DE69703130D1 - Verfahren zur Herstellung einer Gradientenschicht mit einer keramischen Deckschicht - Google Patents

Verfahren zur Herstellung einer Gradientenschicht mit einer keramischen Deckschicht

Info

Publication number
DE69703130D1
DE69703130D1 DE69703130T DE69703130T DE69703130D1 DE 69703130 D1 DE69703130 D1 DE 69703130D1 DE 69703130 T DE69703130 T DE 69703130T DE 69703130 T DE69703130 T DE 69703130T DE 69703130 D1 DE69703130 D1 DE 69703130D1
Authority
DE
Germany
Prior art keywords
layer
producing
ceramic cover
gradient
cover layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69703130T
Other languages
English (en)
Other versions
DE69703130T2 (de
Inventor
Boris A Movchan
Jury E Rudoy
Igor S Kiev Malashenko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INT CENTER FOR ELECTRON BEAM T
Original Assignee
INT CENTER FOR ELECTRON BEAM T
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INT CENTER FOR ELECTRON BEAM T filed Critical INT CENTER FOR ELECTRON BEAM T
Publication of DE69703130D1 publication Critical patent/DE69703130D1/de
Application granted granted Critical
Publication of DE69703130T2 publication Critical patent/DE69703130T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Turbine Rotor Nozzle Sealing (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
DE69703130T 1996-04-04 1997-04-03 Verfahren zur Erzeugung einer Gradientenschicht mit einer keramischen Deckschicht Expired - Fee Related DE69703130T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
UA96041326 1996-04-04

Publications (2)

Publication Number Publication Date
DE69703130D1 true DE69703130D1 (de) 2000-10-26
DE69703130T2 DE69703130T2 (de) 2001-05-17

Family

ID=21689114

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69703130T Expired - Fee Related DE69703130T2 (de) 1996-04-04 1997-04-03 Verfahren zur Erzeugung einer Gradientenschicht mit einer keramischen Deckschicht

Country Status (4)

Country Link
US (1) US5834070A (de)
EP (1) EP0799904B1 (de)
CN (1) CN1074689C (de)
DE (1) DE69703130T2 (de)

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US6391172B2 (en) 1997-08-26 2002-05-21 The Alta Group, Inc. High purity cobalt sputter target and process of manufacturing the same
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US6007880A (en) * 1998-07-17 1999-12-28 United Technologies Corporation Method for generating a ceramic coating
EP0987345B1 (de) * 1998-09-18 2004-02-04 General Electric Company Wärmedämmendes Beschichtungssystem
FR2784120B1 (fr) * 1998-10-02 2000-11-03 Snecma Revetement de barriere thermique a faible conductivite thermique, piece metallique protegee par ce revetement, procede de depot de ce revetement
US6358567B2 (en) * 1998-12-23 2002-03-19 The Regents Of The University Of California Colloidal spray method for low cost thin coating deposition
EP1048746B1 (de) * 1999-04-28 2005-09-21 Alcan Technology & Management AG Verfahren und Vorrichtung zur Herstellung von Packungen
US6287644B1 (en) 1999-07-02 2001-09-11 General Electric Company Continuously-graded bond coat and method of manufacture
US6983718B1 (en) * 1999-08-04 2006-01-10 General Electric Company Electron beam physical vapor deposition apparatus
US6342278B1 (en) * 1999-08-04 2002-01-29 General Electric Company Method for forming a thermal barrier coating by electron beam physical vapor deposition
US6294261B1 (en) * 1999-10-01 2001-09-25 General Electric Company Method for smoothing the surface of a protective coating
UA56228C2 (uk) 1999-11-01 2003-05-15 Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Е.О.Патона Нану Композиційний зливок для одержання шляхом випаровування функціонально градієнтного покриття із зовнішнім керамічним шаром на металевій підкладці (варіанти)
US6383658B1 (en) * 1999-11-18 2002-05-07 General Electric Company Thermally sprayed coatings having an interface with controlled cleanliness
JP3510993B2 (ja) * 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
KR20010062209A (ko) 1999-12-10 2001-07-07 히가시 데쓰로 고내식성 막이 내부에 형성된 챔버를 구비하는 처리 장치
WO2001049892A1 (en) * 1999-12-29 2001-07-12 United Technology Corporation Pratt & Whitney A method of forming on a substrate a coating of complex alloy containing elements whose evaporation temperatures differ by more than 350 °c
US6537613B1 (en) * 2000-04-10 2003-03-25 Air Products And Chemicals, Inc. Process for metal metalloid oxides and nitrides with compositional gradients
SG106639A1 (en) * 2000-10-10 2004-10-29 Gen Electric Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating
US6620525B1 (en) 2000-11-09 2003-09-16 General Electric Company Thermal barrier coating with improved erosion and impact resistance and process therefor
US6492038B1 (en) 2000-11-27 2002-12-10 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US6544665B2 (en) 2001-01-18 2003-04-08 General Electric Company Thermally-stabilized thermal barrier coating
US6617049B2 (en) 2001-01-18 2003-09-09 General Electric Company Thermal barrier coating with improved erosion and impact resistance
JP2002356387A (ja) * 2001-03-30 2002-12-13 Toshiba Ceramics Co Ltd 耐プラズマ性部材
US6830622B2 (en) * 2001-03-30 2004-12-14 Lam Research Corporation Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
US6586115B2 (en) 2001-04-12 2003-07-01 General Electric Company Yttria-stabilized zirconia with reduced thermal conductivity
FR2838752B1 (fr) 2002-04-22 2005-02-25 Snecma Moteurs Procede de formation d'un revetement ceramique sur un substrat par depot physique en phase vapeur sous faisceau d'electrons
US7556695B2 (en) * 2002-05-06 2009-07-07 Honeywell International, Inc. Apparatus to make nanolaminate thermal barrier coatings
EP1400339A1 (de) 2002-09-17 2004-03-24 Siemens Aktiengesellschaft Verfahren zum Herstellen eines dreidimensionalen Formkörpers
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166166B2 (en) * 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
KR100772740B1 (ko) 2002-11-28 2007-11-01 동경 엘렉트론 주식회사 플라즈마 처리 용기 내부재
US7560376B2 (en) 2003-03-31 2009-07-14 Tokyo Electron Limited Method for adjoining adjacent coatings on a processing element
WO2004095532A2 (en) 2003-03-31 2004-11-04 Tokyo Electron Limited A barrier layer for a processing element and a method of forming the same
US6946417B2 (en) * 2003-05-21 2005-09-20 Saint-Gobain Ceramics & Plastics, Inc. Light-colored ESD safe ceramics
US20050036892A1 (en) * 2003-08-15 2005-02-17 Richard Bajan Method for applying metallurgical coatings to gas turbine components
US6979498B2 (en) 2003-11-25 2005-12-27 General Electric Company Strengthened bond coats for thermal barrier coatings
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
ATE426052T1 (de) 2005-07-12 2009-04-15 Alstom Technology Ltd Keramische warmedammschicht
US20070141233A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation EB-PVD system with automatic melt pool height control
EP1947210A1 (de) * 2007-01-16 2008-07-23 ARCELOR France Verfahren zur Beschichtung eines Substrats, Anlage zur Umsetzung des Verfahrens und Vorrichtung zur Metallzuführung zu einer solchen Anlage
EP2371344A1 (de) * 2010-03-31 2011-10-05 Straumann Holding AG Körper aus Keramikmaterial
FR2960242B1 (fr) 2010-05-18 2015-05-01 C R M A Procede de fabrication de pieces multicouches comportant des trous inclines et devant resister a des contraintes thermiques elevees et utilisation du procede pour la reparation de pieces
US9388086B2 (en) 2011-03-04 2016-07-12 Raytheon Company Method of fabricating optical ceramics containing compositionally tailored regions in three dimension
DE102011005246A1 (de) * 2011-03-08 2012-09-13 Behr Gmbh & Co. Kg Verfahren zur Herstellung eines thermoelektrischen Moduls
CN102409310A (zh) * 2011-11-10 2012-04-11 中国航天科技集团公司第五研究院第五一○研究所 柔性金属基底双靶共溅射连续镀制梯度金属陶瓷膜层方法
US8821988B2 (en) 2012-10-01 2014-09-02 Dayton T. Brown, Inc. Method for modification of the surface and subsurface regions of metallic substrates
US9869013B2 (en) 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US9657387B1 (en) 2016-04-28 2017-05-23 General Electric Company Methods of forming a multilayer thermal barrier coating system
US11684703B2 (en) * 2018-02-20 2023-06-27 Qura, Inc. Coatings for implantable devices
RU2705817C1 (ru) * 2018-07-30 2019-11-12 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") Способ формирования на титановых сплавах приповерхностного упрочненного слоя
RU2688417C1 (ru) * 2018-08-08 2019-05-22 Публичное акционерное общество "ОДК-Уфимское моторостроительное производственное объединение" (ПАО "ОДК-УМПО") Способ нанесения теплозащитного покрытия на лопатки турбин высоконагруженного двигателя
US11426818B2 (en) 2018-08-10 2022-08-30 The Research Foundation for the State University Additive manufacturing processes and additively manufactured products
CN109467457B (zh) * 2018-12-25 2020-05-29 北京交通大学 组合物、利用该组合物制得的多孔碳纤维隔热材料表面高发射率抗氧化涂层及其制备方法
DE102019217445A1 (de) * 2019-11-12 2021-05-12 Siemens Aktiengesellschaft Keramisches Material, Pulver sowie Schichtsystem
CN114807855A (zh) * 2022-04-19 2022-07-29 中国航发动力股份有限公司 Eb～pvd一步法制备含阻扩散层的热障涂层工艺方法

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Also Published As

Publication number Publication date
US5834070A (en) 1998-11-10
CN1074689C (zh) 2001-11-14
CN1167657A (zh) 1997-12-17
DE69703130T2 (de) 2001-05-17
EP0799904A1 (de) 1997-10-08
EP0799904B1 (de) 2000-09-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee