DE69828630D1 - Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolett - Google Patents
Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolettInfo
- Publication number
- DE69828630D1 DE69828630D1 DE69828630T DE69828630T DE69828630D1 DE 69828630 D1 DE69828630 D1 DE 69828630D1 DE 69828630 T DE69828630 T DE 69828630T DE 69828630 T DE69828630 T DE 69828630T DE 69828630 D1 DE69828630 D1 DE 69828630D1
- Authority
- DE
- Germany
- Prior art keywords
- improved thermal
- resistant anti
- reflection coatings
- low ultraviolet
- ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/492—Photosoluble emulsions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Surface Treatment Of Glass (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/940,169 US5919599A (en) | 1997-09-30 | 1997-09-30 | Thermosetting anti-reflective coatings at deep ultraviolet |
US940169 | 1997-09-30 | ||
PCT/US1998/020672 WO1999017161A1 (en) | 1997-09-30 | 1998-09-28 | Improved thermosetting anti-reflective coatings at deep ultraviolet |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69828630D1 true DE69828630D1 (de) | 2005-02-17 |
DE69828630T2 DE69828630T2 (de) | 2005-06-16 |
Family
ID=25474362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69828630T Expired - Lifetime DE69828630T2 (de) | 1997-09-30 | 1998-09-28 | Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolett |
Country Status (10)
Country | Link |
---|---|
US (1) | US5919599A (de) |
EP (1) | EP1023634B1 (de) |
JP (1) | JP4310721B2 (de) |
KR (1) | KR100490201B1 (de) |
CN (1) | CN100362428C (de) |
AT (1) | ATE287098T1 (de) |
CA (1) | CA2301020A1 (de) |
DE (1) | DE69828630T2 (de) |
TW (1) | TW483917B (de) |
WO (1) | WO1999017161A1 (de) |
Families Citing this family (100)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6808869B1 (en) | 1996-12-24 | 2004-10-26 | Fuji Photo Film Co., Ltd. | Bottom anti-reflective coating material composition and method for forming resist pattern using the same |
US6165684A (en) * | 1996-12-24 | 2000-12-26 | Fuji Photo Film Co., Ltd. | Bottom anti-reflective coating material composition and method for forming resist pattern using the same |
US6391786B1 (en) * | 1997-12-31 | 2002-05-21 | Lam Research Corporation | Etching process for organic anti-reflective coating |
US6190839B1 (en) | 1998-01-15 | 2001-02-20 | Shipley Company, L.L.C. | High conformality antireflective coating compositions |
US20020102483A1 (en) * | 1998-09-15 | 2002-08-01 | Timothy Adams | Antireflective coating compositions |
JP3852889B2 (ja) * | 1998-09-24 | 2006-12-06 | 富士写真フイルム株式会社 | フォトレジスト用反射防止膜材料組成物 |
US6165855A (en) * | 1998-12-04 | 2000-12-26 | Advanced Micro Devices, Inc. | Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies |
US6314834B1 (en) | 1999-01-25 | 2001-11-13 | Truvativ International Co., Ltd. | Hollow crank arm |
US6316165B1 (en) | 1999-03-08 | 2001-11-13 | Shipley Company, L.L.C. | Planarizing antireflective coating compositions |
US6323287B1 (en) * | 1999-03-12 | 2001-11-27 | Arch Specialty Chemicals, Inc. | Hydroxy-amino thermally cured undercoat for 193 NM lithography |
