DE69213548D1 - Vorrichtung und Verfahren um Halbleiterscheiben zu Kühlen - Google Patents
Vorrichtung und Verfahren um Halbleiterscheiben zu KühlenInfo
- Publication number
- DE69213548D1 DE69213548D1 DE69213548T DE69213548T DE69213548D1 DE 69213548 D1 DE69213548 D1 DE 69213548D1 DE 69213548 T DE69213548 T DE 69213548T DE 69213548 T DE69213548 T DE 69213548T DE 69213548 D1 DE69213548 D1 DE 69213548D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor wafers
- cooling semiconductor
- cooling
- wafers
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001816 cooling Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 235000012431 wafers Nutrition 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S269/00—Work holders
- Y10S269/903—Work holder for electrical circuit assemblages or wiring systems
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/701,437 US5199483A (en) | 1991-05-15 | 1991-05-15 | Method and apparatus for cooling wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69213548D1 true DE69213548D1 (de) | 1996-10-17 |
DE69213548T2 DE69213548T2 (de) | 1997-01-23 |
Family
ID=24817372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69213548T Expired - Fee Related DE69213548T2 (de) | 1991-05-15 | 1992-05-15 | Vorrichtung und Verfahren um Halbleiterscheiben zu Kühlen |
Country Status (5)
Country | Link |
---|---|
US (1) | US5199483A (de) |
EP (1) | EP0513834B2 (de) |
JP (1) | JP2951478B2 (de) |
KR (1) | KR100245289B1 (de) |
DE (1) | DE69213548T2 (de) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5421893A (en) * | 1993-02-26 | 1995-06-06 | Applied Materials, Inc. | Susceptor drive and wafer displacement mechanism |
NL9300389A (nl) * | 1993-03-04 | 1994-10-03 | Xycarb Bv | Substraatdrager. |
US5366002A (en) * | 1993-05-05 | 1994-11-22 | Applied Materials, Inc. | Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing |
DE69404397T2 (de) * | 1993-07-13 | 1997-11-13 | Applied Materials Inc | Verbesserte Suszeptor Ausführung |
DE69401863T2 (de) * | 1993-07-15 | 1997-07-03 | Applied Materials Inc | Verbesserte Suszeptor Ausführung |
JPH0786247A (ja) * | 1993-09-16 | 1995-03-31 | Hitachi Ltd | 減圧雰囲気内における被処理物の処理方法及び処理装置 |
US5588827A (en) * | 1993-12-17 | 1996-12-31 | Brooks Automation Inc. | Passive gas substrate thermal conditioning apparatus and method |
EP0733130A4 (de) * | 1993-12-17 | 1997-04-02 | Brooks Automation Inc | Vorrichtung zum heizen und kuehlen von wafers |
US6086680A (en) * | 1995-08-22 | 2000-07-11 | Asm America, Inc. | Low-mass susceptor |
US6113702A (en) * | 1995-09-01 | 2000-09-05 | Asm America, Inc. | Wafer support system |
AU6962196A (en) | 1995-09-01 | 1997-03-27 | Advanced Semiconductor Materials America, Inc. | Wafer support system |
US5697427A (en) * | 1995-12-22 | 1997-12-16 | Applied Materials, Inc. | Apparatus and method for cooling a substrate |
US5885353A (en) | 1996-06-21 | 1999-03-23 | Micron Technology, Inc. | Thermal conditioning apparatus |
JPH1064985A (ja) * | 1996-08-23 | 1998-03-06 | Sony Corp | ウエハステージ、ウエハの温度調整方法及びドライエッチング装置 |
KR100264202B1 (ko) * | 1997-01-28 | 2000-09-01 | 김영환 | 웨이퍼 산화막 형성 장치 |
US6432203B1 (en) * | 1997-03-17 | 2002-08-13 | Applied Komatsu Technology, Inc. | Heated and cooled vacuum chamber shield |
WO1999000837A1 (en) * | 1997-06-30 | 1999-01-07 | Lam Research Corporation | Vacuum processing chamber workpiece lifter |
US6312525B1 (en) | 1997-07-11 | 2001-11-06 | Applied Materials, Inc. | Modular architecture for semiconductor wafer fabrication equipment |
JP2001522142A (ja) | 1997-11-03 | 2001-11-13 | エーエスエム アメリカ インコーポレイテッド | 改良された低質量ウェハ支持システム |
JP3909944B2 (ja) | 1998-01-12 | 2007-04-25 | キヤノンアネルバ株式会社 | 情報記録ディスク用基板の冷却機構及びこの冷却機構を備えた基板処理装置 |
US6163073A (en) * | 1998-04-17 | 2000-12-19 | International Business Machines Corporation | Integrated heatsink and heatpipe |
US6119368A (en) * | 1998-04-30 | 2000-09-19 | Conexant Systems, Inc. | Apparatus for reducing cool chamber particles |
US6431807B1 (en) * | 1998-07-10 | 2002-08-13 | Novellus Systems, Inc. | Wafer processing architecture including single-wafer load lock with cooling unit |
US6108937A (en) * | 1998-09-10 | 2000-08-29 | Asm America, Inc. | Method of cooling wafers |
US6957690B1 (en) * | 1998-09-10 | 2005-10-25 | Asm America, Inc. | Apparatus for thermal treatment of substrates |
US6328858B1 (en) | 1998-10-01 | 2001-12-11 | Nexx Systems Packaging, Llc | Multi-layer sputter deposition apparatus |
US6217272B1 (en) | 1998-10-01 | 2001-04-17 | Applied Science And Technology, Inc. | In-line sputter deposition system |
US6180926B1 (en) | 1998-10-19 | 2001-01-30 | Applied Materials, Inc. | Heat exchanger apparatus for a semiconductor wafer support and method of fabricating same |
DE69937255T2 (de) * | 1998-11-20 | 2008-07-03 | Steag RTP Systems, Inc., San Jose | Schnell-aufheiz- und -kühlvorrichtung für halbleiterwafer |
US6173948B1 (en) * | 1999-01-20 | 2001-01-16 | International Business Machines Corporation | Dimensional compensating vacuum fixture |
US6440261B1 (en) | 1999-05-25 | 2002-08-27 | Applied Materials, Inc. | Dual buffer chamber cluster tool for semiconductor wafer processing |
US6558509B2 (en) * | 1999-11-30 | 2003-05-06 | Applied Materials, Inc. | Dual wafer load lock |
US6949143B1 (en) | 1999-12-15 | 2005-09-27 | Applied Materials, Inc. | Dual substrate loadlock process equipment |
US7037797B1 (en) | 2000-03-17 | 2006-05-02 | Mattson Technology, Inc. | Localized heating and cooling of substrates |
US6977014B1 (en) * | 2000-06-02 | 2005-12-20 | Novellus Systems, Inc. | Architecture for high throughput semiconductor processing applications |
US6860965B1 (en) | 2000-06-23 | 2005-03-01 | Novellus Systems, Inc. | High throughput architecture for semiconductor processing |
US6290491B1 (en) * | 2000-06-29 | 2001-09-18 | Motorola, Inc. | Method for heating a semiconductor wafer in a process chamber by a shower head, and process chamber |
US6821912B2 (en) | 2000-07-27 | 2004-11-23 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
US6530733B2 (en) | 2000-07-27 | 2003-03-11 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
US6682288B2 (en) | 2000-07-27 | 2004-01-27 | Nexx Systems Packaging, Llc | Substrate processing pallet and related substrate processing method and machine |
KR100960773B1 (ko) * | 2000-09-15 | 2010-06-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 처리 장비용 더블 이중 슬롯 로드록 |
US6609869B2 (en) | 2001-01-04 | 2003-08-26 | Asm America | Transfer chamber with integral loadlock and staging station |
JP3837736B2 (ja) * | 2001-07-02 | 2006-10-25 | ウシオ電機株式会社 | レジスト硬化装置のワークステージ |
JP2003060012A (ja) * | 2001-08-08 | 2003-02-28 | Asm Japan Kk | 半導体処理用反応チャンバ |
US7316966B2 (en) * | 2001-09-21 | 2008-01-08 | Applied Materials, Inc. | Method for transferring substrates in a load lock chamber |
US6908865B2 (en) * | 2001-09-28 | 2005-06-21 | Applied Materials, Inc. | Method and apparatus for cleaning substrates |
US6899507B2 (en) * | 2002-02-08 | 2005-05-31 | Asm Japan K.K. | Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections |
US20030168174A1 (en) | 2002-03-08 | 2003-09-11 | Foree Michael Todd | Gas cushion susceptor system |
