DE69607547T2 - Verfahren und Vorrichtung zum Polieren von Halbleiterscheiben - Google Patents
Verfahren und Vorrichtung zum Polieren von HalbleiterscheibenInfo
- Publication number
- DE69607547T2 DE69607547T2 DE69607547T DE69607547T DE69607547T2 DE 69607547 T2 DE69607547 T2 DE 69607547T2 DE 69607547 T DE69607547 T DE 69607547T DE 69607547 T DE69607547 T DE 69607547T DE 69607547 T2 DE69607547 T2 DE 69607547T2
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor wafers
- polishing semiconductor
- polishing
- wafers
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21626295 | 1995-08-24 | ||
JP32531995 | 1995-12-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69607547D1 DE69607547D1 (de) | 2000-05-11 |
DE69607547T2 true DE69607547T2 (de) | 2000-08-10 |
Family
ID=26521330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69607547T Expired - Fee Related DE69607547T2 (de) | 1995-08-24 | 1996-07-29 | Verfahren und Vorrichtung zum Polieren von Halbleiterscheiben |
Country Status (5)
Country | Link |
---|---|
US (3) | US5769697A (de) |
EP (1) | EP0763401B1 (de) |
KR (1) | KR100423770B1 (de) |
DE (1) | DE69607547T2 (de) |
TW (2) | TW344695B (de) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW344695B (en) * | 1995-08-24 | 1998-11-11 | Matsushita Electric Ind Co Ltd | Method for polishing semiconductor substrate |
KR970018240A (ko) * | 1995-09-08 | 1997-04-30 | 모리시다 요이치 | 반도체 기판의 연마방법 및 그 장치 |
JP3672685B2 (ja) * | 1996-11-29 | 2005-07-20 | 松下電器産業株式会社 | 研磨方法及び研磨装置 |
JPH10329011A (ja) | 1997-03-21 | 1998-12-15 | Canon Inc | 精密研磨装置及び方法 |
US6159087A (en) * | 1998-02-11 | 2000-12-12 | Applied Materials, Inc. | End effector for pad conditioning |
US6117778A (en) * | 1998-02-11 | 2000-09-12 | International Business Machines Corporation | Semiconductor wafer edge bead removal method and tool |
JP3065016B2 (ja) * | 1998-02-17 | 2000-07-12 | 日本電気株式会社 | 研磨装置及び研磨方法 |
US6221774B1 (en) * | 1998-04-10 | 2001-04-24 | Silicon Genesis Corporation | Method for surface treatment of substrates |
WO1999053528A2 (en) * | 1998-04-10 | 1999-10-21 | Silicon Genesis Corporation | Surface treatment process and system |
US6019665A (en) * | 1998-04-30 | 2000-02-01 | Fujitsu Limited | Controlled retention of slurry in chemical mechanical polishing |
US6190243B1 (en) * | 1998-05-07 | 2001-02-20 | Ebara Corporation | Polishing apparatus |
US6129610A (en) * | 1998-08-14 | 2000-10-10 | International Business Machines Corporation | Polish pressure modulation in CMP to preferentially polish raised features |
US6174221B1 (en) * | 1998-09-01 | 2001-01-16 | Micron Technology, Inc. | Polishing chucks, semiconductor wafer polishing chucks, abrading methods, polishing methods, semiconductor wafer polishing methods, and methods of forming polishing chucks |
US6439967B2 (en) * | 1998-09-01 | 2002-08-27 | Micron Technology, Inc. | Microelectronic substrate assembly planarizing machines and methods of mechanical and chemical-mechanical planarization of microelectronic substrate assemblies |
US6220936B1 (en) * | 1998-12-07 | 2001-04-24 | Chartered Semiconductor Manufacturing Ltd. | In-site roller dresser |
US6176764B1 (en) | 1999-03-10 | 2001-01-23 | Micron Technology, Inc. | Polishing chucks, semiconductor wafer polishing chucks, abrading methods, polishing methods, simiconductor wafer polishing methods, and methods of forming polishing chucks |
US6135863A (en) * | 1999-04-20 | 2000-10-24 | Memc Electronic Materials, Inc. | Method of conditioning wafer polishing pads |
US6722963B1 (en) * | 1999-08-03 | 2004-04-20 | Micron Technology, Inc. | Apparatus for chemical-mechanical planarization of microelectronic substrates with a carrier and membrane |
EP1077108B1 (de) * | 1999-08-18 | 2006-12-20 | Ebara Corporation | Verfahren und Einrichtung zum Polieren |
US6306008B1 (en) | 1999-08-31 | 2001-10-23 | Micron Technology, Inc. | Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
US6273796B1 (en) | 1999-09-01 | 2001-08-14 | Micron Technology, Inc. | Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface |
KR20010059876A (ko) * | 1999-12-30 | 2001-07-06 | 구자홍 | 광 기록재생기의 제어 방법 |
US6857942B1 (en) * | 2000-01-11 | 2005-02-22 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for pre-conditioning a conditioning disc |
US6722964B2 (en) * | 2000-04-04 | 2004-04-20 | Ebara Corporation | Polishing apparatus and method |
US6551176B1 (en) | 2000-10-05 | 2003-04-22 | Applied Materials, Inc. | Pad conditioning disk |
US6725120B2 (en) * | 2001-03-29 | 2004-04-20 | Lam Research Corporation | Apparatus and methods with resolution enhancement feature for improving accuracy of conversion of required chemical mechanical polishing pressure to force to be applied by polishing head to wafer |
US6866566B2 (en) * | 2001-08-24 | 2005-03-15 | Micron Technology, Inc. | Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces |
US6652708B2 (en) * | 2001-12-28 | 2003-11-25 | Lam Research Corporation | Methods and apparatus for conditioning and temperature control of a processing surface |
US7727371B2 (en) * | 2005-10-07 | 2010-06-01 | Caliper Life Sciences, Inc. | Electrode apparatus for use with a microfluidic device |
JP5408789B2 (ja) * | 2009-03-06 | 2014-02-05 | エルジー・ケム・リミテッド | フロートガラス研磨システム |
US20100291841A1 (en) * | 2009-05-14 | 2010-11-18 | Chien-Min Sung | Methods and Systems for Water Jet Assisted CMP Processing |
JP2011079076A (ja) * | 2009-10-05 | 2011-04-21 | Toshiba Corp | 研磨装置及び研磨方法 |
US8647170B2 (en) | 2011-10-06 | 2014-02-11 | Wayne O. Duescher | Laser alignment apparatus for rotary spindles |
US8740668B2 (en) * | 2010-03-12 | 2014-06-03 | Wayne O. Duescher | Three-point spindle-supported floating abrasive platen |
US8641476B2 (en) | 2011-10-06 | 2014-02-04 | Wayne O. Duescher | Coplanar alignment apparatus for rotary spindles |
US8647172B2 (en) | 2010-03-12 | 2014-02-11 | Wayne O. Duescher | Wafer pads for fixed-spindle floating-platen lapping |
US8602842B2 (en) * | 2010-03-12 | 2013-12-10 | Wayne O. Duescher | Three-point fixed-spindle floating-platen abrasive system |
US8647171B2 (en) * | 2010-03-12 | 2014-02-11 | Wayne O. Duescher | Fixed-spindle floating-platen workpiece loader apparatus |
US8758088B2 (en) | 2011-10-06 | 2014-06-24 | Wayne O. Duescher | Floating abrading platen configuration |
US8500515B2 (en) | 2010-03-12 | 2013-08-06 | Wayne O. Duescher | Fixed-spindle and floating-platen abrasive system using spherical mounts |
US8696405B2 (en) | 2010-03-12 | 2014-04-15 | Wayne O. Duescher | Pivot-balanced floating platen lapping machine |
US8337280B2 (en) | 2010-09-14 | 2012-12-25 | Duescher Wayne O | High speed platen abrading wire-driven rotary workholder |
US8430717B2 (en) | 2010-10-12 | 2013-04-30 | Wayne O. Duescher | Dynamic action abrasive lapping workholder |
US8998677B2 (en) | 2012-10-29 | 2015-04-07 | Wayne O. Duescher | Bellows driven floatation-type abrading workholder |
US9233452B2 (en) | 2012-10-29 | 2016-01-12 | Wayne O. Duescher | Vacuum-grooved membrane abrasive polishing wafer workholder |
US8845394B2 (en) | 2012-10-29 | 2014-09-30 | Wayne O. Duescher | Bellows driven air floatation abrading workholder |
US9039488B2 (en) | 2012-10-29 | 2015-05-26 | Wayne O. Duescher | Pin driven flexible chamber abrading workholder |
US8998678B2 (en) | 2012-10-29 | 2015-04-07 | Wayne O. Duescher | Spider arm driven flexible chamber abrading workholder |
US9199354B2 (en) | 2012-10-29 | 2015-12-01 | Wayne O. Duescher | Flexible diaphragm post-type floating and rigid abrading workholder |
US9604339B2 (en) | 2012-10-29 | 2017-03-28 | Wayne O. Duescher | Vacuum-grooved membrane wafer polishing workholder |
US9011207B2 (en) | 2012-10-29 | 2015-04-21 | Wayne O. Duescher | Flexible diaphragm combination floating and rigid abrading workholder |
TWI616278B (zh) * | 2015-02-16 | 2018-03-01 | China Grinding Wheel Corp | 化學機械研磨修整器 |
JP6667100B2 (ja) * | 2015-12-14 | 2020-03-18 | 株式会社ジェイテクト | ツルア、これを備えたツルーイング装置、研削装置及びツルーイング方法 |
US10734765B2 (en) | 2016-10-31 | 2020-08-04 | Commscope Technologies Llc | Connector with capacitive crosstalk compensation |
KR102316563B1 (ko) * | 2017-05-22 | 2021-10-25 | 엘지디스플레이 주식회사 | 금속으로 형성된 상부 기판을 포함하는 유기 발광 표시 장치 및 이의 제조 방법 |
US10926378B2 (en) | 2017-07-08 | 2021-02-23 | Wayne O. Duescher | Abrasive coated disk islands using magnetic font sheet |
US11691241B1 (en) * | 2019-08-05 | 2023-07-04 | Keltech Engineering, Inc. | Abrasive lapping head with floating and rigid workpiece carrier |
CN116394151B (zh) * | 2023-03-29 | 2023-12-26 | 江苏山水半导体科技有限公司 | 一种表面具有psg层硅片的化学机械平坦化方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3888053A (en) * | 1973-05-29 | 1975-06-10 | Rca Corp | Method of shaping semiconductor workpiece |
US5257478A (en) * | 1990-03-22 | 1993-11-02 | Rodel, Inc. | Apparatus for interlayer planarization of semiconductor material |
EP0465868B1 (de) * | 1990-06-29 | 1996-10-02 | National Semiconductor Corporation | Polierscheibe mit eingestellter Schmiegsamkeit |
US5212910A (en) * | 1991-07-09 | 1993-05-25 | Intel Corporation | Composite polishing pad for semiconductor process |
US5287663A (en) * | 1992-01-21 | 1994-02-22 | National Semiconductor Corporation | Polishing pad and method for polishing semiconductor wafers |
JP3024373B2 (ja) * | 1992-07-07 | 2000-03-21 | 信越半導体株式会社 | シート状弾性発泡体及びウェーハ研磨加工用治具 |
US5499733A (en) * | 1992-09-17 | 1996-03-19 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
EP0911115B1 (de) * | 1992-09-24 | 2003-11-26 | Ebara Corporation | Poliergerät |
TW338125B (en) * | 1993-02-26 | 1998-08-11 | Hoechst Celanese Corp | Novel matriz resin and its preparation and use in high-temperature stable photoimageable compositions |
JPH0794452A (ja) * | 1993-09-22 | 1995-04-07 | Toshiba Corp | 研磨方法及び研磨装置 |
US5435772A (en) * | 1993-04-30 | 1995-07-25 | Motorola, Inc. | Method of polishing a semiconductor substrate |
TW367551B (en) * | 1993-06-17 | 1999-08-21 | Freescale Semiconductor Inc | Polishing pad and a process for polishing |
JPH0724708A (ja) * | 1993-07-15 | 1995-01-27 | Toshiba Corp | 研磨方法及び研磨装置 |
US5486131A (en) * | 1994-01-04 | 1996-01-23 | Speedfam Corporation | Device for conditioning polishing pads |
JP2914166B2 (ja) * | 1994-03-16 | 1999-06-28 | 日本電気株式会社 | 研磨布の表面処理方法および研磨装置 |
US5547417A (en) * | 1994-03-21 | 1996-08-20 | Intel Corporation | Method and apparatus for conditioning a semiconductor polishing pad |
JPH07297195A (ja) * | 1994-04-27 | 1995-11-10 | Speedfam Co Ltd | 半導体装置の平坦化方法及び平坦化装置 |
TW344695B (en) * | 1995-08-24 | 1998-11-11 | Matsushita Electric Ind Co Ltd | Method for polishing semiconductor substrate |
-
1996
- 1996-06-29 TW TW086109351A patent/TW344695B/zh active
- 1996-06-29 TW TW085108020A patent/TW334379B/zh active
- 1996-07-19 KR KR1019960029167A patent/KR100423770B1/ko not_active IP Right Cessation
- 1996-07-29 DE DE69607547T patent/DE69607547T2/de not_active Expired - Fee Related
- 1996-07-29 EP EP96112215A patent/EP0763401B1/de not_active Expired - Lifetime
- 1996-08-07 US US08/692,065 patent/US5769697A/en not_active Expired - Lifetime
-
1997
- 1997-04-04 US US08/834,513 patent/US5868610A/en not_active Expired - Fee Related
- 1997-04-04 US US08/833,180 patent/US5997385A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TW334379B (en) | 1998-06-21 |
EP0763401B1 (de) | 2000-04-05 |
EP0763401A1 (de) | 1997-03-19 |
US5997385A (en) | 1999-12-07 |
DE69607547D1 (de) | 2000-05-11 |
US5868610A (en) | 1999-02-09 |
TW344695B (en) | 1998-11-11 |
KR100423770B1 (ko) | 2004-06-30 |
KR970013085A (ko) | 1997-03-29 |
US5769697A (en) | 1998-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |