DE69803028D1 - Verfahren zur Herstellen einer dünner homoepitaktischen Diamant-Schicht - Google Patents

Verfahren zur Herstellen einer dünner homoepitaktischen Diamant-Schicht

Info

Publication number
DE69803028D1
DE69803028D1 DE69803028T DE69803028T DE69803028D1 DE 69803028 D1 DE69803028 D1 DE 69803028D1 DE 69803028 T DE69803028 T DE 69803028T DE 69803028 T DE69803028 T DE 69803028T DE 69803028 D1 DE69803028 D1 DE 69803028D1
Authority
DE
Germany
Prior art keywords
thin
producing
diamond layer
homoepitaxial diamond
homoepitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69803028T
Other languages
English (en)
Other versions
DE69803028T2 (de
Inventor
Daisuke Takeuchi
Hideyo Okushi
Koji Kajimura
Hideyuki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Publication of DE69803028D1 publication Critical patent/DE69803028D1/de
Application granted granted Critical
Publication of DE69803028T2 publication Critical patent/DE69803028T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/279—Diamond only control of diamond crystallography
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE69803028T 1997-11-21 1998-10-22 Verfahren zur Herstellen einer dünner homoepitaktischen Diamant-Schicht Expired - Lifetime DE69803028T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09337740A JP3125046B2 (ja) 1997-11-21 1997-11-21 ダイヤモンド単結晶薄膜製造方法

Publications (2)

Publication Number Publication Date
DE69803028D1 true DE69803028D1 (de) 2002-01-31
DE69803028T2 DE69803028T2 (de) 2002-09-05

Family

ID=18311522

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69803028T Expired - Lifetime DE69803028T2 (de) 1997-11-21 1998-10-22 Verfahren zur Herstellen einer dünner homoepitaktischen Diamant-Schicht

Country Status (5)

Country Link
US (1) US6132816A (de)
EP (1) EP0918100B1 (de)
JP (1) JP3125046B2 (de)
DE (1) DE69803028T2 (de)
RU (1) RU2176683C2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6858080B2 (en) 1998-05-15 2005-02-22 Apollo Diamond, Inc. Tunable CVD diamond structures
US6582513B1 (en) 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
US8591856B2 (en) 1998-05-15 2013-11-26 SCIO Diamond Technology Corporation Single crystal diamond electrochemical electrode
EP1220331A1 (de) 1999-07-07 2002-07-03 Tokyo Gas Co., Ltd. Ultraviolette leuchtdiode auf diamantbasis
US7009219B1 (en) 1999-07-09 2006-03-07 Tokyo Gas Co., Ltd. Diamond ultraviolet light-emitting device
JP2001035804A (ja) * 1999-07-21 2001-02-09 Agency Of Ind Science & Technol ダイヤモンド半導体およびその作製方法
AU2001274368B2 (en) * 2000-06-15 2004-10-28 Element Six (Pty) Ltd Single crystal diamond prepared by cvd
DE60115435T2 (de) * 2000-06-15 2006-08-31 Element Six (Pty) Ltd. Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht
WO2004075273A1 (ja) * 2003-02-24 2004-09-02 Tokyo Gas Company Limited ｎ型ダイヤモンド半導体及びその製造方法
US7157067B2 (en) * 2003-07-14 2007-01-02 Carnegie Institution Of Washington Tough diamonds and method of making thereof
JP2005054264A (ja) * 2003-08-07 2005-03-03 Ebara Corp ダイアモンド電極の成膜方法
US7586962B1 (en) * 2004-03-29 2009-09-08 The United States Of America As Represented By The Secretary Of The Air Force Integrated diamond carrier for laser bar arrays
US7399358B2 (en) 2005-09-05 2008-07-15 Rajneesh Bhandari Synthesis of large homoepitaxial monocrystalline diamond
JP2009010559A (ja) 2007-06-27 2009-01-15 Nippon Dempa Kogyo Co Ltd 圧電部品及びその製造方法
JP2009059798A (ja) * 2007-08-30 2009-03-19 Sumitomo Electric Ind Ltd ダイヤモンド電子素子の製造方法
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
GB0813490D0 (en) * 2008-07-23 2008-08-27 Element Six Ltd Solid state material
GB0813491D0 (en) 2008-07-23 2008-08-27 Element Six Ltd Diamond Material
JP6112485B2 (ja) * 2013-09-19 2017-04-12 国立研究開発法人産業技術総合研究所 単結晶ダイヤモンドの製造方法
RU2715472C1 (ru) 2019-06-11 2020-02-28 Общество с ограниченной ответственностью "Научно-технический центр "Новые технологии" Изделие, содержащее основу из кремния и покрывающий слой в виде нанопленки углерода с кристаллической решеткой алмазного типа, и способ изготовления этого изделия
WO2022059161A1 (ja) * 2020-09-18 2022-03-24 三菱電機株式会社 多結晶ダイヤモンド基板、半導体装置、多結晶ダイヤモンド基板の製造方法、および、半導体装置の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5271971A (en) * 1987-03-30 1993-12-21 Crystallume Microwave plasma CVD method for coating a substrate with high thermal-conductivity diamond material
JPH02199099A (ja) * 1988-10-21 1990-08-07 Crystallume 連続ダイヤモンド薄膜およびその製法
EP0449571B1 (de) * 1990-03-30 1995-08-30 Sumitomo Electric Industries, Ltd. Polykristallines Diamantwerkzeug und Verfahren für seine Herstellung
US5308661A (en) * 1993-03-03 1994-05-03 The Regents Of The University Of California Pretreatment process for forming a smooth surface diamond film on a carbon-coated substrate
JPH0769790A (ja) * 1993-08-30 1995-03-14 Ulvac Japan Ltd 薄膜作製装置
DE69503285T2 (de) * 1994-04-07 1998-11-05 Sumitomo Electric Industries Diamantwafer und Verfahren zur Herstellung eines Diamantwafers
EP0699776B1 (de) * 1994-06-09 1999-03-31 Sumitomo Electric Industries, Limited Wafer und Verfahren zur Herstellung eines Wafers
JP3728465B2 (ja) * 1994-11-25 2005-12-21 株式会社神戸製鋼所 単結晶ダイヤモンド膜の形成方法

Also Published As

Publication number Publication date
US6132816A (en) 2000-10-17
EP0918100A1 (de) 1999-05-26
JP3125046B2 (ja) 2001-01-15
DE69803028T2 (de) 2002-09-05
RU2176683C2 (ru) 2001-12-10
EP0918100B1 (de) 2001-12-19
JPH11157990A (ja) 1999-06-15

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