DE915593C - Verfahren zum Anbringen einer Sperrschicht und mit einer solchen Sperrschicht versehene Zelle - Google Patents

Verfahren zum Anbringen einer Sperrschicht und mit einer solchen Sperrschicht versehene Zelle

Info

Publication number
DE915593C
DE915593C DEP19306A DEP0019306A DE915593C DE 915593 C DE915593 C DE 915593C DE P19306 A DEP19306 A DE P19306A DE P0019306 A DEP0019306 A DE P0019306A DE 915593 C DE915593 C DE 915593C
Authority
DE
Germany
Prior art keywords
selenium
barrier layer
layer
barrier
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEP19306A
Other languages
German (de)
English (en)
Inventor
Ludovicus Augustinus Esseling
Willem Christiaan Van Geel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE915593C publication Critical patent/DE915593C/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043—Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/045—Treatment of the surface of the selenium or tellurium layer after having been made conductive
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043—Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/0431—Application of the selenium or tellurium to the foundation plate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/043—Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
    • H10D48/046—Provision of discrete insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2923—Materials being conductive materials, e.g. metallic silicides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
    • H10P14/3202—Materials thereof
    • H10P14/3204—Materials thereof being Group IVA semiconducting materials
    • H10P14/3206—Carbon, e.g. diamond-like carbon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/38—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by treatments done after the formation of the materials
    • H10P14/3802—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth

Landscapes

  • Electrolytic Production Of Metals (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Physical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
DEP19306A 1944-08-08 1948-10-23 Verfahren zum Anbringen einer Sperrschicht und mit einer solchen Sperrschicht versehene Zelle Expired DE915593C (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL253109X 1944-08-08

Publications (1)

Publication Number Publication Date
DE915593C true DE915593C (de) 1954-07-26

Family

ID=19781189

Family Applications (1)

Application Number Title Priority Date Filing Date
DEP19306A Expired DE915593C (de) 1944-08-08 1948-10-23 Verfahren zum Anbringen einer Sperrschicht und mit einer solchen Sperrschicht versehene Zelle

Country Status (7)

Country Link
US (1) US2468527A (en:Method)
BE (1) BE467879A (en:Method)
CH (1) CH253109A (en:Method)
DE (1) DE915593C (en:Method)
FR (1) FR942904A (en:Method)
GB (1) GB637736A (en:Method)
NL (2) NL66146C (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1026874B (de) * 1951-10-29 1958-03-27 Int Standard Electric Corp Selengleichrichter mit Kunststoff-Zwischenschicht zwischen Selen und Gegenelektrode

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1090768B (de) * 1957-05-11 1960-10-13 Licentia Gmbh Verfahren zur Herstellung von Selentrockengleichrichtern
US2892136A (en) * 1957-09-09 1959-06-23 Int Rectifier Corp Rectifier with multiple barrier layers
NL275667A (en:Method) * 1961-04-28

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT153134B (de) * 1936-06-13 1938-04-11 Aeg Verfahren zur Herstellung von Trockenplattengleichrichtern.
CH214020A (de) * 1938-06-07 1941-03-31 Sueddeutsche Apparate Fabrik G Verfahren zur Herstellung von Selengleichrichtern.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2221596A (en) * 1938-01-22 1940-11-12 Fides Gmbh Method of manufacturing dry rectifiers
BE436338A (en:Method) * 1938-09-09
DE742762C (de) * 1939-03-15 1943-12-10 Philips Patentverwaltung Verfahren zur Herstellung eines Sperrschichtelektrodensystems mit einer Selenelektrode

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT153134B (de) * 1936-06-13 1938-04-11 Aeg Verfahren zur Herstellung von Trockenplattengleichrichtern.
CH214020A (de) * 1938-06-07 1941-03-31 Sueddeutsche Apparate Fabrik G Verfahren zur Herstellung von Selengleichrichtern.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1026874B (de) * 1951-10-29 1958-03-27 Int Standard Electric Corp Selengleichrichter mit Kunststoff-Zwischenschicht zwischen Selen und Gegenelektrode

Also Published As

Publication number Publication date
CH253109A (de) 1948-02-15
GB637736A (en) 1950-05-24
NL66146C (en:Method) 1900-01-01
NL118416B (en:Method) 1900-01-01
BE467879A (en:Method) 1900-01-01
US2468527A (en) 1949-04-26
FR942904A (fr) 1949-02-22

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