DE69525283T2 - Verfahren zum Herstellen einer lichtemittierenden Diode - Google Patents
Verfahren zum Herstellen einer lichtemittierenden DiodeInfo
- Publication number
- DE69525283T2 DE69525283T2 DE69525283T DE69525283T DE69525283T2 DE 69525283 T2 DE69525283 T2 DE 69525283T2 DE 69525283 T DE69525283 T DE 69525283T DE 69525283 T DE69525283 T DE 69525283T DE 69525283 T2 DE69525283 T2 DE 69525283T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- light emitting
- emitting diode
- diode
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/305—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table characterised by the doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11799994A JP3163217B2 (ja) | 1994-05-31 | 1994-05-31 | 発光ダイオード及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69525283D1 DE69525283D1 (de) | 2002-03-21 |
DE69525283T2 true DE69525283T2 (de) | 2002-08-22 |
Family
ID=14725545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69525283T Expired - Lifetime DE69525283T2 (de) | 1994-05-31 | 1995-05-31 | Verfahren zum Herstellen einer lichtemittierenden Diode |
Country Status (6)
Country | Link |
---|---|
US (1) | US5529938A (de) |
EP (1) | EP0685892B1 (de) |
JP (1) | JP3163217B2 (de) |
KR (1) | KR950034869A (de) |
DE (1) | DE69525283T2 (de) |
TW (1) | TW270241B (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6063642A (en) * | 1994-11-15 | 2000-05-16 | Peter S. Zory | Method for generating luminescence from a buried layer in a multilayer compound semiconductor material using a liquid contact |
JP3104218B2 (ja) * | 1995-03-27 | 2000-10-30 | 信越半導体株式会社 | 窒素ドープGaPエピタキシャル層の成長方法 |
TW344100B (en) * | 1996-05-31 | 1998-11-01 | Toshiba Co Ltd | Semiconductor liquid phase epitaxial growth method and apparatus |
JP3356041B2 (ja) * | 1997-02-17 | 2002-12-09 | 昭和電工株式会社 | リン化ガリウム緑色発光素子 |
GB2331307A (en) * | 1997-11-15 | 1999-05-19 | Sharp Kk | Growth of buffer layer by molecular beam epitaxy |
DE19824566C1 (de) * | 1998-06-02 | 1999-12-02 | Siemens Ag | GaP-Halbleiteranordnung und Verfahren zur Herstellung derselben |
JP4032224B2 (ja) | 1999-10-29 | 2008-01-16 | 信越半導体株式会社 | 燐化ガリウム発光素子及びその製造方法 |
DE102017104719A1 (de) * | 2017-03-07 | 2018-09-13 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterkörper und Halbleiterchip |
JP2019004098A (ja) * | 2017-06-19 | 2019-01-10 | 信越半導体株式会社 | エピタキシャルウェーハ及びその製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4180423A (en) * | 1974-01-31 | 1979-12-25 | Tokyo Shibaura Electric Co., Ltd. | Method of manufacturing red light-emitting gallium phosphide device |
US4154630A (en) * | 1975-01-07 | 1979-05-15 | U.S. Philips Corporation | Method of manufacturing semiconductor devices having isoelectronically built-in nitrogen and having the p-n junction formed subsequent to the deposition process |
DE2843983C2 (de) * | 1977-10-07 | 1983-09-15 | Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa | Verfahren zum Herstellen einer Grünlicht emittierenden GaP-Lumineszenzdiode |
JPS5624985A (en) * | 1979-08-08 | 1981-03-10 | Toshiba Corp | Manufacture of gallium phosphide green light emitting element |
JPS5690573A (en) * | 1979-12-24 | 1981-07-22 | Toshiba Corp | Liquid phase growing process for light emitting diode |
US4562378A (en) * | 1982-07-08 | 1985-12-31 | Sanyo Electric Co., Ltd. | Gallium phosphide light-emitting diode |
JPS5922376A (ja) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Ind Co Ltd | 純緑色発光ダイオ−ドおよびその製造方法 |
JPS5980981A (ja) * | 1982-11-01 | 1984-05-10 | Sanyo Electric Co Ltd | ガリウム燐緑色発光ダイオードの製造方法 |
JPS6019676A (ja) * | 1983-07-12 | 1985-01-31 | 三菱電機株式会社 | エレベ−タの防犯運転装置 |
JPS60236221A (ja) * | 1984-05-10 | 1985-11-25 | Toshiba Corp | 液相エピタキシヤル成長法 |
JPH01245569A (ja) * | 1988-03-28 | 1989-09-29 | Toshiba Corp | GaP緑色発光素子とその製造方法 |
US5063166A (en) * | 1988-04-29 | 1991-11-05 | Sri International | Method of forming a low dislocation density semiconductor device |
US5164329A (en) * | 1991-09-30 | 1992-11-17 | Motorola, Inc. | Fabricating a low leakage current LED |
JP2599088B2 (ja) * | 1993-04-12 | 1997-04-09 | 信越半導体株式会社 | GaP赤色発光素子基板及びその製造方法 |
US5284781A (en) * | 1993-04-30 | 1994-02-08 | Motorola, Inc. | Method of forming light emitting diode by LPE |
JP3324102B2 (ja) * | 1993-11-22 | 2002-09-17 | 信越半導体株式会社 | エピタキシャルウェーハの製造方法 |
-
1994
- 1994-05-31 JP JP11799994A patent/JP3163217B2/ja not_active Expired - Fee Related
-
1995
- 1995-04-27 TW TW084104199A patent/TW270241B/zh active
- 1995-05-26 US US08/450,922 patent/US5529938A/en not_active Expired - Lifetime
- 1995-05-31 KR KR1019950014097A patent/KR950034869A/ko not_active Application Discontinuation
- 1995-05-31 DE DE69525283T patent/DE69525283T2/de not_active Expired - Lifetime
- 1995-05-31 EP EP95303696A patent/EP0685892B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0685892B1 (de) | 2002-02-06 |
JPH07326792A (ja) | 1995-12-12 |
EP0685892A3 (de) | 1998-04-01 |
US5529938A (en) | 1996-06-25 |
JP3163217B2 (ja) | 2001-05-08 |
TW270241B (de) | 1996-02-11 |
DE69525283D1 (de) | 2002-03-21 |
KR950034869A (ko) | 1995-12-28 |
EP0685892A2 (de) | 1995-12-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |