DE900037C - Galvanische Vernicklung - Google Patents
Galvanische VernicklungInfo
- Publication number
- DE900037C DE900037C DEU1284A DEU0001284A DE900037C DE 900037 C DE900037 C DE 900037C DE U1284 A DEU1284 A DE U1284A DE U0001284 A DEU0001284 A DE U0001284A DE 900037 C DE900037 C DE 900037C
- Authority
- DE
- Germany
- Prior art keywords
- ester
- bath according
- bath
- nickel
- ethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 47
- 229910052759 nickel Inorganic materials 0.000 title claims description 22
- 238000007747 plating Methods 0.000 title claims description 10
- 150000002148 esters Chemical class 0.000 claims description 38
- 239000002253 acid Substances 0.000 claims description 16
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 12
- 125000001931 aliphatic group Chemical group 0.000 claims description 11
- 150000002815 nickel Chemical class 0.000 claims description 9
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 7
- 229940124530 sulfonamide Drugs 0.000 claims description 7
- 150000003456 sulfonamides Chemical class 0.000 claims description 7
- 230000002378 acidificating effect Effects 0.000 claims description 6
- -1 aliphatic ester Chemical class 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000002244 precipitate Substances 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 5
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 5
- INJVHPRSHKTTBD-ARJAWSKDSA-N bis(2-methoxyethyl) (z)-but-2-enedioate Chemical compound COCCOC(=O)\C=C/C(=O)OCCOC INJVHPRSHKTTBD-ARJAWSKDSA-N 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 5
- DZAIBGWGBBQGPZ-XQRVVYSFSA-N trimethyl (z)-prop-1-ene-1,2,3-tricarboxylate Chemical compound COC(=O)C\C(C(=O)OC)=C\C(=O)OC DZAIBGWGBBQGPZ-XQRVVYSFSA-N 0.000 claims description 5
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 claims description 4
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims description 2
- FAOJZHMRXJJQCB-AATRIKPKSA-N bis(2-ethoxyethyl) (e)-but-2-enedioate Chemical compound CCOCCOC(=O)\C=C\C(=O)OCCOCC FAOJZHMRXJJQCB-AATRIKPKSA-N 0.000 claims description 2
- LHHOPWRJTISXDC-UHFFFAOYSA-N bis(2-ethoxyethyl) 2-methylidenebutanedioate Chemical compound CCOCCOC(=O)CC(=C)C(=O)OCCOCC LHHOPWRJTISXDC-UHFFFAOYSA-N 0.000 claims description 2
- INJVHPRSHKTTBD-ONEGZZNKSA-N bis(2-methoxyethyl) (e)-but-2-enedioate Chemical compound COCCOC(=O)\C=C\C(=O)OCCOC INJVHPRSHKTTBD-ONEGZZNKSA-N 0.000 claims description 2
- 150000004702 methyl esters Chemical class 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims 6
- 238000005868 electrolysis reaction Methods 0.000 claims 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 3
- 150000003460 sulfonic acids Chemical class 0.000 claims 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims 2
- NJYYHBHYDNPAJM-UHFFFAOYSA-N bis(2-methoxyethyl) 2-methylidenebutanedioate Chemical compound COCCOC(=O)CC(=C)C(=O)OCCOC NJYYHBHYDNPAJM-UHFFFAOYSA-N 0.000 claims 2
- 239000001530 fumaric acid Substances 0.000 claims 2
- 239000011976 maleic acid Substances 0.000 claims 2
- 239000003929 acidic solution Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000012266 salt solution Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 14
- 150000007513 acids Chemical class 0.000 description 9
- LDCRTTXIJACKKU-ONEGZZNKSA-N dimethyl fumarate Chemical compound COC(=O)\C=C\C(=O)OC LDCRTTXIJACKKU-ONEGZZNKSA-N 0.000 description 6
- 229960004419 dimethyl fumarate Drugs 0.000 description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 5
- 239000004327 boric acid Substances 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 5
- BKOOMYPCSUNDGP-UHFFFAOYSA-N 2-methylbut-2-ene Chemical group CC=C(C)C BKOOMYPCSUNDGP-UHFFFAOYSA-N 0.000 description 4
- 125000001741 organic sulfur group Chemical group 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 229940091179 aconitate Drugs 0.000 description 3
- GTZCVFVGUGFEME-UHFFFAOYSA-N aconitic acid Chemical compound OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000002932 luster Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- CGEXUOTXYSGBLV-UHFFFAOYSA-N phenyl benzenesulfonate Chemical compound C=1C=CC=CC=1S(=O)(=O)OC1=CC=CC=C1 CGEXUOTXYSGBLV-UHFFFAOYSA-N 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000037390 scarring Effects 0.000 description 2
- NPBUMSUYCUWTSF-UHFFFAOYSA-N tetramethyl ethene-1,1,2,2-tetracarboxylate Chemical compound COC(=O)C(C(=O)OC)=C(C(=O)OC)C(=O)OC NPBUMSUYCUWTSF-UHFFFAOYSA-N 0.000 description 2
- XVOUMQNXTGKGMA-OWOJBTEDSA-N (E)-glutaconic acid Chemical compound OC(=O)C\C=C\C(O)=O XVOUMQNXTGKGMA-OWOJBTEDSA-N 0.000 description 1
- CGLHFJGXOBNMGI-UHFFFAOYSA-N 1,5-diphenylcyclohexa-2,4-diene-1-sulfonic acid Chemical compound C1(=CC=CC=C1)C1(CC(=CC=C1)C1=CC=CC=C1)S(=O)(=O)O CGLHFJGXOBNMGI-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- MKQNYQGIPARLKO-UHFFFAOYSA-N 2-methoxybenzenesulfonamide Chemical compound COC1=CC=CC=C1S(N)(=O)=O MKQNYQGIPARLKO-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- STYQHICBPYRHQK-UHFFFAOYSA-N 4-bromobenzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=C(Br)C=C1 STYQHICBPYRHQK-UHFFFAOYSA-N 0.000 description 1
- PXACTUVBBMDKRW-UHFFFAOYSA-N 4-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Br)C=C1 PXACTUVBBMDKRW-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 1
- JDOZUYVDIAKODH-PLNGDYQASA-N 4-o-ethyl 1-o-methyl (z)-but-2-enedioate Chemical compound CCOC(=O)\C=C/C(=O)OC JDOZUYVDIAKODH-PLNGDYQASA-N 0.000 description 1
- CBGCPUCTMYAQDU-UHFFFAOYSA-N CC(C(=C(C(=O)O)C)C(=O)O)(C(=O)O)C Chemical compound CC(C(=C(C(=O)O)C)C(=O)O)(C(=O)O)C CBGCPUCTMYAQDU-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical class CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzenecarboxaldehyde Natural products O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 1
- FJCOPDAKOAJJRG-UHFFFAOYSA-N benzenesulfonamidomethanesulfonic acid Chemical compound OS(=O)(=O)CNS(=O)(=O)C1=CC=CC=C1 FJCOPDAKOAJJRG-UHFFFAOYSA-N 0.000 description 1
- FAOJZHMRXJJQCB-WAYWQWQTSA-N bis(2-ethoxyethyl) (z)-but-2-enedioate Chemical compound CCOCCOC(=O)\C=C/C(=O)OCCOCC FAOJZHMRXJJQCB-WAYWQWQTSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- OGQPUOLFKIMRMF-UHFFFAOYSA-N chlorosulfamic acid Chemical compound OS(=O)(=O)NCl OGQPUOLFKIMRMF-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- ZEFVHSWKYCYFFL-UHFFFAOYSA-N diethyl 2-methylidenebutanedioate Chemical compound CCOC(=O)CC(=C)C(=O)OCC ZEFVHSWKYCYFFL-UHFFFAOYSA-N 0.000 description 1
- YFHHDQFGPGNXRZ-ARJAWSKDSA-N dimethyl (z)-2-bromobut-2-enedioate Chemical compound COC(=O)\C=C(/Br)C(=O)OC YFHHDQFGPGNXRZ-ARJAWSKDSA-N 0.000 description 1
- VYXGXXYXSAMWBM-ARJAWSKDSA-N dimethyl (z)-2-chlorobut-2-enedioate Chemical compound COC(=O)\C=C(/Cl)C(=O)OC VYXGXXYXSAMWBM-ARJAWSKDSA-N 0.000 description 1
- WQEXBUQDXKPVHR-PLNGDYQASA-N dimethyl (z)-2-methylbut-2-enedioate Chemical compound COC(=O)\C=C(\C)C(=O)OC WQEXBUQDXKPVHR-PLNGDYQASA-N 0.000 description 1
- SKCGFFOFYXLNCG-ARJAWSKDSA-N dimethyl (z)-pent-2-enedioate Chemical compound COC(=O)C\C=C/C(=O)OC SKCGFFOFYXLNCG-ARJAWSKDSA-N 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- KTLZQSZGORXBED-UHFFFAOYSA-N dimethyl 2-methylidenepropanedioate Chemical compound COC(=O)C(=C)C(=O)OC KTLZQSZGORXBED-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- 229960001484 edetic acid Drugs 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- JOXWSDNHLSQKCC-UHFFFAOYSA-N ethenesulfonamide Chemical compound NS(=O)(=O)C=C JOXWSDNHLSQKCC-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- ABOYDMHGKWRPFD-UHFFFAOYSA-N phenylmethanesulfonamide Chemical compound NS(=O)(=O)CC1=CC=CC=C1 ABOYDMHGKWRPFD-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- UNYWISZSMFIKJI-UHFFFAOYSA-N prop-2-ene-1-sulfonamide Chemical compound NS(=O)(=O)CC=C UNYWISZSMFIKJI-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US179873A US2678910A (en) | 1950-08-16 | 1950-08-16 | Electroplating of nickel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE900037C true DE900037C (de) | 1953-12-17 |
Family
ID=22658345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEU1284A Expired DE900037C (de) | 1950-08-16 | 1951-08-07 | Galvanische Vernicklung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US2678910A (enrdf_load_stackoverflow) |
| BE (1) | BE505242A (enrdf_load_stackoverflow) |
| DE (1) | DE900037C (enrdf_load_stackoverflow) |
| FR (1) | FR1048418A (enrdf_load_stackoverflow) |
| GB (1) | GB704185A (enrdf_load_stackoverflow) |
| NL (1) | NL80234C (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1003531B (de) * | 1954-04-05 | 1957-02-28 | Udylite Res Corp | Saures galvanisches Glanzvernickelungsbad |
| DE1032056B (de) * | 1954-08-09 | 1958-06-12 | Metal & Thermit Corp | Glanzvernickelungsbad |
| DE1042337B (de) * | 1955-10-04 | 1958-10-30 | Udylite Res Corp | Bad und Verfahren zur galvanischen Abscheidung hochglaenzender Nickelueberzuege |
| DE1190287B (de) * | 1960-04-22 | 1965-04-01 | Harshaw Chem Corp | Waessriges Bad fuer die galvanische Vernickelung |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2773818A (en) * | 1954-05-20 | 1956-12-11 | Harshaw Chem Corp | Alkaline nickel plating solution |
| US2900707A (en) * | 1954-08-06 | 1959-08-25 | Udylite Corp | Metallic protective coating |
| US3376207A (en) * | 1965-05-17 | 1968-04-02 | Patent Serm Ag | Electrodeposition of nickel and electrolytes therefor |
| US3498893A (en) * | 1967-03-27 | 1970-03-03 | Ian H S Henderson | Anodization of a nickel body which has a coating of partially electronically insulating material |
| US3639220A (en) * | 1970-07-27 | 1972-02-01 | Udylite Corp | Electrodeposition of nickel |
| CN109642098B (zh) * | 2016-07-26 | 2022-02-11 | Ppg工业俄亥俄公司 | 包含1,1-二活化的乙烯基化合物的可电沉积的涂料组合物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2466677A (en) * | 1945-08-27 | 1949-04-12 | Udylite Corp | Electrodeposition of nickel from an acid bath |
| US2523161A (en) * | 1947-11-28 | 1950-09-19 | Allied Chem & Dye Corp | Electrodeposition of nickel |
-
0
- BE BE505242D patent/BE505242A/xx unknown
- NL NL80234D patent/NL80234C/xx active
-
1950
- 1950-08-16 US US179873A patent/US2678910A/en not_active Expired - Lifetime
-
1951
- 1951-08-07 DE DEU1284A patent/DE900037C/de not_active Expired
- 1951-08-09 FR FR1048418D patent/FR1048418A/fr not_active Expired
- 1951-08-15 GB GB19207/51A patent/GB704185A/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1003531B (de) * | 1954-04-05 | 1957-02-28 | Udylite Res Corp | Saures galvanisches Glanzvernickelungsbad |
| DE1032056B (de) * | 1954-08-09 | 1958-06-12 | Metal & Thermit Corp | Glanzvernickelungsbad |
| DE1042337B (de) * | 1955-10-04 | 1958-10-30 | Udylite Res Corp | Bad und Verfahren zur galvanischen Abscheidung hochglaenzender Nickelueberzuege |
| DE1190287B (de) * | 1960-04-22 | 1965-04-01 | Harshaw Chem Corp | Waessriges Bad fuer die galvanische Vernickelung |
Also Published As
| Publication number | Publication date |
|---|---|
| NL80234C (enrdf_load_stackoverflow) | |
| US2678910A (en) | 1954-05-18 |
| FR1048418A (fr) | 1953-12-22 |
| GB704185A (en) | 1954-02-17 |
| BE505242A (enrdf_load_stackoverflow) |
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