DE69309011T2 - Halbleiterlaser mit optimiertem Resonator - Google Patents
Halbleiterlaser mit optimiertem ResonatorInfo
- Publication number
- DE69309011T2 DE69309011T2 DE69309011T DE69309011T DE69309011T2 DE 69309011 T2 DE69309011 T2 DE 69309011T2 DE 69309011 T DE69309011 T DE 69309011T DE 69309011 T DE69309011 T DE 69309011T DE 69309011 T2 DE69309011 T2 DE 69309011T2
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- optimized resonator
- resonator
- optimized
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0281—Coatings made of semiconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1039—Details on the cavity length
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33468192 | 1992-12-15 | ||
JP17797893A JP3225699B2 (ja) | 1992-12-15 | 1993-07-19 | 半導体レーザ及びこれを用いた光学装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69309011D1 DE69309011D1 (de) | 1997-04-24 |
DE69309011T2 true DE69309011T2 (de) | 1997-10-09 |
Family
ID=26498319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69309011T Expired - Fee Related DE69309011T2 (de) | 1992-12-15 | 1993-12-14 | Halbleiterlaser mit optimiertem Resonator |
Country Status (5)
Country | Link |
---|---|
US (1) | US5438583A (de) |
EP (1) | EP0602603B1 (de) |
JP (1) | JP3225699B2 (de) |
KR (1) | KR100246054B1 (de) |
DE (1) | DE69309011T2 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3283802B2 (ja) * | 1997-09-29 | 2002-05-20 | 日本電気株式会社 | 選択成長法を用いた半導体層及びその成長方法、選択成長法を用いた窒化物系半導体層及びその成長方法、窒化物系半導体発光素子とその製造方法 |
JP2000101200A (ja) * | 1998-09-25 | 2000-04-07 | Sony Corp | 半導体レーザーおよびマルチ半導体レーザー |
JP3225942B2 (ja) * | 1999-01-21 | 2001-11-05 | 日本電気株式会社 | 半導体光素子、その製造方法及び半導体光学装置 |
JP3225943B2 (ja) * | 1999-01-22 | 2001-11-05 | 日本電気株式会社 | 半導体レーザ及びその製造方法 |
US6403451B1 (en) * | 2000-02-09 | 2002-06-11 | Noerh Carolina State University | Methods of fabricating gallium nitride semiconductor layers on substrates including non-gallium nitride posts |
KR100361593B1 (ko) * | 2000-11-23 | 2002-11-22 | 주식회사일진 | 볼록 요철을 갖는 광학집적회로 소자, 그 제조방법, 그광학집적 회로 소자를 이용하여 제조한 광통신용 송수신장치의 모듈 |
US7649921B2 (en) | 2002-05-08 | 2010-01-19 | The Furukawa Electric Co., Ltd. | Laser module |
JP2003332680A (ja) | 2002-05-08 | 2003-11-21 | Furukawa Electric Co Ltd:The | レーザモジュール |
JP2004289108A (ja) * | 2002-09-27 | 2004-10-14 | Mitsubishi Electric Corp | 半導体光素子 |
JP2006190782A (ja) * | 2005-01-05 | 2006-07-20 | Fujitsu Ltd | 光半導体装置及びその製造方法 |
KR100842277B1 (ko) * | 2006-12-07 | 2008-06-30 | 한국전자통신연구원 | 반사형 반도체 광증폭기 및 수퍼 루미네센스 다이오드 |
JP5223439B2 (ja) * | 2007-05-28 | 2013-06-26 | ソニー株式会社 | 半導体発光素子 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5967677A (ja) * | 1982-07-01 | 1984-04-17 | Semiconductor Res Found | 光集積回路 |
-
1993
- 1993-07-19 JP JP17797893A patent/JP3225699B2/ja not_active Expired - Fee Related
- 1993-12-14 DE DE69309011T patent/DE69309011T2/de not_active Expired - Fee Related
- 1993-12-14 EP EP93120145A patent/EP0602603B1/de not_active Expired - Lifetime
- 1993-12-15 KR KR1019930027723A patent/KR100246054B1/ko not_active IP Right Cessation
- 1993-12-15 US US08/166,949 patent/US5438583A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69309011D1 (de) | 1997-04-24 |
EP0602603A2 (de) | 1994-06-22 |
EP0602603A3 (de) | 1994-10-26 |
JPH06237045A (ja) | 1994-08-23 |
KR940017020A (ko) | 1994-07-25 |
EP0602603B1 (de) | 1997-03-19 |
US5438583A (en) | 1995-08-01 |
KR100246054B1 (ko) | 2000-03-15 |
JP3225699B2 (ja) | 2001-11-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |