DK1084992T3 - Fremgangsmåde til udfældning af zirkoniumoxid-lag ved anvendelse af oplöselige pulvere - Google Patents

Fremgangsmåde til udfældning af zirkoniumoxid-lag ved anvendelse af oplöselige pulvere

Info

Publication number
DK1084992T3
DK1084992T3 DK00118170T DK00118170T DK1084992T3 DK 1084992 T3 DK1084992 T3 DK 1084992T3 DK 00118170 T DK00118170 T DK 00118170T DK 00118170 T DK00118170 T DK 00118170T DK 1084992 T3 DK1084992 T3 DK 1084992T3
Authority
DK
Denmark
Prior art keywords
zirconium
sol
solution
oxide layers
zirconium oxide
Prior art date
Application number
DK00118170T
Other languages
Danish (da)
English (en)
Inventor
Peer Dr Loebmann
Walther Glaubitt
Dieter Sporn
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Application granted granted Critical
Publication of DK1084992T3 publication Critical patent/DK1084992T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00—Compounds of zirconium
    • C01G25/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/20—Particle morphology extending in two dimensions, e.g. plate-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/22—ZrO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemically Coating (AREA)
DK00118170T 1999-09-13 2000-08-30 Fremgangsmåde til udfældning af zirkoniumoxid-lag ved anvendelse af oplöselige pulvere DK1084992T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19943789A DE19943789A1 (de) 1999-09-13 1999-09-13 Verfahren zur Abscheidung von Zirkonoxid-Schichten unter Verwendung von löslichen Pulvern

Publications (1)

Publication Number Publication Date
DK1084992T3 true DK1084992T3 (da) 2004-05-10

Family

ID=7921839

Family Applications (1)

Application Number Title Priority Date Filing Date
DK00118170T DK1084992T3 (da) 1999-09-13 2000-08-30 Fremgangsmåde til udfældning af zirkoniumoxid-lag ved anvendelse af oplöselige pulvere

Country Status (7)

Country Link
US (2) US6403161B1 (xx)
EP (1) EP1084992B1 (xx)
AT (1) ATE264812T1 (xx)
DE (2) DE19943789A1 (xx)
DK (1) DK1084992T3 (xx)
ES (1) ES2219237T3 (xx)
SE (2) SE1084992T5 (xx)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI252215B (en) * 2003-03-27 2006-04-01 Univ Nat Central Zirconia sol and method of preparing the same
JP2004299921A (ja) * 2003-03-28 2004-10-28 Seiko Epson Corp 塗布用セラミックス材料およびその製造方法
DE10322701B4 (de) * 2003-05-20 2006-12-28 Humboldt-Universität Zu Berlin Probenträger unter Verwendung eines porösen, Metalloxidpartikel umfassenden Films, Verfahren zur Herstellung eines Probenträgers, Verwendung des Probenträgers sowie Verfahren zum selektiven Nachweis von phosphorylierten/sulfatierten Biopolymeren, insbesondere Peptiden/Proteinen
DE10324910B4 (de) * 2003-05-30 2005-05-25 Vacuumschmelze Gmbh & Co. Kg Metallisches Halbzeug mit elektrisch isolierender Beschichtung sowie Verfahren zur Herstellung einer elektrisch isolierenden Beschichtung
DE102006032759B4 (de) * 2006-07-14 2010-08-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Stabile Suspensionen von kristallinen ZrO2-Partikeln aus hydrothermal behandelten Sol-Gel-Vorstufenpulvern
DE102007047082A1 (de) * 2007-10-01 2009-04-02 Robert Bosch Gmbh Verfahren zur Herstellung einer metallischen Schicht
DE102010021466A1 (de) 2010-05-25 2011-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung strukturierter Oxid-Dünnschichten über Vorstufen aus organisch vernetzten oder organisch vernetzbaren metallorganischen Verbindungen, sowie diese Vorstufen selbst
WO2012106532A2 (en) * 2011-02-02 2012-08-09 Advenira, Inc. Solution derived nanocomposite precursor solutions, methods for making thin films and thin films made by such methods
US10131793B2 (en) 2011-02-02 2018-11-20 Advenira Enterprises, Inc. Modified hybrid sol-gel solutions and compositions formed from such solutions
CN104694908B (zh) * 2013-12-05 2017-05-17 北京有色金属研究总院 一种采用无机锆盐在锆合金表面制备氧化锆薄膜的方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3539127C1 (de) * 1985-11-05 1987-01-02 Hoechst Ag Verfahren zur Herstellung eines Traegerkatalysators
DE3736686A1 (de) * 1987-10-29 1989-05-11 Fraunhofer Ges Forschung Verfahren zur herstellung von monodispersen keramischen pulvern
JP2512402B2 (ja) * 1988-06-22 1996-07-03 日新製鋼株式会社 ジルコニア膜の製造方法
US5234870A (en) * 1988-07-21 1993-08-10 Nippon Shokubai Kagaku Kogyo Co., Ltd. Zirconia sol and method for production thereof
IN176027B (xx) * 1988-08-12 1995-12-23 Alcan Int Ltd
US5382383A (en) * 1988-08-24 1995-01-17 Catalysts & Chemicals Industries Co., Ltd. Coating solutions for forming transparent conductive ceramic coatings, substrates coated with transparent conductive ceramic coatings and process for preparing same, and uses of substrates coated with transparent conductive ceramic coatings
US5256615A (en) * 1989-06-21 1993-10-26 Toagosei Chemical Industry, Co., Ltd. Granular inorganic exchangers
CA2053518A1 (en) * 1990-10-16 1992-04-17 Tetsuya Miyazaki Highly light-transmitting dust protective film, process for preparation thereof and dust protective member
JPH0679965B2 (ja) * 1991-04-12 1994-10-12 株式会社コロイドリサーチ ジルコニアゾルの製造方法およびジルコニア成形体の製造方法
FR2681851A1 (fr) * 1991-10-01 1993-04-02 Corning France Procede de preparation de zircon sous forme de couche ultra-mince supportee et membrane d'ultrafiltration comportant une telle couche ultra-mince poreuse.
JP2716302B2 (ja) * 1991-11-29 1998-02-18 セントラル硝子株式会社 マイクロピット状表層を有する酸化物薄膜および該薄膜を用いた多層膜、ならびにその形成法
JPH06130214A (ja) * 1992-10-12 1994-05-13 Nissha Printing Co Ltd 液晶用ガラス基板、ｔｆｔ液晶用カラーフィルター、プロジェクション用ｔｆｔ液晶表示装置、カラーｔｆｔ液晶表示装置
JP3139918B2 (ja) * 1993-12-28 2001-03-05 株式会社キャディック・テクノロジ−・サ−ビス 耐火物成形品の製造方法および耐火物成形品用バインダ
DE4405411C1 (de) * 1994-02-21 1995-01-19 Kernforschungsz Karlsruhe Verfahren zur Herstellung eines Sols für die Produktion einer PZT-oder einer PMNT-Keramik
US5585136A (en) * 1995-03-22 1996-12-17 Queen's University At Kingston Method for producing thick ceramic films by a sol gel coating process
KR100317898B1 (ko) * 1996-06-24 2002-06-27 우츠미 오사무 투명피막형성용도포액,투명피막이도포된기재및그의용도
JP4146533B2 (ja) * 1997-08-21 2008-09-10 ローム株式会社 強誘電体膜形成用溶液および強誘電体膜の形成法
JP2002275121A (ja) * 2000-04-21 2002-09-25 Mitsubishi Materials Corp 有機ジルコニウム化合物及び該化合物を含む有機溶液並びにそれを用いて作製されたジルコニウム含有薄膜

Also Published As

Publication number Publication date
DE19943789A1 (de) 2001-03-15
SE1084992T3 (xx) 2004-04-27
US6860933B2 (en) 2005-03-01
ATE264812T1 (de) 2004-05-15
EP1084992B1 (de) 2004-04-21
EP1084992A1 (de) 2001-03-21
ES2219237T3 (es) 2004-12-01
DE50006128D1 (de) 2004-05-27
SE1084992T5 (xx) 2004-05-18
US20020046683A1 (en) 2002-04-25
US6403161B1 (en) 2002-06-11

Similar Documents

Publication Publication Date Title
Sorek et al. Zirconia and Zirconia− ORMOSIL planar waveguides prepared at room temperature
DK1084992T3 (da) Fremgangsmåde til udfældning af zirkoniumoxid-lag ved anvendelse af oplöselige pulvere
TR200400058T2 (tr) Fotoaktif kaplama kaplanmış eşya ve bu kaplama ve eşyanın yapımı için yöntem
US3048499A (en) Process for rendering structural materials water repellent
TW200811601A (en) Composite composition for micropatterned layers
DK1045815T4 (da) Fremgangsmåde til udfældning af titanoxidlag under anvendelse af oplöselige pulvere
MY123514A (en) Method and apparatus for the production of a coating film
Cueto et al. On the optical, structural, and morphological properties of ZrO2 and TiO2 dip-coated thin films supported on glass substrates
JP5546341B2 (ja) 着色透明被膜、熱線吸収用透明被膜及びその製造方法
EA200000380A1 (ru) Покрытый пленкой порошок и способ его получения
TW373032B (en) Process for producing thin films of oxide ceramic
KR100346319B1 (ko) 유기황금화합물,이의제조방법및이를함유하는금배합물
JPS5841724A (ja) 金属酸化被膜形成組成物
JP3343377B2 (ja) 酸化物薄膜の作製方法
JPH09268383A (ja) 無機・有機融合体被覆鋼板およびその製造方法
JPH0214820A (ja) 酸化チタン薄膜形成材料の製造方法
JPH0222476A (ja) ジルコニア膜の製造方法
JP2001010816A (ja) 金属酸化物薄膜形成用組成物
KR880014591A (ko) 화학적 중합에 의한 초전도 세라믹 산화물의 형성방법
JPS55167130A (en) Metal oxide thin film forming method
JPH10249211A (ja) 光触媒活性を有する薄膜の製造方法
JPH08277115A (ja) ジルコニアゾル
JPS5525470A (en) Titanium-based coating composition
JP2002012422A (ja) チタニア膜形成用液及びそれを用いた膜形成方法
JPH0543344A (ja) アルミナ系多孔体の製造方法