IT8224336A0 - Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio / ossido di stagno. - Google Patents

Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio / ossido di stagno.

Info

Publication number
IT8224336A0
IT8224336A0 IT8224336A IT2433682A IT8224336A0 IT 8224336 A0 IT8224336 A0 IT 8224336A0 IT 8224336 A IT8224336 A IT 8224336A IT 2433682 A IT2433682 A IT 2433682A IT 8224336 A0 IT8224336 A0 IT 8224336A0
Authority
IT
Italy
Prior art keywords
silicon oxide
procedure
oxide
vapor phase
phase deposition
Prior art date
Application number
IT8224336A
Other languages
English (en)
Other versions
IT8224336A1 (it
IT1153087B (it
Inventor
Roy G Gordon
Original Assignee
Roy G Gordon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roy G Gordon filed Critical Roy G Gordon
Publication of IT8224336A0 publication Critical patent/IT8224336A0/it
Publication of IT8224336A1 publication Critical patent/IT8224336A1/it
Application granted granted Critical
Publication of IT1153087B publication Critical patent/IT1153087B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Polymers (AREA)
  • Catalysts (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
IT24336/82A 1981-11-20 1982-11-19 Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno IT1153087B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/323,249 US4386117A (en) 1981-11-20 1981-11-20 Coating process using alkoxy substituted silicon-bearing reactant

Publications (3)

Publication Number Publication Date
IT8224336A0 true IT8224336A0 (it) 1982-11-19
IT8224336A1 IT8224336A1 (it) 1984-05-19
IT1153087B IT1153087B (it) 1987-01-14

Family

ID=23258350

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24336/82A IT1153087B (it) 1981-11-20 1982-11-19 Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno

Country Status (16)

Country Link
US (1) US4386117A (it)
JP (1) JPS58501946A (it)
AU (1) AU553492B2 (it)
BE (1) BE895069A (it)
BR (1) BR8207989A (it)
CA (1) CA1200444A (it)
CH (1) CH655675B (it)
DE (1) DE3249203T1 (it)
ES (1) ES8401918A1 (it)
FR (1) FR2516815B1 (it)
GB (1) GB2122596B (it)
IT (1) IT1153087B (it)
MX (1) MX162142A (it)
NL (1) NL8220464A (it)
SE (1) SE442861B (it)
WO (1) WO1983001750A1 (it)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5926942A (ja) * 1982-08-02 1984-02-13 Nippon Sheet Glass Co Ltd 金属酸化物被覆ガラスの製造方法
US4792460A (en) * 1986-07-15 1988-12-20 Electric Power Research Institute, Inc. Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium
US5173452A (en) * 1989-02-15 1992-12-22 Dobuzinsky David M Process for the vapor deposition of polysilanes photoresists
US5221352A (en) * 1989-06-19 1993-06-22 Glaverbel Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
RU2118302C1 (ru) * 1991-12-26 1998-08-27 ЕЛФ Атокем Норт Америка, Инк. Способ получения покрытия на стеклянной подложке (варианты)
PL169649B1 (pl) * 1991-12-26 1996-08-30 Atochem North America Elf Sposób powlekania podloza szklanego PL PL PL PL PL
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5395698A (en) * 1993-06-04 1995-03-07 Ppg Industries, Inc. Neutral, low emissivity coated glass articles and method for making
CH690511A5 (de) * 1994-09-01 2000-09-29 Balzers Hochvakuum Optisches Bauteil und Verfahren zum Herstellen eines solchen.
DE4433206A1 (de) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten
US5744215A (en) 1996-01-04 1998-04-28 Ppg Industries, Inc. Reduction of haze in transparent coatings
JP5290488B2 (ja) 2000-09-28 2013-09-18 プレジデント アンド フェロウズ オブ ハーバード カレッジ 酸化物、ケイ酸塩及びリン酸塩の気相成長
KR100996816B1 (ko) * 2002-03-28 2010-11-25 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 이산화규소 나노라미네이트의 증기증착
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
WO2008008319A2 (en) * 2006-07-10 2008-01-17 President And Fellows Of Harvard College Selective sealing of porous dielectric materials
WO2014014542A2 (en) 2012-04-27 2014-01-23 Burning Bush Group High performance silicon based coating compositions
WO2013170124A1 (en) 2012-05-10 2013-11-14 Burning Bush Group High performance silicon based thermal coating compositions
WO2014008443A2 (en) 2012-07-03 2014-01-09 Burning Bush Group, Llc High performance silicon based coating compositions
US9006355B1 (en) 2013-10-04 2015-04-14 Burning Bush Group, Llc High performance silicon-based compositions
GB201507330D0 (en) 2015-04-29 2015-06-10 Pilkington Group Ltd Splash screen
GB201902032D0 (en) * 2019-02-14 2019-04-03 Pilkington Group Ltd Apparatus and process for determining the distance between a glass substrate and a coater

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3242007A (en) * 1961-11-15 1966-03-22 Texas Instruments Inc Pyrolytic deposition of protective coatings of semiconductor surfaces
NL7202331A (it) * 1972-01-24 1973-07-26
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
US4187336A (en) * 1977-04-04 1980-02-05 Gordon Roy G Non-iridescent glass structures
CA1134214A (en) * 1978-03-08 1982-10-26 Roy G. Gordon Deposition method
US4261650A (en) * 1978-12-18 1981-04-14 International Business Machines Corporation Method for producing uniform parallel alignment in liquid crystal cells
DE3016010C2 (de) * 1980-04-25 1985-01-10 Degussa Ag, 6000 Frankfurt Verfahren zur pyrogenen Herstellung von Kieselsäure

Also Published As

Publication number Publication date
WO1983001750A1 (en) 1983-05-26
NL8220464A (nl) 1983-10-03
MX162142A (es) 1991-04-02
BE895069A (fr) 1983-05-19
SE442861B (sv) 1986-02-03
FR2516815B1 (fr) 1987-03-20
DE3249203C2 (it) 1991-04-18
US4386117A (en) 1983-05-31
SE8304070L (sv) 1983-07-20
CH655675B (it) 1986-05-15
ES517489A0 (es) 1984-01-01
AU8987382A (en) 1983-05-26
IT8224336A1 (it) 1984-05-19
ES8401918A1 (es) 1984-01-01
CA1200444A (en) 1986-02-11
BR8207989A (pt) 1983-10-04
GB8318227D0 (en) 1983-08-03
SE8304070D0 (sv) 1983-07-20
DE3249203T1 (de) 1983-12-01
GB2122596A (en) 1984-01-18
FR2516815A1 (fr) 1983-05-27
AU553492B2 (en) 1986-07-17
GB2122596B (en) 1986-05-08
IT1153087B (it) 1987-01-14
JPS58501946A (ja) 1983-11-17

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