US6459701B1 (en) * | 1999-08-06 | 2002-10-01 | Emulex Corporation | Variable access fairness in a fibre channel arbitrated loop |
US20040034134A1 (en) * | 1999-08-26 | 2004-02-19 | Lamb James E. | Crosslinkable fill compositions for uniformly protecting via and contact holes |
US6376361B1 (en) * | 1999-10-18 | 2002-04-23 | Chartered Semiconductor Manufacturing Ltd. | Method to remove excess metal in the formation of damascene and dual interconnects |
WO2001040865A1 (en) * | 1999-11-30 | 2001-06-07 | Brewer Science, Inc. | Non-aromatic chromophores for use in polymer anti-reflective coatings |
KR100427440B1 (ko) * | 1999-12-23 | 2004-04-17 | 주식회사 하이닉스반도체 | 유기 반사방지 화합물 및 그의 제조방법 |
US6852473B2 (en) * | 2000-01-12 | 2005-02-08 | Infineon Technologies Richmond, Lp | Anti-reflective coating conformality control |
KR100912975B1 (ko) * | 2000-03-09 | 2009-08-20 | 브레우어 사이언스 인코포레이션 | 중합 아미노플라스트를 함유하는 개선된 반사 방지액 조성물 |
US6323310B1 (en) | 2000-04-19 | 2001-11-27 | Brewer Science, Inc. | Anti-reflective coating compositions comprising polymerized aminoplasts |
US6653411B2 (en) | 2000-04-19 | 2003-11-25 | Brewer Science, Inc. | Anti-reflective coating compositions comprising polymerized aminoplasts |
FR2809109B1 (fr) * | 2000-05-17 | 2003-10-03 | Atofina | Polymeres ayant des fonctions hydroxyles sur les chaines laterales |
KR100687850B1 (ko) * | 2000-06-30 | 2007-02-27 | 주식회사 하이닉스반도체 | 유기반사방지막 조성물 및 그의 제조방법 |
KR100721182B1 (ko) * | 2000-06-30 | 2007-05-23 | 주식회사 하이닉스반도체 | 유기반사방지막 조성물 및 그의 제조방법 |
KR100721181B1 (ko) * | 2000-06-30 | 2007-05-23 | 주식회사 하이닉스반도체 | 유기반사방지막 조성물 및 그의 제조방법 |
WO2002025374A2 (en) * | 2000-09-19 | 2002-03-28 | Shipley Company, L.L.C. | Antireflective composition |
US6495305B1 (en) | 2000-10-04 | 2002-12-17 | Tomoyuki Enomoto | Halogenated anti-reflective coatings |
US6455416B1 (en) * | 2000-10-24 | 2002-09-24 | Advanced Micro Devices, Inc. | Developer soluble dyed BARC for dual damascene process |
CN100470365C (zh) * | 2001-01-12 | 2009-03-18 | 富士胶片株式会社 | 正型成像材料 |
US20020162031A1 (en) * | 2001-03-08 | 2002-10-31 | Shmuel Levin | Method and apparatus for automatic control of access |
CN1257435C (zh) * | 2001-04-10 | 2006-05-24 | 日产化学工业株式会社 | 形成光刻用防反射膜的组合物 |
WO2002083415A1 (en) * | 2001-04-17 | 2002-10-24 | Brewer Science, Inc. | Anti-reflective coating composition with improved spin bowl compatibility |
EP1426822B1 (de) * | 2001-08-20 | 2009-04-08 | Nissan Chemical Industries, Ltd. | Zusammensetzung zur bildung eines antireflexfilms zur verwendung bei der lithographie |
JP4840554B2 (ja) * | 2001-09-13 | 2011-12-21 | 日産化学工業株式会社 | 反射防止膜の表面エネルギーの調整方法 |
US7425347B2 (en) * | 2001-10-10 | 2008-09-16 | Nissan Chemical Industries, Ltd | Composition for forming anti-reflective coating for use in lithography |
US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
US6846612B2 (en) * | 2002-02-01 | 2005-01-25 | Brewer Science Inc. | Organic anti-reflective coating compositions for advanced microlithography |
EP2000852B1 (de) * | 2002-02-11 | 2010-08-25 | Brewer Science, Inc. | Halogenierte Antireflexionsbeschichtungen |
US7309560B2 (en) * | 2002-02-19 | 2007-12-18 | Nissan Chemical Industries, Ltd. | Composition for forming anti-reflective coating |
