DE69801974D1 - Halbleiterlaser - Google Patents

Halbleiterlaser

Info

Publication number
DE69801974D1
DE69801974D1 DE69801974T DE69801974T DE69801974D1 DE 69801974 D1 DE69801974 D1 DE 69801974D1 DE 69801974 T DE69801974 T DE 69801974T DE 69801974 T DE69801974 T DE 69801974T DE 69801974 D1 DE69801974 D1 DE 69801974D1
Authority
DE
Germany
Prior art keywords
semiconductor laser
laser
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69801974T
Other languages
English (en)
Other versions
DE69801974T2 (de
Inventor
Toshiaki Fukunaga
Mitsugu Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69801974D1 publication Critical patent/DE69801974D1/de
Application granted granted Critical
Publication of DE69801974T2 publication Critical patent/DE69801974T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32333—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm based on InGaAsP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Lasers (AREA)
DE69801974T 1997-11-25 1998-11-24 Halbleiterlaser Expired - Lifetime DE69801974T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32317697 1997-11-25
JP31764498A JP3753216B2 (ja) 1997-11-25 1998-11-09 半導体レーザ装置

Publications (2)

Publication Number Publication Date
DE69801974D1 true DE69801974D1 (de) 2001-11-15
DE69801974T2 DE69801974T2 (de) 2002-04-04

Family

ID=26569090

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69801974T Expired - Lifetime DE69801974T2 (de) 1997-11-25 1998-11-24 Halbleiterlaser

Country Status (4)

Country Link
US (1) US6127691A (de)
EP (1) EP0920096B1 (de)
JP (1) JP3753216B2 (de)
DE (1) DE69801974T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11233815A (ja) * 1998-02-13 1999-08-27 Furukawa Electric Co Ltd:The 半導体発光ダイオード
JP3434706B2 (ja) * 1998-05-21 2003-08-11 富士写真フイルム株式会社 半導体レーザおよびその製造方法
US6219365B1 (en) * 1998-11-03 2001-04-17 Wisconsin Alumni Research Foundation High performance aluminum free active region semiconductor lasers
US6542528B1 (en) 1999-02-15 2003-04-01 Ricoh Company, Ltd. Light-emitting semiconductor device producing red wavelength optical radiation
JP2001308466A (ja) * 2000-04-24 2001-11-02 Fuji Photo Film Co Ltd 半導体レーザ装置
JP2002026453A (ja) * 2000-07-03 2002-01-25 Mitsubishi Electric Corp リッジ導波路型半導体レーザ及びその製造方法
EP1198042B1 (de) * 2000-10-12 2006-05-10 Fuji Photo Film Co., Ltd. Halbleiterlaser mit Gebiet ohne Stromzuführung in der Nähe einer Resonatorendfläche und zugehöriges Herstellungsverfahren
JP2002204032A (ja) * 2000-10-31 2002-07-19 Fuji Photo Film Co Ltd 半導体レーザ素子
JP2002305352A (ja) * 2001-04-05 2002-10-18 Fuji Photo Film Co Ltd 半導体レーザ素子
JP2003152281A (ja) 2001-11-15 2003-05-23 Sharp Corp 半導体レーザ素子およびそれを用いた光ディスク装置
JP2003283056A (ja) 2002-01-15 2003-10-03 Sharp Corp 半導体レーザ装置および光ディスク再生記録装置
JP2003289175A (ja) 2002-01-28 2003-10-10 Sharp Corp 半導体レーザ素子
JP4927807B2 (ja) * 2002-01-28 2012-05-09 シャープ株式会社 半導体レーザ素子
US7801194B2 (en) 2002-07-01 2010-09-21 Sharp Kabushiki Kaisha Semiconductor laser device and optical disk unit using the same
US7378681B2 (en) * 2002-08-12 2008-05-27 Agility Communications, Inc. Ridge waveguide device surface passivation by epitaxial regrowth
JP2004158615A (ja) * 2002-11-06 2004-06-03 Mitsubishi Electric Corp 半導体レーザ装置
JP2004296637A (ja) 2003-03-26 2004-10-21 Sharp Corp 半導体レーザ装置および光ディスク装置
JP2004296634A (ja) * 2003-03-26 2004-10-21 Sharp Corp 半導体レーザ装置および光ディスク装置
JP4262549B2 (ja) * 2003-07-22 2009-05-13 シャープ株式会社 半導体レーザ素子およびその製造方法
US7687291B2 (en) 2005-03-25 2010-03-30 Trumpf Photonics Inc. Laser facet passivation
US7403552B2 (en) * 2006-03-10 2008-07-22 Wisconsin Alumni Research Foundation High efficiency intersubband semiconductor lasers
US7457338B2 (en) * 2006-04-19 2008-11-25 Wisconsin Alumni Research Foundation Quantum well lasers with strained quantum wells and dilute nitride barriers
TWI341600B (en) * 2007-08-31 2011-05-01 Huga Optotech Inc Light optoelectronic device and forming method thereof
DE102007057708A1 (de) * 2007-09-26 2009-04-09 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
US9716368B2 (en) * 2015-07-02 2017-07-25 Sae Magnetics (H.K.) Ltd. Tunable optical phase filter
US10043941B1 (en) 2017-01-31 2018-08-07 International Business Machines Corporation Light emitting diode having improved quantum efficiency at low injection current
CN110854678B (zh) * 2018-08-20 2021-02-05 山东华光光电子股份有限公司 一种GaAs基大功率激光器制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5488233A (en) * 1993-03-11 1996-01-30 Kabushiki Kaisha Toshiba Semiconductor light-emitting device with compound semiconductor layer
US5389396A (en) * 1993-08-11 1995-02-14 Northwestern University InGaAsP/GaAs diode laser
US5617437A (en) * 1994-11-24 1997-04-01 Fuji Photo Film Co., Ltd. Semiconductor laser
US5663976A (en) * 1995-10-16 1997-09-02 Northwestern University Buried-ridge laser device
JPH09270558A (ja) * 1996-03-29 1997-10-14 Fuji Photo Film Co Ltd 半導体レーザ

Also Published As

Publication number Publication date
EP0920096A2 (de) 1999-06-02
JPH11220224A (ja) 1999-08-10
EP0920096B1 (de) 2001-10-10
US6127691A (en) 2000-10-03
EP0920096A3 (de) 1999-07-14
JP3753216B2 (ja) 2006-03-08
DE69801974T2 (de) 2002-04-04

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Legal Events

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Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

R082 Change of representative

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Country of ref document: EP

Representative=s name: KLUNKER, SCHMITT-NILSON, HIRSCH, 80796 MUENCHEN, D