DE68928010D1 - Reinigung und Trocknung von elektronischen Bauteilen - Google Patents

Reinigung und Trocknung von elektronischen Bauteilen

Info

Publication number
DE68928010D1
DE68928010D1 DE68928010T DE68928010T DE68928010D1 DE 68928010 D1 DE68928010 D1 DE 68928010D1 DE 68928010 T DE68928010 T DE 68928010T DE 68928010 T DE68928010 T DE 68928010T DE 68928010 D1 DE68928010 D1 DE 68928010D1
Authority
DE
Germany
Prior art keywords
cleaning
drying
electronic components
organic solvent
fluorinated compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68928010T
Other languages
English (en)
Other versions
DE68928010T2 (de
Inventor
David Stanley Lloyd Slinn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhone Poulenc Chimie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB888816343A external-priority patent/GB8816343D0/en
Priority claimed from GB898902280A external-priority patent/GB8902280D0/en
Application filed by Rhone Poulenc Chimie SA filed Critical Rhone Poulenc Chimie SA
Application granted granted Critical
Publication of DE68928010D1 publication Critical patent/DE68928010D1/de
Publication of DE68928010T2 publication Critical patent/DE68928010T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/012—Flame-retardant; Preventing of inflammation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08—Treatments involving gases
    • H05K2203/088—Using a vapour or mist, e.g. cleaning using water vapor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1518—Vertically held PCB
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
DE68928010T 1988-07-08 1989-07-06 Reinigung und Trocknung von elektronischen Bauteilen Expired - Fee Related DE68928010T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB888816343A GB8816343D0 (en) 1988-07-08 1988-07-08 Cleaning & drying of electronic assemblies
GB898902280A GB8902280D0 (en) 1989-02-02 1989-02-02 Cleaning and drying of electronic assemblies

Publications (2)

Publication Number Publication Date
DE68928010D1 true DE68928010D1 (de) 1997-06-05
DE68928010T2 DE68928010T2 (de) 1997-11-20

Family

ID=26294140

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68928010T Expired - Fee Related DE68928010T2 (de) 1988-07-08 1989-07-06 Reinigung und Trocknung von elektronischen Bauteilen

Country Status (8)

Country Link
US (1) US5055138A (de)
EP (1) EP0350316B1 (de)
JP (1) JP2768743B2 (de)
AT (1) ATE152487T1 (de)
DE (1) DE68928010T2 (de)
ES (1) ES2103705T3 (de)
GB (1) GB2220951B (de)
GR (1) GR3023937T3 (de)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02261583A (ja) * 1989-03-31 1990-10-24 Yoshihide Shibano 超音波洗浄、バリ取り装置
US5240018A (en) * 1989-08-30 1993-08-31 Vitronics Corporation Apparatus for cleaning mechanical devices using terpene compounds
MY107434A (en) * 1989-10-26 1995-12-30 Momentive Performance Mat Jp Cleaning compositions.
US5142873A (en) * 1990-02-15 1992-09-01 E. I. Du Pont De Nemours And Company Vapor control system for vapor degreasing/defluxing equipment
US5503681A (en) * 1990-03-16 1996-04-02 Kabushiki Kaisha Toshiba Method of cleaning an object
KR980700133A (ko) * 1990-03-16 1998-03-30 나시무로 다이조 세정방법 및 세정장치(Cleaning Method and Cleaning Apparatus)
DE4013369A1 (de) * 1990-04-26 1991-10-31 Hoechst Ag Neues azeotropes oder azeotropartiges gemisch aus 2,2,2-trifluorethyl-1,1,2,2-tetrafluorethylether und ethanol sowie dessen verwendung
GB9009504D0 (en) * 1990-04-27 1990-06-20 Isc Chemicals Ltd Reduced flammability mixture based on isopropanol
JPH0490878A (ja) * 1990-08-03 1992-03-24 Japan Field Kk 可燃性溶剤を用いた被洗浄物の洗浄方法および装置
JPH0632795B2 (ja) * 1990-08-10 1994-05-02 ジャパン・フィールド株式会社 可燃性溶剤を用いた被洗浄物の洗浄方法および装置
JP3105271B2 (ja) * 1991-01-21 2000-10-30 ジャパン・フィールド株式会社 被洗浄物の濯ぎ洗浄方法及びその装置
JPH0632797B2 (ja) * 1990-08-30 1994-05-02 ジャパン・フィールド株式会社 アルコールを用いた洗浄方法および装置
US5593507A (en) * 1990-08-22 1997-01-14 Kabushiki Kaisha Toshiba Cleaning method and cleaning apparatus
CA2066753A1 (en) * 1990-08-22 1992-02-23 Minoru Inada Cleaning method and cleaning apparatus
US5082503A (en) * 1990-10-22 1992-01-21 Baxter International Inc. Method for removing contaminants from the surfaces of articles
JPH04161280A (ja) * 1990-10-23 1992-06-04 Sumitomo 3M Ltd 物品の洗浄乾燥方法
JPH04173899A (ja) * 1990-11-05 1992-06-22 Japan Field Kk 被洗浄物の濯ぎ洗浄方法
JPH04270799A (ja) * 1991-02-25 1992-09-28 Arakawa Chem Ind Co Ltd 非ハロゲン系の工業用脱脂洗浄剤及び該洗浄剤を用いてなる物品の洗浄処理方法
US5089152A (en) * 1991-04-19 1992-02-18 Minnesota Mining And Manufacturing Company Water displacement composition
EP0588978B1 (de) * 1991-06-14 1999-01-13 Petroferm Inc. Zusammensetzung und verfahren zum entfernen von rosin-lötflussmittel mit terpen und kohlenwasserstoffen
EP0519431B1 (de) * 1991-06-21 1997-04-16 SOLVAY (Société Anonyme) Azeotropartiges Gemisch aus Methanol und 1H-Perfluorhexan
EP0519432A3 (en) * 1991-06-21 1993-05-05 Hoechst Aktiengesellschaft Azeotrope-like mixture of 2-propanol and 1h-perfluorohexane
US5182042A (en) * 1991-10-21 1993-01-26 Allied-Signal Inc. Azeotrope-like compositions of 1,1,1-trifluorohexane and perfluoromethylcyclohexane
JPH05123657A (ja) * 1991-11-05 1993-05-21 Japan Field Kk 被洗浄物の洗浄方法
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system
MX9206771A (es) * 1991-12-02 1993-06-01 Allied Signal Inc Mejoras en sistema de limpieza por solventes multiples
US5259983A (en) * 1992-04-27 1993-11-09 Allied Signal Inc. Azeotrope-like compositions of 1-H-perfluorohexane and trifluoroethanol or n-propanol
US5304322A (en) * 1992-05-15 1994-04-19 The Boeing Company Cleaning solvent for aircraft hydraulic fluid
FR2701872B1 (fr) * 1993-02-23 1995-04-07 Air Liquide Procédé de traitement d'objets à l'aide d'un liquide volatil inflammable.
US5401429A (en) * 1993-04-01 1995-03-28 Minnesota Mining And Manufacturing Company Azeotropic compositions containing perfluorinated cycloaminoether
US5494601A (en) * 1993-04-01 1996-02-27 Minnesota Mining And Manufacturing Company Azeotropic compositions
US5339843A (en) * 1993-04-16 1994-08-23 Martin Marietta Corporation Controlled agitation cleaning system
EP0699746A4 (de) * 1993-05-17 1996-09-11 Toshiba Kk Reinigungsmittel, reinigungsverfahren und reinigungsvorichtung
EP0701634A1 (de) * 1993-06-01 1996-03-20 AlliedSignal Inc. Mehrloesungsmittel-reinigungssystem
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
WO1995032274A1 (fr) * 1994-05-19 1995-11-30 Ag Technology Co., Ltd. Composition solvante mixte
US5534078A (en) * 1994-01-27 1996-07-09 Breunsbach; Rex Method for cleaning electronic assemblies
US5658962A (en) 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5476974A (en) * 1994-05-20 1995-12-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5660642A (en) * 1995-05-26 1997-08-26 The Regents Of The University Of California Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor
US5715612A (en) * 1995-08-17 1998-02-10 Schwenkler; Robert S. Method for precision drying surfaces
US5752532A (en) * 1995-08-17 1998-05-19 Schwenkler; Robert S. Method for the precision cleaning and drying surfaces
US5616549A (en) * 1995-12-29 1997-04-01 Clark; Lawrence A. Molecular level cleaning of contaminates from parts utilizing an envronmentally safe solvent
US6869487B1 (en) 1997-05-09 2005-03-22 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
US20020157686A1 (en) * 1997-05-09 2002-10-31 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
US7264680B2 (en) * 1997-05-09 2007-09-04 Semitool, Inc. Process and apparatus for treating a workpiece using ozone
US7378355B2 (en) * 1997-05-09 2008-05-27 Semitool, Inc. System and methods for polishing a wafer
US6240933B1 (en) * 1997-05-09 2001-06-05 Semitool, Inc. Methods for cleaning semiconductor surfaces
US20050034745A1 (en) * 1997-05-09 2005-02-17 Semitool, Inc. Processing a workpiece with ozone and a halogenated additive
US7163588B2 (en) * 1997-05-09 2007-01-16 Semitool, Inc. Processing a workpiece using water, a base, and ozone
US7404863B2 (en) * 1997-05-09 2008-07-29 Semitool, Inc. Methods of thinning a silicon wafer using HF and ozone
US20050215063A1 (en) * 1997-05-09 2005-09-29 Bergman Eric J System and methods for etching a silicon wafer using HF and ozone
US6701941B1 (en) 1997-05-09 2004-03-09 Semitool, Inc. Method for treating the surface of a workpiece
US7416611B2 (en) * 1997-05-09 2008-08-26 Semitool, Inc. Process and apparatus for treating a workpiece with gases
ATE259681T1 (de) * 1998-04-16 2004-03-15 Semitool Inc Verfahren und gerät zur behandlung eines werkstückes, wie ein halbleiterwafer
GB2346953A (en) * 1999-02-16 2000-08-23 Stephen Rodger Henly Removing water from articles
TWI250206B (en) * 2000-06-01 2006-03-01 Asahi Kasei Corp Cleaning agent, cleaning method and cleaning apparatus
WO2001099156A1 (en) 2000-06-16 2001-12-27 Applied Materials, Inc. Configurable single substrate wet-dry integrated cluster cleaner
US6692579B2 (en) 2001-01-19 2004-02-17 Chartered Semiconductor Manufacturing Ltd. Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence
US6899111B2 (en) * 2001-06-15 2005-05-31 Applied Materials, Inc. Configurable single substrate wet-dry integrated cluster cleaner
US6398875B1 (en) 2001-06-27 2002-06-04 International Business Machines Corporation Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
US20040031167A1 (en) 2002-06-13 2004-02-19 Stein Nathan D. Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife
AU2003300937B2 (en) * 2002-12-17 2008-05-29 Honeywell International, Inc. Compositions and methods for cleaning contaminated articles
JP5349965B2 (ja) * 2005-11-01 2013-11-20 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 不飽和フッ素化炭化水素類を含む溶媒組成物
US20070098646A1 (en) 2005-11-01 2007-05-03 Nappa Mario J Aerosol propellants comprising unsaturated fluorocarbons
KR20080114758A (ko) * 2006-02-28 2008-12-31 이 아이 듀폰 디 네모아 앤드 캄파니 세정 분야를 위한 플루오르화 화합물을 포함하는 공비 조성물
MX2009011471A (es) 2007-04-27 2009-11-10 Du Pont Composiciones azeotropicas y semejantes a un azeotropo de z-1,1,1,4,4,4-hexafluoro-2-buteno.
EP2152833B1 (de) 2007-06-12 2014-07-23 E. I. Du Pont de Nemours and Company Azeotrope und azeotropenähnliche zusammensetzungen aus e-1,1,1,4,4,4-hexafluor-2-buten
CN101815773B (zh) 2007-09-06 2014-05-07 纳幕尔杜邦公司 E-1,1,1,4,4,5,5,5-八氟-2-戊烯的共沸和类共沸组合物
MX2010005757A (es) 2007-11-29 2010-06-09 Du Pont Composiciones y uso de la composicion formadora de espuma de cis-1,1,1,4,4,4-hexafluoro-2-buteno en la preparacion de espumas a base de poliisocianato.
ES2559315T3 (es) 2007-12-19 2016-02-11 E. I. Du Pont De Nemours And Company Composiciones formadoras de espuma que contienen una mezcla azeotrópica o similar a un azeótropo que contiene z-1,1,1,4,4,4-hexafluoro-2-buteno y formiato de metilo y sus usos en la preparación de espumas basadas en poliisocianato
JP5238278B2 (ja) * 2008-02-13 2013-07-17 光治郎 大川 ２液式洗浄装置
JP5077031B2 (ja) * 2008-04-10 2012-11-21 東ソー株式会社 洗浄剤の回収方法
US8821749B2 (en) 2010-04-26 2014-09-02 E I Du Pont De Nemours And Company Azeotrope-like compositions of E-1,1,1,4,4,4-hexafluoro-2-butene and 1-chloro-3,3,3-trifluoropropene
CN102709157B (zh) * 2012-05-30 2014-07-09 常州佳讯光电产业发展有限公司 一种二极管清洗工艺及其清洗设备
US20140048103A1 (en) * 2012-08-20 2014-02-20 Kyle J. Doyel Method and apparatus for continuous separation of cleaning solvent from rinse fluid in a dual-solvent vapor degreasing system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB456821A (en) * 1935-05-16 1936-11-16 Norman Roy Hood Improvements in or relating to apparatus for degreasing by means of volatile solvents
CH485035A (de) * 1967-04-14 1970-01-31 Elga S A Pour La Galvanoplasti Reinigungsgerät, insbesondere für Werkstücke
FR2229436B1 (de) * 1973-05-16 1976-05-28 Rhone Progil
US3923541A (en) * 1973-06-20 1975-12-02 Litton Systems Inc Vapor degreasing system
US4186032A (en) * 1976-09-23 1980-01-29 Rca Corp. Method for cleaning and drying semiconductors
US4414067A (en) * 1981-12-24 1983-11-08 Mccord James W Vapor condensate return means in a vapor generating and recovery apparatus
US4486239A (en) * 1983-04-22 1984-12-04 California Institute Of Technology Vapor degreasing system
JPS60108162A (ja) * 1983-11-16 1985-06-13 Hitachi Ltd 蒸気槽
DE3666962D1 (en) * 1985-03-11 1989-12-21 Allied Signal Inc Apparatus and method for cleaning and drying surfaces of non-absorbent articles
JPS63229185A (ja) * 1987-03-18 1988-09-26 三井・デユポンフロロケミカル株式会社 洗浄方法及び洗浄装置

Also Published As

Publication number Publication date
GR3023937T3 (en) 1997-09-30
JP2768743B2 (ja) 1998-06-25
GB2220951A (en) 1990-01-24
GB8915464D0 (en) 1989-08-23
EP0350316B1 (de) 1997-05-02
DE68928010T2 (de) 1997-11-20
EP0350316A1 (de) 1990-01-10
US5055138A (en) 1991-10-08
JPH02191581A (ja) 1990-07-27
GB2220951B (en) 1992-09-16
ES2103705T3 (es) 1997-10-01
ATE152487T1 (de) 1997-05-15

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