DE69330980D1 - Verfahren zur Herstellung einer Halbleiteranordnung - Google Patents
Verfahren zur Herstellung einer HalbleiteranordnungInfo
- Publication number
- DE69330980D1 DE69330980D1 DE69330980T DE69330980T DE69330980D1 DE 69330980 D1 DE69330980 D1 DE 69330980D1 DE 69330980 T DE69330980 T DE 69330980T DE 69330980 T DE69330980 T DE 69330980T DE 69330980 D1 DE69330980 D1 DE 69330980D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00865—Multistep processes for the separation of wafers into individual elements
- B81C1/00888—Multistep processes involving only mechanical separation, e.g. grooving followed by cleaving
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/00158—Diaphragms, membranes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0055—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements bonded on a diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/12—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
- G01P15/123—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance by piezo-resistive elements, e.g. semiconductor strain gauges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0111—Bulk micromachining
- B81C2201/0114—Electrochemical etching, anodic oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/05—Temporary protection of devices or parts of the devices during manufacturing
- B81C2201/053—Depositing a protective layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/028—Dicing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/159—Strain gauges
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/977—Thinning or removal of substrate
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10309192 | 1992-04-22 | ||
JP13536192 | 1992-05-27 | ||
JP15833192A JP3182885B2 (ja) | 1992-06-17 | 1992-06-17 | 半導体装置の製造方法 |
JP16123592A JP2876899B2 (ja) | 1992-04-22 | 1992-06-19 | 半導体装置の製造方法 |
JP25016392A JP3361553B2 (ja) | 1992-09-18 | 1992-09-18 | 半導体装置の製造方法 |
JP04250162A JP3129851B2 (ja) | 1992-09-18 | 1992-09-18 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69330980D1 true DE69330980D1 (de) | 2001-11-29 |
DE69330980T2 DE69330980T2 (de) | 2002-07-11 |
Family
ID=27552153
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69334194T Expired - Lifetime DE69334194T2 (de) | 1992-04-22 | 1993-04-20 | Verfahren zum Erzeugen einer Halbleitervorrichtung |
DE69330980T Expired - Lifetime DE69330980T2 (de) | 1992-04-22 | 1993-04-20 | Verfahren zur Herstellung einer Halbleiteranordnung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69334194T Expired - Lifetime DE69334194T2 (de) | 1992-04-22 | 1993-04-20 | Verfahren zum Erzeugen einer Halbleitervorrichtung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5525549A (de) |
EP (2) | EP1119032B8 (de) |
DE (2) | DE69334194T2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5949118A (en) * | 1994-03-14 | 1999-09-07 | Nippondenso Co., Ltd. | Etching method for silicon substrates and semiconductor sensor |
US6020618A (en) * | 1994-03-30 | 2000-02-01 | Denso Corporation | Semiconductor device in which thin silicon portions are formed by electrochemical stop etching method |
DE19511596B4 (de) * | 1994-03-30 | 2007-11-22 | Denso Corp., Kariya | Verfahren zum Ätzen von Halbleiterwafern |
JP3261904B2 (ja) * | 1994-12-22 | 2002-03-04 | 日産自動車株式会社 | 半導体装置 |
JP3489309B2 (ja) * | 1995-12-27 | 2004-01-19 | 株式会社デンソー | 半導体力学量センサの製造方法および異方性エッチングマスク |
EP0845665A3 (de) * | 1996-12-02 | 1999-04-14 | Motorola, Inc. | Sensor, Vorspannungsschaltung und Verfahren zum darin verwendete Stromnebenschluss |
JP3624597B2 (ja) * | 1996-12-10 | 2005-03-02 | 株式会社デンソー | 半導体装置及びその製造方法 |
JPH10199946A (ja) * | 1997-01-07 | 1998-07-31 | Mitsubishi Electric Corp | 半導体装置の評価方法 |
US6284670B1 (en) | 1997-07-23 | 2001-09-04 | Denso Corporation | Method of etching silicon wafer and silicon wafer |
DE19903380B4 (de) | 1998-02-02 | 2007-10-18 | Denso Corp., Kariya | Halbleitersensoren für eine physikalische Grösse und ihre Herstellungsverfahren |
US6284384B1 (en) * | 1998-12-09 | 2001-09-04 | Memc Electronic Materials, Inc. | Epitaxial silicon wafer with intrinsic gettering |
JP4238437B2 (ja) | 1999-01-25 | 2009-03-18 | 株式会社デンソー | 半導体力学量センサとその製造方法 |
DE69917943T2 (de) * | 1999-02-15 | 2005-06-23 | Yamatake Corp. | Halbleiter-drucksensor |
US6443813B1 (en) | 2000-04-12 | 2002-09-03 | Seagate Technology Llc | Process of eliminating ridges formed during dicing of aerodynamic sliders, and sliders formed thereby |
JP2002131161A (ja) * | 2000-10-27 | 2002-05-09 | Denso Corp | 半導体圧力センサ |
JP2002190607A (ja) | 2000-12-22 | 2002-07-05 | Denso Corp | 半導体装置及びその製造方法 |
JP2002340713A (ja) * | 2001-05-10 | 2002-11-27 | Denso Corp | 半導体圧力センサ |
JP4306162B2 (ja) * | 2001-08-22 | 2009-07-29 | 株式会社デンソー | 半導体装置およびその製造方法 |
JP2003172745A (ja) * | 2001-09-26 | 2003-06-20 | Hitachi Metals Ltd | 半導体加速度センサ |
DE102004012238A1 (de) * | 2004-03-12 | 2005-09-29 | Infineon Technologies Ag | Anordnung von Halbleiterbauelementen in einem Wafer |
JP2006073690A (ja) * | 2004-09-01 | 2006-03-16 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
JP3895347B2 (ja) * | 2004-11-19 | 2007-03-22 | 横浜ゴム株式会社 | タイヤ変形量算出方法及びタイヤ変形量算出装置 |
KR100735016B1 (ko) * | 2005-08-17 | 2007-07-03 | 삼성전자주식회사 | 플라즈마 공정에서의 차지업 방지 방법 및 그것에 의해제조된 반도체 웨이퍼 |
EP3257809A1 (de) * | 2005-11-25 | 2017-12-20 | Panasonic Intellectual Property Management Co., Ltd. | Verpackungsstruktur auf wafer-ebene und herstellungsverfahren dafür |
US7674638B2 (en) * | 2005-11-25 | 2010-03-09 | Panasonic Electric Works Co., Ltd. | Sensor device and production method therefor |
EP1953815B1 (de) * | 2005-11-25 | 2012-07-11 | Panasonic Corporation | Kapselungsstruktur auf waferniveau und aus einer solchen kapselungsstruktur erhaltene sensoranordnung |
US20070238215A1 (en) * | 2006-04-07 | 2007-10-11 | Honeywell International Inc. | Pressure transducer with increased sensitivity |
DE112007003051B4 (de) * | 2007-01-23 | 2012-12-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mikromechanisches Bauelement mit erhöhter Steifigkeit und Verfahren zum Herstellen desselben |
DE102010041763A1 (de) * | 2010-09-30 | 2012-04-05 | Siemens Aktiengesellschaft | Mikromechanisches Substrat |
FR3014094B1 (fr) * | 2013-11-29 | 2016-01-22 | Commissariat Energie Atomique | Systeme mecanique micro-usine (nems) avec resistances d'adaptation |
CN105158493B (zh) * | 2015-07-29 | 2018-09-11 | 中国科学院电子学研究所 | 集成式复合敏感电极及其制造方法 |
US20230146214A1 (en) | 2020-03-19 | 2023-05-11 | Shenzhen New Degree Technology Co., Ltd. | Pressure sensing device and pressure sensing apparatus |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5913377A (ja) * | 1982-07-14 | 1984-01-24 | Fuji Electric Corp Res & Dev Ltd | 半導体圧力変換素子の受圧ダイヤフラム形成方法 |
JPS6130038A (ja) * | 1984-07-23 | 1986-02-12 | Nec Corp | エツチングの方法 |
JPS6130039A (ja) * | 1984-07-23 | 1986-02-12 | Nec Corp | エツチングの方法 |
JPS6197572A (ja) * | 1984-10-19 | 1986-05-16 | Nissan Motor Co Ltd | 半導体加速度センサの製造方法 |
JPS63292071A (ja) * | 1987-05-26 | 1988-11-29 | Fujikura Ltd | 半導体加速度センサの製造方法 |
US5095349A (en) * | 1988-06-08 | 1992-03-10 | Nippondenso Co., Ltd. | Semiconductor pressure sensor and method of manufacturing same |
JPH02132843A (ja) * | 1988-11-14 | 1990-05-22 | Fujikura Ltd | 半導体圧力センサ用ウェハの切断方法 |
US5071510A (en) * | 1989-09-22 | 1991-12-10 | Robert Bosch Gmbh | Process for anisotropic etching of silicon plates |
JP3013377B2 (ja) * | 1990-03-07 | 2000-02-28 | 日産自動車株式会社 | 半導体基板のエッチング方法 |
JP2560140B2 (ja) * | 1990-08-03 | 1996-12-04 | 日産自動車株式会社 | 半導体装置 |
US5289721A (en) * | 1990-09-10 | 1994-03-01 | Nippondenso Co., Ltd. | Semiconductor pressure sensor |
JP3143915B2 (ja) * | 1990-09-20 | 2001-03-07 | 日産自動車株式会社 | 電解エッチングされる半導体基板 |
JP2586359B2 (ja) * | 1990-12-17 | 1997-02-26 | 日本電気株式会社 | 半導体加速度センサおよびその製造方法 |
JPH04258175A (ja) * | 1991-02-12 | 1992-09-14 | Mitsubishi Electric Corp | シリコン半導体加速度センサの製造方法 |
US5408112A (en) * | 1991-06-03 | 1995-04-18 | Nippondenso Co., Ltd. | Semiconductor strain sensor having improved resistance to bonding strain effects |
-
1993
- 1993-04-20 DE DE69334194T patent/DE69334194T2/de not_active Expired - Lifetime
- 1993-04-20 EP EP01107622A patent/EP1119032B8/de not_active Expired - Lifetime
- 1993-04-20 EP EP93106391A patent/EP0567075B1/de not_active Expired - Lifetime
- 1993-04-20 DE DE69330980T patent/DE69330980T2/de not_active Expired - Lifetime
- 1993-04-21 US US08/049,801 patent/US5525549A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69334194T2 (de) | 2008-12-04 |
EP1119032B1 (de) | 2007-12-12 |
DE69330980T2 (de) | 2002-07-11 |
EP0567075B1 (de) | 2001-10-24 |
DE69334194D1 (de) | 2008-01-24 |
EP0567075A2 (de) | 1993-10-27 |
EP0567075A3 (en) | 1997-09-24 |
EP1119032A3 (de) | 2001-10-17 |
EP1119032B8 (de) | 2008-03-19 |
EP1119032A2 (de) | 2001-07-25 |
US5525549A (en) | 1996-06-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |