IT1153087B - Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno - Google Patents

Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno

Info

Publication number
IT1153087B
IT1153087B IT24336/82A IT2433682A IT1153087B IT 1153087 B IT1153087 B IT 1153087B IT 24336/82 A IT24336/82 A IT 24336/82A IT 2433682 A IT2433682 A IT 2433682A IT 1153087 B IT1153087 B IT 1153087B
Authority
IT
Italy
Prior art keywords
silicon oxide
oxide
including mixtures
coatings including
deposition procedure
Prior art date
Application number
IT24336/82A
Other languages
English (en)
Other versions
IT8224336A0 (it
IT8224336A1 (it
Inventor
Roy G Gordon
Original Assignee
Roy G Gordon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roy G Gordon filed Critical Roy G Gordon
Publication of IT8224336A0 publication Critical patent/IT8224336A0/it
Publication of IT8224336A1 publication Critical patent/IT8224336A1/it
Application granted granted Critical
Publication of IT1153087B publication Critical patent/IT1153087B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Silicon Polymers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Catalysts (AREA)
IT24336/82A 1981-11-20 1982-11-19 Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno IT1153087B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/323,249 US4386117A (en) 1981-11-20 1981-11-20 Coating process using alkoxy substituted silicon-bearing reactant

Publications (3)

Publication Number Publication Date
IT8224336A0 IT8224336A0 (it) 1982-11-19
IT8224336A1 IT8224336A1 (it) 1984-05-19
IT1153087B true IT1153087B (it) 1987-01-14

Family

ID=23258350

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24336/82A IT1153087B (it) 1981-11-20 1982-11-19 Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno

Country Status (16)

Country Link
US (1) US4386117A (it)
JP (1) JPS58501946A (it)
AU (1) AU553492B2 (it)
BE (1) BE895069A (it)
BR (1) BR8207989A (it)
CA (1) CA1200444A (it)
CH (1) CH655675B (it)
DE (1) DE3249203T1 (it)
ES (1) ES8401918A1 (it)
FR (1) FR2516815B1 (it)
GB (1) GB2122596B (it)
IT (1) IT1153087B (it)
MX (1) MX162142A (it)
NL (1) NL8220464A (it)
SE (1) SE442861B (it)
WO (1) WO1983001750A1 (it)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5926942A (ja) * 1982-08-02 1984-02-13 Nippon Sheet Glass Co Ltd 金属酸化物被覆ガラスの製造方法
US4792460A (en) * 1986-07-15 1988-12-20 Electric Power Research Institute, Inc. Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium
US5173452A (en) * 1989-02-15 1992-12-22 Dobuzinsky David M Process for the vapor deposition of polysilanes photoresists
US5221352A (en) * 1989-06-19 1993-06-22 Glaverbel Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
DK0573639T3 (da) * 1991-12-26 2000-02-07 Atochem North America Elf Coatingsammensætning til glas
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5395698A (en) * 1993-06-04 1995-03-07 Ppg Industries, Inc. Neutral, low emissivity coated glass articles and method for making
CH690511A5 (de) * 1994-09-01 2000-09-29 Balzers Hochvakuum Optisches Bauteil und Verfahren zum Herstellen eines solchen.
DE4433206A1 (de) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten
US5744215A (en) * 1996-01-04 1998-04-28 Ppg Industries, Inc. Reduction of haze in transparent coatings
EP1327010B1 (en) * 2000-09-28 2013-12-04 President and Fellows of Harvard College Vapor deposition of silicates
WO2003083167A1 (en) * 2002-03-28 2003-10-09 President And Fellows Of Harvard College Vapor deposition of silicon dioxide nanolaminates
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
WO2008008319A2 (en) * 2006-07-10 2008-01-17 President And Fellows Of Harvard College Selective sealing of porous dielectric materials
WO2014014542A2 (en) 2012-04-27 2014-01-23 Burning Bush Group High performance silicon based coating compositions
WO2013170124A1 (en) 2012-05-10 2013-11-14 Burning Bush Group High performance silicon based thermal coating compositions
CN107236453B (zh) 2012-07-03 2019-06-11 伯宁布什集团有限公司 硅基高性能涂料组合物
US9006355B1 (en) 2013-10-04 2015-04-14 Burning Bush Group, Llc High performance silicon-based compositions
GB201507330D0 (en) 2015-04-29 2015-06-10 Pilkington Group Ltd Splash screen

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3242007A (en) * 1961-11-15 1966-03-22 Texas Instruments Inc Pyrolytic deposition of protective coatings of semiconductor surfaces
NL7202331A (it) * 1972-01-24 1973-07-26
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
US4187336A (en) * 1977-04-04 1980-02-05 Gordon Roy G Non-iridescent glass structures
CA1134214A (en) * 1978-03-08 1982-10-26 Roy G. Gordon Deposition method
US4261650A (en) * 1978-12-18 1981-04-14 International Business Machines Corporation Method for producing uniform parallel alignment in liquid crystal cells
DE3016010C2 (de) * 1980-04-25 1985-01-10 Degussa Ag, 6000 Frankfurt Verfahren zur pyrogenen Herstellung von Kieselsäure

Also Published As

Publication number Publication date
GB2122596B (en) 1986-05-08
FR2516815A1 (fr) 1983-05-27
AU553492B2 (en) 1986-07-17
BE895069A (fr) 1983-05-19
GB2122596A (en) 1984-01-18
DE3249203T1 (de) 1983-12-01
GB8318227D0 (en) 1983-08-03
JPS58501946A (ja) 1983-11-17
AU8987382A (en) 1983-05-26
MX162142A (es) 1991-04-02
DE3249203C2 (it) 1991-04-18
IT8224336A0 (it) 1982-11-19
SE8304070L (sv) 1983-07-20
NL8220464A (nl) 1983-10-03
CH655675B (it) 1986-05-15
BR8207989A (pt) 1983-10-04
CA1200444A (en) 1986-02-11
US4386117A (en) 1983-05-31
ES517489A0 (es) 1984-01-01
WO1983001750A1 (en) 1983-05-26
FR2516815B1 (fr) 1987-03-20
SE8304070D0 (sv) 1983-07-20
ES8401918A1 (es) 1984-01-01
SE442861B (sv) 1986-02-03
IT8224336A1 (it) 1984-05-19

Similar Documents

Publication Publication Date Title
IT1153087B (it) Procedimento di deposizione in fase vapore di rivestimenti comprendenti miscele di ossido di silicio o di ossido di silicio/ossido di stagno
BR8205984A (pt) Revestimento de metal/oxido de metal
GB2021979B (en) Applying processing fluid onto silicon wafers
FI793175A (fi) Floedesfoerdelningsdon samt tilluftsskaerm foersedd med saodant don
NO820083L (no) Fremgangsmaate ved fremstilling av d-fenylalanyl-l-propyl-l-argininaldehydsulfat
ES510717A0 (es) "perfeccionamientos introducidos en la construccion de recubrimientos de proteccion calorifuga".
JPS5341319A (en) Method of coating surface of glass or ceramic
FI820394L (fi) Belagda faergade djupstansade artiklar
IT1157228B (it) Procedimento per il trattamento superficiale getterizzante il lato dorsale di piatrine di semiconduttori
IT8247936A0 (it) Trattamento di residui di carbonilazione
JPS5552379A (en) Silicon etching liquid
GB2108481B (en) Improvements in or relating to the processing of silicon wafers
IT1152282B (it) Pennacchi di smalto ceramico durevoli
NO822319L (no) Byggeenhet samt fremgangsmaate for fremstilling av samme
NO820006L (no) Fremgangsmaate ved fremstilling av hydrogenfluorid
JPS5633495A (en) Treatment of substrate having tin surface
GB2028290B (en) Electrochrimic layers of tungsten and/or mocybdenum oxide
JPS57126125A (en) Piezoelectric or pyroelectric element
GB2057949B (en) Mechanically removing the oxide layer from the external surface of the ends of polyolefine pipes
GB2098525B (en) Treatment of planar articles
JPS57126124A (en) Piezoelectric or pyroelectric element
JPS57149473A (en) Formation of protective oxide film
JPS56110201A (en) Method of forming positive temperature coefficient porcelain semiconductor
JPS57145935A (en) Coating of silicon steel
JPS57126123A (en) Piezoelectric or pyroelectric element

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19971125