JP2003318126A (ja) * | 2002-04-25 | 2003-11-07 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
JP3852593B2 (ja) * | 2002-07-17 | 2006-11-29 | 日産化学工業株式会社 | 反射防止膜形成組成物 |
TWI283335B (en) * | 2002-08-20 | 2007-07-01 | Kyowa Yuka Kk | A composition with photo-sensibility of visible light |
JP3597523B2 (ja) * | 2002-08-27 | 2004-12-08 | 東京応化工業株式会社 | リソグラフィー用下地材 |
US7148265B2 (en) * | 2002-09-30 | 2006-12-12 | Rohm And Haas Electronic Materials Llc | Functional polymer |
US7323289B2 (en) | 2002-10-08 | 2008-01-29 | Brewer Science Inc. | Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
US7425399B2 (en) * | 2002-10-09 | 2008-09-16 | Nissan Chemical Industries, Ltd. | Composition for forming anti-reflective coating for use in lithography |
US7038328B2 (en) * | 2002-10-15 | 2006-05-02 | Brewer Science Inc. | Anti-reflective compositions comprising triazine compounds |
KR101158297B1 (ko) * | 2002-12-26 | 2012-06-26 | 닛산 가가쿠 고교 가부시키 가이샤 | 알칼리 용해형 리소그라피용 갭 필링재 형성조성물 |
JP2004252349A (ja) * | 2003-02-21 | 2004-09-09 | Semiconductor Leading Edge Technologies Inc | 反射防止膜及びパターン転写方法 |
US8007979B2 (en) | 2003-02-21 | 2011-08-30 | Nissan Chemical Industries, Ltd. | Acrylic polymer-containing gap fill material forming composition for lithography |
EP1617289A4 (de) * | 2003-04-02 | 2009-12-16 | Nissan Chemical Ind Ltd | Zusammensetzung zur bildung eines unterschichtfilms für die lithographie mit epoxydzusammensetzung und carboxylsäurezusammensetzung |
US7365023B2 (en) * | 2003-04-17 | 2008-04-29 | Nissan Chemical Industries, Ltd. | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating |
JP2004356708A (ja) * | 2003-05-27 | 2004-12-16 | Hosiden Corp | 音響検出機構及びその製造方法 |
US7008476B2 (en) * | 2003-06-11 | 2006-03-07 | Az Electronic Materials Usa Corp. | Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof |
TWI363251B (en) * | 2003-07-30 | 2012-05-01 | Nissan Chemical Ind Ltd | Sublayer coating-forming composition for lithography containing compound having protected carboxy group |
TWI360726B (en) * | 2003-10-30 | 2012-03-21 | Nissan Chemical Ind Ltd | Sublayer coating-forming composition containing de |
US7030201B2 (en) * | 2003-11-26 | 2006-04-18 | Az Electronic Materials Usa Corp. | Bottom antireflective coatings |
US7727902B2 (en) * | 2003-12-26 | 2010-06-01 | Nissan Chemical Industries, Ltd. | Composition for forming nitride coating film for hard mask |
TWI377446B (en) * | 2004-03-16 | 2012-11-21 | Nissan Chemical Ind Ltd | Anti-reflective coating containing sulfur atom |
KR100853004B1 (ko) * | 2004-04-09 | 2008-08-19 | 닛산 가가쿠 고교 가부시키 가이샤 | 축합계 폴리머를 갖는 반도체용 반사 방지막 |
US7691556B2 (en) * | 2004-09-15 | 2010-04-06 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
US20060057501A1 (en) * | 2004-09-15 | 2006-03-16 | Hengpeng Wu | Antireflective compositions for photoresists |
JP4687910B2 (ja) * | 2004-10-12 | 2011-05-25 | 日産化学工業株式会社 | 硫黄原子を含むリソグラフィー用反射防止膜形成組成物 |
US7687223B2 (en) * | 2004-11-01 | 2010-03-30 | Nissan Chemical Industries, Ltd. | Underlayer coating forming composition for lithography containing cyclodextrin compound |
US7326523B2 (en) * | 2004-12-16 | 2008-02-05 | International Business Machines Corporation | Low refractive index polymers as underlayers for silicon-containing photoresists |
JP4662793B2 (ja) * | 2005-03-01 | 2011-03-30 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | エポキシ含有物質を含むネガ型感光性樹脂組成物 |
JP4602807B2 (ja) * | 2005-03-18 | 2010-12-22 | Jsr株式会社 | スチレン系重合体およびその製造方法並びに屈折率変換材料および光−熱エネルギー変換蓄積材料 |
TWI340296B (en) * | 2005-03-20 | 2011-04-11 | Rohm & Haas Elect Mat | Coating compositions for use with an overcoated photoresist |
KR101088568B1 (ko) * | 2005-04-19 | 2011-12-05 | 아반토르 퍼포먼스 머티리얼스, 인크. | 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 |
SG195598A1 (en) * | 2005-04-19 | 2013-12-30 | Nissan Chemical Ind Ltd | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating |
US7632626B2 (en) * | 2005-04-19 | 2009-12-15 | Nissan Chemical Industries, Ltd. | Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure |
US7816067B2 (en) * | 2005-06-10 | 2010-10-19 | Nissan Chemical Industries, Ltd. | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative |
JP5029832B2 (ja) * | 2005-08-25 | 2012-09-19 | 日産化学工業株式会社 | ビニルナフタレン樹脂誘導体を含有するリソグラフィー用塗布型下層膜形成組成物 |
US7553905B2 (en) * | 2005-10-31 | 2009-06-30 | Az Electronic Materials Usa Corp. | Anti-reflective coatings |
KR100703007B1 (ko) * | 2005-11-17 | 2007-04-06 | 삼성전자주식회사 | 감광성 유기 반사 방지막 형성용 조성물 및 이를 이용한패턴 형성 방법 |
WO2007066597A1 (ja) * | 2005-12-06 | 2007-06-14 | Nissan Chemical Industries, Ltd. | 光架橋硬化のレジスト下層膜を形成するためのケイ素含有レジスト下層膜形成組成物 |
US7736822B2 (en) * | 2006-02-13 | 2010-06-15 | Hoya Corporation | Resist underlayer coating forming composition for mask blank, mask blank and mask |
JP4784784B2 (ja) * | 2006-08-28 | 2011-10-05 | 日産化学工業株式会社 | 液状添加剤を含むレジスト下層膜形成組成物 |
EP2085822A4 (de) | 2006-10-12 | 2011-03-16 | Nissan Chemical Ind Ltd | Prozess zur halbleiterbauelementeproduktion unter verwendung eines durch fotovernetzung ausgehärteten unterresistfilms |
CN101622580B (zh) * | 2007-02-27 | 2013-12-25 | 日产化学工业株式会社 | 形成电子束光刻用抗蚀剂下层膜的组合物 |
US20090042133A1 (en) * | 2007-08-10 | 2009-02-12 | Zhong Xiang | Antireflective Coating Composition |
EP2203519A4 (de) * | 2007-10-02 | 2010-11-10 | King Ind | Sulfonatester als latente säurekatalysatoren |
ES2382255T3 (es) * | 2007-12-11 | 2012-06-06 | Carl Zeiss Meditec Ag | Copolímero y composición oftalmológica |
KR100952465B1 (ko) * | 2007-12-18 | 2010-04-13 | 제일모직주식회사 | 방향족 (메타)아크릴레이트 화합물 및 감광성 고분자, 및레지스트 조성물 |
US8808960B2 (en) * | 2009-03-11 | 2014-08-19 | Sumitomo Chemical Company, Limited | Compound and chemically amplified positive resist composition |
CN104749887A (zh) | 2009-04-21 | 2015-07-01 | 日产化学工业株式会社 | Euv光刻用抗蚀剂下层膜形成用组合物 |
CN102422228B (zh) | 2009-05-07 | 2015-01-21 | 巴斯夫欧洲公司 | 抗蚀剂剥离组合物和生产电气装置的方法 |
WO2010127941A1 (en) | 2009-05-07 | 2010-11-11 | Basf Se | Resist stripping compositions and methods for manufacturing electrical devices |
SG10201402081TA (en) | 2009-05-07 | 2014-07-30 | Basf Se | Resist stripping compositions and methods for manufacturing electrical devices |
JP2013060477A (ja) * | 2010-01-27 | 2013-04-04 | Nissan Chem Ind Ltd | 絶縁膜形成用組成物及び絶縁膜 |
JP5741340B2 (ja) | 2010-09-29 | 2015-07-01 | Jsr株式会社 | レジスト下層膜形成用組成物、重合体、レジスト下層膜、パターン形成方法及び半導体装置の製造方法 |
JP6404757B2 (ja) | 2015-03-27 | 2018-10-17 | 信越化学工業株式会社 | レジスト下層膜材料用重合体、レジスト下層膜材料、及びパターン形成方法 |
JP6853716B2 (ja) | 2017-03-31 | 2021-03-31 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
JP6718406B2 (ja) | 2017-03-31 | 2020-07-08 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
JPWO2018230322A1 (ja) * | 2017-06-12 | 2019-11-14 | Dic株式会社 | 重合性化合物及び液晶組成物 |
WO2019098040A1 (ja) | 2017-11-17 | 2019-05-23 | Dic株式会社 | 重合性化合物、並びにそれを使用した液晶組成物及び液晶表示素子 |
US11739270B2 (en) | 2018-03-01 | 2023-08-29 | Dic Corporation | Polymerizable compound as well as liquid crystal composition and liquid crystal display device each including polymerizable compound |
WO2019241402A1 (en) | 2018-06-13 | 2019-12-19 | Brewer Science, Inc. | Adhesion layers for euv lithography |
CN112680052B (zh) * | 2020-12-23 | 2022-06-28 | 上海飞凯材料科技股份有限公司 | 一种抗反射涂料组合物及其应用 |
WO2023008355A1 (ja) | 2021-07-30 | 2023-02-02 | 三菱瓦斯化学株式会社 | レジスト補助膜組成物、及び該組成物を用いたパターンの形成方法 |
CN114326304A (zh) * | 2021-12-30 | 2022-04-12 | 苏州瑞红电子化学品有限公司 | 一种耐刻蚀的正性光刻胶 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL100227C (de) * | 1956-07-27 | |||
US4316940A (en) * | 1980-03-21 | 1982-02-23 | E. I. Du Pont De Nemours And Company | High-solids polyester and aminoplast coating composition |
US4544691A (en) * | 1981-11-05 | 1985-10-01 | Ciba-Geigy Corporation | Compositions containing ultraviolet-absorbing stabilizing substituted by an aliphatic hydroxyl group |
EP0112798B1 (de) * | 1982-11-25 | 1987-05-13 | Ciba-Geigy Ag | Zu Kondensations- oder Additionsreaktionen befähigte lichtempfindliche und gegebenenfalls vernetzbare Stoffgemische, daraus herstellbare Reaktionsprodukte und deren Verwendung |
EP0380790B1 (de) * | 1989-01-31 | 1994-08-17 | BASF Corporation | Hydrofobe Farbstoffe enthaltende, kathodisch abscheidbare Elektrotauchlackierungen |
WO1993002384A1 (en) * | 1991-07-19 | 1993-02-04 | E.I. Du Pont De Nemours And Company | Preparation of nonlinear optical elements |
US6165697A (en) * | 1991-11-15 | 2000-12-26 | Shipley Company, L.L.C. | Antihalation compositions |
US5324789A (en) * | 1991-12-30 | 1994-06-28 | Ppg Industries, Inc. | Azetidinol reaction products |
JP2694097B2 (ja) * | 1992-03-03 | 1997-12-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 反射防止コーティング組成物 |
US5294680A (en) * | 1992-07-24 | 1994-03-15 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
US5731385A (en) * | 1993-12-16 | 1998-03-24 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
US5607824A (en) * | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
US5693691A (en) * | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
US5733714A (en) * | 1996-09-30 | 1998-03-31 | Clariant Finance (Bvi) Limited | Antireflective coating for photoresist compositions |
-
1997
- 1997-09-30 US US08/940,169 patent/US5919599A/en not_active Expired - Lifetime
-
1998
- 1998-09-28 CN CNB988093901A patent/CN100362428C/zh not_active Expired - Lifetime
- 1998-09-28 WO PCT/US1998/020672 patent/WO1999017161A1/en active IP Right Grant
- 1998-09-28 CA CA002301020A patent/CA2301020A1/en not_active Abandoned
- 1998-09-28 AT AT98952017T patent/ATE287098T1/de not_active IP Right Cessation
- 1998-09-28 JP JP2000514166A patent/JP4310721B2/ja not_active Expired - Lifetime
- 1998-09-28 KR KR10-2000-7003060A patent/KR100490201B1/ko not_active IP Right Cessation
- 1998-09-28 DE DE69828630T patent/DE69828630T2/de not_active Expired - Lifetime
- 1998-09-28 EP EP98952017A patent/EP1023634B1/de not_active Expired - Lifetime
- 1998-09-29 TW TW087116151A patent/TW483917B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2002502982A (ja) | 2002-01-29 |
JP4310721B2 (ja) | 2009-08-12 |
ATE287098T1 (de) | 2005-01-15 |
CA2301020A1 (en) | 1999-04-08 |
CN1302391A (zh) | 2001-07-04 |
KR20010030667A (ko) | 2001-04-16 |
CN100362428C (zh) | 2008-01-16 |
KR100490201B1 (ko) | 2005-05-17 |
EP1023634A1 (de) | 2000-08-02 |
WO1999017161A1 (en) | 1999-04-08 |
DE69828630T2 (de) | 2005-06-16 |
EP1023634A4 (de) | 2002-02-13 |
EP1023634B1 (de) | 2005-01-12 |
TW483917B (en) | 2002-04-21 |
US5919599A (en) | 1999-07-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69828630D1 (de) | Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolett | |
EP1123951A3 (de) | Beschichtungen, die Silikonoligomere enthalten | |
WO2002050144A3 (en) | Polymeric biomaterials containing silsesquixane monomers | |
WO2000057247A8 (en) | Improved thermosetting anti-reflective coatings | |
ATE205866T1 (de) | Hydrophile, hochquellfähige hydrogele | |
AU2385001A (en) | Polymers, their preparation and uses | |
ATE232218T1 (de) | Hyperverzweigtes makromolekül vom typ polyester | |
FR2796392B1 (fr) | Composition nettoyante comprenant un polymere hydrosoluble ou hydrodispersable | |
MY119180A (en) | Fluorescent polymers and coating compositions | |
MY130446A (en) | Polymer-bonded functional agents | |
DE69821786D1 (de) | Pulverbeschichtungszusammensetzung | |
AU2003286902A1 (en) | Curable pressure sensitive adhesive compositions | |
MXPA02001097A (es) | Composiciones de recubrimiento que tienen una mejor resistencia a las raspaduras, sustratos recubiertos, y metodos relacionados con lo mismo. | |
MY118903A (en) | Dirt pickup resistant coating binder and coatings | |
BR0014417A (pt) | Processo para preparação de uma mistura polimérica dispersada em água, mistura polimérica dispersada em água, composição para preparação de um revestimento resistente à água, e, artigo revestido resistente à água | |
ATE336547T1 (de) | Polymerzusammensetzung, enthaltend wenigstens ein mittelmolekulares reaktives polyisobuten | |
MXPA05013238A (es) | Composiciones de revestimiento que contienen diluyentes reactivos y metodos. | |
CA2029627A1 (en) | Coating composition | |
TW344755B (en) | Reactive dyes, copolymer made therefrom and lenses utilizing the same | |
ES2196610T3 (es) | Composicion de revestimiento endurecible. | |
AU5547299A (en) | Novel latex compositions for deposition on various substrates | |
BR0009490A (pt) | Micropartìculas acrìlicas com ligações cruzadas, processo para preparação e uso destes em revestimentos e produtos moldados | |
MX9700165A (es) | Composiciones de revestimiento con polimero ramificado. | |
GB9828446D0 (en) | Coating composition | |
MX9502266A (es) | Latex autoestables y metodo para controlar el peso molecular de los mismos. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |