DE69933368D1 - Haltungsverfahren und vorrichtung fuer einen wafer - Google Patents

Haltungsverfahren und vorrichtung fuer einen wafer

Info

Publication number
DE69933368D1
DE69933368D1 DE69933368T DE69933368T DE69933368D1 DE 69933368 D1 DE69933368 D1 DE 69933368D1 DE 69933368 T DE69933368 T DE 69933368T DE 69933368 T DE69933368 T DE 69933368T DE 69933368 D1 DE69933368 D1 DE 69933368D1
Authority
DE
Germany
Prior art keywords
wafer
positioning process
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69933368T
Other languages
English (en)
Inventor
Oleg Siniaguine
John Jacques
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allvia Inc
Original Assignee
Allvia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allvia Inc filed Critical Allvia Inc
Application granted granted Critical
Publication of DE69933368D1 publication Critical patent/DE69933368D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69933368T 1998-03-11 1999-01-08 Haltungsverfahren und vorrichtung fuer einen wafer Expired - Lifetime DE69933368D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/041,284 US6095582A (en) 1998-03-11 1998-03-11 Article holders and holding methods
PCT/US1999/000430 WO1999046806A1 (en) 1998-03-11 1999-01-08 Article holders and holding methods

Publications (1)

Publication Number Publication Date
DE69933368D1 true DE69933368D1 (de) 2006-11-09

Family

ID=21915751

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69933368T Expired - Lifetime DE69933368D1 (de) 1998-03-11 1999-01-08 Haltungsverfahren und vorrichtung fuer einen wafer

Country Status (5)

