DE69724741D1 - Herstellung von integrierten bipolaren/CMOS-Schaltkreisen - Google Patents

Herstellung von integrierten bipolaren/CMOS-Schaltkreisen

Info

Publication number
DE69724741D1
DE69724741D1 DE69724741T DE69724741T DE69724741D1 DE 69724741 D1 DE69724741 D1 DE 69724741D1 DE 69724741 T DE69724741 T DE 69724741T DE 69724741 T DE69724741 T DE 69724741T DE 69724741 D1 DE69724741 D1 DE 69724741D1
Authority
DE
Germany
Prior art keywords
manufacture
cmos circuits
integrated bipolar
bipolar
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69724741T
Other languages
English (en)
Inventor
Yvon Gris
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Application granted granted Critical
Publication of DE69724741D1 publication Critical patent/DE69724741D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8248—Combination of bipolar and field-effect technology
    • H01L21/8249—Bipolar and MOS technology

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
DE69724741T 1996-11-19 1997-11-18 Herstellung von integrierten bipolaren/CMOS-Schaltkreisen Expired - Lifetime DE69724741D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9614412A FR2756104B1 (fr) 1996-11-19 1996-11-19 Fabrication de circuits integres bipolaires/cmos

Publications (1)

Publication Number Publication Date
DE69724741D1 true DE69724741D1 (de) 2003-10-16

Family

ID=9497996

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69724741T Expired - Lifetime DE69724741D1 (de) 1996-11-19 1997-11-18 Herstellung von integrierten bipolaren/CMOS-Schaltkreisen

Country Status (7)

Country Link
US (1) US5953600A (de)
EP (1) EP0843354B1 (de)
JP (1) JP3003654B2 (de)
KR (1) KR100564890B1 (de)
DE (1) DE69724741D1 (de)
FR (1) FR2756104B1 (de)
TW (1) TW359882B (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2756100B1 (fr) 1996-11-19 1999-02-12 Sgs Thomson Microelectronics Transistor bipolaire a emetteur inhomogene dans un circuit integre bicmos
FR2756101B1 (fr) * 1996-11-19 1999-02-12 Sgs Thomson Microelectronics Procede de fabrication d'un transistor npn dans une technologie bicmos
FR2756104B1 (fr) * 1996-11-19 1999-01-29 Sgs Thomson Microelectronics Fabrication de circuits integres bipolaires/cmos
FR2756103B1 (fr) * 1996-11-19 1999-05-14 Sgs Thomson Microelectronics Fabrication de circuits integres bipolaires/cmos et d'un condensateur
US6352887B1 (en) * 1998-03-26 2002-03-05 Texas Instruments Incorporated Merged bipolar and CMOS circuit and method
US6184110B1 (en) * 1998-04-30 2001-02-06 Sharp Laboratories Of America, Inc. Method of forming nitrogen implanted ultrathin gate oxide for dual gate CMOS devices
US6080612A (en) * 1998-05-20 2000-06-27 Sharp Laboratories Of America, Inc. Method of forming an ultra-thin SOI electrostatic discharge protection device
FR2779573B1 (fr) * 1998-06-05 2001-10-26 St Microelectronics Sa Transistor bipolaire vertical comportant une base extrinseque de rugosite reduite, et procede de fabrication
FR2790867B1 (fr) * 1999-03-12 2001-11-16 St Microelectronics Sa Procede de fabrication de transistor bipolaire
US6261932B1 (en) * 1999-07-29 2001-07-17 Fairchild Semiconductor Corp. Method of fabricating Schottky diode and related structure
JP2001217317A (ja) 2000-02-07 2001-08-10 Sony Corp 半導体装置およびその製造方法
US6410383B1 (en) 2000-03-16 2002-06-25 Sharp Laboratories Of America, Inc. Method of forming conducting diffusion barriers
US6303419B1 (en) * 2000-03-24 2001-10-16 Industrial Technology Research Institute Method for fabricating a BiCMOS device featuring twin wells and an N type epitaxial layer
US6348373B1 (en) 2000-03-29 2002-02-19 Sharp Laboratories Of America, Inc. Method for improving electrical properties of high dielectric constant films
DE10028008A1 (de) * 2000-06-06 2001-12-13 Bosch Gmbh Robert Schutzvorrichtung gegen elektrostatische Entladungen
US6271068B1 (en) 2001-01-08 2001-08-07 Taiwan Semiconductor Manufacturing Company Method for making improved polysilicon emitters for bipolar transistors on BiCMOS integrated circuits
FR2819631B1 (fr) 2001-01-12 2003-04-04 St Microelectronics Sa Procede de fabrication d'un substrat monocristallin, et circuit integre comportant un tel substrat
US7214593B2 (en) 2001-02-01 2007-05-08 International Business Machines Corporation Passivation for improved bipolar yield
SE0103036D0 (sv) * 2001-05-04 2001-09-13 Ericsson Telefon Ab L M Semiconductor process and integrated circuit
JP2003197908A (ja) * 2001-09-12 2003-07-11 Seiko Instruments Inc 半導体素子及びその製造方法
US6759730B2 (en) * 2001-09-18 2004-07-06 Agere Systems Inc. Bipolar junction transistor compatible with vertical replacement gate transistor
SE522890C2 (sv) * 2001-11-15 2004-03-16 Ericsson Telefon Ab L M Lateral pnp-transistor, integrerad krets och tllverkningsprocess för dessa
JP2003234423A (ja) * 2002-02-07 2003-08-22 Sony Corp 半導体装置及びその製造方法
SE0200414D0 (sv) * 2002-02-13 2002-02-13 Ericsson Telefon Ab L M Semiconductor fabrication process lateral pnp transistor, and integrated circuit
DE10327709A1 (de) * 2003-06-21 2005-01-13 Infineon Technologies Ag Integrierte Schaltungsanordnung mit npn- und pnp-Bipolartransistoren sowie Herstellungsverfahren
US6965133B2 (en) * 2004-03-13 2005-11-15 International Business Machines Corporation Method of base formation in a BiCMOS process
US6911681B1 (en) * 2004-04-14 2005-06-28 International Business Machines Corporation Method of base formation in a BiCMOS process
US7632760B2 (en) * 2005-04-07 2009-12-15 Semiconductor Components Industries, Llc Semiconductor device having field stabilization film and method
US20070120173A1 (en) * 2005-11-28 2007-05-31 Bohumil Lojek Non-volatile memory cell with high current output line
US7989875B2 (en) * 2008-11-24 2011-08-02 Nxp B.V. BiCMOS integration of multiple-times-programmable non-volatile memories
US9184097B2 (en) * 2009-03-12 2015-11-10 System General Corporation Semiconductor devices and formation methods thereof
KR101153565B1 (ko) 2010-02-01 2012-06-12 한국과학기술원 Ｒｆ 스위치 회로
KR20230141883A (ko) 2010-02-05 2023-10-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 및 반도체 장치의 제조 방법
US8598008B2 (en) * 2010-10-20 2013-12-03 Texas Instruments Incorporated Stacked ESD clamp with reduced variation in clamp voltage
US10043903B2 (en) 2015-12-21 2018-08-07 Samsung Electronics Co., Ltd. Semiconductor devices with source/drain stress liner
GB2561390B (en) 2017-04-13 2020-03-11 Raytheon Systems Ltd Silicon carbide transistor
GB2561388B (en) 2017-04-13 2019-11-06 Raytheon Systems Ltd Silicon carbide integrated circuit

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752589A (en) * 1985-12-17 1988-06-21 Siemens Aktiengesellschaft Process for the production of bipolar transistors and complementary MOS transistors on a common silicon substrate
US5015594A (en) * 1988-10-24 1991-05-14 International Business Machines Corporation Process of making BiCMOS devices having closely spaced device regions
US5047826A (en) * 1989-06-30 1991-09-10 Texas Instruments Incorporated Gigaohm load resistor for BICMOS process
JPH0349234A (ja) * 1989-07-17 1991-03-04 Fujitsu Ltd 半導体装置の製造方法
US4960726A (en) * 1989-10-19 1990-10-02 International Business Machines Corporation BiCMOS process
JPH03198371A (ja) * 1989-12-27 1991-08-29 Oki Electric Ind Co Ltd 半導体装置の製造方法
US5429959A (en) * 1990-11-23 1995-07-04 Texas Instruments Incorporated Process for simultaneously fabricating a bipolar transistor and a field-effect transistor
JP2625602B2 (ja) * 1991-01-18 1997-07-02 インターナショナル・ビジネス・マシーンズ・コーポレイション 集積回路デバイスの製造プロセス
JPH04361568A (ja) * 1991-06-10 1992-12-15 Hitachi Ltd 半導体記憶装置及びその製造方法
JP3128267B2 (ja) * 1991-06-27 2001-01-29 株式会社東芝 半導体集積回路装置の製造方法
KR930008018B1 (ko) * 1991-06-27 1993-08-25 삼성전자 주식회사 바이씨모스장치 및 그 제조방법
JPH05175437A (ja) * 1991-12-20 1993-07-13 Fujitsu Ltd 半導体装置の製造方法
US5416031A (en) * 1992-09-30 1995-05-16 Sony Corporation Method of producing Bi-CMOS transistors
JP2886420B2 (ja) * 1992-10-23 1999-04-26 三菱電機株式会社 半導体装置の製造方法
JPH07106452A (ja) * 1993-10-04 1995-04-21 Mitsubishi Electric Corp 半導体装置およびその製造方法
FR2756104B1 (fr) * 1996-11-19 1999-01-29 Sgs Thomson Microelectronics Fabrication de circuits integres bipolaires/cmos

Also Published As

Publication number Publication date
JP3003654B2 (ja) 2000-01-31
US5953600A (en) 1999-09-14
JPH10233459A (ja) 1998-09-02
EP0843354B1 (de) 2003-09-10
EP0843354A1 (de) 1998-05-20
KR100564890B1 (ko) 2006-07-14
FR2756104A1 (fr) 1998-05-22
FR2756104B1 (fr) 1999-01-29
KR19980042526A (ko) 1998-08-17
TW359882B (en) 1999-06-01

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