DE69800608D1 - Amorphe Kieselsaüreteilchen mit Doppel-Struktur und Verfahren zu deren Herstellung und Verwendung - Google Patents

Amorphe Kieselsaüreteilchen mit Doppel-Struktur und Verfahren zu deren Herstellung und Verwendung

Info

Publication number
DE69800608D1
DE69800608D1 DE69800608T DE69800608T DE69800608D1 DE 69800608 D1 DE69800608 D1 DE 69800608D1 DE 69800608 T DE69800608 T DE 69800608T DE 69800608 T DE69800608 T DE 69800608T DE 69800608 D1 DE69800608 D1 DE 69800608D1
Authority
DE
Germany
Prior art keywords
production
silica particles
amorphous silica
double structure
double
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69800608T
Other languages
English (en)
Other versions
DE69800608T2 (de
Inventor
Masanori Tanaka
Yuuji Washio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mizusawa Industrial Chemicals Ltd
Original Assignee
Mizusawa Industrial Chemicals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mizusawa Industrial Chemicals Ltd filed Critical Mizusawa Industrial Chemicals Ltd
Publication of DE69800608D1 publication Critical patent/DE69800608D1/de
Application granted granted Critical
Publication of DE69800608T2 publication Critical patent/DE69800608T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3045—Treatment with inorganic compounds
    • C09C1/3054—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3072—Treatment with macro-molecular organic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/42—Gloss-reducing agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Dispersion Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Composite Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Silicon Compounds (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Lubricants (AREA)
DE69800608T 1997-06-13 1998-06-15 Amorphe Kieselsaüreteilchen mit Doppel-Struktur und Verfahren zu deren Herstellung und Verwendung Expired - Lifetime DE69800608T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17125197 1997-06-13

Publications (2)

Publication Number Publication Date
DE69800608D1 true DE69800608D1 (de) 2001-04-26
DE69800608T2 DE69800608T2 (de) 2001-06-28

Family

ID=15919864

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69800608T Expired - Lifetime DE69800608T2 (de) 1997-06-13 1998-06-15 Amorphe Kieselsaüreteilchen mit Doppel-Struktur und Verfahren zu deren Herstellung und Verwendung

Country Status (8)

Country Link
US (2) US6159277A (de)
EP (1) EP0884277B1 (de)
KR (1) KR100495178B1 (de)
CN (1) CN1109652C (de)
DE (1) DE69800608T2 (de)
ES (1) ES2157112T3 (de)
ID (1) ID20440A (de)
MY (1) MY117802A (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1307743B1 (it) * 1999-02-03 2001-11-19 Italcementi Spa Procedimento per la preparazione di silice a partire da silicati dicalcio.
US7462654B2 (en) 2001-03-15 2008-12-09 Cabot Corporation Corrosion-resistant coating composition
WO2004006873A1 (ja) * 2002-07-11 2004-01-22 Catalysts & Chmicals Industries Co.,Ltd. 化粧料
US6946119B2 (en) * 2003-02-14 2005-09-20 J.M. Huber Corporation Precipitated silica product with low surface area, dentifrices containing same, and processes
EP1599180B1 (de) 2003-02-14 2012-07-11 J.M. Huber Corporation Fällungskieselsäureprodukt, zahnpasten damit und verfahren
US7306788B2 (en) * 2004-11-24 2007-12-11 J.M. Huber Corporation High-cleaning/moderate abrasive silica materials and dentifrice containing such materials
US7267814B2 (en) * 2004-11-24 2007-09-11 J.M. Huber Corporation High-cleaning/low abrasive silica and materials and dentifrice containing such materials
US7303742B2 (en) * 2004-11-24 2007-12-04 J.M. Huber Corporation Viscosity-modifying silica materials that exhibit low cleaning and abrasive levels and dentifrices thereof
US7670593B2 (en) * 2004-11-24 2010-03-02 J.M. Huber Corporation High-cleaning silica materials and dentifrice containing such
US20060110307A1 (en) * 2004-11-24 2006-05-25 Mcgill Patrick D High-cleaning silica materials made via product morphology control and dentifrice containing such
US20060144654A1 (en) * 2005-01-06 2006-07-06 Lin A P Bicycle brake shoe
US7270803B1 (en) * 2006-03-23 2007-09-18 J.M. Huber Corporation High-cleaning, low abrasion, high brightness silica materials for dentrifices
US20070224133A1 (en) * 2006-03-23 2007-09-27 Mcgill Patrick D High-cleaning silica materials made via product morphology control under high shear conditions
CN101426725B (zh) * 2006-04-20 2011-04-13 旭硝子株式会社 核壳型二氧化硅及其制造方法
CN100572456C (zh) * 2006-04-24 2009-12-23 广州慧谷化学有限公司 纳米内核夹心式结构二氧化硅消光剂及其制备方法
CN101591510A (zh) * 2008-05-26 2009-12-02 3M创新有限公司 漆面处理组合物、漆面处理方法及漆面修补方法
US20090297459A1 (en) * 2008-06-03 2009-12-03 Duen-Wu Hua Transparent silica gel/precipitated silica composite materials for dentifrices
CN101397139B (zh) * 2008-09-09 2012-01-04 苏州纳迪微电子有限公司 高纯度硅溶胶及其制备方法
DE102009045116A1 (de) * 2009-09-29 2011-03-31 Evonik Degussa Gmbh Niederdruckvermahlungsverfahren
CN102011477A (zh) * 2010-12-03 2011-04-13 广东盈然木业有限公司 一种具有自洁功能的地板
WO2014152726A1 (en) 2013-03-15 2014-09-25 Dow Global Technologies Llc Epdm packaging system and process
CN103274422B (zh) * 2013-05-31 2016-03-30 肇庆金三江硅材料有限公司 核壳型沉淀二氧化硅、制备方法及含有该二氧化硅的牙膏
CN103289453B (zh) * 2013-07-08 2015-03-18 华夏贝能（北京）生态科技有限公司 一种抑菌除味无机功能涂料及其制备方法
CN103289455B (zh) * 2013-07-08 2015-04-01 华夏贝能（北京）生态科技有限公司 一种无甲醛无voc无机功能涂料及其制备方法
CN104556065B (zh) * 2013-10-24 2016-08-17 中国石油化工股份有限公司 一种多孔氧化硅及其制备工艺方法
JP6330145B2 (ja) * 2014-06-17 2018-05-30 パナソニックＩｐマネジメント株式会社 キセロゲルの製造方法
CN105236415B (zh) * 2015-09-02 2016-05-25 广州市飞雪材料科技有限公司 一种核壳型沉淀二氧化硅及其制备方法
CN111100489B (zh) * 2018-10-26 2022-03-15 3M创新有限公司 一种离型硬涂料、一种离型膜和一种光伏组件
EP3843625B1 (de) 2018-11-18 2022-07-13 Asociatia Transylvanian Institute of Neuroscience Verfahren, mensch-maschine-schnittstelle, maschinenrecheneinheit und computerprogramme zur steuerung von mindestens einem aktuator zur durchführung von mindestens einer aufgabe
CN110256915A (zh) * 2019-07-22 2019-09-20 刘忠 一种纳米水性防水耐腐蚀涂料
CN116323822A (zh) * 2020-10-02 2023-06-23 赢创运营有限公司 在粉末涂料中作为消光剂的低表面积球形沉淀二氧化硅
CN112897537B (zh) * 2021-03-08 2022-04-01 武汉理工大学 一种利用焙烧硅藻土制备非晶二氧化硅的方法
CN114656746A (zh) * 2022-03-02 2022-06-24 界首市锦丰塑业有限公司 一种消光塑料合金的制备方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2885366A (en) * 1956-06-28 1959-05-05 Du Pont Product comprising a skin of dense, hydrated amorphous silica bound upon a core of another solid material and process of making same
US3591518A (en) * 1968-12-31 1971-07-06 Du Pont Silica aquasols and powders
JPH0643515B2 (ja) * 1989-10-25 1994-06-08 水澤化学工業株式会社 新規充填剤及びその製法
DE69207640T2 (de) * 1991-03-15 1996-09-19 Mizusawa Industrial Chem Amorpher silicaartiger Füllstoff
GB9222434D0 (en) * 1992-10-24 1992-12-09 Tioxide Group Services Ltd Process for coating inorganic particles
JP3333907B2 (ja) * 1994-08-16 2002-10-15 富士電機株式会社 電圧形インバータの電流制限方法及び電流制限回路
FR2747668B1 (fr) * 1996-04-22 1998-05-22 Rhone Poulenc Chimie Procede de preparation de silice comprenant une ecorce de silice et un coeur en un materiau autre

Also Published As

Publication number Publication date
CN1203191A (zh) 1998-12-30
MY117802A (en) 2004-08-30
CN1109652C (zh) 2003-05-28
US6159277A (en) 2000-12-12
KR100495178B1 (ko) 2005-09-15
US6342193B1 (en) 2002-01-29
ES2157112T3 (es) 2001-08-01
EP0884277B1 (de) 2001-03-21
ID20440A (id) 1998-12-17
KR19990006919A (ko) 1999-01-25
DE69800608T2 (de) 2001-06-28
EP0884277A1 (de) 1998-12-16

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