DK0787363T3 - Flerlagede kompositmaterialer og fremgangsmåde til fremstilling deraf - Google Patents

Flerlagede kompositmaterialer og fremgangsmåde til fremstilling deraf

Info

Publication number
DK0787363T3
DK0787363T3 DK95937535T DK95937535T DK0787363T3 DK 0787363 T3 DK0787363 T3 DK 0787363T3 DK 95937535 T DK95937535 T DK 95937535T DK 95937535 T DK95937535 T DK 95937535T DK 0787363 T3 DK0787363 T3 DK 0787363T3
Authority
DK
Denmark
Prior art keywords
thallium
processes
making
composite materials
multilayer composite
Prior art date
Application number
DK95937535T
Other languages
English (en)
Inventor
Dean Willett Face
Kirsten Elizabeth Myers
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of DK0787363T3 publication Critical patent/DK0787363T3/da

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices
    • H10N60/0941—Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/702—Josephson junction present
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Secondary Cells (AREA)
  • Metal Extraction Processes (AREA)
DK95937535T 1994-10-17 1995-10-10 Flerlagede kompositmaterialer og fremgangsmåde til fremstilling deraf DK0787363T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32356094A 1994-10-17 1994-10-17
PCT/US1995/013462 WO1996012307A1 (en) 1994-10-17 1995-10-10 Multilayered composites and process of manufacture

Publications (1)

Publication Number Publication Date
DK0787363T3 true DK0787363T3 (da) 2000-05-08

Family

ID=23259739

Family Applications (1)

Application Number Title Priority Date Filing Date
DK95937535T DK0787363T3 (da) 1994-10-17 1995-10-10 Flerlagede kompositmaterialer og fremgangsmåde til fremstilling deraf

Country Status (13)

Country Link
US (2) US5567673A (da)
EP (1) EP0787363B1 (da)
JP (1) JPH10507590A (da)
KR (1) KR100428910B1 (da)
AT (1) ATE188313T1 (da)
CA (1) CA2200185A1 (da)
DE (1) DE69514248T2 (da)
DK (1) DK0787363T3 (da)
ES (1) ES2141967T3 (da)
GR (1) GR3032460T3 (da)
PT (1) PT787363E (da)
TW (1) TW318287B (da)
WO (1) WO1996012307A1 (da)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5773875A (en) * 1996-02-23 1998-06-30 Trw Inc. High performance, low thermal loss, bi-temperature superconductive device
JPH11186623A (ja) * 1997-12-25 1999-07-09 Sumitomo Electric Ind Ltd 磁気センサ
JP2001111123A (ja) * 1999-10-12 2001-04-20 Sumitomo Electric Ind Ltd Ｓｑｕｉｄ素子
US20050260331A1 (en) * 2002-01-22 2005-11-24 Xingwu Wang Process for coating a substrate
US7091412B2 (en) * 2002-03-04 2006-08-15 Nanoset, Llc Magnetically shielded assembly
US20040225213A1 (en) * 2002-01-22 2004-11-11 Xingwu Wang Magnetic resonance imaging coated assembly
EP1751294A1 (en) * 2004-05-26 2007-02-14 Novus Energy, LLC Ethanol production from biological wastes
US20060118758A1 (en) * 2004-09-15 2006-06-08 Xingwu Wang Material to enable magnetic resonance imaging of implantable medical devices
US7517834B2 (en) * 2006-01-24 2009-04-14 The University Of Hong Kong High temperature superconducting (HTS) tape coil with enhanced protection and method for making same
US10256392B1 (en) * 2018-03-23 2019-04-09 International Business Machines Corporation Vertical transmon qubit device
CN111969102B (zh) * 2020-09-11 2023-10-27 中国科学院紫金山天文台 一种改善超导钛-铌薄膜接触电极的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4454522A (en) * 1981-11-05 1984-06-12 The Board Of Trustees Of The Leland Stanford Junior University Microbridge superconducting device having support with stepped parallel surfaces
JPS6431475A (en) * 1987-07-28 1989-02-01 Univ Tokyo Superconducting device and forming method thereof
US5034359A (en) * 1988-04-08 1991-07-23 Kabushiki Kaisha Toshiba Insulating composition
JPH0258879A (ja) * 1988-08-25 1990-02-28 Canon Inc トンネル型ジョセフソン接合素子およびその製造方法
JP2616986B2 (ja) * 1988-12-14 1997-06-04 工業技術院長 Ｔｌ系超電導体積層膜の製造法
JPH0368180A (ja) * 1989-08-07 1991-03-25 Nippon Telegr & Teleph Corp <Ntt> 超伝導接合素子
JP2790494B2 (ja) * 1989-10-13 1998-08-27 松下電器産業株式会社 超伝導素子
DE69120840T2 (de) * 1990-02-21 1996-11-21 United Kingdom Government Supraleiter auf Thalliumbasis substituiert durch seltene Erden
JPH03286601A (ja) * 1990-04-03 1991-12-17 Res Dev Corp Of Japan マイクロ波共振器
US5292718A (en) * 1990-05-30 1994-03-08 Sumitomo Electric Industries, Ltd. Process for preparing superconducting junction of oxide superconductor
EP0468868B1 (en) * 1990-07-19 1996-02-28 Sumitomo Electric Industries, Ltd. Superconducting device having a layered structure composed of oxide superconductor thin film and insulator thin film and method for manufacturing the same
JPH04171872A (ja) * 1990-11-05 1992-06-19 Matsushita Electric Ind Co Ltd ジョセフソン素子およびその製造方法
US5134117A (en) * 1991-01-22 1992-07-28 Biomagnetic Technologies, Inc. High tc microbridge superconductor device utilizing stepped edge-to-edge sns junction
US5252551A (en) * 1991-12-27 1993-10-12 The United States Of America As Represented By The Department Of Energy Superconducting composite with multilayer patterns and multiple buffer layers
EP0660968A1 (en) * 1992-09-14 1995-07-05 Conductus, Inc. Improved barrier layers for oxide superconductor devices and circuits

Also Published As

Publication number Publication date
JPH10507590A (ja) 1998-07-21
EP0787363A1 (en) 1997-08-06
ES2141967T3 (es) 2000-04-01
TW318287B (da) 1997-10-21
CA2200185A1 (en) 1996-04-25
ATE188313T1 (de) 2000-01-15
GR3032460T3 (en) 2000-05-31
KR100428910B1 (ko) 2004-09-16
KR970707595A (ko) 1997-12-01
US5736488A (en) 1998-04-07
EP0787363B1 (en) 1999-12-29
PT787363E (pt) 2000-04-28
WO1996012307A1 (en) 1996-04-25
US5567673A (en) 1996-10-22
DE69514248T2 (de) 2000-07-06
DE69514248D1 (de) 2000-02-03

Similar Documents

Publication Publication Date Title
DK0787363T3 (da) Flerlagede kompositmaterialer og fremgangsmåde til fremstilling deraf
DK0434802T3 (da) Gastæt kantpakning og fremgangsmåde til dennes fremstilling
TWI770226B (zh) 層沉積設備及在起始基板上提供滲透阻障層系統或製造設置有表面滲透阻障層系統的基板的方法
WO2003080887A3 (en) Methods and apparatus for annealing in physical vapor deposition systems
AU2003250772A8 (en) Optical variable element having a variable distance-layer thickness
DK1100618T3 (da) Flerlagskatalysator og fremgangsmåde til fremstilling deraf
AU2003250246A8 (en) Method for production of a glazed piece provided with a multi-layer coating
ATE180712T1 (de) Kathode für plasma-sputtering
TW200726856A (en) Controlled vapor deposition of multilayered coatings adhered by an oxide layer (Ⅰ)
HK1007489A1 (en) A multilayer laminated blister film
KR880010479A (ko) 티타늄/질화티타늄 이중층을 제조하는 방법
KR950012625A (ko) 기판 처리 장치 및 방법과 박막 반도체 디바이스 제조 방법
CA2159848A1 (en) Masks with Low Stress Multilayer Films and a Process for Controlling the Stress of Multilayer Films
TW348272B (en) Method and apparatus for depositing planar and highly oriented layers
WO2003062922A3 (en) Photomask and method for manufacturing the same
GB2290309A (en) Diffusion barrier layers
SE9200555D0 (sv) A method of coating a piezoelectric substrate
MY120896A (en) Preparation of structural materials by physical vapour deposition process
EP1107302A3 (en) Method and apparatus for reducing fixed charges in a semiconductor device
JP2004091821A5 (da)
AU576940B2 (en) Multi-layer refractory structure
JPH06188200A (ja) 薄膜形成装置
JPH06234570A (ja) 耐酸化性炭素繊維強化炭素複合材料及びその製造方法
JPS6418446A (en) Metallic carrier catalyst for puriffying exhaust gas and its manufacture
JPS60211846A (ja) 多層絶縁膜の形成方法