DE69120972D1 - Halbleiterlaser - Google Patents

Halbleiterlaser

Info

Publication number
DE69120972D1
DE69120972D1 DE69120972T DE69120972T DE69120972D1 DE 69120972 D1 DE69120972 D1 DE 69120972D1 DE 69120972 T DE69120972 T DE 69120972T DE 69120972 T DE69120972 T DE 69120972T DE 69120972 D1 DE69120972 D1 DE 69120972D1
Authority
DE
Germany
Prior art keywords
semiconductor laser
laser
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69120972T
Other languages
English (en)
Other versions
DE69120972T2 (de
Inventor
Kimio Shigihara
Yutaka Nagai
Toshitaka Aoyagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE69120972D1 publication Critical patent/DE69120972D1/de
Application granted granted Critical
Publication of DE69120972T2 publication Critical patent/DE69120972T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14—External cavity lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0285—Coatings with a controllable reflectivity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/0622—Controlling the frequency of the radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3418—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers using transitions from higher quantum levels

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Lasers (AREA)
DE69120972T 1990-08-28 1991-04-17 Halbleiterlaser Expired - Fee Related DE69120972T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2228570A JPH04107976A (ja) 1990-08-28 1990-08-28 半導体レーザ装置

Publications (2)

Publication Number Publication Date
DE69120972D1 true DE69120972D1 (de) 1996-08-22
DE69120972T2 DE69120972T2 (de) 1996-11-28

Family

ID=16878434

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69120496T Expired - Fee Related DE69120496T2 (de) 1990-08-28 1991-04-17 Halbleiterlaser
DE69120972T Expired - Fee Related DE69120972T2 (de) 1990-08-28 1991-04-17 Halbleiterlaser

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69120496T Expired - Fee Related DE69120496T2 (de) 1990-08-28 1991-04-17 Halbleiterlaser

Country Status (4)

Country Link
US (2) US5161164A (de)
EP (2) EP0603164B1 (de)
JP (1) JPH04107976A (de)
DE (2) DE69120496T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5416583A (en) * 1993-07-30 1995-05-16 Kearfott Guidance & Navigation Corporation Quantum well bias mirror for phase modulation in a ring laser gyroscope
US5434874A (en) * 1993-10-08 1995-07-18 Hewlett-Packard Company Method and apparatus for optimizing output characteristics of a tunable external cavity laser
US5461637A (en) * 1994-03-16 1995-10-24 Micracor, Inc. High brightness, vertical cavity semiconductor lasers
JP4488559B2 (ja) * 1999-10-06 2010-06-23 Ｏｋｉセミコンダクタ株式会社 半導体レーザ装置
JP2004088049A (ja) * 2002-03-08 2004-03-18 Mitsubishi Electric Corp 光半導体装置
US7662698B2 (en) * 2006-11-07 2010-02-16 Raytheon Company Transistor having field plate
KR100803222B1 (ko) * 2007-01-26 2008-02-14 삼성전자주식회사 스펙클 저감 레이저와 이를 채용한 레이저 디스플레이 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59115583A (ja) * 1982-12-22 1984-07-04 Sanyo Electric Co Ltd 半導体レ−ザ
US4589115A (en) * 1983-09-09 1986-05-13 Xerox Corporation Wavelength tuning of quantum well heterostructure lasers using an external grating
US4680769A (en) * 1984-11-21 1987-07-14 Bell Communications Research, Inc. Broadband laser amplifier structure
EP0194335B1 (de) * 1985-03-14 1991-01-02 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Halbleiterlaser-Vorrichtungen
DE3617084A1 (de) * 1986-05-21 1987-11-26 Messerschmitt Boelkow Blohm Laser mit umschaltbarer emissionswellenlaenge
JPS6332985A (ja) * 1986-07-25 1988-02-12 Mitsubishi Electric Corp 半導体レ−ザ
JPS6354794A (ja) * 1986-07-25 1988-03-09 Mitsubishi Electric Corp 半導体レ−ザ
DE3751535T2 (de) * 1986-07-25 1996-02-22 Mitsubishi Electric Corp Halbleiterlaser.
JPS6332986A (ja) * 1986-07-25 1988-02-12 Mitsubishi Electric Corp 集積化半導体レ−ザ
FI82326C (fi) * 1986-12-05 1991-02-11 Lasermatic Oy Laserhuvud.
JPS63312688A (ja) * 1987-06-15 1988-12-21 Mitsubishi Electric Corp 半導体レ−ザ及びその使用方法
JPH01208884A (ja) * 1988-02-17 1989-08-22 Nec Corp 波長可変単一軸モードレーザダイオード
US4993036A (en) * 1988-09-28 1991-02-12 Canon Kabushiki Kaisha Semiconductor laser array including lasers with reflecting means having different wavelength selection properties
US5056098A (en) * 1990-07-05 1991-10-08 At&T Bell Laboratories Vertical cavity laser with mirror having controllable reflectivity

Also Published As

Publication number Publication date
EP0603164A2 (de) 1994-06-22
US5161164A (en) 1992-11-03
EP0603164B1 (de) 1996-07-17
EP0482733B1 (de) 1996-06-26
EP0603164A3 (de) 1994-08-03
JPH04107976A (ja) 1992-04-09
DE69120496D1 (de) 1996-08-01
US5177749A (en) 1993-01-05
EP0482733A1 (de) 1992-04-29
DE69120496T2 (de) 1997-02-06
DE69120972T2 (de) 1996-11-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee