DK353284D0 - Fremgangsmaade til kemisk dampafsaetning af titaniumnitrid og lignende film - Google Patents

Fremgangsmaade til kemisk dampafsaetning af titaniumnitrid og lignende film

Info

Publication number
DK353284D0
DK353284D0 DK353284A DK353284A DK353284D0 DK 353284 D0 DK353284 D0 DK 353284D0 DK 353284 A DK353284 A DK 353284A DK 353284 A DK353284 A DK 353284A DK 353284 D0 DK353284 D0 DK 353284D0
Authority
DK
Denmark
Prior art keywords
procedure
vapor deposition
chemical vapor
titanium nitride
similar films
Prior art date
Application number
DK353284A
Other languages
English (en)
Other versions
DK162938B (da
DK162938C (da
DK353284A (da
Inventor
Roy Gerald Gordon
Original Assignee
Roy Gerald Gordon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roy Gerald Gordon filed Critical Roy Gerald Gordon
Publication of DK353284A publication Critical patent/DK353284A/da
Publication of DK353284D0 publication Critical patent/DK353284D0/da
Publication of DK162938B publication Critical patent/DK162938B/da
Application granted granted Critical
Publication of DK162938C publication Critical patent/DK162938C/da

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/281Nitrides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/152Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Ceramic Products (AREA)
DK353284A 1982-11-22 1984-07-19 Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat DK162938C (da)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US44334082A 1982-11-22 1982-11-22
US44334082 1982-11-22
PCT/US1983/001678 WO1984002128A1 (en) 1982-11-22 1983-10-28 Chemical vapor deposition of titanium nitride and like films
US8301678 1983-10-28

Publications (4)

Publication Number Publication Date
DK353284A DK353284A (da) 1984-07-19
DK353284D0 true DK353284D0 (da) 1984-07-19
DK162938B DK162938B (da) 1991-12-30
DK162938C DK162938C (da) 1992-05-25

Family

ID=23760404

Family Applications (1)

Application Number Title Priority Date Filing Date
DK353284A DK162938C (da) 1982-11-22 1984-07-19 Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat

Country Status (13)

Country Link
US (3) US4524718A (da)
EP (1) EP0128169B1 (da)
AU (1) AU565957B2 (da)
CA (1) CA1222912A (da)
CH (1) CH662808A5 (da)
DE (1) DE3390341T1 (da)
DK (1) DK162938C (da)
ES (1) ES527422A0 (da)
GB (1) GB2141444B (da)
IT (1) IT1203683B (da)
MX (1) MX160808A (da)
SE (1) SE453491B (da)
WO (1) WO1984002128A1 (da)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251274A (ja) * 1984-05-28 1985-12-11 Toyota Central Res & Dev Lab Inc 窒化物被覆方法
EP0174743A3 (en) * 1984-09-05 1988-06-08 Morton Thiokol, Inc. Process for transition metal nitrides thin film deposition
US4690871A (en) * 1986-03-10 1987-09-01 Gordon Roy G Protective overcoat of titanium nitride films
US4847157A (en) * 1986-08-28 1989-07-11 Libbey-Owens-Ford Co. Glass coating method and resulting article
US4946712A (en) * 1986-08-28 1990-08-07 Libbey-Owens-Ford Co. Glass coating method and resulting article
US4920006A (en) * 1987-03-26 1990-04-24 Ppg Industries, Inc. Colored metal alloy/oxynitride coatings
US4861669A (en) * 1987-03-26 1989-08-29 Ppg Industries, Inc. Sputtered titanium oxynitride films
US4900633A (en) * 1987-03-26 1990-02-13 Ppg Industries, Inc. High performance multilayer coatings
US4924936A (en) * 1987-08-05 1990-05-15 M&T Chemicals Inc. Multiple, parallel packed column vaporizer
GB8801366D0 (en) * 1988-01-21 1988-02-17 Secr Defence Infra red transparent materials
US5167986A (en) * 1988-04-15 1992-12-01 Gordon Roy G Titanium silicide-coated glass windows
GB8809504D0 (en) * 1988-04-22 1988-05-25 Marconi Gec Ltd Optical devices
DE3830174A1 (de) * 1988-09-06 1990-03-15 Geesthacht Gkss Forschung Leitfaehige oberflaechenschicht
GB8824104D0 (en) * 1988-10-14 1988-11-23 Pilkington Plc Process for coating glass
JP2637804B2 (ja) * 1988-12-20 1997-08-06 日本碍子株式会社 メッキ付き基材
US5139825A (en) * 1989-11-30 1992-08-18 President And Fellows Of Harvard College Process for chemical vapor deposition of transition metal nitrides
DE3941795A1 (de) * 1989-12-19 1991-06-20 Leybold Ag Optisch wirkende schicht fuer substrate, die insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung der schicht
DE4117258A1 (de) * 1989-12-19 1992-12-03 Leybold Ag Optisch wirkende schicht fuer substrate, die insbesondere eine hohe antireflexwirkung aufweist
DE3941797A1 (de) * 1989-12-19 1991-06-20 Leybold Ag Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags
DE4117257B4 (de) * 1989-12-27 2006-03-30 Unaxis Deutschland Holding Gmbh Optisch wirkendes Schichtsystem mit hoher Antireflexwirkung für transparente Substrate
ES2079643T3 (es) * 1990-02-22 1996-01-16 Roy Gerald Gordon Nitruro de titanio u oxido de estaño que se unen a una superficie recubridora.
US5407733A (en) * 1990-08-10 1995-04-18 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5279857A (en) * 1991-08-16 1994-01-18 Materials Research Corporation Process for forming low resistivity titanium nitride films
US5308655A (en) * 1991-08-16 1994-05-03 Materials Research Corporation Processing for forming low resistivity titanium nitride films
US5188979A (en) * 1991-08-26 1993-02-23 Motorola Inc. Method for forming a nitride layer using preheated ammonia
US5202152A (en) * 1991-10-25 1993-04-13 Cornell Research Foundation, Inc. Synthesis of titanium nitride films
EP0546670B2 (en) * 1991-12-13 2000-11-08 Ford Motor Company Limited Metal nitride films
US5194642A (en) * 1992-01-24 1993-03-16 Ford Motor Company Metallo-organic precursors to titanium nitride
US5300322A (en) * 1992-03-10 1994-04-05 Martin Marietta Energy Systems, Inc. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
US5409735A (en) * 1992-11-30 1995-04-25 Wayne State University Chemical vapor deposition of metal pnictogenide films using single source precursors
US5416045A (en) * 1993-02-18 1995-05-16 Micron Technology, Inc. Method for chemical vapor depositing a titanium nitride layer on a semiconductor wafer and method of annealing tin films
FR2708924B1 (fr) * 1993-08-12 1995-10-20 Saint Gobain Vitrage Int Procédé de dépôt d'une couche de nitrure métallique sur un substrat transparent.
US5378501A (en) * 1993-10-05 1995-01-03 Foster; Robert F. Method for chemical vapor deposition of titanium nitride films at low temperatures
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
AU1745695A (en) * 1994-06-03 1996-01-04 Materials Research Corporation A method of nitridization of titanium thin films
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5665640A (en) * 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
EP0784713A4 (en) * 1994-10-11 2000-03-01 Gelest Inc TITANIUM BASED CONFORMING LAYERS AND PREPARATION METHOD
US5691044A (en) * 1994-12-13 1997-11-25 Asahi Glass Company, Ltd. Light absorptive antireflector
US5656338A (en) * 1994-12-13 1997-08-12 Gordon; Roy G. Liquid solution of TiBr4 in Br2 used as a precursor for the chemical vapor deposition of titanium or titanium nitride
US6231999B1 (en) * 1996-06-21 2001-05-15 Cardinal Ig Company Heat temperable transparent coated glass article
US5968594A (en) * 1996-06-28 1999-10-19 Lam Research Corporation Direct liquid injection of liquid ammonia solutions in chemical vapor deposition
US5980977A (en) * 1996-12-09 1999-11-09 Pinnacle Research Institute, Inc. Method of producing high surface area metal oxynitrides as substrates in electrical energy storage
