DE69940702D1 - Nachweissystem für nanometer genaue topographische messung reflektiver oberflächen - Google Patents
Nachweissystem für nanometer genaue topographische messung reflektiver oberflächenInfo
- Publication number
- DE69940702D1 DE69940702D1 DE69940702T DE69940702T DE69940702D1 DE 69940702 D1 DE69940702 D1 DE 69940702D1 DE 69940702 T DE69940702 T DE 69940702T DE 69940702 T DE69940702 T DE 69940702T DE 69940702 D1 DE69940702 D1 DE 69940702D1
- Authority
- DE
- Germany
- Prior art keywords
- nachometer
- nanometers
- reflective surfaces
- topographic measurement
- exact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005259 measurement Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/195,533 US6999183B2 (en) | 1998-11-18 | 1998-11-18 | Detection system for nanometer scale topographic measurements of reflective surfaces |
| PCT/US1999/027464 WO2000029807A2 (en) | 1998-11-18 | 1999-11-18 | Detection system for nanometer scale topographic measurements of reflective surfaces |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE69940702D1 true DE69940702D1 (de) | 2009-05-20 |
Family
ID=22721777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69940702T Expired - Lifetime DE69940702D1 (de) | 1998-11-18 | 1999-11-18 | Nachweissystem für nanometer genaue topographische messung reflektiver oberflächen |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US6999183B2 (enExample) |
| EP (1) | EP1131623B1 (enExample) |
| JP (1) | JP2002530631A (enExample) |
| AU (1) | AU1738600A (enExample) |
| DE (1) | DE69940702D1 (enExample) |
| WO (1) | WO2000029807A2 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6999183B2 (en) * | 1998-11-18 | 2006-02-14 | Kla-Tencor Corporation | Detection system for nanometer scale topographic measurements of reflective surfaces |
| TW490596B (en) * | 1999-03-08 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus |
| US6924884B2 (en) | 1999-03-08 | 2005-08-02 | Asml Netherlands B.V. | Off-axis leveling in lithographic projection apparatus |
| US7116401B2 (en) * | 1999-03-08 | 2006-10-03 | Asml Netherlands B.V. | Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method |
| US6870611B2 (en) * | 2001-07-26 | 2005-03-22 | Orbotech Ltd. | Electrical circuit conductor inspection |
| US20070258085A1 (en) * | 2006-05-02 | 2007-11-08 | Robbins Michael D | Substrate illumination and inspection system |
| JP4485910B2 (ja) * | 2004-11-04 | 2010-06-23 | 株式会社日立ハイテクノロジーズ | 外観検査装置 |
| US7505150B2 (en) * | 2005-05-13 | 2009-03-17 | Laytec Gmbh | Device and method for the measurement of the curvature of a surface |
| US20070116350A1 (en) * | 2005-11-21 | 2007-05-24 | Cheverton Mark A | Method for detecting the alignment of films for automated defect detection |
| US20070114693A1 (en) * | 2005-11-21 | 2007-05-24 | Buckley Paul W | Methods for improving mold quality for use in the manufacture of liquid crystal display components |
| US7371590B2 (en) * | 2005-11-21 | 2008-05-13 | General Electric Company | Integrated inspection system and defect correction method |
| US20070115464A1 (en) * | 2005-11-21 | 2007-05-24 | Harding Kevin G | System and method for inspection of films |
| US20090116727A1 (en) * | 2006-05-02 | 2009-05-07 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Defects Detection |
| US7508504B2 (en) * | 2006-05-02 | 2009-03-24 | Accretech Usa, Inc. | Automatic wafer edge inspection and review system |
| US20090122304A1 (en) * | 2006-05-02 | 2009-05-14 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Exclusion Measurement |
| US7671978B2 (en) * | 2007-04-24 | 2010-03-02 | Xyratex Technology Limited | Scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts |
| US7746459B2 (en) * | 2007-08-10 | 2010-06-29 | Kla-Tencor Technologies Corp. | Systems configured to inspect a wafer |
| US8402785B2 (en) * | 2007-11-09 | 2013-03-26 | Corning Incorporated | Method and apparatus for measuring surface shape profile |
| DE112009000832T5 (de) * | 2008-04-04 | 2011-07-28 | Nanda Technologies GmbH, 85716 | System und Verfahren zur optischen Inspektion |
| US7623229B1 (en) | 2008-10-07 | 2009-11-24 | Kla-Tencor Corporation | Systems and methods for inspecting wafers |
| CN102053047B (zh) * | 2010-11-12 | 2012-07-04 | 北京理工大学 | 可兼顾分辨力和量程的激光差动共焦theta扫描检测方法 |
| US8669523B2 (en) * | 2011-05-25 | 2014-03-11 | Kla-Tencor Corporation | Contour-based defect detection using an inspection apparatus |
| US9019491B2 (en) * | 2012-01-19 | 2015-04-28 | KLA—Tencor Corporation | Method and apparatus for measuring shape and thickness variation of a wafer |
| US9097645B2 (en) * | 2013-08-23 | 2015-08-04 | Kla-Tencor Corporation | Method and system for high speed height control of a substrate surface within a wafer inspection system |
| JP6259669B2 (ja) * | 2014-01-20 | 2018-01-10 | 株式会社日立ハイテクノロジーズ | 検査装置および計測装置 |
| US9726615B2 (en) * | 2014-07-22 | 2017-08-08 | Kla-Tencor Corporation | System and method for simultaneous dark field and phase contrast inspection |
| EP3588061B1 (en) * | 2014-12-23 | 2023-04-19 | Apple Inc. | Optical inspection system and method including accounting for variations of optical path length within a sample |
| CN107430263B (zh) | 2014-12-23 | 2020-12-01 | 苹果公司 | 具有平均照明路径和平均收集路径的共焦检查系统 |
| KR102615932B1 (ko) | 2015-09-01 | 2023-12-21 | 애플 인크. | 물질의 비접촉 감지를 위한 레퍼런스 스위치 아키텍처 |
| US9958257B2 (en) | 2015-09-21 | 2018-05-01 | Kla-Tencor Corporation | Increasing dynamic range of a height sensor for inspection and metrology |
| EP4589271A3 (en) | 2016-04-21 | 2025-07-30 | Apple Inc. | Optical system for reference switching |
| US10203198B2 (en) * | 2017-05-22 | 2019-02-12 | Applejack 199 L.P. | Measurement of surface topography of a work-piece |
| US10504805B2 (en) * | 2017-08-24 | 2019-12-10 | Applied Materials Israel Ltd. | Method of examining defects in a semiconductor specimen and system thereof |
| EP3688446A2 (en) | 2017-09-29 | 2020-08-05 | Apple Inc. | Resolve path optical sampling architectures |
| CN114545550B (zh) | 2018-02-13 | 2024-05-28 | 苹果公司 | 具有集成边缘外耦合器的集成光子装置 |
| CN108844488B (zh) * | 2018-06-20 | 2020-08-04 | 中国科学院上海光学精密机械研究所 | 环形抛光沥青盘表面面形在线监控装置及监控方法 |
| US11017520B2 (en) * | 2018-09-04 | 2021-05-25 | Kla Corporation | Multi-wavelength interferometry for defect classification |
| US11852318B2 (en) | 2020-09-09 | 2023-12-26 | Apple Inc. | Optical system for noise mitigation |
| CN119334880A (zh) * | 2024-12-24 | 2025-01-21 | 上海优睿谱半导体设备有限公司 | 晶圆缺陷检测系统及方法 |
Family Cites Families (60)
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|---|---|---|---|---|
| US523201A (en) * | 1894-07-17 | Shutter-operating device | ||
| DE1915935B2 (de) * | 1969-03-28 | 1971-09-02 | Vorrichtung zur messung der lagekoordinaten eines punktes mittels eines horizontierten laserstrahls | |
| DE2256736C3 (de) * | 1972-11-18 | 1979-01-25 | Ibm Deutschland Gmbh, 7000 Stuttgart | Meßanordnung zur automatischen Prüfung der Oberflächenbeschaffenheit und Ebenheit einer Werkstückoberfläche |
| US3894230A (en) * | 1973-10-25 | 1975-07-08 | Coherent Radiation | Apparatus for detecting the position of a moving or modulated light beam |
| US3885875A (en) * | 1974-07-29 | 1975-05-27 | Zygo Corp | Noncontact surface profilometer |
| US4125317A (en) * | 1977-11-26 | 1978-11-14 | United Technologies Corporation | Optical inspection system employing dual path pickup system with single spherical mirror |
| US4183672A (en) * | 1977-11-26 | 1980-01-15 | United Technologies Corporation | Optical inspection system employing spherical mirror |
| US5164579A (en) * | 1979-04-30 | 1992-11-17 | Diffracto Ltd. | Method and apparatus for electro-optically determining the dimension, location and attitude of objects including light spot centroid determination |
| JPS58153328A (ja) | 1982-03-09 | 1983-09-12 | Hitachi Ltd | イメ−ジセンサの受光感度不均一補正方式 |
| DE3422143A1 (de) | 1984-06-14 | 1985-12-19 | Josef Prof. Dr. Bille | Geraet zur wafer-inspektion |
| JPS6197927A (ja) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | エツチングの均一度検査方法 |
| US4732485A (en) * | 1985-04-17 | 1988-03-22 | Olympus Optical Co., Ltd. | Optical surface profile measuring device |
| DE3601179A1 (de) * | 1986-01-17 | 1987-07-23 | Nestle & Fischer | Nivelliersystem mit rotierendem laserstrahl |
| JPH0834240B2 (ja) * | 1986-09-22 | 1996-03-29 | 株式会社ニコン | アライメント装置 |
| US5015096A (en) * | 1986-10-10 | 1991-05-14 | Kowalski Frank V | Method and apparatus for testing optical components |
| US5093563A (en) * | 1987-02-05 | 1992-03-03 | Hughes Aircraft Company | Electronically phased detector arrays for optical imaging |
| US4732483A (en) * | 1987-03-19 | 1988-03-22 | Zygo Corporation | Interferometric surface profiler |
| JPS63285450A (ja) | 1987-05-18 | 1988-11-22 | Mitsubishi Electric Corp | 表面欠陥検査装置 |
| DE3856575T2 (de) * | 1987-08-12 | 2005-11-10 | Olympus Optical Co., Ltd. | Rastertunnelmikroskop |
| JPH01165941A (ja) | 1987-12-22 | 1989-06-29 | Kobe Steel Ltd | 表面欠陥検出方法および装置 |
| US4869593A (en) * | 1988-04-22 | 1989-09-26 | Zygo Corporation | Interferometric surface profiler |
| EP0350595A3 (de) | 1988-07-14 | 1990-09-05 | Oerlikon-Contraves AG | Verfahren zum Messen schneller optischer Vorgänge und Vorrichtung dazu |
| JPH0749925B2 (ja) * | 1989-03-01 | 1995-05-31 | 浜松ホトニクス株式会社 | 2次元入射位置検出装置 |
| US5233201A (en) | 1989-05-26 | 1993-08-03 | Ann Koo First American Building | System for measuring radii of curvatures |
| US5118955A (en) | 1989-05-26 | 1992-06-02 | Ann Koo | Film stress measurement system having first and second stage means |
| JPH02312028A (ja) * | 1989-05-26 | 1990-12-27 | Toyobo Co Ltd | ディスク検査方法およびその装置 |
| US5270560A (en) | 1989-05-26 | 1993-12-14 | Ann F. Koo | Method and apparatus for measuring workpiece surface topography |
| US4989984A (en) * | 1989-11-08 | 1991-02-05 | Environmental Research Institute Of Michigan | System for measuring optical characteristics of curved surfaces |
| US5134303A (en) | 1990-08-14 | 1992-07-28 | Flexus, Inc. | Laser apparatus and method for measuring stress in a thin film using multiple wavelengths |
| US5248889A (en) | 1990-08-14 | 1993-09-28 | Tencor Instruments, Inc. | Laser apparatus and method for measuring stress in a thin film using multiple wavelengths |
| JPH04136754A (ja) | 1990-09-28 | 1992-05-11 | Haimo Kk | センサー流入液の温度調整法 |
| JPH076923B2 (ja) | 1990-11-09 | 1995-01-30 | 三菱電機株式会社 | 空間周波数フィルタ、その空間周波数フィルタの製造方法及びパターン欠陥検査装置 |
| JPH04369412A (ja) | 1991-06-18 | 1992-12-22 | Nippon Steel Corp | 形状不良検出装置 |
| EP0568478A1 (en) | 1992-04-29 | 1993-11-03 | International Business Machines Corporation | Darkfield alignment system using a confocal spatial filter |
| US5523582A (en) | 1992-04-30 | 1996-06-04 | Ann F. Koo | Method and apparatus for measuring the curvature of wafers with a laser source selecting device |
| JPH06222013A (ja) | 1992-09-11 | 1994-08-12 | Hologenix Inc | 表面の光学的検査装置 |
| JPH06188107A (ja) | 1992-12-21 | 1994-07-08 | Matsushita Electric Ind Co Ltd | 光電センサの感度調整装置 |
| US5452078A (en) | 1993-06-17 | 1995-09-19 | Ann F. Koo | Method and apparatus for finding wafer index marks and centers |
| JPH0772093A (ja) | 1993-06-30 | 1995-03-17 | Hitachi Ltd | 異物等の欠陥検出方法および検査装置 |
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| JPH08111361A (ja) * | 1994-10-11 | 1996-04-30 | Nikon Corp | 面位置検出装置 |
| US5764363A (en) | 1995-06-30 | 1998-06-09 | Nikon Corporation | Apparatus for observing a surface using polarized light |
| JPH0961718A (ja) | 1995-08-24 | 1997-03-07 | Nikon Corp | 微分干渉顕微鏡 |
| DE19528198A1 (de) * | 1995-08-01 | 1997-02-06 | Blz Gmbh | Verfahren zur Bestimmung der Intensitätsverteilung eines Laserstrahls |
| GB2305257B (en) * | 1995-09-12 | 1999-08-18 | Siemens Plc | Improvements in or relating to spectrometers |
| US5838653A (en) * | 1995-10-04 | 1998-11-17 | Reveo, Inc. | Multiple layer optical recording media and method and system for recording and reproducing information using the same |
| US5644141A (en) * | 1995-10-12 | 1997-07-01 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Apparatus and method for high-speed characterization of surfaces |
| US5812266A (en) * | 1995-12-15 | 1998-09-22 | Hewlett-Packard Company | Non-contact position sensor |
| US5798829A (en) | 1996-03-05 | 1998-08-25 | Kla-Tencor Corporation | Single laser bright field and dark field system for detecting anomalies of a sample |
| JP3317132B2 (ja) * | 1996-03-11 | 2002-08-26 | 日産自動車株式会社 | 位置検出センサ |
| MY123792A (en) | 1996-12-04 | 2006-06-30 | Ade Optical Systems | Wafer inspection system for distinguishing pits and particles |
| JP3573587B2 (ja) | 1997-02-05 | 2004-10-06 | 株式会社ルネサステクノロジ | 微小欠陥検査方法およびその装置並びに露光方法および半導体基板の製造方法 |
| US5889593A (en) * | 1997-02-26 | 1999-03-30 | Kla Instruments Corporation | Optical system and method for angle-dependent reflection or transmission measurement |
| US6172349B1 (en) * | 1997-03-31 | 2001-01-09 | Kla-Tencor Corporation | Autofocusing apparatus and method for high resolution microscope system |
| US6999183B2 (en) * | 1998-11-18 | 2006-02-14 | Kla-Tencor Corporation | Detection system for nanometer scale topographic measurements of reflective surfaces |
| JP4136754B2 (ja) | 2003-03-28 | 2008-08-20 | 日本碍子株式会社 | 回転角速度測定装置 |
| JP4369412B2 (ja) | 2005-09-30 | 2009-11-18 | 株式会社荏原製作所 | 流入ゲートの運転制御方法及び排水ポンプ設備 |
| JP5113407B2 (ja) | 2007-03-22 | 2013-01-09 | 古野電気株式会社 | Gps複合航法装置 |
-
1998
- 1998-11-18 US US09/195,533 patent/US6999183B2/en not_active Expired - Fee Related
-
1999
- 1999-11-18 JP JP2000582761A patent/JP2002530631A/ja active Pending
- 1999-11-18 EP EP99960511A patent/EP1131623B1/en not_active Expired - Lifetime
- 1999-11-18 AU AU17386/00A patent/AU1738600A/en not_active Abandoned
- 1999-11-18 WO PCT/US1999/027464 patent/WO2000029807A2/en not_active Ceased
- 1999-11-18 DE DE69940702T patent/DE69940702D1/de not_active Expired - Lifetime
-
2005
- 2005-12-15 US US11/304,878 patent/US7342672B2/en not_active Expired - Fee Related
-
2008
- 2008-03-03 US US12/074,421 patent/US8384903B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000029807A3 (en) | 2000-11-23 |
| WO2000029807A2 (en) | 2000-05-25 |
| US20010013936A1 (en) | 2001-08-16 |
| US20080225275A1 (en) | 2008-09-18 |
| JP2002530631A (ja) | 2002-09-17 |
| US20060092427A1 (en) | 2006-05-04 |
| US7342672B2 (en) | 2008-03-11 |
| EP1131623A2 (en) | 2001-09-12 |
| EP1131623B1 (en) | 2009-04-08 |
| US6999183B2 (en) | 2006-02-14 |
| US8384903B2 (en) | 2013-02-26 |
| AU1738600A (en) | 2000-06-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |