DE68905735D1 - Synthetisches geschmolzenes quarzglas und verfahren zu dessen herstellung. - Google Patents
Synthetisches geschmolzenes quarzglas und verfahren zu dessen herstellung.Info
- Publication number
- DE68905735D1 DE68905735D1 DE8989402471T DE68905735T DE68905735D1 DE 68905735 D1 DE68905735 D1 DE 68905735D1 DE 8989402471 T DE8989402471 T DE 8989402471T DE 68905735 T DE68905735 T DE 68905735T DE 68905735 D1 DE68905735 D1 DE 68905735D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- quartz glass
- molten quartz
- synthetic molten
- synthetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/30—Additives
- C03C2203/32—Catalysts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/90—Drying, dehydration, minimizing oh groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/901—Liquid phase reaction process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22933388A JPH0280329A (ja) | 1988-09-13 | 1988-09-13 | 合成石英ガラスの製造方法 |
JP32562688A JPH02172832A (ja) | 1988-12-22 | 1988-12-22 | 合成石英ガラスおよびその製造方法 |
JP33507088A JPH02180723A (ja) | 1988-12-28 | 1988-12-28 | 合成石英ガラスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68905735D1 true DE68905735D1 (de) | 1993-05-06 |
DE68905735T2 DE68905735T2 (de) | 1993-08-05 |
Family
ID=27331515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8989402471T Expired - Lifetime DE68905735T2 (de) | 1988-09-13 | 1989-09-11 | Synthetisches geschmolzenes quarzglas und verfahren zu dessen herstellung. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4979973A (de) |
EP (1) | EP0360659B1 (de) |
DE (1) | DE68905735T2 (de) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02124739A (ja) * | 1988-10-31 | 1990-05-14 | Shin Etsu Chem Co Ltd | 合成石英ガラスおよびその製造方法 |
US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
JP2933404B2 (ja) * | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
US5330941A (en) * | 1991-07-24 | 1994-07-19 | Asahi Glass Company Ltd. | Quartz glass substrate for polysilicon thin film transistor liquid crystal display |
US5192351A (en) * | 1991-12-17 | 1993-03-09 | Alfred University | Production of dehydroxylated glass |
JP2888079B2 (ja) * | 1993-02-04 | 1999-05-10 | 信越半導体株式会社 | シリコン単結晶引上げ用ルツボ |
US5613995A (en) * | 1993-04-23 | 1997-03-25 | Lucent Technologies Inc. | Method for making planar optical waveguides |
DE69508473T2 (de) * | 1994-07-06 | 1999-10-28 | Shinetsu Handotai Kk | Verfahren zur Herstellung von Silizium-Einkristall und Tiegel aus geschmolzenem Silika dafür |
JPH0826742A (ja) * | 1994-07-11 | 1996-01-30 | Mitsubishi Chem Corp | 合成石英ガラス粉 |
KR100414962B1 (ko) * | 1994-12-26 | 2004-04-13 | 미쓰비시 가가꾸 가부시키가이샤 | 합성석영분말의제조방법 |
EP0728709B1 (de) * | 1995-02-22 | 1998-04-29 | Heraeus Quarzglas GmbH | Opakes Quarzglas und Verfahren zu dessen Herstellung |
EP1170253A1 (de) * | 1996-11-20 | 2002-01-09 | Mitsubishi Chemical Corporation | Synthetisches Quartzpulver und Kieselsäuregelpulver |
DE19706515A1 (de) * | 1997-02-19 | 1998-08-20 | Inst Neue Mat Gemein Gmbh | Hydroxylgruppen-arme organisch/anorganische Komposite, Verfahren zu deren Herstellung und deren Verwendung |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
GB2331985B (en) * | 1997-12-03 | 2001-11-21 | Tosoh Corp | High purity transparent silica glass and process for producing same |
US5913975A (en) * | 1998-02-03 | 1999-06-22 | Memc Electronic Materials, Inc. | Crucible and method of preparation thereof |
US6582826B1 (en) | 1998-03-23 | 2003-06-24 | Kabushiki Kaisha Ohara | Glass-ceramics |
JP4648512B2 (ja) * | 2000-03-07 | 2011-03-09 | セイコーインスツル株式会社 | 近視野光発生素子の製造方法 |
JP4117641B2 (ja) * | 2001-11-26 | 2008-07-16 | ジャパンスーパークォーツ株式会社 | 合成石英粉の処理方法およびその石英ガラス製品 |
DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
JP2004292190A (ja) * | 2003-03-25 | 2004-10-21 | Univ Shinshu | 二酸化ケイ素薄膜とその製造法 |
EP1700824A1 (de) | 2005-03-09 | 2006-09-13 | Degussa AG | Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen |
JP5213356B2 (ja) * | 2007-05-31 | 2013-06-19 | 信越石英株式会社 | シリコン単結晶引上用石英ガラスルツボおよびその製造方法 |
JP5388691B2 (ja) * | 2008-05-23 | 2014-01-15 | キヤノン株式会社 | 触媒層および膜電極接合体の製造方法 |
US9249028B2 (en) | 2010-02-08 | 2016-02-02 | Momentive Performance Materials Inc. | Method for making high purity metal oxide particles and materials made thereof |
US8197782B2 (en) | 2010-02-08 | 2012-06-12 | Momentive Performance Materials | Method for making high purity metal oxide particles and materials made thereof |
PL409679A1 (pl) * | 2014-10-06 | 2016-04-11 | Wrocławskie Centrum Badań Eit + Spółka Z Ograniczoną Odpowiedzialnością | Sposób wytwarzania pianosilikatów z domieszkami o właściwościach magnetycznych oraz pianosilikat wytworzony tym sposobem |
CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
CN109153593A (zh) * | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
KR20180095616A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조 |
TWI794150B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 自二氧化矽顆粒製備石英玻璃體 |
US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
CN108698887B (zh) | 2015-12-18 | 2022-01-21 | 贺利氏石英玻璃有限两合公司 | 由均质石英玻璃制得的玻璃纤维和预成形品 |
EP3390290B1 (de) * | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
TWI812586B (zh) | 2015-12-18 | 2023-08-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點 |
WO2018229151A1 (en) * | 2017-06-14 | 2018-12-20 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body |
WO2020181490A1 (zh) * | 2019-03-12 | 2020-09-17 | 湖州五爻硅基材料研究院有限公司 | 一种球形二氧化硅粉体填料的制备方法和由此得到的球形二氧化硅粉体填料及其应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1596839B1 (de) * | 1966-05-07 | 1970-11-26 | Jenaer Glaswerk Schott & Gen | Verfahren zur Herstellung von Formkoerpern aus Glaesern bei einer Temperatur unterhalb der ueblichen Schmelztemperatur |
US4266978A (en) * | 1979-06-25 | 1981-05-12 | General Electric Company | Synthesis of mixed oxide composition |
GB2075003B (en) * | 1980-04-28 | 1984-01-04 | Hitachi Ltd | Method for producing optical glass |
GB2113200B (en) * | 1982-01-08 | 1985-06-19 | Hitachi Ltd | Process for producing optical glass |
US4500657A (en) * | 1982-08-02 | 1985-02-19 | Johnson & Johnson Dental Products Company | Dental restorative compositions having improved mechanical properties and hydrolytic stability |
DE3302745A1 (de) * | 1983-01-27 | 1984-08-02 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur herstellung von gegenstaenden aus hochreinem synthetischem quarzglas |
GB2165234B (en) * | 1984-10-05 | 1988-09-01 | Suwa Seikosha Kk | Methods of preparing doped silica glass |
DE3522194A1 (de) * | 1985-06-21 | 1987-01-02 | Philips Patentverwaltung | Verfahren zur herstellung von glaskoerpern |
US4767433A (en) * | 1986-05-22 | 1988-08-30 | Asahi Glass Company Ltd. | Spherical silica glass powder particles and process for their production |
US4872895A (en) * | 1986-12-11 | 1989-10-10 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method for fabricating articles which include high silica glass bodies |
-
1989
- 1989-09-08 US US07/404,585 patent/US4979973A/en not_active Expired - Lifetime
- 1989-09-11 DE DE8989402471T patent/DE68905735T2/de not_active Expired - Lifetime
- 1989-09-11 EP EP89402471A patent/EP0360659B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE68905735T2 (de) | 1993-08-05 |
EP0360659A1 (de) | 1990-03-28 |
EP0360659B1 (de) | 1993-03-31 |
US4979973A (en) | 1990-12-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |