DE69101469D1 - Halbleiterlaser mit SiGe-Einkristallsubstrat. - Google Patents
Halbleiterlaser mit SiGe-Einkristallsubstrat.Info
- Publication number
- DE69101469D1 DE69101469D1 DE91305083T DE69101469T DE69101469D1 DE 69101469 D1 DE69101469 D1 DE 69101469D1 DE 91305083 T DE91305083 T DE 91305083T DE 69101469 T DE69101469 T DE 69101469T DE 69101469 D1 DE69101469 D1 DE 69101469D1
- Authority
- DE
- Germany
- Prior art keywords
- single crystal
- semiconductor laser
- crystal substrate
- sige single
- sige
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32325—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm red laser based on InGaP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/021—Silicon based substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2148288A JPH07120838B2 (ja) | 1990-06-05 | 1990-06-05 | 半導体発光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69101469D1 true DE69101469D1 (de) | 1994-04-28 |
DE69101469T2 DE69101469T2 (de) | 1994-07-21 |
Family
ID=15449421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69101469T Expired - Fee Related DE69101469T2 (de) | 1990-06-05 | 1991-06-05 | Halbleiterlaser mit SiGe-Einkristallsubstrat. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5164950A (de) |
EP (1) | EP0460939B1 (de) |
JP (1) | JPH07120838B2 (de) |
DE (1) | DE69101469T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4310571A1 (de) * | 1993-03-26 | 1994-09-29 | Daimler Benz Ag | Leuchtdiode |
DE4310569A1 (de) * | 1993-03-26 | 1994-09-29 | Daimler Benz Ag | Laserdiode |
JPH07231142A (ja) * | 1994-02-18 | 1995-08-29 | Mitsubishi Electric Corp | 半導体発光素子 |
JP2001015798A (ja) * | 1999-06-29 | 2001-01-19 | Toshiba Corp | 半導体発光素子 |
US8837547B2 (en) * | 2011-03-17 | 2014-09-16 | Finisar Corporation | Lasers with InGaAs quantum wells with InGaP barrier layers with reduced decomposition |
CN110165555A (zh) * | 2019-04-28 | 2019-08-23 | 西安理工大学 | 一种基于GexSi1-x可变晶格常数基体的红光半导体激光器 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5821320A (ja) * | 1981-07-29 | 1983-02-08 | Hitachi Ltd | 半導体装置とその製法 |
JPS58191421A (ja) * | 1982-05-04 | 1983-11-08 | Nec Corp | 化合物半導体成長用基板と化合物半導体の製造方法 |
JPS5986281A (ja) * | 1982-11-09 | 1984-05-18 | Agency Of Ind Science & Technol | 可視光半導体レ−ザ |
EP0259026B1 (de) * | 1986-08-08 | 1994-04-27 | Kabushiki Kaisha Toshiba | Doppelheterostruktur-Halbleiterlaser mit streifenförmigem Mesa-Wellenleiter |
JPS6381990A (ja) * | 1986-09-26 | 1988-04-12 | Tokuzo Sukegawa | 発光素子用材料 |
JPS63197391A (ja) * | 1987-02-12 | 1988-08-16 | Hitachi Ltd | 半導体レ−ザ装置 |
FR2620863B1 (fr) * | 1987-09-22 | 1989-12-01 | Thomson Csf | Dispositif optoelectronique a base de composes iii-v sur substrat silicium |
JPH0318273A (ja) * | 1989-06-15 | 1991-01-25 | Stanley Electric Co Ltd | スイッチング電源装置 |
-
1990
- 1990-06-05 JP JP2148288A patent/JPH07120838B2/ja not_active Expired - Fee Related
-
1991
- 1991-06-04 US US07/709,841 patent/US5164950A/en not_active Expired - Lifetime
- 1991-06-05 DE DE69101469T patent/DE69101469T2/de not_active Expired - Fee Related
- 1991-06-05 EP EP91305083A patent/EP0460939B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5164950A (en) | 1992-11-17 |
JPH07120838B2 (ja) | 1995-12-20 |
EP0460939A2 (de) | 1991-12-11 |
JPH0439988A (ja) | 1992-02-10 |
EP0460939B1 (de) | 1994-03-23 |
DE69101469T2 (de) | 1994-07-21 |
EP0460939A3 (en) | 1992-07-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE68915673D1 (de) | Halbleiterlaser-Vorrichtung. | |
DE69104808D1 (de) | Halbleiterlasersystem mit nichtlinearem Kristallresonator. | |
DE68918884D1 (de) | Halbleiterlaser-Vorrichtung. | |
DE69104429D1 (de) | Optisches Halbleiterbauelement. | |
DE3852960D1 (de) | Monokristallines Dünnschichtsubstrat. | |
DE68908646D1 (de) | Halbleiterlaser. | |
DE69009448D1 (de) | Halbleiterlaseranordnung. | |
DE68914906D1 (de) | Geschwindigkeitsmesser mit Halbleiterlaser. | |
DE69120185D1 (de) | Halbleiterlaser | |
DE68912512D1 (de) | Halbleiterlaser-Vorrichtung. | |
DE69102240D1 (de) | Abstimmbarer Halbleiterlaser. | |
DE68912852D1 (de) | Halbleiterlaser. | |
DE68910492D1 (de) | Halbleiterlaservorrichtung. | |
DE3883188D1 (de) | Duennfilm-halbleiteranordung. | |
DE69008953D1 (de) | Schwärzbares Substrat. | |
DE69018732D1 (de) | Halbleiterlaser. | |
DE69110605D1 (de) | Halbleiterlaser mit verteilter Rückkoppelung. | |
DE69013631D1 (de) | Einkristallsilizium. | |
FI890845A0 (fi) | Kalorifattiga fettsubstrat. | |
DE69009266D1 (de) | Halbleiterlaser-Vorrichtung. | |
DE69005132D1 (de) | Halbleiterlaser. | |
DE68918799D1 (de) | Verbindungshalbleitersubstrat. | |
DE68923778D1 (de) | Halbleitermodul. | |
DE69115555D1 (de) | Halbleiterlaser | |
FI911127A (fi) | Anordning foer framstaellning av enskilda silikonkristaller. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |