DE68911330D1 - Vorrichtung mit einem Ausrichtungsgestell. - Google Patents

Vorrichtung mit einem Ausrichtungsgestell.

Info

Publication number
DE68911330D1
DE68911330D1 DE89101756T DE68911330T DE68911330D1 DE 68911330 D1 DE68911330 D1 DE 68911330D1 DE 89101756 T DE89101756 T DE 89101756T DE 68911330 T DE68911330 T DE 68911330T DE 68911330 D1 DE68911330 D1 DE 68911330D1
Authority
DE
Germany
Prior art keywords
alignment frame
alignment
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE89101756T
Other languages
English (en)
Other versions
DE68911330T2 (de
Inventor
Takehiko C O Patent Div Nomura
Ryoichi C O Patent Divi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63026790A external-priority patent/JPH01202687A/ja
Priority claimed from JP63030405A external-priority patent/JPH01206287A/ja
Priority claimed from JP63132994A external-priority patent/JPH01302197A/ja
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE68911330D1 publication Critical patent/DE68911330D1/de
Publication of DE68911330T2 publication Critical patent/DE68911330T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE68911330T 1988-02-08 1989-02-01 Vorrichtung mit einem Ausrichtungsgestell. Expired - Fee Related DE68911330T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63026790A JPH01202687A (ja) 1988-02-08 1988-02-08 位置決め装置
JP63030405A JPH01206287A (ja) 1988-02-12 1988-02-12 位置決め装置
JP63132994A JPH01302197A (ja) 1988-05-31 1988-05-31 位置決め装置

Publications (2)

Publication Number Publication Date
DE68911330D1 true DE68911330D1 (de) 1994-01-27
DE68911330T2 DE68911330T2 (de) 1994-05-26

Family

ID=27285539

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68911330T Expired - Fee Related DE68911330T2 (de) 1988-02-08 1989-02-01 Vorrichtung mit einem Ausrichtungsgestell.

Country Status (4)

Country Link
US (1) US4948330A (de)
EP (1) EP0327949B1 (de)
KR (1) KR930000292B1 (de)
DE (1) DE68911330T2 (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2960423B2 (ja) * 1988-11-16 1999-10-06 株式会社日立製作所 試料移動装置及び半導体製造装置
JPH03159148A (ja) * 1989-11-16 1991-07-09 Advantest Corp 位置決め装置及びこの位置決め装置を利用したｉｃ試験装置
US5061039A (en) * 1990-06-22 1991-10-29 The United States Of America As Represented By The United States Department Of Energy Dual axis translation apparatus and system for translating an optical beam and related method
US5165297A (en) * 1991-02-15 1992-11-24 Albert Einstein College Of Medicine Of Yeshiva University, A Div. Of Yeshiva Univ. Remote controlled micromanipulator
US5303035A (en) * 1992-05-04 1994-04-12 New Focus, Inc. Precision micropositioner
JPH07218749A (ja) * 1993-12-07 1995-08-18 Furukawa Electric Co Ltd:The 多軸微動ステージ
EP0668606B1 (de) * 1994-02-07 1997-09-17 Ushiodenki Kabushiki Kaisha Haltevorrichtung
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6989647B1 (en) * 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5489089A (en) * 1994-04-26 1996-02-06 Ohio Northern University Automatic alignmant vise
JPH08241126A (ja) * 1995-03-02 1996-09-17 Canon Inc 同期位置制御方法および装置
US6008500A (en) * 1995-04-04 1999-12-28 Nikon Corporation Exposure apparatus having dynamically isolated reaction frame
NL1000815C2 (nl) * 1995-07-14 1997-01-15 Univ Delft Tech XY-verplaatsingsinrichting.
JP3365598B2 (ja) * 1995-08-31 2003-01-14 富士通株式会社 光モジュール組立体の製造方法および製造装置
CH691709A5 (de) * 1995-11-03 2001-09-14 Zeiss Carl Fa Antrieb für die Bewegung eines bewegten Geräteteils.
IL119213A (en) * 1996-09-06 2000-08-31 Orbot Instr Ltd Universal chuck for holding plates of various sizes
US5812310A (en) * 1996-10-16 1998-09-22 Applied Precision, Inc. Orthogonal high accuracy microscope stage
KR100235610B1 (en) * 1997-06-30 1999-12-15 Daewoo Electronics Co Ltd Panel positioning device
US6185030B1 (en) * 1998-03-20 2001-02-06 James W. Overbeck Wide field of view and high speed scanning microscopy
US6764272B1 (en) 1999-05-27 2004-07-20 Micron Technology, Inc. Adjustable coarse alignment tooling for packaged semiconductor devices
US6405659B1 (en) 2000-05-01 2002-06-18 Nikon Corporation Monolithic stage
JP2001328043A (ja) * 2000-05-24 2001-11-27 Harmonic Drive Syst Ind Co Ltd テーブル位置決め装置
US6553644B2 (en) * 2001-02-09 2003-04-29 International Business Machines Corporation Fixture, carrier ring, and method for processing delicate workpieces
KR100416791B1 (ko) * 2001-03-19 2004-01-31 삼성전자주식회사 반도체 웨이퍼 검사용 현미경장치 및 그 검사방법
DE10139586C2 (de) * 2001-08-11 2003-11-27 Erich Thallner Plattenförmiges Justierelement
US6888289B2 (en) * 2002-07-16 2005-05-03 Baldor Electric Company Multi-axes, sub-micron positioner
US7036777B2 (en) * 2003-05-14 2006-05-02 Quickset International, Inc. Zero backlash positioning device
US7180662B2 (en) * 2004-04-12 2007-02-20 Applied Scientific Instrumentation Inc. Stage assembly and method for optical microscope including Z-axis stage and piezoelectric actuator for rectilinear translation of Z stage
KR100610833B1 (ko) 2004-06-21 2006-08-08 현대자동차주식회사 부품 위치결정장치
KR101130890B1 (ko) 2005-03-18 2012-03-28 엘지전자 주식회사 근접노광형 노광장치
DE102005045680A1 (de) * 2005-09-24 2007-04-05 Edmund Uschkurat Vorrichtung zum Ausrichten eines Gegenstandes
FR2893132B1 (fr) * 2005-11-09 2008-07-25 Innopsys Sa Dispositif d'analyse a balayage d'echantillons biologiques par fluorescence
JP4849227B2 (ja) * 2006-07-31 2012-01-11 株式会社ダイフク 荷位置ずれ自動矯正装置
CN102910405B (zh) * 2012-10-25 2015-12-09 深圳市华星光电技术有限公司 一种卡匣搬运叉车
US10041973B2 (en) * 2013-09-04 2018-08-07 Infineon Technologies Ag Method and apparatus for dynamic alignment of semiconductor devices
US10186450B2 (en) * 2014-07-21 2019-01-22 Asm Ip Holding B.V. Apparatus and method for adjusting a pedestal assembly for a reactor
JP6960352B2 (ja) * 2018-02-20 2021-11-05 株式会社日立ハイテク ステージ装置、及び荷電粒子線装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB892836A (en) * 1958-09-25 1962-03-28 Leitz Ernst Gmbh Improvements in or relating to arrangements for effecting fine adjusting movement of microscope stages and other movable members requiring precision adjustment
GB1193501A (en) * 1967-02-02 1970-06-03 Watson W & Sons Ltd Improvements in or relating to Positioning Apparatus
US3466514A (en) * 1967-06-26 1969-09-09 Ibm Method and apparatus for positioning objects in preselected orientations
GB1270566A (en) * 1969-10-31 1972-04-12 Image Analysing Computers Ltd Improved precision stage for optical microscope
GB1301008A (en) * 1970-08-04 1972-12-29 Ass Elect Ind Improvements in or relating to specimen stages for electron microscopes
US3829978A (en) * 1972-09-18 1974-08-20 U Okun Worktable for positioning workpieces in measuring devices to check dimensions
US3918167A (en) * 1974-03-01 1975-11-11 Gerber Scientific Instr Co Apparatus for sensing relative movement of a work table and tool
US4328553A (en) * 1976-12-07 1982-05-04 Computervision Corporation Method and apparatus for targetless wafer alignment
JPS5650517Y2 (de) * 1977-02-09 1981-11-26
US4248498A (en) * 1978-06-29 1981-02-03 Georges Michael P Automatic microscope slide
JPS5878642A (ja) * 1981-11-05 1983-05-12 株式会社ニコン 眼底カメラの合焦位置検出装置
US4457664A (en) * 1982-03-22 1984-07-03 Ade Corporation Wafer alignment station
US4609264A (en) * 1984-01-23 1986-09-02 The Micromanipulator Microscope Company, Inc. Apparatus for positioning flat objects for microscopic examination
US4667415A (en) * 1985-11-29 1987-05-26 Gca Corporation Microlithographic reticle positioning system
JPS6325946A (ja) * 1986-07-18 1988-02-03 Toshiba Corp 微動テ−ブル装置
JPS6372138A (ja) * 1986-09-12 1988-04-01 Metsukusu:Kk シリコンウエハ−の位置決め装置
JPH052632A (ja) * 1991-06-25 1993-01-08 Sumitomo Heavy Ind Ltd 果物表面模様判定装置

Also Published As

Publication number Publication date
EP0327949A2 (de) 1989-08-16
DE68911330T2 (de) 1994-05-26
US4948330A (en) 1990-08-14
EP0327949A3 (en) 1990-10-17
EP0327949B1 (de) 1993-12-15
KR890013710A (ko) 1989-09-25
KR930000292B1 (ko) 1993-01-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee