ATE152487T1 - Reinigung und trocknung von elektronischen bauteilen - Google Patents
Reinigung und trocknung von elektronischen bauteilenInfo
- Publication number
- ATE152487T1 ATE152487T1 AT89306894T AT89306894T ATE152487T1 AT E152487 T1 ATE152487 T1 AT E152487T1 AT 89306894 T AT89306894 T AT 89306894T AT 89306894 T AT89306894 T AT 89306894T AT E152487 T1 ATE152487 T1 AT E152487T1
- Authority
- AT
- Austria
- Prior art keywords
- cleaning
- electronic components
- organic solvent
- drying electronic
- fluorinated compound
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
- 238000001035 drying Methods 0.000 title 1
- 239000003960 organic solvent Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5018—Halogenated solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/04—Apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/012—Flame-retardant; Preventing of inflammation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/08—Treatments involving gases
- H05K2203/088—Using a vapour or mist, e.g. cleaning using water vapor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1518—Vertically held PCB
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Emergency Medicine (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Extraction Or Liquid Replacement (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB888816343A GB8816343D0 (en) | 1988-07-08 | 1988-07-08 | Cleaning & drying of electronic assemblies |
GB898902280A GB8902280D0 (en) | 1989-02-02 | 1989-02-02 | Cleaning and drying of electronic assemblies |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE152487T1 true ATE152487T1 (de) | 1997-05-15 |
Family
ID=26294140
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT89306894T ATE152487T1 (de) | 1988-07-08 | 1989-07-06 | Reinigung und trocknung von elektronischen bauteilen |
Country Status (8)
Country | Link |
---|---|
US (1) | US5055138A (de) |
EP (1) | EP0350316B1 (de) |
JP (1) | JP2768743B2 (de) |
AT (1) | ATE152487T1 (de) |
DE (1) | DE68928010T2 (de) |
ES (1) | ES2103705T3 (de) |
GB (1) | GB2220951B (de) |
GR (1) | GR3023937T3 (de) |
Families Citing this family (76)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02261583A (ja) * | 1989-03-31 | 1990-10-24 | Yoshihide Shibano | 超音波洗浄、バリ取り装置 |
US5240018A (en) * | 1989-08-30 | 1993-08-31 | Vitronics Corporation | Apparatus for cleaning mechanical devices using terpene compounds |
MY107434A (en) * | 1989-10-26 | 1995-12-30 | Momentive Performance Mat Jp | Cleaning compositions. |
US5142873A (en) * | 1990-02-15 | 1992-09-01 | E. I. Du Pont De Nemours And Company | Vapor control system for vapor degreasing/defluxing equipment |
US5503681A (en) * | 1990-03-16 | 1996-04-02 | Kabushiki Kaisha Toshiba | Method of cleaning an object |
DE69131853T2 (de) * | 1990-03-16 | 2000-06-29 | Japan Field Co | Reinigungsverfahren |
DE4013369A1 (de) * | 1990-04-26 | 1991-10-31 | Hoechst Ag | Neues azeotropes oder azeotropartiges gemisch aus 2,2,2-trifluorethyl-1,1,2,2-tetrafluorethylether und ethanol sowie dessen verwendung |
GB9009504D0 (en) * | 1990-04-27 | 1990-06-20 | Isc Chemicals Ltd | Reduced flammability mixture based on isopropanol |
JPH0490878A (ja) * | 1990-08-03 | 1992-03-24 | Japan Field Kk | 可燃性溶剤を用いた被洗浄物の洗浄方法および装置 |
JPH0632795B2 (ja) * | 1990-08-10 | 1994-05-02 | ジャパン・フィールド株式会社 | 可燃性溶剤を用いた被洗浄物の洗浄方法および装置 |
JPH0632797B2 (ja) * | 1990-08-30 | 1994-05-02 | ジャパン・フィールド株式会社 | アルコールを用いた洗浄方法および装置 |
US5593507A (en) * | 1990-08-22 | 1997-01-14 | Kabushiki Kaisha Toshiba | Cleaning method and cleaning apparatus |
JP3105271B2 (ja) * | 1991-01-21 | 2000-10-30 | ジャパン・フィールド株式会社 | 被洗浄物の濯ぎ洗浄方法及びその装置 |
AU654297B2 (en) * | 1990-08-22 | 1994-11-03 | Japan Field Company, Ltd. | Method and device for cleaning |
US5082503A (en) * | 1990-10-22 | 1992-01-21 | Baxter International Inc. | Method for removing contaminants from the surfaces of articles |
JPH04161280A (ja) * | 1990-10-23 | 1992-06-04 | Sumitomo 3M Ltd | 物品の洗浄乾燥方法 |
JPH04173899A (ja) * | 1990-11-05 | 1992-06-22 | Japan Field Kk | 被洗浄物の濯ぎ洗浄方法 |
JPH04270799A (ja) * | 1991-02-25 | 1992-09-28 | Arakawa Chem Ind Co Ltd | 非ハロゲン系の工業用脱脂洗浄剤及び該洗浄剤を用いてなる物品の洗浄処理方法 |
US5089152A (en) * | 1991-04-19 | 1992-02-18 | Minnesota Mining And Manufacturing Company | Water displacement composition |
ES2061427T3 (es) * | 1991-06-14 | 1999-06-16 | Petroferm Inc | Compuesto y procedimiento para eliminar el fundente de colofonia de la soldadura con terpenos e hidrocarburos. |
EP0519432A3 (en) * | 1991-06-21 | 1993-05-05 | Hoechst Aktiengesellschaft | Azeotrope-like mixture of 2-propanol and 1h-perfluorohexane |
DE59208347D1 (de) * | 1991-06-21 | 1997-05-22 | Solvay | Azeotropartiges Gemisch aus Methanol und 1H-Perfluorhexan |
US5182042A (en) * | 1991-10-21 | 1993-01-26 | Allied-Signal Inc. | Azeotrope-like compositions of 1,1,1-trifluorohexane and perfluoromethylcyclohexane |
JPH05123657A (ja) * | 1991-11-05 | 1993-05-21 | Japan Field Kk | 被洗浄物の洗浄方法 |
US6355113B1 (en) | 1991-12-02 | 2002-03-12 | 3M Innovative Properties Company | Multiple solvent cleaning system |
MX9206771A (es) * | 1991-12-02 | 1993-06-01 | Allied Signal Inc | Mejoras en sistema de limpieza por solventes multiples |
US5259983A (en) * | 1992-04-27 | 1993-11-09 | Allied Signal Inc. | Azeotrope-like compositions of 1-H-perfluorohexane and trifluoroethanol or n-propanol |
US5304322A (en) * | 1992-05-15 | 1994-04-19 | The Boeing Company | Cleaning solvent for aircraft hydraulic fluid |
FR2701872B1 (fr) * | 1993-02-23 | 1995-04-07 | Air Liquide | Procédé de traitement d'objets à l'aide d'un liquide volatil inflammable. |
US5401429A (en) * | 1993-04-01 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Azeotropic compositions containing perfluorinated cycloaminoether |
US5494601A (en) * | 1993-04-01 | 1996-02-27 | Minnesota Mining And Manufacturing Company | Azeotropic compositions |
US5339843A (en) * | 1993-04-16 | 1994-08-23 | Martin Marietta Corporation | Controlled agitation cleaning system |
EP0699746A4 (de) * | 1993-05-17 | 1996-09-11 | Toshiba Kk | Reinigungsmittel, reinigungsverfahren und reinigungsvorichtung |
AU693453B2 (en) * | 1993-06-01 | 1998-07-02 | Minnesota Mining And Manufacturing Company | Multiple solvent cleaning system |
US6187729B1 (en) * | 1993-12-14 | 2001-02-13 | Petroferm Inc. | Cleaning composition comprising solvating agent and rinsing agent |
US5534078A (en) * | 1994-01-27 | 1996-07-09 | Breunsbach; Rex | Method for cleaning electronic assemblies |
US5827454A (en) * | 1994-05-19 | 1998-10-27 | Ag Technology Co., Ltd. | Mixed solvent composition |
US5476974A (en) * | 1994-05-20 | 1995-12-19 | Minnesota Mining And Manufacturing Company | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
US5658962A (en) | 1994-05-20 | 1997-08-19 | Minnesota Mining And Manufacturing Company | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
US5660642A (en) * | 1995-05-26 | 1997-08-26 | The Regents Of The University Of California | Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor |
US5752532A (en) * | 1995-08-17 | 1998-05-19 | Schwenkler; Robert S. | Method for the precision cleaning and drying surfaces |
