DE69506331T2 - Verfahren zur Herstellung einer synthetischen Diamantschicht mit reduzierter Beugung - Google Patents

Verfahren zur Herstellung einer synthetischen Diamantschicht mit reduzierter Beugung

Info

Publication number
DE69506331T2
DE69506331T2 DE69506331T DE69506331T DE69506331T2 DE 69506331 T2 DE69506331 T2 DE 69506331T2 DE 69506331 T DE69506331 T DE 69506331T DE 69506331 T DE69506331 T DE 69506331T DE 69506331 T2 DE69506331 T2 DE 69506331T2
Authority
DE
Germany
Prior art keywords
production
diamond layer
synthetic diamond
reduced diffraction
diffraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69506331T
Other languages
English (en)
Other versions
DE69506331D1 (de
Inventor
John Meroth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Ceramics and Plastics Inc
Original Assignee
Saint Gobain Norton Industrial Ceramics Corp
Saint Gobain Industrial Ceramics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Norton Industrial Ceramics Corp, Saint Gobain Industrial Ceramics Inc filed Critical Saint Gobain Norton Industrial Ceramics Corp
Publication of DE69506331D1 publication Critical patent/DE69506331D1/de
Application granted granted Critical
Publication of DE69506331T2 publication Critical patent/DE69506331T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/276—Diamond only using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
DE69506331T 1994-07-05 1995-07-01 Verfahren zur Herstellung einer synthetischen Diamantschicht mit reduzierter Beugung Expired - Fee Related DE69506331T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/270,656 US5587124A (en) 1994-07-05 1994-07-05 Method of making synthetic diamond film with reduced bowing

Publications (2)

Publication Number Publication Date
DE69506331D1 DE69506331D1 (de) 1999-01-14
DE69506331T2 true DE69506331T2 (de) 1999-08-12

Family

ID=23032240

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69506331T Expired - Fee Related DE69506331T2 (de) 1994-07-05 1995-07-01 Verfahren zur Herstellung einer synthetischen Diamantschicht mit reduzierter Beugung

Country Status (5)

Country Link
US (1) US5587124A (de)
EP (1) EP0695816B1 (de)
JP (1) JPH08188497A (de)
CA (1) CA2153184A1 (de)
DE (1) DE69506331T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022205081A1 (de) 2022-05-20 2023-11-23 Universität Augsburg, Körperschaft des öffentlichen Rechts Verfahren, Substrat, Vorrichtung und deren Verwendung zur Synthese von ebenen einkristallinen Diamanten

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5762715A (en) * 1995-06-07 1998-06-09 Saint-Gobain/Norton Industrial Ceramics Corporation Segmented substrate for improved ARC-JET diamond deposition
KR100352985B1 (ko) 1999-04-30 2002-09-18 한국과학기술연구원 균열이 없고 평탄한 다이아몬드막 합성 방법
GB201021853D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
GB201021865D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB2510269B (en) * 2010-12-23 2014-11-19 Element Six Ltd Substrates for synthetic diamond manufacture and methods of manufacturing synthetic diamond material using such substrates
GB201021855D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave power delivery system for plasma reactors
GB201021870D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
RU2555018C2 (ru) 2010-12-23 2015-07-10 Элемент Сикс Лимитед Контролируемое легирование синтетического алмазного материала
GB201021913D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave plasma reactors and substrates for synthetic diamond manufacture
CN103553036A (zh) * 2013-09-29 2014-02-05 陈晖� 一种合成金刚石的电路
CN113151801B (zh) * 2021-03-03 2022-12-27 电子科技大学 一种自支撑悬浮碳膜制备方法
CN112996209B (zh) * 2021-05-07 2021-08-10 四川大学 一种微波激发常压等离子体射流的结构和阵列结构

Family Cites Families (21)

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US4471003A (en) * 1980-11-25 1984-09-11 Cann Gordon L Magnetoplasmadynamic apparatus and process for the separation and deposition of materials
US4487162A (en) * 1980-11-25 1984-12-11 Cann Gordon L Magnetoplasmadynamic apparatus for the separation and deposition of materials
SE442305B (sv) * 1984-06-27 1985-12-16 Santrade Ltd Forfarande for kemisk gasutfellning (cvd) for framstellning av en diamantbelagd sammansatt kropp samt anvendning av kroppen
US4900628A (en) * 1986-07-23 1990-02-13 Sumitomo Electric Industries, Ltd. Gaseous phase synthesized diamond and method for synthesizing same
JP2603257B2 (ja) * 1987-06-05 1997-04-23 株式会社神戸製鋼所 ダイヤモンド多層薄膜
JPH0757039B2 (ja) * 1988-05-09 1995-06-14 株式会社ケンウッド 音響用振動板及びその製造法
US5006203A (en) * 1988-08-12 1991-04-09 Texas Instruments Incorporated Diamond growth method
US4988421A (en) * 1989-01-12 1991-01-29 Ford Motor Company Method of toughening diamond coated tools
GB8912498D0 (en) * 1989-05-31 1989-07-19 De Beers Ind Diamond Diamond growth
CA2034440A1 (en) * 1990-02-13 1991-08-14 Thomas R. Anthony Cvd diamond workpieces and their fabrication
DE69112465T2 (de) * 1990-03-30 1996-03-28 Sumitomo Electric Industries Polykristallines Diamantwerkzeug und Verfahren für seine Herstellung.
US5260106A (en) * 1990-08-03 1993-11-09 Fujitsu Limited Method for forming diamond films by plasma jet CVD
US5124179A (en) * 1990-09-13 1992-06-23 Diamonex, Incorporated Interrupted method for producing multilayered polycrystalline diamond films
US5310512A (en) * 1990-11-15 1994-05-10 Norton Company Method for producing synthetic diamond structures
JP3028660B2 (ja) * 1991-10-21 2000-04-04 住友電気工業株式会社 ダイヤモンドヒートシンクの製造方法
US5314540A (en) * 1991-03-22 1994-05-24 Nippondenso Co., Ltd. Apparatus for forming diamond film
US5365345A (en) * 1991-04-10 1994-11-15 Santa Barbara Research Center Infrared transmitting window and method of making same
US5204144A (en) * 1991-05-10 1993-04-20 Celestech, Inc. Method for plasma deposition on apertured substrates
US5183689A (en) * 1991-07-15 1993-02-02 Cvd, Inc. Process for an improved laminated of znse and zns
US5270077A (en) * 1991-12-13 1993-12-14 General Electric Company Method for producing flat CVD diamond film
US5314652A (en) * 1992-11-10 1994-05-24 Norton Company Method for making free-standing diamond film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022205081A1 (de) 2022-05-20 2023-11-23 Universität Augsburg, Körperschaft des öffentlichen Rechts Verfahren, Substrat, Vorrichtung und deren Verwendung zur Synthese von ebenen einkristallinen Diamanten

Also Published As

Publication number Publication date
DE69506331D1 (de) 1999-01-14
US5587124A (en) 1996-12-24
EP0695816B1 (de) 1998-12-02
EP0695816A1 (de) 1996-02-07
CA2153184A1 (en) 1996-01-06
JPH08188497A (ja) 1996-07-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee