DK162938C - Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat - Google Patents

Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat

Info

Publication number
DK162938C
DK162938C DK353284A DK353284A DK162938C DK 162938 C DK162938 C DK 162938C DK 353284 A DK353284 A DK 353284A DK 353284 A DK353284 A DK 353284A DK 162938 C DK162938 C DK 162938C
Authority
DK
Denmark
Prior art keywords
transparent
shorted
marketing
tape
heated
Prior art date
Application number
DK353284A
Other languages
Danish (da)
English (en)
Other versions
DK162938B (da
DK353284A (da
DK353284D0 (da
Inventor
Roy Gerald Gordon
Original Assignee
Roy Gerald Gordon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roy Gerald Gordon filed Critical Roy Gerald Gordon
Publication of DK353284A publication Critical patent/DK353284A/da
Publication of DK353284D0 publication Critical patent/DK353284D0/da
Publication of DK162938B publication Critical patent/DK162938B/da
Application granted granted Critical
Publication of DK162938C publication Critical patent/DK162938C/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/281—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Ceramic Products (AREA)
DK353284A 1982-11-22 1984-07-19 Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat DK162938C (da)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US44334082A 1982-11-22 1982-11-22
US44334082 1982-11-22
PCT/US1983/001678 WO1984002128A1 (en) 1982-11-22 1983-10-28 Chemical vapor deposition of titanium nitride and like films
US8301678 1983-10-28

Publications (4)

Publication Number Publication Date
DK353284A DK353284A (da) 1984-07-19
DK353284D0 DK353284D0 (da) 1984-07-19
DK162938B DK162938B (da) 1991-12-30
DK162938C true DK162938C (da) 1992-05-25

Family

ID=23760404

Family Applications (1)

Application Number Title Priority Date Filing Date
DK353284A DK162938C (da) 1982-11-22 1984-07-19 Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat

Country Status (13)

Country Link
US (3) US4524718A (sv)
EP (1) EP0128169B1 (sv)
AU (1) AU565957B2 (sv)
CA (1) CA1222912A (sv)
CH (1) CH662808A5 (sv)
DE (1) DE3390341T1 (sv)
DK (1) DK162938C (sv)
ES (1) ES527422A0 (sv)
GB (1) GB2141444B (sv)
IT (1) IT1203683B (sv)
MX (1) MX160808A (sv)
SE (1) SE453491B (sv)
WO (1) WO1984002128A1 (sv)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251274A (ja) * 1984-05-28 1985-12-11 Toyota Central Res & Dev Lab Inc 窒化物被覆方法
EP0174743A3 (en) * 1984-09-05 1988-06-08 Morton Thiokol, Inc. Process for transition metal nitrides thin film deposition
US4690871A (en) * 1986-03-10 1987-09-01 Gordon Roy G Protective overcoat of titanium nitride films
US4847157A (en) * 1986-08-28 1989-07-11 Libbey-Owens-Ford Co. Glass coating method and resulting article
US4946712A (en) * 1986-08-28 1990-08-07 Libbey-Owens-Ford Co. Glass coating method and resulting article
US4920006A (en) * 1987-03-26 1990-04-24 Ppg Industries, Inc. Colored metal alloy/oxynitride coatings
US4861669A (en) * 1987-03-26 1989-08-29 Ppg Industries, Inc. Sputtered titanium oxynitride films
US4900633A (en) * 1987-03-26 1990-02-13 Ppg Industries, Inc. High performance multilayer coatings
US4924936A (en) * 1987-08-05 1990-05-15 M&T Chemicals Inc. Multiple, parallel packed column vaporizer
GB8801366D0 (en) * 1988-01-21 1988-02-17 Secr Defence Infra red transparent materials
US5167986A (en) * 1988-04-15 1992-12-01 Gordon Roy G Titanium silicide-coated glass windows
GB8809504D0 (en) * 1988-04-22 1988-05-25 Marconi Gec Ltd Optical devices
DE3830174A1 (de) * 1988-09-06 1990-03-15 Geesthacht Gkss Forschung Leitfaehige oberflaechenschicht
GB8824104D0 (en) * 1988-10-14 1988-11-23 Pilkington Plc Process for coating glass
JP2637804B2 (ja) * 1988-12-20 1997-08-06 日本碍子株式会社 メッキ付き基材
US5139825A (en) * 1989-11-30 1992-08-18 President And Fellows Of Harvard College Process for chemical vapor deposition of transition metal nitrides
DE3941795A1 (de) * 1989-12-19 1991-06-20 Leybold Ag Optisch wirkende schicht fuer substrate, die insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung der schicht
DE4117258A1 (de) * 1989-12-19 1992-12-03 Leybold Ag Optisch wirkende schicht fuer substrate, die insbesondere eine hohe antireflexwirkung aufweist
DE3941797A1 (de) * 1989-12-19 1991-06-20 Leybold Ag Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags
DE4117257B4 (de) * 1989-12-27 2006-03-30 Unaxis Deutschland Holding Gmbh Optisch wirkendes Schichtsystem mit hoher Antireflexwirkung für transparente Substrate
ES2079643T3 (es) * 1990-02-22 1996-01-16 Roy Gerald Gordon Nitruro de titanio u oxido de estaño que se unen a una superficie recubridora.
US5407733A (en) * 1990-08-10 1995-04-18 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5279857A (en) * 1991-08-16 1994-01-18 Materials Research Corporation Process for forming low resistivity titanium nitride films
US5308655A (en) * 1991-08-16 1994-05-03 Materials Research Corporation Processing for forming low resistivity titanium nitride films
US5188979A (en) * 1991-08-26 1993-02-23 Motorola Inc. Method for forming a nitride layer using preheated ammonia
US5202152A (en) * 1991-10-25 1993-04-13 Cornell Research Foundation, Inc. Synthesis of titanium nitride films
EP0546670B2 (en) * 1991-12-13 2000-11-08 Ford Motor Company Limited Metal nitride films
US5194642A (en) * 1992-01-24 1993-03-16 Ford Motor Company Metallo-organic precursors to titanium nitride
US5300322A (en) * 1992-03-10 1994-04-05 Martin Marietta Energy Systems, Inc. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride
US5409735A (en) * 1992-11-30 1995-04-25 Wayne State University Chemical vapor deposition of metal pnictogenide films using single source precursors
US5416045A (en) * 1993-02-18 1995-05-16 Micron Technology, Inc. Method for chemical vapor depositing a titanium nitride layer on a semiconductor wafer and method of annealing tin films
FR2708924B1 (fr) * 1993-08-12 1995-10-20 Saint Gobain Vitrage Int Procédé de dépôt d'une couche de nitrure métallique sur un substrat transparent.
US5378501A (en) * 1993-10-05 1995-01-03 Foster; Robert F. Method for chemical vapor deposition of titanium nitride films at low temperatures
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
AU1745695A (en) * 1994-06-03 1996-01-04 Materials Research Corporation A method of nitridization of titanium thin films
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5665640A (en) * 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
EP0784713A4 (en) * 1994-10-11 2000-03-01 Gelest Inc TITANIUM BASED CONFORMING LAYERS AND PREPARATION METHOD
US5691044A (en) * 1994-12-13 1997-11-25 Asahi Glass Company, Ltd. Light absorptive antireflector
US5656338A (en) * 1994-12-13 1997-08-12 Gordon; Roy G. Liquid solution of TiBr4 in Br2 used as a precursor for the chemical vapor deposition of titanium or titanium nitride
US6231999B1 (en) * 1996-06-21 2001-05-15 Cardinal Ig Company Heat temperable transparent coated glass article
US5968594A (en) * 1996-06-28 1999-10-19 Lam Research Corporation Direct liquid injection of liquid ammonia solutions in chemical vapor deposition
US5980977A (en) * 1996-12-09 1999-11-09 Pinnacle Research Institute, Inc. Method of producing high surface area metal oxynitrides as substrates in electrical energy storage
US5989652A (en) * 1997-01-31 1999-11-23 Tokyo Electron Limited Method of low temperature plasma enhanced chemical vapor deposition of tin film over titanium for use in via level applications
FR2766817B1 (fr) * 1997-07-31 1999-08-27 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche reflechissante et son procede d'obtention
KR20010042649A (ko) * 1999-02-12 2001-05-25 베리 아이클스 텅스텐 질화물의 화학기상증착
US6410432B1 (en) 1999-04-27 2002-06-25 Tokyo Electron Limited CVD of integrated Ta and TaNx films from tantalum halide precursors
US6268288B1 (en) 1999-04-27 2001-07-31 Tokyo Electron Limited Plasma treated thermal CVD of TaN films from tantalum halide precursors
US6413860B1 (en) 1999-04-27 2002-07-02 Tokyo Electron Limited PECVD of Ta films from tanatalum halide precursors
US6410433B1 (en) 1999-04-27 2002-06-25 Tokyo Electron Limited Thermal CVD of TaN films from tantalum halide precursors
US6265311B1 (en) 1999-04-27 2001-07-24 Tokyo Electron Limited PECVD of TaN films from tantalum halide precursors
US6555183B2 (en) * 1999-06-11 2003-04-29 Applied Materials, Inc. Plasma treatment of a titanium nitride film formed by chemical vapor deposition
US6548402B2 (en) 1999-06-11 2003-04-15 Applied Materials, Inc. Method of depositing a thick titanium nitride film
US20010051215A1 (en) * 2000-04-13 2001-12-13 Gelest, Inc. Methods for chemical vapor deposition of titanium-silicon-nitrogen films
JP2001322833A (ja) * 2000-05-09 2001-11-20 Central Glass Co Ltd 車両用低反射ガラス
US6451692B1 (en) * 2000-08-18 2002-09-17 Micron Technology, Inc. Preheating of chemical vapor deposition precursors
US6854487B2 (en) * 2003-06-26 2005-02-15 General Electric Company Fluid conduit wall inhibiting heat transfer and method for making
WO2005073428A1 (en) * 2004-01-23 2005-08-11 Arkema Inc. Method of depositing film stacks on a substrate
US7966969B2 (en) * 2004-09-22 2011-06-28 Asm International N.V. Deposition of TiN films in a batch reactor
KR100681274B1 (ko) 2004-11-25 2007-02-09 삼성전자주식회사 커패시터 및 그 제조 방법
US7691757B2 (en) 2006-06-22 2010-04-06 Asm International N.V. Deposition of complex nitride films
US7629256B2 (en) * 2007-05-14 2009-12-08 Asm International N.V. In situ silicon and titanium nitride deposition
JP5062144B2 (ja) * 2008-11-10 2012-10-31 東京エレクトロン株式会社 ガスインジェクター
US7833906B2 (en) 2008-12-11 2010-11-16 Asm International N.V. Titanium silicon nitride deposition
WO2011162747A1 (en) 2010-06-22 2011-12-29 Line Travel Automated Coating Inc. Plural component coating application system with a compressed gas flushing system and spray tip flip mechanism
RU2534150C2 (ru) * 2012-05-22 2014-11-27 Николай Евгеньевич Староверов Способ получения нитридной наноплёнки или нанонити
US10139520B2 (en) 2015-01-30 2018-11-27 Cpfilms Inc. Method of using a heat-treated titanium nitride film
JP6851173B2 (ja) * 2016-10-21 2021-03-31 東京エレクトロン株式会社 成膜装置および成膜方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB284412A (en) * 1926-11-01 1928-02-01 Henry C Stephens Ltd Improvements in or relating to containers for liquid or semiliquid adhesives
GB773702A (en) * 1954-03-05 1957-05-01 Metallgesellschaft Ag Method of producing coatings from hard high-melting point nitrides
US2865791A (en) * 1954-03-05 1958-12-23 Metallgesellschaft Ag Metal nitride coating process
US2953483A (en) * 1956-08-13 1960-09-20 Owens Illinois Glass Co Method and apparatus for applying coatings to selected areas of articles
US3511703A (en) * 1963-09-20 1970-05-12 Motorola Inc Method for depositing mixed oxide films containing aluminum oxide
US3306768A (en) * 1964-01-08 1967-02-28 Motorola Inc Method of forming thin oxide films
GB1282866A (en) * 1968-08-16 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the production of glass having desired surface characteristics
BE758067A (fr) * 1969-10-27 1971-04-27 Ppg Industries Inc Appareil de revetement du verre
GB1283432A (en) * 1970-03-24 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the coating of glass
BE787599A (fr) * 1971-08-16 1973-02-16 Battelle Memorial Institute Vitrage filtrant antisolaire et isolant thermique
US4101703A (en) * 1972-02-04 1978-07-18 Schwarzkopf Development Corporation Coated cemented carbide elements
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3979500A (en) * 1973-05-02 1976-09-07 Ppg Industries, Inc. Preparation of finely-divided refractory powders of groups III-V metal borides, carbides, nitrides, silicides and sulfides
US4196233A (en) * 1974-02-07 1980-04-01 Ciba-Geigy Corporation Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides
LU74666A1 (sv) * 1976-03-29 1977-10-10
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
JPS5437077A (en) * 1977-08-02 1979-03-19 Agency Of Ind Science & Technol Chemical evaporation method and apparatus for same
BE879189A (fr) * 1978-10-19 1980-04-04 Bfg Glassgroup Procede de formation d'un revetement d'oxyde d'etain sur un support de verre chaud et produits ainsi obtenus
CH628600A5 (fr) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.
US4401052A (en) * 1979-05-29 1983-08-30 The University Of Delaware Apparatus for continuous deposition by vacuum evaporation
IT1134153B (it) * 1979-11-21 1986-07-31 Siv Soc Italiana Vetro Ugello per depositare in continuo su un substrato uno strato di una materia solida
US4325988A (en) * 1980-08-08 1982-04-20 Ppg Industries, Inc. Deposition of coatings from fine powder reactants
CH640571A5 (fr) * 1981-03-06 1984-01-13 Battelle Memorial Institute Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.

Also Published As

Publication number Publication date
GB8417560D0 (en) 1984-08-15
GB2141444B (en) 1986-06-11
IT8368218A0 (it) 1983-11-21
WO1984002128A1 (en) 1984-06-07
US4524718A (en) 1985-06-25
US4535000A (en) 1985-08-13
EP0128169A4 (en) 1985-08-27
CA1222912A (en) 1987-06-16
SE8403834D0 (sv) 1984-07-23
EP0128169A1 (en) 1984-12-19
ES8500874A1 (es) 1984-11-01
SE8403834L (sv) 1984-07-23
GB2141444A (en) 1984-12-19
ES527422A0 (es) 1984-11-01
DE3390341C2 (sv) 1992-10-22
DK162938B (da) 1991-12-30
CH662808A5 (fr) 1987-10-30
MX160808A (es) 1990-05-25
DK353284A (da) 1984-07-19
US4585674A (en) 1986-04-29
DK353284D0 (da) 1984-07-19
AU2269883A (en) 1984-06-18
SE453491B (sv) 1988-02-08
DE3390341T1 (de) 1985-01-10
EP0128169B1 (en) 1990-07-11
AU565957B2 (en) 1987-10-01
IT1203683B (it) 1989-02-15

Similar Documents

Publication Publication Date Title
DK162938C (da) Fremgangsmaade til afsaetning af en transparent, solstraaleregulerende film hovedsageligt bestaaende af titannitrid paa et transparent, opvarmet, baandformet glassubstrat
NL189960C (nl) Cesium-bevattend optisch glas, licht-convergerende lens.
DK522779A (da) Hul rotor til fibrering af termoplastisk materiale,navnlig glas
DK159761C (da) Fremgangsmaade til overtraekning af roer.
NO154684C (no) Fremgangsmaate for aa hindre avsetning av damper paa overflaten av en reflektor for en uv-straalingskilde.
DK373188A (da) Fremgangsmaade til opretning af fotomaskiner, navnlig foto-litografiske masker paa flade arbejdsstykker
DK305779A (da) Fremgangsmaade til dannelse af en belaegning paa glas
DE3176283D1 (en) Semiconductor fabrication utilizing laser radiation
BR8107123A (pt) Concentrador de radiacao de foco pontual e concentrador para refracao incidente de radiacao
IT1118817B (it) Eliostato per la riflessione di raggi solari verso un punto determinato
AT371268B (de) Optoelektronisches fokusfehlerdetektionssystem
DK95281A (da) Fremgangsmaade til fremstilling af genetisk modificerede mikroorganismer
NO150168C (no) Lense
DK272983A (da) Fremgangsmaade til fremstilling af en optisk anisotrop, deformerbar beg
ES499630A0 (es) Procedimiento para obtener un revestimiento transparente so-bre una hoja de vidrio
FI96432C (sv) Flytande, strålningshärdbar överdragsmassa för överdragning av glasytor
NO165633C (no) Glassmateriale med et pyrolytisk dannet, lystransmitterende, solstraalebeskyttende metalloksydbelegg.
IT1197886B (it) Procedimento per formare un film antiriflessione su lenti organiche ad esempio per occhiali
DK423484A (da) Fremgangsmaade til polering af overfladen paa en glasgenstand
DK282081A (da) Fremgangsmaade til fremstilling af en baererfolie belagt med en med elektronstraaler haerdet lak
FI832152A0 (fi) Nytt foerfarande foer framstaellning av 2-(2-aminotiazol-4-yl)glyoxylsyraderivat eller dess salter,foerfarandet anvaendbara mellanprodukter och foerfarande foer framstaellning av dessa mellanprodukt
DK151637C (da) Fremgangsmaade til fremstilling af bakteriecelleaggregat
DK236681A (da) Fremgangsmaade til fremstilling af tinforbindelser
DK480481A (da) Udstyr til absorption af solvarme
ES517694A0 (es) Metodo para formar una pelicula de oxido metalico sobre una superficie de un substrato de vidrio caliente.

Legal Events

Date Code Title Description
PBP Patent lapsed