US6776849B2 (en) * | 2002-03-15 | 2004-08-17 | Asm America, Inc. | Wafer holder with peripheral lift ring |
US6861321B2 (en) | 2002-04-05 | 2005-03-01 | Asm America, Inc. | Method of loading a wafer onto a wafer holder to reduce thermal shock |
DE10247051A1 (de) * | 2002-10-09 | 2004-04-22 | Polymer Latex Gmbh & Co Kg | Latex und Verfahren zu seiner Herstellung |
US20050170314A1 (en) * | 2002-11-27 | 2005-08-04 | Richard Golden | Dental pliers design with offsetting jaw and pad elements for assisting in removing upper and lower teeth and method for removing teeth utilizing the dental plier design |
US7033443B2 (en) * | 2003-03-28 | 2006-04-25 | Axcelis Technologies, Inc. | Gas-cooled clamp for RTP |
US7100954B2 (en) * | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
US7207766B2 (en) * | 2003-10-20 | 2007-04-24 | Applied Materials, Inc. | Load lock chamber for large area substrate processing system |
US7000418B2 (en) * | 2004-05-14 | 2006-02-21 | Intevac, Inc. | Capacitance sensing for substrate cooling |
US7497414B2 (en) * | 2004-06-14 | 2009-03-03 | Applied Materials, Inc. | Curved slit valve door with flexible coupling |
JP4860167B2 (ja) * | 2005-03-30 | 2012-01-25 | 東京エレクトロン株式会社 | ロードロック装置,処理システム及び処理方法 |
US20060273815A1 (en) * | 2005-06-06 | 2006-12-07 | Applied Materials, Inc. | Substrate support with integrated prober drive |
US20070006936A1 (en) * | 2005-07-07 | 2007-01-11 | Applied Materials, Inc. | Load lock chamber with substrate temperature regulation |
US7845891B2 (en) * | 2006-01-13 | 2010-12-07 | Applied Materials, Inc. | Decoupled chamber body |
JP5280861B2 (ja) * | 2006-01-19 | 2013-09-04 | エーエスエム アメリカ インコーポレイテッド | 高温aldインレットマニホールド |
US7665951B2 (en) * | 2006-06-02 | 2010-02-23 | Applied Materials, Inc. | Multiple slot load lock chamber and method of operation |
US7845618B2 (en) | 2006-06-28 | 2010-12-07 | Applied Materials, Inc. | Valve door with ball coupling |
US8124907B2 (en) * | 2006-08-04 | 2012-02-28 | Applied Materials, Inc. | Load lock chamber with decoupled slit valve door seal compartment |
JP2008198739A (ja) * | 2007-02-09 | 2008-08-28 | Tokyo Electron Ltd | 載置台構造、これを用いた処理装置及びこの装置の使用方法 |
US20080251019A1 (en) * | 2007-04-12 | 2008-10-16 | Sriram Krishnaswami | System and method for transferring a substrate into and out of a reduced volume chamber accommodating multiple substrates |
JP5795162B2 (ja) | 2007-05-18 | 2015-10-14 | ブルックス オートメーション インコーポレイテッド | ロードロック高速排気および通気 |
US10541157B2 (en) | 2007-05-18 | 2020-01-21 | Brooks Automation, Inc. | Load lock fast pump vent |
KR20090001091A (ko) * | 2007-06-29 | 2009-01-08 | (주)티티에스 | 외부발열부재가 구성된 반도체 제조장치 |
US8092606B2 (en) | 2007-12-18 | 2012-01-10 | Asm Genitech Korea Ltd. | Deposition apparatus |
US8801857B2 (en) | 2008-10-31 | 2014-08-12 | Asm America, Inc. | Self-centering susceptor ring assembly |
US20100247804A1 (en) * | 2009-03-24 | 2010-09-30 | Applied Materials, Inc. | Biasable cooling pedestal |
US20120000426A1 (en) * | 2010-06-30 | 2012-01-05 | Primestar Solar, Inc. | Integrated gearbox and rotary feedthrough system for a vacuum chamber structure |
US9719166B2 (en) * | 2011-06-21 | 2017-08-01 | Spts Technologies Limited | Method of supporting a workpiece during physical vapour deposition |
US20130021604A1 (en) * | 2011-07-20 | 2013-01-24 | Richard Sun | Automated Sample Positioning System For Ellipsometers |
US9574268B1 (en) | 2011-10-28 | 2017-02-21 | Asm America, Inc. | Pulsed valve manifold for atomic layer deposition |
US9388492B2 (en) | 2011-12-27 | 2016-07-12 | Asm America, Inc. | Vapor flow control apparatus for atomic layer deposition |
US8970114B2 (en) | 2013-02-01 | 2015-03-03 | Lam Research Corporation | Temperature controlled window of a plasma processing chamber component |
US10662527B2 (en) | 2016-06-01 | 2020-05-26 | Asm Ip Holding B.V. | Manifolds for uniform vapor deposition |
USD920936S1 (en) | 2019-01-17 | 2021-06-01 | Asm Ip Holding B.V. | Higher temperature vented susceptor |
US11961756B2 (en) | 2019-01-17 | 2024-04-16 | Asm Ip Holding B.V. | Vented susceptor |
USD914620S1 (en) | 2019-01-17 | 2021-03-30 | Asm Ip Holding B.V. | Vented susceptor |
US11492701B2 (en) | 2019-03-19 | 2022-11-08 | Asm Ip Holding B.V. | Reactor manifolds |
US11404302B2 (en) | 2019-05-22 | 2022-08-02 | Asm Ip Holding B.V. | Substrate susceptor using edge purging |
KR20210048408A (ko) | 2019-10-22 | 2021-05-03 | 에이에스엠 아이피 홀딩 비.브이. | 반도체 증착 반응기 매니폴드 |
US11764101B2 (en) | 2019-10-24 | 2023-09-19 | ASM IP Holding, B.V. | Susceptor for semiconductor substrate processing |
DE102020109265A1 (de) | 2020-04-02 | 2021-10-07 | Apeva Se | Substrathalter mit einer elastischen Substratauflage |
CN113451183B (zh) * | 2020-06-03 | 2023-03-31 | 重庆康佳光电技术研究院有限公司 | 一种晶圆盒 |
USD1031676S1 (en) | 2020-12-04 | 2024-06-18 | Asm Ip Holding B.V. | Combined susceptor, support, and lift system |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5269578A (en) * | 1975-12-08 | 1977-06-09 | Hitachi Ltd | Wafer suscepter |
JPS5450790A (en) * | 1977-09-30 | 1979-04-20 | Nippon Atom Ind Group Co Ltd | Neutron flux distribution of axial derection in reactor measuring device |
JPS5572029A (en) * | 1978-11-27 | 1980-05-30 | Nec Corp | Tray for semiconductor wafer |
JPS5689743A (en) * | 1979-12-24 | 1981-07-21 | Toshiba Corp | Fixed stand by adsorption under reduced pressure |
US4433835A (en) * | 1981-11-30 | 1984-02-28 | Tencor Instruments | Wafer chuck with wafer cleaning feature |
US4724621A (en) * | 1986-04-17 | 1988-02-16 | Varian Associates, Inc. | Wafer processing chuck using slanted clamping pins |
US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
JPH06103663B2 (ja) * | 1987-01-21 | 1994-12-14 | 東京エレクトロン株式会社 | 処理装置 |
US4955590A (en) * | 1988-12-08 | 1990-09-11 | Tokyo Electron Limited | Plate-like member receiving apparatus |
US5034199A (en) * | 1987-11-13 | 1991-07-23 | Kopin Corporation | Zone melt recrystallization apparatus |
JPH01283391A (ja) * | 1988-05-09 | 1989-11-14 | Tokyo Electron Ltd | エッチング装置 |
KR0155545B1 (ko) * | 1988-06-27 | 1998-12-01 | 고다까 토시오 | 기판의 열처리 장치 |
JPH0279027U (de) * | 1988-12-05 | 1990-06-18 | ||
JP2875341B2 (ja) * | 1990-05-23 | 1999-03-31 | 沖電気工業株式会社 | プラズマcvd装置 |
JPH0451541A (ja) * | 1990-06-19 | 1992-02-20 | Tokyo Electron Ltd | 半導体基板用載置台 |
JP3073432U (ja) * | 2000-05-22 | 2000-11-30 | 和義 松元 | イカ釣り用掛け針 |
-
1991
- 1991-05-15 US US07/701,437 patent/US5199483A/en not_active Expired - Lifetime
-
1992
- 1992-05-14 JP JP12094692A patent/JP2951478B2/ja not_active Expired - Lifetime
- 1992-05-15 KR KR1019920008203A patent/KR100245289B1/ko not_active IP Right Cessation
- 1992-05-15 DE DE69213548T patent/DE69213548T2/de not_active Expired - Fee Related
- 1992-05-15 EP EP92108288A patent/EP0513834B2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100245289B1 (ko) | 2000-02-15 |
JP2951478B2 (ja) | 1999-09-20 |
DE69213548T2 (de) | 1997-01-23 |
EP0513834B2 (de) | 2005-05-04 |
EP0513834A1 (de) | 1992-11-19 |
US5199483A (en) | 1993-04-06 |
KR920022409A (ko) | 1992-12-19 |
JPH05166916A (ja) | 1993-07-02 |
EP0513834B1 (de) | 1996-09-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8366 | Restricted maintained after opposition proceedings | ||
8339 | Ceased/non-payment of the annual fee |