US5989652A (en) * 1997-01-31 1999-11-23 Tokyo Electron Limited Method of low temperature plasma enhanced chemical vapor deposition of tin film over titanium for use in via level applications
FR2766817B1 (fr) * 1997-07-31 1999-08-27 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche reflechissante et son procede d'obtention
KR20010042649A (ko) * 1999-02-12 2001-05-25 베리 아이클스 텅스텐 질화물의 화학기상증착
US6410432B1 (en) 1999-04-27 2002-06-25 Tokyo Electron Limited CVD of integrated Ta and TaNx films from tantalum halide precursors
US6268288B1 (en) 1999-04-27 2001-07-31 Tokyo Electron Limited Plasma treated thermal CVD of TaN films from tantalum halide precursors
US6413860B1 (en) 1999-04-27 2002-07-02 Tokyo Electron Limited PECVD of Ta films from tanatalum halide precursors
US6410433B1 (en) 1999-04-27 2002-06-25 Tokyo Electron Limited Thermal CVD of TaN films from tantalum halide precursors
US6265311B1 (en) 1999-04-27 2001-07-24 Tokyo Electron Limited PECVD of TaN films from tantalum halide precursors
US6555183B2 (en) * 1999-06-11 2003-04-29 Applied Materials, Inc. Plasma treatment of a titanium nitride film formed by chemical vapor deposition
US6548402B2 (en) 1999-06-11 2003-04-15 Applied Materials, Inc. Method of depositing a thick titanium nitride film
US20010051215A1 (en) * 2000-04-13 2001-12-13 Gelest, Inc. Methods for chemical vapor deposition of titanium-silicon-nitrogen films
JP2001322833A (ja) * 2000-05-09 2001-11-20 Central Glass Co Ltd 車両用低反射ガラス
US6451692B1 (en) * 2000-08-18 2002-09-17 Micron Technology, Inc. Preheating of chemical vapor deposition precursors
US6854487B2 (en) * 2003-06-26 2005-02-15 General Electric Company Fluid conduit wall inhibiting heat transfer and method for making
WO2005073428A1 (en) * 2004-01-23 2005-08-11 Arkema Inc. Method of depositing film stacks on a substrate
US7966969B2 (en) * 2004-09-22 2011-06-28 Asm International N.V. Deposition of TiN films in a batch reactor
KR100681274B1 (ko) 2004-11-25 2007-02-09 삼성전자주식회사 커패시터 및 그 제조 방법
US7691757B2 (en) 2006-06-22 2010-04-06 Asm International N.V. Deposition of complex nitride films
US7629256B2 (en) * 2007-05-14 2009-12-08 Asm International N.V. In situ silicon and titanium nitride deposition
JP5062144B2 (ja) * 2008-11-10 2012-10-31 東京エレクトロン株式会社 ガスインジェクター
US7833906B2 (en) 2008-12-11 2010-11-16 Asm International N.V. Titanium silicon nitride deposition
WO2011162747A1 (en) 2010-06-22 2011-12-29 Line Travel Automated Coating Inc. Plural component coating application system with a compressed gas flushing system and spray tip flip mechanism
RU2534150C2 (ru) * 2012-05-22 2014-11-27 Николай Евгеньевич Староверов Способ получения нитридной наноплёнки или нанонити
US10139520B2 (en) 2015-01-30 2018-11-27 Cpfilms Inc. Method of using a heat-treated titanium nitride film
JP6851173B2 (ja) * 2016-10-21 2021-03-31 東京エレクトロン株式会社 成膜装置および成膜方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB284412A (en) * 1926-11-01 1928-02-01 Henry C Stephens Ltd Improvements in or relating to containers for liquid or semiliquid adhesives
GB773702A (en) * 1954-03-05 1957-05-01 Metallgesellschaft Ag Method of producing coatings from hard high-melting point nitrides
US2865791A (en) * 1954-03-05 1958-12-23 Metallgesellschaft Ag Metal nitride coating process
US2953483A (en) * 1956-08-13 1960-09-20 Owens Illinois Glass Co Method and apparatus for applying coatings to selected areas of articles
US3511703A (en) * 1963-09-20 1970-05-12 Motorola Inc Method for depositing mixed oxide films containing aluminum oxide
US3306768A (en) * 1964-01-08 1967-02-28 Motorola Inc Method of forming thin oxide films
GB1282866A (en) * 1968-08-16 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the production of glass having desired surface characteristics
BE758067A (fr) * 1969-10-27 1971-04-27 Ppg Industries Inc Appareil de revetement du verre
GB1283432A (en) * 1970-03-24 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the coating of glass
BE787599A (fr) * 1971-08-16 1973-02-16 Battelle Memorial Institute Vitrage filtrant antisolaire et isolant thermique
US4101703A (en) * 1972-02-04 1978-07-18 Schwarzkopf Development Corporation Coated cemented carbide elements
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3979500A (en) * 1973-05-02 1976-09-07 Ppg Industries, Inc. Preparation of finely-divided refractory powders of groups III-V metal borides, carbides, nitrides, silicides and sulfides
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
LU74666A1 (da) * 1976-03-29 1977-10-10
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
JPS5437077A (en) * 1977-08-02 1979-03-19 Agency Of Ind Science & Technol Chemical evaporation method and apparatus for same
BE879189A (fr) * 1978-10-19 1980-04-04 Bfg Glassgroup Procede de formation d'un revetement d'oxyde d'etain sur un support de verre chaud et produits ainsi obtenus
CH628600A5 (fr) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.
US4401052A (en) * 1979-05-29 1983-08-30 The University Of Delaware Apparatus for continuous deposition by vacuum evaporation
IT1134153B (it) * 1979-11-21 1986-07-31 Siv Soc Italiana Vetro Ugello per depositare in continuo su un substrato uno strato di una materia solida
US4325988A (en) * 1980-08-08 1982-04-20 Ppg Industries, Inc. Deposition of coatings from fine powder reactants
CH640571A5 (fr) * 1981-03-06 1984-01-13 Battelle Memorial Institute Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.

Also Published As

Publication number Publication date
GB8417560D0 (en) 1984-08-15
GB2141444B (en) 1986-06-11
IT8368218A0 (it) 1983-11-21
WO1984002128A1 (en) 1984-06-07
US4524718A (en) 1985-06-25
US4535000A (en) 1985-08-13
EP0128169A4 (en) 1985-08-27
CA1222912A (en) 1987-06-16
SE8403834D0 (sv) 1984-07-23
EP0128169A1 (en) 1984-12-19
ES8500874A1 (es) 1984-11-01
SE8403834L (sv) 1984-07-23
GB2141444A (en) 1984-12-19
ES527422A0 (es) 1984-11-01
DE3390341C2 (da) 1992-10-22
DK162938B (da) 1991-12-30
CH662808A5 (fr) 1987-10-30
MX160808A (es) 1990-05-25
DK162938C (da) 1992-05-25
DK353284A (da) 1984-07-19
US4585674A (en) 1986-04-29
AU2269883A (en) 1984-06-18
SE453491B (sv) 1988-02-08
DE3390341T1 (de) 1985-01-10
EP0128169B1 (en) 1990-07-11
AU565957B2 (en) 1987-10-01
IT1203683B (it) 1989-02-15

Similar Documents

Publication Publication Date Title
DK353284D0 (da) Fremgangsmaade til kemisk dampafsaetning af titaniumnitrid og lignende film
DK190281A (da) Fremgangsmaade til fremstilling af aminothiadiazoler
GB2130189B (en) Vapour deposition of films
DK70489A (da) Metalliseret fleksibel film, og fremgangsmaade til fremstilling af denne
DK163877C (da) Analogifremgangsmaade til fremstilling af hidtil ukendte cephalosporiner
DK9879A (da) Taetningsring og fremgangsmaade til fremstilling af en saadan
DK157301C (da) Analogifremgangsmaade til fremstilling af hydantoinderivater og salte deraf
DK424383A (da) Fremgangsmaade til fremstilling af doseringsenheder af cis-platin(ii)diamindichlorid
DK150903C (da) Analogifremgangsmaade til fremstilling af benzisoselenazoloner
DK383782A (da) Fremgangsmaade til foroegelse af tolerancen af roentgenstraalekontrastmedier og derved opnaaede kontrastmedier
DK69082A (da) Fremgangsmaade til at beskytte urter buske og traeer mod angreb af patogene sampe middel til brug ved udoevelse af fremgangsmaaden og fremgangsmaade til fremstilling af midlet
DK132779A (da) Fremgangsmaade til fremstilling af cishexahydrodibenzoepyranoner og tetrahydrobenzoxoiner
IT8224336A0 (it) Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio / ossido di stagno.
DK113079A (da) Fremgangsmaade til fremstilling af n-oxacyclylalkyl-piperidyl-diazaforbindelser og anvendelsen deraf
IT1097510B (it) Procedimento per la preparazione di film poliolefinici termosaldabili
DK76283D0 (da) Fremgangsmade til behandling af spildgasser
DK137582A (da) Praeparater i pulverform indeholdende pesticider og egnede til bahandling af bohave
DK162752C (da) Fremgangsmaade til overfladebehandling af folier
NO873014D0 (no) Fremgangsmaate for fremstilling av dugg-hindrende forbindelser og filmer fremstilt derfra.
DK283782A (da) Fremgangsmaade ved udfaeldning af xanthangummi
DK43283D0 (da) Fremgangsmade til fremstilling af rynkefri piezoelektriske film ved poling
DE3664793D1 (en) Chemical vapor deposition method for the thin film of semiconductor
DK410083D0 (da) Fremgangsmade og komposition til polymerfilmovertraekning af metalliske underlag
DK9582A (da) Laag af foliemateriale samt fremgangsmaade til fremstilling af samme
GB2194556B (en) Chemical vapour deposition of films

Legal Events

Date Code Title Description
PBP Patent lapsed