DE69817351D1 - Einstufiges verfahren zur entfernung von einem photoresistmuster und einer seitenwand - Google Patents
Einstufiges verfahren zur entfernung von einem photoresistmuster und einer seitenwandInfo
- Publication number
- DE69817351D1 DE69817351D1 DE69817351T DE69817351T DE69817351D1 DE 69817351 D1 DE69817351 D1 DE 69817351D1 DE 69817351 T DE69817351 T DE 69817351T DE 69817351 T DE69817351 T DE 69817351T DE 69817351 D1 DE69817351 D1 DE 69817351D1
- Authority
- DE
- Germany
- Prior art keywords
- sidewall
- photoresist pattern
- step method
- photoresist
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02071—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Adhesive Tapes (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2739997 | 1997-02-12 | ||
JP9027399A JPH10223615A (ja) | 1997-02-12 | 1997-02-12 | レジスト材と側壁保護膜との一括除去方法 |
PCT/JP1998/000509 WO1998036445A1 (fr) | 1997-02-12 | 1998-02-06 | Procede pour retirer en une seule operation un element de resist et une couche de protection de paroi laterale |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69817351D1 true DE69817351D1 (de) | 2003-09-25 |
DE69817351T2 DE69817351T2 (de) | 2004-04-08 |
Family
ID=12219994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69817351T Expired - Fee Related DE69817351T2 (de) | 1997-02-12 | 1998-02-06 | Einstufiges verfahren zur entfernung von einem photoresistmuster und einer seitenwand |
Country Status (8)
Country | Link |
---|---|
US (1) | US6436220B1 (de) |
EP (1) | EP0989465B1 (de) |
JP (1) | JPH10223615A (de) |
KR (1) | KR100460166B1 (de) |
DE (1) | DE69817351T2 (de) |
ES (1) | ES2205440T3 (de) |
TW (1) | TW370679B (de) |
WO (1) | WO1998036445A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001076871A (ja) * | 1999-06-29 | 2001-03-23 | Nitto Denko Corp | 有機エレクトロルミネセンス素子およびその製造方法 |
TWI457238B (zh) * | 2011-11-15 | 2014-10-21 | Himax Tech Ltd | 晶圓級光學透鏡模組之保護膜除去方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5474650A (en) * | 1991-04-04 | 1995-12-12 | Hitachi, Ltd. | Method and apparatus for dry etching |
US5466325A (en) * | 1993-06-02 | 1995-11-14 | Nitto Denko Corporation | Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method |
JP3074634B2 (ja) * | 1994-03-28 | 2000-08-07 | 三菱瓦斯化学株式会社 | フォトレジスト用剥離液及び配線パターンの形成方法 |
JPH088153A (ja) * | 1994-06-22 | 1996-01-12 | Nitto Denko Corp | レジスト除去方法およびその装置 |
JP3590672B2 (ja) * | 1994-12-29 | 2004-11-17 | 日東電工株式会社 | レジスト膜画像の除去方法 |
JP3581190B2 (ja) * | 1995-04-27 | 2004-10-27 | 日東電工株式会社 | レジスト剥離用接着シ―ト類と剥離方法 |
JPH0916082A (ja) | 1995-04-27 | 1997-01-17 | Nitto Denko Corp | パターン形成用シート及びそのラベル |
JPH08305042A (ja) * | 1995-04-27 | 1996-11-22 | Nitto Denko Corp | レジストの除去方法 |
WO1997000534A1 (fr) * | 1995-06-15 | 1997-01-03 | Nitto Denko Corporation | Procede d'elimination d'un agent photoresistant, et adhesif ou feuille adhesive utilises a cet effet |
JP3590673B2 (ja) * | 1995-06-15 | 2004-11-17 | 日東電工株式会社 | レジスト膜画像の除去方法 |
JP3396357B2 (ja) * | 1995-11-16 | 2003-04-14 | 日東電工株式会社 | レジスト除去装置 |
JP3028927B2 (ja) * | 1996-02-16 | 2000-04-04 | 日本電気株式会社 | 高融点金属膜のドライエッチング方法 |
US5895740A (en) * | 1996-11-13 | 1999-04-20 | Vanguard International Semiconductor Corp. | Method of forming contact holes of reduced dimensions by using in-situ formed polymeric sidewall spacers |
JPH10247321A (ja) * | 1997-03-06 | 1998-09-14 | Nitto Denko Corp | スタンパ―の製造方法 |
JPH11162805A (ja) * | 1997-12-02 | 1999-06-18 | Nitto Denko Corp | レジスト除去方法 |
-
1997
- 1997-02-12 JP JP9027399A patent/JPH10223615A/ja active Pending
-
1998
- 1998-02-06 ES ES98901544T patent/ES2205440T3/es not_active Expired - Lifetime
- 1998-02-06 KR KR10-1999-7007305A patent/KR100460166B1/ko not_active IP Right Cessation
- 1998-02-06 DE DE69817351T patent/DE69817351T2/de not_active Expired - Fee Related
- 1998-02-06 US US09/367,099 patent/US6436220B1/en not_active Expired - Fee Related
- 1998-02-06 WO PCT/JP1998/000509 patent/WO1998036445A1/ja active IP Right Grant
- 1998-02-06 EP EP98901544A patent/EP0989465B1/de not_active Expired - Lifetime
- 1998-02-12 TW TW087101910A patent/TW370679B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP0989465A1 (de) | 2000-03-29 |
EP0989465A4 (de) | 2000-03-29 |
EP0989465B1 (de) | 2003-08-20 |
TW370679B (en) | 1999-09-21 |
US6436220B1 (en) | 2002-08-20 |
DE69817351T2 (de) | 2004-04-08 |
WO1998036445A1 (fr) | 1998-08-20 |
KR100460166B1 (ko) | 2004-12-08 |
JPH10223615A (ja) | 1998-08-21 |
ES2205440T3 (es) | 2004-05-01 |
KR20000071038A (ko) | 2000-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |