DE69937724T2 - Verbesserte optische Übertragungsvorrichtung, die Metallschichten mit Öffnungen und periodischer Oberflächentopographie verwendet - Google Patents
Verbesserte optische Übertragungsvorrichtung, die Metallschichten mit Öffnungen und periodischer Oberflächentopographie verwendet Download PDFInfo
- Publication number
- DE69937724T2 DE69937724T2 DE69937724T DE69937724T DE69937724T2 DE 69937724 T2 DE69937724 T2 DE 69937724T2 DE 69937724 T DE69937724 T DE 69937724T DE 69937724 T DE69937724 T DE 69937724T DE 69937724 T2 DE69937724 T2 DE 69937724T2
- Authority
- DE
- Germany
- Prior art keywords
- light
- metal layer
- openings
- periodic
- transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 165
- 239000002184 metal Substances 0.000 title claims description 165
- 230000005540 biological transmission Effects 0.000 title claims description 123
- 230000000737 periodic effect Effects 0.000 title claims description 105
- 238000012876 topography Methods 0.000 title claims description 64
- 230000003287 optical effect Effects 0.000 title claims description 42
- 239000000523 sample Substances 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 238000000206 photolithography Methods 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000010453 quartz Substances 0.000 description 11
- 239000013598 vector Substances 0.000 description 11
- 238000012546 transfer Methods 0.000 description 10
- 238000000411 transmission spectrum Methods 0.000 description 10
- 239000002023 wood Substances 0.000 description 10
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000004651 near-field scanning optical microscopy Methods 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 238000003491 array Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 238000012552 review Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Radiology & Medical Imaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Microscoopes, Condenser (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US208116 | 1998-12-09 | ||
| US09/208,116 US6236033B1 (en) | 1998-12-09 | 1998-12-09 | Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69937724D1 DE69937724D1 (de) | 2008-01-24 |
| DE69937724T2 true DE69937724T2 (de) | 2008-11-27 |
Family
ID=22773246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69937724T Expired - Lifetime DE69937724T2 (de) | 1998-12-09 | 1999-08-20 | Verbesserte optische Übertragungsvorrichtung, die Metallschichten mit Öffnungen und periodischer Oberflächentopographie verwendet |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6236033B1 (enExample) |
| EP (1) | EP1008870B1 (enExample) |
| JP (2) | JP3766238B2 (enExample) |
| DE (1) | DE69937724T2 (enExample) |
Families Citing this family (148)
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| US7351374B2 (en) * | 2000-10-17 | 2008-04-01 | President And Fellows Of Harvard College | Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations |
| US6818907B2 (en) | 2000-10-17 | 2004-11-16 | The President And Fellows Of Harvard College | Surface plasmon enhanced illumination system |
| JP3520335B2 (ja) | 2001-01-10 | 2004-04-19 | 独立行政法人産業技術総合研究所 | 近接場光検出方法およびその装置 |
| JP3525142B2 (ja) * | 2001-01-12 | 2004-05-10 | 独立行政法人 科学技術振興機構 | 金属ナノウェルを用いた蛍光分析用素子及びその製造方法 |
| WO2002086557A2 (en) * | 2001-04-25 | 2002-10-31 | New Mexico State University Technology Transfer Corporation | Plasmonic nanophotonics methods, materials, and apparatuses |
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| US20080099667A1 (en) * | 2001-08-14 | 2008-05-01 | President And Fellows Of Harvard College | Methods and apparatus for sensing a physical substance |
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| US7248297B2 (en) * | 2001-11-30 | 2007-07-24 | The Board Of Trustees Of The Leland Stanford Junior University | Integrated color pixel (ICP) |
| US6975580B2 (en) | 2001-12-18 | 2005-12-13 | Interntional Business Machines Corporation | Optical aperture for data recording having transmission enhanced by waveguide mode resonance |
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-
1998
- 1998-12-09 US US09/208,116 patent/US6236033B1/en not_active Expired - Lifetime
-
1999
- 1999-08-13 JP JP22923199A patent/JP3766238B2/ja not_active Expired - Fee Related
- 1999-08-20 DE DE69937724T patent/DE69937724T2/de not_active Expired - Lifetime
- 1999-08-20 EP EP99116396A patent/EP1008870B1/en not_active Expired - Lifetime
-
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- 2003-05-28 JP JP2003150755A patent/JP3862019B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3766238B2 (ja) | 2006-04-12 |
| US6236033B1 (en) | 2001-05-22 |
| EP1008870B1 (en) | 2007-12-12 |
| DE69937724D1 (de) | 2008-01-24 |
| JP2000171763A (ja) | 2000-06-23 |
| EP1008870A1 (en) | 2000-06-14 |
| JP2004070288A (ja) | 2004-03-04 |
| JP3862019B2 (ja) | 2006-12-27 |
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