DE652900C - Mittel zum lithographischen AEtzen und bzw. oder Feuchten von Flachdruckformen aus Zink oder Aluminium - Google Patents
Mittel zum lithographischen AEtzen und bzw. oder Feuchten von Flachdruckformen aus Zink oder AluminiumInfo
- Publication number
- DE652900C DE652900C DEM126937D DEM0126937D DE652900C DE 652900 C DE652900 C DE 652900C DE M126937 D DEM126937 D DE M126937D DE M0126937 D DEM0126937 D DE M0126937D DE 652900 C DE652900 C DE 652900C
- Authority
- DE
- Germany
- Prior art keywords
- solution
- printing
- etching
- plate
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 title claims description 53
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims description 24
- 229910052725 zinc Inorganic materials 0.000 title claims description 24
- 239000011701 zinc Substances 0.000 title claims description 24
- 229910052782 aluminium Inorganic materials 0.000 title claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 11
- 239000003795 chemical substances by application Substances 0.000 title claims description 11
- 239000000243 solution Substances 0.000 claims description 78
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 76
- 235000011187 glycerol Nutrition 0.000 claims description 36
- 230000002378 acidificating effect Effects 0.000 claims description 25
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- 241000416162 Astragalus gummifer Species 0.000 claims description 9
- 229920000084 Gum arabic Polymers 0.000 claims description 9
- 229920001615 Tragacanth Polymers 0.000 claims description 9
- 235000010489 acacia gum Nutrition 0.000 claims description 9
- 239000000205 acacia gum Substances 0.000 claims description 9
- 235000010487 tragacanth Nutrition 0.000 claims description 9
- 239000000196 tragacanth Substances 0.000 claims description 9
- 229940116362 tragacanth Drugs 0.000 claims description 9
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 claims description 8
- 239000004254 Ammonium phosphate Substances 0.000 claims description 7
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims description 7
- 229910000148 ammonium phosphate Inorganic materials 0.000 claims description 7
- 235000019289 ammonium phosphates Nutrition 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 7
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 claims description 7
- 229910001981 cobalt nitrate Inorganic materials 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 241000978776 Senegalia senegal Species 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 39
- 239000002184 metal Substances 0.000 description 39
- 229910019142 PO4 Inorganic materials 0.000 description 21
- 235000021317 phosphate Nutrition 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 150000003839 salts Chemical class 0.000 description 17
- 239000000203 mixture Substances 0.000 description 16
- 239000002253 acid Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 13
- 239000010452 phosphate Substances 0.000 description 13
- 102000009027 Albumins Human genes 0.000 description 12
- 108010088751 Albumins Proteins 0.000 description 12
- 239000000976 ink Substances 0.000 description 12
- 239000003973 paint Substances 0.000 description 11
- 239000007921 spray Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 9
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 9
- 239000005871 repellent Substances 0.000 description 9
- 244000215068 Acacia senegal Species 0.000 description 8
- 239000003518 caustics Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 8
- 150000001340 alkali metals Chemical group 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- IQYVXTLKMOTJKI-UHFFFAOYSA-L cobalt(ii) chlorate Chemical compound [Co+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O IQYVXTLKMOTJKI-UHFFFAOYSA-L 0.000 description 6
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 5
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 5
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 5
- 239000004927 clay Substances 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- RZLUIDROFNIMHF-UHFFFAOYSA-L nickel(2+);dichlorate Chemical compound [Ni+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O RZLUIDROFNIMHF-UHFFFAOYSA-L 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 230000004913 activation Effects 0.000 description 4
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 230000002940 repellent Effects 0.000 description 4
- 230000008961 swelling Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- -1 B. nickel nitrate Chemical class 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000001627 detrimental effect Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 235000019786 weight gain Nutrition 0.000 description 3
- 230000004584 weight gain Effects 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 235000021053 average weight gain Nutrition 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 230000029142 excretion Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910001960 metal nitrate Inorganic materials 0.000 description 2
- 238000001935 peptisation Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- DJHGAFSJWGLOIV-UHFFFAOYSA-K Arsenate3- Chemical class [O-][As]([O-])([O-])=O DJHGAFSJWGLOIV-UHFFFAOYSA-K 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- ZVCNBVJYXBEKTC-UHFFFAOYSA-L azanium;zinc;phosphate Chemical compound [NH4+].[Zn+2].[O-]P([O-])([O-])=O ZVCNBVJYXBEKTC-UHFFFAOYSA-L 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000010073 coating (rubber) Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- AUZIFBWIBXOIRV-UHFFFAOYSA-N diazanium hydrogen phosphate nitric acid Chemical compound [NH4+].[NH4+].O[N+]([O-])=O.OP([O-])([O-])=O AUZIFBWIBXOIRV-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical class [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US689289A US1977646A (en) | 1933-09-13 | 1933-09-13 | Method of etching planographic plates and composition therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE652900C true DE652900C (de) | 1937-11-11 |
Family
ID=24767795
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEM126937D Expired DE652900C (de) | 1933-09-13 | 1934-03-21 | Mittel zum lithographischen AEtzen und bzw. oder Feuchten von Flachdruckformen aus Zink oder Aluminium |
| DEM126938D Expired DE638651C (de) | 1933-09-13 | 1934-03-21 | Mittel zum lithographischen AEtzen und zum Feuchten von Flachdruckformen aus Zink oder Aluminium |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEM126938D Expired DE638651C (de) | 1933-09-13 | 1934-03-21 | Mittel zum lithographischen AEtzen und zum Feuchten von Flachdruckformen aus Zink oder Aluminium |
Country Status (6)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE856156C (de) * | 1941-10-10 | 1952-12-11 | Strecker Otto C Dr Kg | Grundiermittel fuer Flachdruckplatten |
| DE914860C (de) * | 1951-10-17 | 1954-07-12 | Heinrich Renck | Verfahren zur Herstellung von Flachdruckformen |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2780168A (en) * | 1951-11-16 | 1957-02-05 | John H Schneider | Composition for use in eliminating oil and grease smudges from offset printing mats and plates |
| US2830536A (en) * | 1955-12-15 | 1958-04-15 | Harris Intertype Corp | Lithographic printing |
| US3039909A (en) * | 1956-07-09 | 1962-06-19 | Dow Chemical Co | Method of uniformly reducing the dimensions of magnesium shapes |
| US2957765A (en) * | 1957-06-13 | 1960-10-25 | Gen Aniline & Film Corp | Method of and composition for preparing lithographic printing plates |
| US3070008A (en) * | 1959-02-02 | 1962-12-25 | William C Huebner | Oxide image printing plate |
| US3134702A (en) * | 1960-08-17 | 1964-05-26 | Dow Chemical Co | Chemical milling of magnesium metal and magnesium alloys |
| US4388864A (en) * | 1978-12-11 | 1983-06-21 | Warner "Autolitho" Corporation | Lithographic dampening system |
| KR20210075151A (ko) * | 2018-10-17 | 2021-06-22 | 가부시키가이샤 아데카 | 표면 처리액 및 니켈 함유 재료의 표면 처리 방법 |
-
0
- BE BE404772D patent/BE404772A/xx unknown
- BE BE404773D patent/BE404773A/xx unknown
- NL NL41082D patent/NL41082C/xx active
-
1933
- 1933-09-13 US US689289A patent/US1977646A/en not_active Expired - Lifetime
-
1934
- 1934-03-07 GB GB7271/34A patent/GB430112A/en not_active Expired
- 1934-03-07 GB GB7270/34A patent/GB430111A/en not_active Expired
- 1934-03-21 DE DEM126937D patent/DE652900C/de not_active Expired
- 1934-03-21 DE DEM126938D patent/DE638651C/de not_active Expired
- 1934-03-27 FR FR770835D patent/FR770835A/fr not_active Expired
- 1934-03-27 FR FR770836D patent/FR770836A/fr not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE856156C (de) * | 1941-10-10 | 1952-12-11 | Strecker Otto C Dr Kg | Grundiermittel fuer Flachdruckplatten |
| DE914860C (de) * | 1951-10-17 | 1954-07-12 | Heinrich Renck | Verfahren zur Herstellung von Flachdruckformen |
Also Published As
| Publication number | Publication date |
|---|---|
| GB430111A (en) | 1935-06-13 |
| FR770836A (fr) | 1934-09-21 |
| US1977646A (en) | 1934-10-23 |
| FR770835A (fr) | 1934-09-21 |
| DE638651C (de) | 1936-11-20 |
| NL41082C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | |
| BE404772A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | |
| GB430112A (en) | 1935-06-13 |
| BE404773A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2934897C1 (de) | Desensibilisierungsloesung fuer fotoempfindliche Diazodruckplatten | |
| DE2504594C2 (de) | Wäßrige Desensibilisierungslösung zur Verwendung beim Herstellen lithographischer Druckformen sowie Verwendung der Lösung | |
| DE2218471C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| EP0249752B1 (de) | Feuchtmittel mit einem darin enthaltenen Kolloidgemisch | |
| EP0089510B1 (de) | Aluminiummaterial mit einer hydrophilen Oberflächenbeschichtung, ein Verfahren zu seiner Herstellung und seine Verwendung als Träger für Offsetdruckplatten | |
| DE652900C (de) | Mittel zum lithographischen AEtzen und bzw. oder Feuchten von Flachdruckformen aus Zink oder Aluminium | |
| DE2848927A1 (de) | Behandlungsfluessigkeit fuer die oberflaechenbehandlung von lithographie- druckplatten | |
| EP0024298A2 (de) | Schlussbehandlungslösung für Flachdruckplatten und Verfahren zum Behandeln einer entwickelten Flachdruckplatte | |
| DE747690C (de) | Mittel zum Wasserempfaenglichmachen der nichtdruckenden Stellen von Flach- und Offsetdruckformen | |
| DE3149258A1 (de) | Reinigungs- und kratzerbeseitigungs-zubereitung, verfahren zu ihrer herstellung und deren verwendung | |
| DE69506974T2 (de) | Feuchtwasser für Druckverfahren | |
| EP0279164B1 (de) | Von organischen Lösemitteln freies, weitgehend pH-neutrales Entwicklergemisch zum Entwickeln von Flachdruckplatten | |
| DE2328606B2 (de) | Verfahren zur kontinuierlichen vorbehandlung von aluminiumband fuer die herstellung lithografischer platten | |
| DE654491C (de) | Flachdruckverfahren | |
| DE1956795A1 (de) | Verfahren zur Herstellung von Offsetdruckplatten aus eloxiertem Aluminium | |
| DE2905633A1 (de) | Vorsensibilisierte lithographische platte und verfahren zur herstellung eines traegers fuer eine solche platte | |
| DE120061C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| DE2226164C3 (de) | Verwendung einer wässrigen, Perjodationen enthaltenden Lösung zum Entfernen einer unlöslich gemachten, Polyvinylalkohol enthaltenden Oberflächenschicht | |
| DE743162C (de) | Verfahren zur Herstellung von Flachdruckformen | |
| DE2645550C3 (de) | Druckfarbenzusatz | |
| EP0536531A2 (de) | Verfahren zum Aufrauhen von Aluminium bzw. von Aluminiumlegierungen als Trägermaterial für Druckplatten und eine Druckplatte | |
| EP0249751A2 (de) | Feuchtmittel mit einem darin enthaltenen Polyolgemisch | |
| EP0220662A1 (de) | Befeuchtungslösung für den Offsetdruck | |
| DE1421385B2 (de) | Verfahren zur herstellung einer zwischen traeger und kopierschicht befindlichen hydrophilen zwischenschicht bei lithographischen flachdruckplatten | |
| DE2042217C3 (de) | Verwendung einer wässrigen Behandlungslösung für die Schlußbehandlung von Flachdruckplatten |