IE56665B1 (xx)
NO (1) NO168213C (xx)
ZA (1) ZA853737B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US10034690B2 (en) 2014-12-09 2018-07-31 John A. Heflin Spine alignment system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3203803A (en) * 1964-01-20 1965-08-31 Tecnifax Corp Light-sensitive diazo hexafluoro-phosphate compositions
US3591381A (en) * 1967-07-31 1971-07-06 Eastman Kodak Co Stabilized diazotype composition
US3619191A (en) * 1967-09-13 1971-11-09 Tecnifax Corp The Diazo-type materials
US3857896A (en) * 1967-09-13 1974-12-31 R Desjarlais Substituted diresorcyl sulfide and sulfoxide compounds
DE2747412A1 (de) * 1976-10-22 1978-04-27 Scott Paper Co Lichtempfindliche diazomasse fuer die diazotypie
DE2652942C3 (de) * 1976-11-22 1979-05-31 Hoechst Ag, 6000 Frankfurt Zweikomponenten-Diazotypiematerial
DE2811981A1 (de) * 1978-03-18 1979-09-27 Hoechst Ag 2-hydroxy-3-naphthoesaeureamide
DE2907446A1 (de) * 1979-02-26 1980-09-04 Hoechst Ag Zweikomponenten-diazotypiematerial

Also Published As

Publication number Publication date
DK219485D0 (da) 1985-05-17
IE56665B1 (en) 1991-10-23
FI851954A0 (fi) 1985-05-16
EP0161655A3 (en) 1987-05-27
ES543035A0 (es) 1986-06-01
ES8607574A1 (es) 1986-06-01
EP0161655A2 (de) 1985-11-21
FI851954L (fi) 1985-11-19
JPS60256140A (ja) 1985-12-17
EP0161655B1 (de) 1989-01-04
ATE39771T1 (de) 1989-01-15
DK219485A (da) 1985-11-19
DK161113C (da) 1991-11-11
DE3567291D1 (en) 1989-02-09
DK161113B (da) 1991-05-27
CA1270142A (en) 1990-06-12
NO168213C (no) 1992-01-22
NO851973L (no) 1985-11-19
NO168213B (no) 1991-10-14
IE851243L (en) 1985-11-18
AU4262685A (en) 1985-11-21
AU578094B2 (en) 1988-10-13
BR8502350A (pt) 1986-01-21
DE3418469A1 (de) 1985-11-21

Similar Documents

Publication Publication Date Title
SE8502432L (sv) Forbettring av flytegenskaper for formsprutbara aromatiska polyestrar
DE3567291D1 (en) Light-sensitive composition and two-component diazotype material prepared therefrom
ES464338A1 (es) Un procedimiento perfeccionado para la preparacion de un ma-terial de diazotipia.
JPS5670545A (en) Photothermosensitive composition
JPS52141899A (en) Epoxy resin composition
JPS56142205A (en) Composition for oral cavity
JPS56118023A (en) Preparation of aromatic compound containing fluorine
JPS56167A (en) Type head
JPS5355399A (en) Epoxy resin composition
JPS5297945A (en) Acid anhydride composition
Rustamov et al. Interactions on the Ga sub 2 Te sub 3--FeTe and GaTe--Fe Sections of the Ga--Fe--Te System
JPS5359431A (en) Resin covered carrier for electrophotographic dry type toner
Stora et al. Synergistic tests on marine invertebrates. Relations with the natural environment.
JPS56115293A (en) Recording material
JPS52105953A (en) Olefin resin compositions
Gurshumov et al. TlSe--Fe (Co) Se Systems
JPS56139525A (en) Epoxy resin composition
JPS56151756A (en) Polyamide-imide resin composition
JPS56145984A (en) Preparation of stable coal-oil mixture
JPS5595955A (en) Electrostatically photographic liquid developer
Metzger TEFRA changes earned income definition for Keogh contributions
Egstrom The Los Angeles County underwater resource inventory.
Stotyn The development of the Bow River irrigation project, 1906-1950
JPS57143342A (en) Vinyl chloride resin compound
JPS5297903A (en) Stabilized formaldehyde compositions with high concentration