US5715612A (en) * | 1995-08-17 | 1998-02-10 | Schwenkler; Robert S. | Method for precision drying surfaces |
US5616549A (en) | 1995-12-29 | 1997-04-01 | Clark; Lawrence A. | Molecular level cleaning of contaminates from parts utilizing an envronmentally safe solvent |
US7404863B2 (en) * | 1997-05-09 | 2008-07-29 | Semitool, Inc. | Methods of thinning a silicon wafer using HF and ozone |
US6869487B1 (en) | 1997-05-09 | 2005-03-22 | Semitool, Inc. | Process and apparatus for treating a workpiece such as a semiconductor wafer |
US20050034745A1 (en) * | 1997-05-09 | 2005-02-17 | Semitool, Inc. | Processing a workpiece with ozone and a halogenated additive |
US6240933B1 (en) | 1997-05-09 | 2001-06-05 | Semitool, Inc. | Methods for cleaning semiconductor surfaces |
US20020157686A1 (en) * | 1997-05-09 | 2002-10-31 | Semitool, Inc. | Process and apparatus for treating a workpiece such as a semiconductor wafer |
US6701941B1 (en) | 1997-05-09 | 2004-03-09 | Semitool, Inc. | Method for treating the surface of a workpiece |
US20050215063A1 (en) * | 1997-05-09 | 2005-09-29 | Bergman Eric J | System and methods for etching a silicon wafer using HF and ozone |
US7264680B2 (en) * | 1997-05-09 | 2007-09-04 | Semitool, Inc. | Process and apparatus for treating a workpiece using ozone |
US7378355B2 (en) * | 1997-05-09 | 2008-05-27 | Semitool, Inc. | System and methods for polishing a wafer |
US7163588B2 (en) * | 1997-05-09 | 2007-01-16 | Semitool, Inc. | Processing a workpiece using water, a base, and ozone |
US7416611B2 (en) * | 1997-05-09 | 2008-08-26 | Semitool, Inc. | Process and apparatus for treating a workpiece with gases |
JP3515521B2 (ja) * | 1998-04-16 | 2004-04-05 | セミトゥール・インコーポレイテッド | 半導体ウェーハなどのワークピースの処理方法および処理装置 |
GB2346953A (en) * | 1999-02-16 | 2000-08-23 | Stephen Rodger Henly | Removing water from articles |
TWI250206B (en) * | 2000-06-01 | 2006-03-01 | Asahi Kasei Corp | Cleaning agent, cleaning method and cleaning apparatus |
WO2001099156A1 (en) | 2000-06-16 | 2001-12-27 | Applied Materials, Inc. | Configurable single substrate wet-dry integrated cluster cleaner |
US6692579B2 (en) | 2001-01-19 | 2004-02-17 | Chartered Semiconductor Manufacturing Ltd. | Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence |
US6899111B2 (en) * | 2001-06-15 | 2005-05-31 | Applied Materials, Inc. | Configurable single substrate wet-dry integrated cluster cleaner |
US6398875B1 (en) | 2001-06-27 | 2002-06-04 | International Business Machines Corporation | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide |
US20040031167A1 (en) | 2002-06-13 | 2004-02-19 | Stein Nathan D. | Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife |
JP2006521460A (ja) * | 2002-12-17 | 2006-09-21 | ハネウェル・インターナショナル・インコーポレーテッド | 汚染された物品の洗浄ための組成物及び方法 |
MY151990A (en) | 2005-11-01 | 2014-07-31 | Du Pont | Solvent compositions comprising unsaturated fluorinated hydrocarbons |
US20070098646A1 (en) | 2005-11-01 | 2007-05-03 | Nappa Mario J | Aerosol propellants comprising unsaturated fluorocarbons |
US7498296B2 (en) | 2006-02-28 | 2009-03-03 | E. I. Dupont De Nemours And Company | Azeotropic compositions comprising fluorinated compounds for cleaning applications |
WO2008134061A2 (en) | 2007-04-27 | 2008-11-06 | E. I. Du Pont De Nemours And Company | Azeotropic and azeotrope-like compositions of z-1,1,1,4,4,4-hexafluoro-2-butene |
BR122018074413B1 (pt) | 2007-06-12 | 2019-03-19 | E. I. Du Pont De Nemours And Company | Composição e processo para produzir refrigeração |
BRPI0815462A2 (pt) | 2007-09-06 | 2015-02-18 | Du Pont | "composição, processos de preparação de uma espuma termoplástica ou termorretrátil, de produção de refrigeração, de fabricação de um produto de aerossol, de extinção ou supressão de incêndios e processos" |
WO2009073487A1 (en) | 2007-11-29 | 2009-06-11 | E. I. Du Pont De Nemours And Company | Compositions and use of cis-1,1,1,4,4,4-hexafluoro-2-butene foam-forming composition in the preparation of polyisocyanate-based foams |
CA2941024C (en) | 2007-12-19 | 2018-12-04 | E. I. Du Pont De Nemours And Company | Foam-forming compositions containing azeotropic or azeotrope-like mixtures containing z-1,1,1,4,4,4-hexafluoro-2-butene and their uses in the preparation of polyisocyanate-based foams |
JP5238278B2 (ja) * | 2008-02-13 | 2013-07-17 | 光治郎 大川 | 2液式洗浄装置 |
JP5077031B2 (ja) * | 2008-04-10 | 2012-11-21 | 東ソー株式会社 | 洗浄剤の回収方法 |
US8821749B2 (en) | 2010-04-26 | 2014-09-02 | E I Du Pont De Nemours And Company | Azeotrope-like compositions of E-1,1,1,4,4,4-hexafluoro-2-butene and 1-chloro-3,3,3-trifluoropropene |
CN102709157B (zh) * | 2012-05-30 | 2014-07-09 | 常州佳讯光电产业发展有限公司 | 一种二极管清洗工艺及其清洗设备 |
US20140048103A1 (en) * | 2012-08-20 | 2014-02-20 | Kyle J. Doyel | Method and apparatus for continuous separation of cleaning solvent from rinse fluid in a dual-solvent vapor degreasing system |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB456821A (en) * | 1935-05-16 | 1936-11-16 | Norman Roy Hood | Improvements in or relating to apparatus for degreasing by means of volatile solvents |
CH485035A (de) * | 1967-04-14 | 1970-01-31 | Elga S A Pour La Galvanoplasti | Reinigungsgerät, insbesondere für Werkstücke |
FR2229436B1 (de) * | 1973-05-16 | 1976-05-28 | Rhone Progil | |
US3923541A (en) * | 1973-06-20 | 1975-12-02 | Litton Systems Inc | Vapor degreasing system |
US4186032A (en) * | 1976-09-23 | 1980-01-29 | Rca Corp. | Method for cleaning and drying semiconductors |
US4414067A (en) * | 1981-12-24 | 1983-11-08 | Mccord James W | Vapor condensate return means in a vapor generating and recovery apparatus |
US4486239A (en) * | 1983-04-22 | 1984-12-04 | California Institute Of Technology | Vapor degreasing system |
JPS60108162A (ja) * | 1983-11-16 | 1985-06-13 | Hitachi Ltd | 蒸気槽 |
DE3666962D1 (en) * | 1985-03-11 | 1989-12-21 | Allied Signal Inc | Apparatus and method for cleaning and drying surfaces of non-absorbent articles |
JPS63229185A (ja) * | 1987-03-18 | 1988-09-26 | 三井・デユポンフロロケミカル株式会社 | 洗浄方法及び洗浄装置 |
-
1989
- 1989-07-06 EP EP89306894A patent/EP0350316B1/de not_active Expired - Lifetime
- 1989-07-06 ES ES89306894T patent/ES2103705T3/es not_active Expired - Lifetime
- 1989-07-06 DE DE68928010T patent/DE68928010T2/de not_active Expired - Fee Related
- 1989-07-06 GB GB8915464A patent/GB2220951B/en not_active Revoked
- 1989-07-06 AT AT89306894T patent/ATE152487T1/de not_active IP Right Cessation
- 1989-07-07 US US07/376,651 patent/US5055138A/en not_active Ceased
- 1989-07-10 JP JP1177853A patent/JP2768743B2/ja not_active Expired - Lifetime
-
1997
- 1997-06-30 GR GR970401585T patent/GR3023937T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
DE68928010T2 (de) | 1997-11-20 |
GB8915464D0 (en) | 1989-08-23 |
US5055138A (en) | 1991-10-08 |
JPH02191581A (ja) | 1990-07-27 |
GB2220951B (en) | 1992-09-16 |
GR3023937T3 (en) | 1997-09-30 |
GB2220951A (en) | 1990-01-24 |
DE68928010D1 (de) | 1997-06-05 |
JP2768743B2 (ja) | 1998-06-25 |
EP0350316B1 (de) | 1997-05-02 |
ES2103705T3 (es) | 1997-10-01 |
EP0350316A1 (de) | 1990-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
REN | Ceased due to non-payment of the annual fee |