GB735129A - Manufacture of light-sensitive reproduction material - Google Patents

Manufacture of light-sensitive reproduction material

Info

Publication number
GB735129A
GB735129A GB9453A GB9453A GB735129A GB 735129 A GB735129 A GB 735129A GB 9453 A GB9453 A GB 9453A GB 9453 A GB9453 A GB 9453A GB 735129 A GB735129 A GB 735129A
Authority
GB
United Kingdom
Prior art keywords
naphthol
diazo
sulphonic acid
naphtho
propyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB9453A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB735129A publication Critical patent/GB735129A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31844—Of natural gum, rosin, natural oil or lac

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

The a -naphthyl ester of 2-diazo-naphthol-(1)-5-sulphonic acid is obtained by adding aqueous sodium carbonate to a solution of a -naphthol and 2 - diazo - naphthol - (1) - 5 - sulphonic acid chloride in dioxane at room temperature, heating and rendering the cooled solution alkaline with caustic soda. The condensation product of 2 mols of 2-diazo-naphthol-(1)-5-sulphonic acid and 1 mol of 2 : 21-dihydroxy-1 : 11-dinaphthylmethane can be obtained in a similar manner. The 71 - hydroxy - 2 - ethyl - N - (n - propyl)-naphtho - 11 : 21 : 4 - 5 - imidazole ester of 2-diazo - naphthol - (1) - 4 - sulphonic acid is made by adding aqueous sodium carbonate to 71 - hydroxy - 2 - ethyl - N - (n - propyl)-naphtho - 11 : 21 : 4 : 5 - imidazole in dioxane and water, followed at 30 DEG to 35 DEG C., by a warm solution of 2-diazo-naphthol-(1)-4-sulphochloride in dioxane. 2 - Diazo - naphthol - (1) - 5 - sulphonic acid-p-xylidide may be obtained by reacting 2-diazo - naphthol - (1) - 5 - sulphochloride with 2 : 5-dimethylaniline in the presence of an acid binding agent. 71 - Hydroxy - 2 - ethyl - 1 (or 3) - (n - propyl)-naphtho - 11 : 21 : 4 : 5 - imidazole is obtained by boiling an aqueous solution of 1 mol. of 1 : 2 - diaminonaphthalene - 7 - sulphonic acid and 2 mols. of n-propionaldehyde, filtering the precipitated 2-ethyl-N-(n-propyl)-naphtho-11 : 21 : 4 : 5 - imidazole - 71 - sulphonic aci and fusing it with caustic potash. Specifications 371,153, 450,817 and 707,378, [all in Group XX], are referred to.
GB9453A 1952-01-05 1953-01-01 Manufacture of light-sensitive reproduction material Expired GB735129A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK12749A DE918848C (en) 1952-01-05 1952-01-05 Photosensitive material made using diazo compounds

Publications (1)

Publication Number Publication Date
GB735129A true GB735129A (en) 1955-08-17

Family

ID=25793124

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9453A Expired GB735129A (en) 1952-01-05 1953-01-01 Manufacture of light-sensitive reproduction material

Country Status (7)

Country Link
US (1) US3046131A (en)
BE (1) BE516716A (en)
CH (1) CH311827A (en)
DE (1) DE918848C (en)
FR (1) FR1069408A (en)
GB (1) GB735129A (en)
NL (1) NL77599C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703499A1 (en) * 1994-09-23 1996-03-27 Minnesota Mining And Manufacturing Company Top coats for shoot and run printing plates

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL77599C (en) * 1952-01-05 1954-10-15
US3046114A (en) * 1955-03-01 1962-07-24 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
JPS5421089B2 (en) * 1973-05-29 1979-07-27
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
JPS50125805A (en) * 1974-03-19 1975-10-03
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
US4093463A (en) * 1977-02-22 1978-06-06 Eastman Kodak Company Water soluble binder overcoat on vesicular element containing N2 -releasing agent
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4784936A (en) * 1985-10-24 1988-11-15 General Electric Company Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
DE4040117C2 (en) * 1990-12-13 1994-02-17 Fotochem Werke Gmbh Steel sensitive material for electron beam and X-ray lithography and process for dry development of the material

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL70798C (en) * 1948-10-15
DE907739C (en) * 1949-07-23 1954-02-18 Kalle & Co Ag Process for the production of copies, especially printing forms, with the aid of diazo compounds and light-sensitive material which can be used therefor
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
NL77599C (en) * 1952-01-05 1954-10-15

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703499A1 (en) * 1994-09-23 1996-03-27 Minnesota Mining And Manufacturing Company Top coats for shoot and run printing plates
US5939237A (en) * 1994-09-23 1999-08-17 Imation Corp. Top coats for shoot and run printing plates

Also Published As

Publication number Publication date
NL77599C (en) 1954-10-15
US3046131A (en) 1962-07-24
DE918848C (en) 1954-10-07
CH311827A (en) 1955-12-15
FR1069408A (en) 1954-07-07
BE516716A (en) 1900-01-01

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