DE69636404D1 - Verfahren zur Herstellung einer photoelektrischen Umwandlungsvorrichtung - Google Patents

Verfahren zur Herstellung einer photoelektrischen Umwandlungsvorrichtung

Info

Publication number
DE69636404D1
DE69636404D1 DE69636404T DE69636404T DE69636404D1 DE 69636404 D1 DE69636404 D1 DE 69636404D1 DE 69636404 T DE69636404 T DE 69636404T DE 69636404 T DE69636404 T DE 69636404T DE 69636404 D1 DE69636404 D1 DE 69636404D1
Authority
DE
Germany
Prior art keywords
manufacturing
photoelectric conversion
conversion device
photoelectric
conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69636404T
Other languages
English (en)
Other versions
DE69636404T2 (de
Inventor
Shinichi Hayashi
Akira Funakoshi
Akira Tago
Satoshi Okada
Shinichi Takeda
Eiichi Takami
Masakazu Morishita
Chiori Mochizuki
Tadao Endo
Toshikazu Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69636404D1 publication Critical patent/DE69636404D1/de
Publication of DE69636404T2 publication Critical patent/DE69636404T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14618Containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/14Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14634Assemblies, i.e. Hybrid structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0203Containers; Encapsulations, e.g. encapsulation of photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0232Optical elements or arrangements associated with the device
    • H01L31/02322Optical elements or arrangements associated with the device comprising luminescent members, e.g. fluorescent sheets upon the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14665Imagers using a photoconductor layer
    • H01L27/14676X-ray, gamma-ray or corpuscular radiation imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12042LASER
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062Prior to assembly
    • Y10T156/1075Prior to assembly of plural laminae from single stock and assembling to each other or to additional lamina
    • Y10T156/1077Applying plural cut laminae to single face of additional lamina
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1089Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
    • Y10T156/1092All laminae planar and face to face

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Facsimile Heads (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
DE69636404T 1995-10-20 1996-10-18 Verfahren zur Herstellung einer photoelektrischen Umwandlungsvorrichtung Expired - Lifetime DE69636404T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP27299795 1995-10-20
JP27299795 1995-10-20
JP732496 1996-01-19
JP732496 1996-01-19
JP26713896 1996-10-08
JP26713896A JP3805031B2 (ja) 1995-10-20 1996-10-08 光電変換装置

Publications (2)

Publication Number Publication Date
DE69636404D1 true DE69636404D1 (de) 2006-09-14
DE69636404T2 DE69636404T2 (de) 2007-02-01

Family

ID=27277562

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69637881T Expired - Lifetime DE69637881D1 (de) 1995-10-20 1996-10-18 Photoelektrische Umwandlungsvorrichtung und Herstellungsverfahren dazu
DE69636404T Expired - Lifetime DE69636404T2 (de) 1995-10-20 1996-10-18 Verfahren zur Herstellung einer photoelektrischen Umwandlungsvorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69637881T Expired - Lifetime DE69637881D1 (de) 1995-10-20 1996-10-18 Photoelektrische Umwandlungsvorrichtung und Herstellungsverfahren dazu

Country Status (5)

Country Link
US (2) US5856699A (de)
EP (2) EP0769817B1 (de)
JP (1) JP3805031B2 (de)
DE (2) DE69637881D1 (de)
TW (1) TW402817B (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3805031B2 (ja) * 1995-10-20 2006-08-02 キヤノン株式会社 光電変換装置
JP3618973B2 (ja) * 1997-10-01 2005-02-09 キヤノン株式会社 半導体装置及び光検出装置の製造方法
GB9925227D0 (en) 1999-10-25 1999-12-22 Internet Limited Data storage retrieval and access system
JP4293584B2 (ja) 2000-02-25 2009-07-08 浜松ホトニクス株式会社 X線像撮像装置及びその製造方法
JP4302279B2 (ja) * 2000-02-29 2009-07-22 富士フイルム株式会社 固体撮像装置及びその製造方法
JP2001264442A (ja) * 2000-03-22 2001-09-26 Fuji Photo Film Co Ltd 画像記録媒体
JP3978971B2 (ja) * 2000-03-28 2007-09-19 株式会社島津製作所 2次元画像検出器およびその製造方法
US6855935B2 (en) 2000-03-31 2005-02-15 Canon Kabushiki Kaisha Electromagnetic wave detector
JP2003168794A (ja) * 2001-11-30 2003-06-13 Canon Inc 放射線検出素子、放射線撮像装置、放射線検出方法、及び放射線撮像方法
US6953934B2 (en) * 2002-03-06 2005-10-11 Canon Kabushiki Kaisha Radiation detection apparatus and system
JP3722367B2 (ja) 2002-03-19 2005-11-30 ソニー株式会社 固体撮像素子の製造方法
US7127793B2 (en) * 2002-04-24 2006-10-31 Fuji Photo Film Co., Ltd. Method of producing solid state pickup device
KR100539234B1 (ko) * 2003-06-11 2005-12-27 삼성전자주식회사 투명 고분자 소재를 적용한 씨모스형 이미지 센서 모듈 및그 제조방법
US20050009239A1 (en) * 2003-07-07 2005-01-13 Wolff Larry Lee Optoelectronic packaging with embedded window
JP4563042B2 (ja) * 2004-01-29 2010-10-13 浜松ホトニクス株式会社 放射線イメージセンサ
JP4389626B2 (ja) * 2004-03-29 2009-12-24 ソニー株式会社 固体撮像素子の製造方法
DE202004011854U1 (de) * 2004-07-28 2004-11-04 Microelectronic Packaging Dresden Gmbh Image-Modul
JPWO2006112320A1 (ja) * 2005-04-15 2008-12-11 株式会社日立メディコ X線平面検出器及びx線画像診断装置
JP4622670B2 (ja) * 2005-05-17 2011-02-02 株式会社島津製作所 2次元放射線検出器
TWI278694B (en) * 2005-09-20 2007-04-11 Ind Tech Res Inst Method for supporting a flexible substrate and method for manufacturing a flexible display
JP2006139316A (ja) * 2006-02-10 2006-06-01 Ushio Inc 原稿読み取り用光源装置
JP4871629B2 (ja) * 2006-04-12 2012-02-08 キヤノン株式会社 放射線撮像装置の製造方法及び放射線撮像システム
JP2008014900A (ja) * 2006-07-10 2008-01-24 Fujifilm Corp 放射線像変換パネルの製造方法および放射線像変換パネル
DE102006038969B4 (de) * 2006-08-21 2013-02-28 Siemens Aktiengesellschaft Röntgenkonverterelement und Verfahren zu dessen Herstellung
DE102007027207A1 (de) * 2006-10-21 2008-04-24 Sunzenit Gmbh Photovoltaikmodul mit Kühleinrichtung
CN101389979A (zh) 2006-12-27 2009-03-18 株式会社东芝 射线检测器
JP5004848B2 (ja) * 2007-04-18 2012-08-22 キヤノン株式会社 放射線検出装置及び放射線検出システム
JP5350604B2 (ja) * 2007-05-16 2013-11-27 スパンション エルエルシー 半導体装置及びその製造方法
JP5124227B2 (ja) * 2007-10-01 2013-01-23 浜松ホトニクス株式会社 放射線検出器
WO2009133502A2 (en) * 2008-04-29 2009-11-05 Philips Intellectual Property & Standards Gmbh Photo-detector
RU2510520C2 (ru) * 2008-11-21 2014-03-27 Трикселль Способ сборки ячеистого радиационного детектора
US9496442B2 (en) * 2009-01-22 2016-11-15 Omnipv Solar modules including spectral concentrators and related manufacturing methods
JP5665494B2 (ja) * 2010-06-24 2015-02-04 キヤノン株式会社 放射線検出装置及び放射線撮像システム
JP2012047487A (ja) 2010-08-24 2012-03-08 Hamamatsu Photonics Kk 放射線検出器
US9269741B2 (en) * 2010-09-07 2016-02-23 Konica Minolta Medical & Graphic, Inc. Production method of radiation image detector and radiation image detector
JP2012154696A (ja) 2011-01-24 2012-08-16 Canon Inc シンチレータパネル、放射線検出装置およびそれらの製造方法
JP5709572B2 (ja) 2011-02-18 2015-04-30 キヤノン株式会社 撮像装置および撮像システム
WO2012145038A1 (en) * 2011-04-19 2012-10-26 Teledyne Rad-Icon Imaging Corp. Method of direct silicon tiling of a tiled image sensor array
EA021593B1 (ru) * 2012-11-21 2015-07-30 Закрытое Акционерное Общество "Импульс" Детектор рентгеновского изображения, способ изготовления фоточувствительного элемента и способ изготовления детектора
JP2015049121A (ja) * 2013-08-30 2015-03-16 株式会社東芝 検出器モジュール製造方法、検出器モジュール及び医用画像診断装置
US10162343B2 (en) 2014-07-23 2018-12-25 Apple Inc. Adaptive processes for improving integrity of surfaces
US10649497B2 (en) * 2014-07-23 2020-05-12 Apple Inc. Adaptive processes for improving integrity of surfaces
US9599723B2 (en) 2015-08-18 2017-03-21 Carestream Health, Inc. Method and apparatus with tiled image sensors
DE102018200845B4 (de) 2018-01-19 2021-05-06 Siemens Healthcare Gmbh Montageverfahren für die Herstellung eines Röntgendetektors, Röntgendetektor und Röntgengerät
JP7427410B2 (ja) 2019-10-11 2024-02-05 キヤノン株式会社 撮像装置及びカメラ

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537827A (en) * 1983-02-07 1985-08-27 Hughes Aircraft Company Optically flat semiconductor baseplate structure
EP0355522B1 (de) 1988-08-18 1993-12-15 Seiko Epson Corporation Festkörper-Bildaufnahmevorrichtung
JPH0287869A (ja) 1988-09-26 1990-03-28 Ricoh Co Ltd 千鳥配列マルチチツプ型イメージセンサ
JPH02143466A (ja) * 1988-11-25 1990-06-01 Mitsubishi Electric Corp 半導体装置の製造方法
GB2228366B (en) * 1989-02-21 1993-09-29 Canon Kk Photoelectric converter and image reading apparatus mounting the same
US4999077A (en) * 1989-08-31 1991-03-12 Xerox Corporation Method of fabricating full width scanning or imaging arrays from subunits
US5132539A (en) * 1991-08-29 1992-07-21 General Electric Company Planar X-ray imager having a moisture-resistant sealing structure
JP3805031B2 (ja) * 1995-10-20 2006-08-02 キヤノン株式会社 光電変換装置

Also Published As

Publication number Publication date
TW402817B (en) 2000-08-21
DE69636404T2 (de) 2007-02-01
EP1513201A2 (de) 2005-03-09
EP0769817A3 (de) 1998-04-01
EP0769817A2 (de) 1997-04-23
JPH09260626A (ja) 1997-10-03
EP1513201B1 (de) 2009-03-18
US6352875B1 (en) 2002-03-05
DE69637881D1 (de) 2009-04-30
EP0769817B1 (de) 2006-08-02
EP1513201A3 (de) 2007-03-14
JP3805031B2 (ja) 2006-08-02
US5856699A (en) 1999-01-05

Similar Documents

Publication Publication Date Title
DE69636404D1 (de) Verfahren zur Herstellung einer photoelektrischen Umwandlungsvorrichtung
DE69617854D1 (de) Verfahren zur Herstellung einer photovoltaischen Vorrichtung
DE69936906D1 (de) Verfahren zur Herstellung einer siliziumhaltigen photoelektrischen Dünnschicht-Umwandlungsanordnung
DE69636338D1 (de) Verfahren zur herstellung einer halbleitervorrichtung
DE69317800T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE10080916T1 (de) Verfahren zur Herstellung einer photovoltaischen Vorrichtung
DE69727655D1 (de) Verfahren zur herstellung einer cdte-schicht
DE69421592D1 (de) Verfahren zur Herstellung einer Halbleitervorrichtung
DE69503532T2 (de) Verfahren zur Herstellung einer Halbleitervorrichtung
DE69613723T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung mit einem Kondensator
DE69330980T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69232432T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69231803D1 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69323979D1 (de) Verfahren zur Herstellung einer Halbleitervorrichtung
DE69527344D1 (de) Verfahren zur Herstellung einer Halbleiterverbindungsstruktur
DE69224788T2 (de) Verfahren zur Herstellung einer Festkoerper- Bildaufnahmevorrichtung
DE69615052D1 (de) Verfahren zur herstellung einer benzimidazolverbindung
DE69501832D1 (de) Verfahren zur Herstellung einer Nockenwelle
DE59608481D1 (de) Verfahren zur Herstellung einer Halbleiteranordnung mit Kondensator
DE69722661D1 (de) Verfahren zur herstellung einer halbleitervorrichtung
DE59510618D1 (de) Verfahren zur Herstellung einer Sensorelektrode
DE69615642T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE69326908D1 (de) Verfahren zur Herstellung einer Halbleiter-Anordnung
DE59309045D1 (de) Verfahren zur herstellung einer halbleiterstruktur
DE69522413T2 (de) Verfahren zur Herstellung einer Halbleiteranordnung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition