DE918848C - Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material - Google Patents

Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material

Info

Publication number
DE918848C
DE918848C DEK12749A DEK0012749A DE918848C DE 918848 C DE918848 C DE 918848C DE K12749 A DEK12749 A DE K12749A DE K0012749 A DEK0012749 A DE K0012749A DE 918848 C DE918848 C DE 918848C
Authority
DE
Germany
Prior art keywords
water
layer
diazo compounds
solution
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEK12749A
Other languages
German (de)
English (en)
Inventor
Dr Wilhelm Neugebauer
August Rebenstock
Dr Maximilian Paul Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL77599D priority Critical patent/NL77599C/xx
Priority to BE516716D priority patent/BE516716A/xx
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Priority to DEK12749A priority patent/DE918848C/de
Priority to GB9453A priority patent/GB735129A/en
Priority to FR1069408D priority patent/FR1069408A/fr
Priority to CH311827D priority patent/CH311827A/de
Application granted granted Critical
Publication of DE918848C publication Critical patent/DE918848C/de
Priority to US71518258 priority patent/US3046131A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31844—Of natural gum, rosin, natural oil or lac

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
DEK12749A 1952-01-05 1952-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material Expired DE918848C (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL77599D NL77599C (US08124317-20120228-C00026.png) 1952-01-05
BE516716D BE516716A (US08124317-20120228-C00026.png) 1952-01-05
DEK12749A DE918848C (de) 1952-01-05 1952-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material
GB9453A GB735129A (en) 1952-01-05 1953-01-01 Manufacture of light-sensitive reproduction material
FR1069408D FR1069408A (fr) 1952-01-05 1953-01-03 Matériel photosensible préparé en utilisant des composés diazoïques
CH311827D CH311827A (de) 1952-01-05 1953-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material.
US71518258 US3046131A (en) 1952-01-05 1958-02-14 Photographic material containing light sensitive quinone diazides

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK12749A DE918848C (de) 1952-01-05 1952-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material

Publications (1)

Publication Number Publication Date
DE918848C true DE918848C (de) 1954-10-07

Family

ID=25793124

Family Applications (1)

Application Number Title Priority Date Filing Date
DEK12749A Expired DE918848C (de) 1952-01-05 1952-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material

Country Status (7)

Country Link
US (1) US3046131A (US08124317-20120228-C00026.png)
BE (1) BE516716A (US08124317-20120228-C00026.png)
CH (1) CH311827A (US08124317-20120228-C00026.png)
DE (1) DE918848C (US08124317-20120228-C00026.png)
FR (1) FR1069408A (US08124317-20120228-C00026.png)
GB (1) GB735129A (US08124317-20120228-C00026.png)
NL (1) NL77599C (US08124317-20120228-C00026.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4040117A1 (de) * 1990-12-13 1992-06-17 Fotochem Werke Gmbh Trockenentwickelbares negativresistsystem und dessen verarbeitungsprozess fuer die elektronenstrahl- und roentgenstrahllithographie

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE516716A (US08124317-20120228-C00026.png) * 1952-01-05 1900-01-01
US3046114A (en) * 1955-03-01 1962-07-24 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
JPS5421089B2 (US08124317-20120228-C00026.png) * 1973-05-29 1979-07-27
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
JPS50125805A (US08124317-20120228-C00026.png) * 1974-03-19 1975-10-03
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
US4093463A (en) * 1977-02-22 1978-06-06 Eastman Kodak Company Water soluble binder overcoat on vesicular element containing N2 -releasing agent
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4784936A (en) * 1985-10-24 1988-11-15 General Electric Company Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
US5506090A (en) * 1994-09-23 1996-04-09 Minnesota Mining And Manufacturing Company Process for making shoot and run printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL70798C (US08124317-20120228-C00026.png) * 1948-10-15
NL78723C (US08124317-20120228-C00026.png) * 1949-07-23
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
BE516716A (US08124317-20120228-C00026.png) * 1952-01-05 1900-01-01

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4040117A1 (de) * 1990-12-13 1992-06-17 Fotochem Werke Gmbh Trockenentwickelbares negativresistsystem und dessen verarbeitungsprozess fuer die elektronenstrahl- und roentgenstrahllithographie

Also Published As

Publication number Publication date
US3046131A (en) 1962-07-24
BE516716A (US08124317-20120228-C00026.png) 1900-01-01
FR1069408A (fr) 1954-07-07
CH311827A (de) 1955-12-15
GB735129A (en) 1955-08-17
NL77599C (US08124317-20120228-C00026.png) 1954-10-15

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