Country Link
US (1) US6095582A (de)
EP (1) EP1062683B1 (de)
JP (1) JPH11330203A (de)
DE (1) DE69933368D1 (de)
WO (1) WO1999046806A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4040254B2 (ja) * 1998-06-08 2008-01-30 クライテック株式会社 吸引装置
EP1052682B1 (de) * 1999-04-28 2002-01-09 SEZ Semiconductor-Equipment Zubehör für die Halbleiterfertigung AG Vorrichtung und Verfahren zur Flüssigkeitsbehandlung von scheibenförmigen Gegenständen
US6467297B1 (en) 2000-10-12 2002-10-22 Jetek, Inc. Wafer holder for rotating and translating wafers
US6402843B1 (en) * 1999-12-07 2002-06-11 Trusi Technologies, Llc Non-contact workpiece holder
US6203661B1 (en) * 1999-12-07 2001-03-20 Trusi Technologies, Llc Brim and gas escape for non-contact wafer holder
US6398823B1 (en) * 1999-12-07 2002-06-04 Tru-Si Technologies, Inc. Dynamic break for non-contact wafer holder
JP4669252B2 (ja) * 2000-06-09 2011-04-13 株式会社ハーモテック 旋回流形成体および非接触搬送装置
US6631935B1 (en) * 2000-08-04 2003-10-14 Tru-Si Technologies, Inc. Detection and handling of semiconductor wafer and wafer-like objects
DE10039482B4 (de) * 2000-08-08 2016-03-24 Zs-Handling Gmbh Handler zum Transportieren von flachen, in der Halbleiterindustrie zur Anwendung kommenden Substraten
WO2002013244A2 (en) * 2000-08-08 2002-02-14 Qc Solutions, Inc. Apparatus and method for handling and testing of wafers
EP1233442B1 (de) * 2001-02-20 2009-10-14 Harmotec Corporation Kontaktlose Transportvorrichtung
TW500651B (en) * 2001-02-20 2002-09-01 Harmotec Corp Non-contact transfer device
US6615113B2 (en) 2001-07-13 2003-09-02 Tru-Si Technologies, Inc. Articles holders with sensors detecting a type of article held by the holder
US6935830B2 (en) * 2001-07-13 2005-08-30 Tru-Si Technologies, Inc. Alignment of semiconductor wafers and other articles
US6638004B2 (en) 2001-07-13 2003-10-28 Tru-Si Technologies, Inc. Article holders and article positioning methods
DE20112634U1 (de) * 2001-07-31 2001-11-15 FESTO AG & Co., 73734 Esslingen Positioniereinrichtung für Gegenstände, insbesondere für pneumatische Handhabungsvorrichtungen
DE10144409B4 (de) * 2001-09-10 2004-11-18 Infineon Technologies Ag Vorrichtung mit einem Greifer zur Handhabung von Platten
DE10161902B4 (de) * 2001-12-17 2005-06-23 Infineon Technologies Ag Verfahren und Vorrichtung zum Handhaben von Platten
US6893070B2 (en) * 2002-10-17 2005-05-17 Delaware Capital Formation, Inc. Integrated end effector
DE10303460A1 (de) * 2003-01-29 2004-08-19 Infineon Technologies Ag Verfahren und Vorrichtung zum Handhaben von scheibenförmigen Gegenständen
US6759341B1 (en) 2003-04-09 2004-07-06 Tru-Si Technologies, Inc. Wafering method comprising a plasma etch with a gas emitting wafer holder
US7083209B2 (en) * 2003-06-20 2006-08-01 Weatherford/Lamb, Inc. Hydraulic overshot tool without a nozzle, and method of retrieving a cylinder
US7654596B2 (en) 2003-06-27 2010-02-02 Mattson Technology, Inc. Endeffectors for handling semiconductor wafers
US7100954B2 (en) * 2003-07-11 2006-09-05 Nexx Systems, Inc. Ultra-thin wafer handling system
JP4312001B2 (ja) * 2003-07-28 2009-08-12 リアライズ・アドバンストテクノロジ株式会社 基板支持装置および基板取り外し方法
US8082932B2 (en) * 2004-03-12 2011-12-27 Applied Materials, Inc. Single side workpiece processing
US20060113806A1 (en) * 2004-11-29 2006-06-01 Asm Japan K.K. Wafer transfer mechanism
JP2007176637A (ja) * 2005-12-27 2007-07-12 Harmotec Corp 非接触搬送装置
US8104488B2 (en) * 2006-02-22 2012-01-31 Applied Materials, Inc. Single side workpiece processing
JP4642787B2 (ja) * 2006-05-09 2011-03-02 東京エレクトロン株式会社 基板搬送装置及び縦型熱処理装置
JP5013400B2 (ja) * 2006-09-29 2012-08-29 国立大学法人東北大学 塗布膜コーティング装置
JP4616873B2 (ja) * 2007-09-28 2011-01-19 東京エレクトロン株式会社 半導体製造装置、基板保持方法及びプログラム
JP2009119562A (ja) * 2007-11-15 2009-06-04 Izumi Akiyama 非接触型搬送保持具および非接触型搬送保持装置
US20090250955A1 (en) * 2008-04-07 2009-10-08 Applied Materials, Inc. Wafer transfer blade
CN102341901B (zh) * 2009-01-11 2013-11-06 应用材料公司 用于移动基板的系统、设备与方法
ITUD20090214A1 (it) * 2009-11-24 2011-05-25 Applied Materials Inc Effettore d'estremita' per la manipolazione di substrati
JP5553592B2 (ja) * 2009-12-15 2014-07-16 日本空圧システム株式会社 保持具
US9275884B2 (en) * 2011-03-25 2016-03-01 Novellus Systems, Inc. Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers
DE202011107531U1 (de) * 2011-11-07 2011-12-15 Bdt Media Automation Gmbh Vorrichtung zum Heben und Positionieren eines Objekts
US9038262B2 (en) * 2012-02-23 2015-05-26 Beijing Sevenstar Electronics Co., Ltd. Device for holding disk-shaped articles and method thereof
CN102760666A (zh) * 2012-07-05 2012-10-31 西安永电电气有限责任公司 用于igbt的键合真空吸附工装
WO2014107351A1 (en) * 2013-01-04 2014-07-10 Rudolph Technologies, Inc. Edge grip substrate handler
JP6278807B2 (ja) * 2014-04-10 2018-02-14 浜井産業株式会社 ワークハンドリング装置
JP6456065B2 (ja) * 2014-05-16 2019-01-23 日本電産サンキョー株式会社 産業用ロボットのハンドおよび産業用ロボット
KR102397110B1 (ko) 2016-06-13 2022-05-12 도쿄엘렉트론가부시키가이샤 기판 반송 장치 및 기판 반송 방법
JP6858041B2 (ja) * 2017-03-16 2021-04-14 川崎重工業株式会社 基板搬送装置
CN111170001A (zh) * 2020-02-18 2020-05-19 浙江大学 转盘机构
KR102682220B1 (ko) * 2022-04-11 2024-07-05 주식회사 쎄믹스 웨이퍼 이송 장치

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438668A (en) * 1965-08-26 1969-04-15 Gen Electric Contactless lifter
US3466079A (en) * 1965-09-08 1969-09-09 Western Electric Co Pressurized fluid pickup device
US3425736A (en) * 1966-03-25 1969-02-04 Bell Telephone Labor Inc Pneumatic probe for handling flat objects
US3523706A (en) * 1967-10-27 1970-08-11 Ibm Apparatus for supporting articles without structural contact and for positioning the supported articles
US3539216A (en) * 1968-01-11 1970-11-10 Sprague Electric Co Pickup device
GB1513444A (en) * 1974-09-06 1978-06-07 Chemical Reactor Equip As Pick-up devices for lifting and moving semiconductor wafers
SU537924A1 (ru) * 1974-12-08 1976-12-05 Харьковский авиационный институт Вакуумное грузозахватное устройство
DE2609754A1 (de) * 1976-03-09 1977-09-22 Wacker Chemitronic Halterung fuer das beidseitig beruehrungslose aufnehmen von scheiben
US4029351A (en) * 1976-06-02 1977-06-14 International Business Machines Corporation Bernoulli pickup head with self-restoring anti-tilt improvement
US4257637A (en) * 1979-09-28 1981-03-24 International Business Machines Corporation Contactless air film lifting device
US4508161A (en) * 1982-05-25 1985-04-02 Varian Associates, Inc. Method for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer
US4474397A (en) * 1982-11-16 1984-10-02 International Business Machines Corporation Pick-up head utilizing aspirated air flow
US4603466A (en) * 1984-02-17 1986-08-05 Gca Corporation Wafer chuck
US4566726A (en) * 1984-06-13 1986-01-28 At&T Technologies, Inc. Method and apparatus for handling semiconductor wafers
US5067762A (en) * 1985-06-18 1991-11-26 Hiroshi Akashi Non-contact conveying device
JPS62269826A (ja) * 1986-05-15 1987-11-24 Matsushita Electronics Corp 半導体ウエハの浮遊吸着方法
US5080549A (en) * 1987-05-11 1992-01-14 Epsilon Technology, Inc. Wafer handling system with Bernoulli pick-up
US4773687A (en) * 1987-05-22 1988-09-27 American Telephone And Telegraph Company, At&T Technologies, Inc. Wafer handler
US5262029A (en) * 1988-05-23 1993-11-16 Lam Research Method and system for clamping semiconductor wafers
US5022695A (en) * 1989-01-30 1991-06-11 Texas Instruments Incorporated Semiconductor slice holder
JP2865690B2 (ja) * 1989-02-17 1999-03-08 株式会社日立製作所 嵌合挿入装置
JPH0666381B2 (ja) * 1989-05-18 1994-08-24 株式会社エンヤシステム ウエハチヤツク方法及び装置
US4969676A (en) * 1989-06-23 1990-11-13 At&T Bell Laboratories Air pressure pick-up tool
SU1732399A1 (ru) * 1989-07-31 1992-05-07 Физико-Энергетический Институт Ан Латвсср Автомат дл контрол и разбраковки полупроводниковых пластин
US5238499A (en) * 1990-07-16 1993-08-24 Novellus Systems, Inc. Gas-based substrate protection during processing
US5578532A (en) * 1990-07-16 1996-11-26 Novellus Systems, Inc. Wafer surface protection in a gas deposition process
JP2728766B2 (ja) * 1990-07-18 1998-03-18 株式会社東芝 半導体の処理方法およびその装置
US5169196A (en) * 1991-06-17 1992-12-08 Safabakhsh Ali R Non-contact pick-up head
DE59406900D1 (de) * 1993-02-08 1998-10-22 Sez Semiconduct Equip Zubehoer Träger für scheibenförmige Gegenstände
DE59407361D1 (de) * 1993-02-08 1999-01-14 Sez Semiconduct Equip Zubehoer Träger für scheibenförmige Gegenstände
US5542559A (en) * 1993-02-16 1996-08-06 Tokyo Electron Kabushiki Kaisha Plasma treatment apparatus
JP2934565B2 (ja) * 1993-05-21 1999-08-16 三菱電機株式会社 半導体製造装置及び半導体製造方法
EP0634787B1 (de) * 1993-07-15 1997-05-02 Applied Materials, Inc. Substratfangvorrichtung und Keramikblatt für Halbleiterbearbeitungseinrichtung
US5368645A (en) * 1993-09-24 1994-11-29 Specialty Coating Systems Inc. Vacuum chuck for coating apparatus
US5590996A (en) * 1994-10-13 1997-01-07 Semitherm Wafer transfer apparatus
RU2075135C1 (ru) * 1995-01-13 1997-03-10 Акционерное общество Научно-производственная фирма "А3" Установка для плазмоструйной обработки пластин
US5692873A (en) * 1995-03-31 1997-12-02 Motorola, Inc. Apparatus for holding a piece of semiconductor
US5632873A (en) * 1995-05-22 1997-05-27 Stevens; Joseph J. Two piece anti-stick clamp ring
JP3440655B2 (ja) * 1995-10-31 2003-08-25 株式会社日立製作所 試料保持方法、試料回転方法及び試料表面の流体処理方法並びにそれらの装置
US5697427A (en) * 1995-12-22 1997-12-16 Applied Materials, Inc. Apparatus and method for cooling a substrate
EP0902966A1 (de) * 1996-05-31 1999-03-24 IPEC Precision, Inc. Berührungsloses haltewerkzeug für wafer änlichen artikeln
JP3831043B2 (ja) * 1997-01-24 2006-10-11 東京エレクトロン株式会社 回転処理装置

Also Published As

Publication number Publication date
US6095582A (en) 2000-08-01
JPH11330203A (ja) 1999-11-30
EP1062683B1 (de) 2006-09-27
WO1999046806A1 (en) 1999-09-16
EP1062683A1 (de) 2000-12-27

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Legal Events

Date Code Title Description
8332 No legal effect for de