DE60316228D1 - Lichtempfindliche Polyimidharzprecursor-Zusammensetzung, Lichtwellenleiter mit dessen Polyimid und Verfahren zur Herstellung von diesem Lichtwellenleiter - Google Patents

Lichtempfindliche Polyimidharzprecursor-Zusammensetzung, Lichtwellenleiter mit dessen Polyimid und Verfahren zur Herstellung von diesem Lichtwellenleiter

Info

Publication number
DE60316228D1
DE60316228D1 DE60316228T DE60316228T DE60316228D1 DE 60316228 D1 DE60316228 D1 DE 60316228D1 DE 60316228 T DE60316228 T DE 60316228T DE 60316228 T DE60316228 T DE 60316228T DE 60316228 D1 DE60316228 D1 DE 60316228D1
Authority
DE
Germany
Prior art keywords
optical waveguide
making
polyimide
precursor composition
resin precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60316228T
Other languages
English (en)
Other versions
DE60316228T2 (de
Inventor
Kazunori Mune
Amane Mochizuki
Shunichi Hayashi
Hirofumi Fujii
Takahiro Fukuoka
Ryusuke Naitou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002208429A external-priority patent/JP3841288B2/ja
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of DE60316228D1 publication Critical patent/DE60316228D1/de
Application granted granted Critical
Publication of DE60316228T2 publication Critical patent/DE60316228T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H1/00—Tops
    • A63H1/20—Tops with figure-like features; with movable objects, especially figures
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
    • A63H33/00—Other toys
    • A63H33/04—Building blocks, strips, or similar building parts
    • A63H33/06—Building blocks, strips, or similar building parts to be assembled without the use of additional elements
    • A63H33/08—Building blocks, strips, or similar building parts to be assembled without the use of additional elements provided with complementary holes, grooves, or protuberances, e.g. dovetails
    • A63H33/084—Building blocks, strips, or similar building parts to be assembled without the use of additional elements provided with complementary holes, grooves, or protuberances, e.g. dovetails with grooves
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3432—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Integrated Circuits (AREA)
DE60316228T 2002-07-17 2003-06-20 Lichtempfindliche Polyimidharzprecursor-Zusammensetzung, Lichtwellenleiter mit dessen Polyimid und Verfahren zur Herstellung von diesem Lichtwellenleiter Expired - Lifetime DE60316228T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002208429A JP3841288B2 (ja) 2001-12-21 2002-07-17 感光性ポリイミド樹脂前駆体組成物とそれより得られる光学用ポリイミドと光導波路
JP2002208429 2002-07-17

Publications (2)

Publication Number Publication Date
DE60316228D1 true DE60316228D1 (de) 2007-10-25
DE60316228T2 DE60316228T2 (de) 2008-01-03

Family

ID=29774636

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60316228T Expired - Lifetime DE60316228T2 (de) 2002-07-17 2003-06-20 Lichtempfindliche Polyimidharzprecursor-Zusammensetzung, Lichtwellenleiter mit dessen Polyimid und Verfahren zur Herstellung von diesem Lichtwellenleiter

Country Status (5)

Country Link
US (1) US7037637B2 (de)
EP (1) EP1382644B1 (de)
KR (1) KR20040008073A (de)
CN (1) CN1282713C (de)
DE (1) DE60316228T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003280053A (ja) * 2002-03-20 2003-10-02 Fujitsu Ltd 光スイッチ
JP3987787B2 (ja) * 2002-11-25 2007-10-10 日東電工株式会社 三次元ポリイミド光導波路の製造方法
JP3947457B2 (ja) * 2002-11-29 2007-07-18 日東電工株式会社 ポリイミド光導波路の製造方法
JP2005165139A (ja) * 2003-12-04 2005-06-23 Nitto Denko Corp 光導波路の製造方法
JP2006030294A (ja) * 2004-07-12 2006-02-02 Nitto Denko Corp フレキシブル光導波路の製法
JP4564439B2 (ja) * 2005-03-07 2010-10-20 日東電工株式会社 ポジ型感光性樹脂組成物
KR100757108B1 (ko) * 2005-11-28 2007-10-08 씨티엔지니어링주식회사 반도체 소자의 미세 패턴을 형성하기 위한 하드마스크용고분자 및 이를 함유하는 하드마스크용 조성물
US8351752B2 (en) * 2006-03-06 2013-01-08 Hitachi Chemical Company, Ltd. Flexible optical waveguide, method for manufacturing such flexible optical waveguide, and optical module
CN102393548A (zh) * 2006-10-31 2012-03-28 株式会社日本触媒 一种柔性光波导
JP2012063645A (ja) 2010-09-17 2012-03-29 Nitto Denko Corp 感光性樹脂組成物およびそれを用いた金属支持体付回路基板
JP2012073358A (ja) * 2010-09-28 2012-04-12 Nitto Denko Corp コネクタ用光導波路の製法
CN102492320B (zh) * 2011-12-05 2014-01-15 中昊北方涂料工业研究设计院有限公司 耐高温光纤用快速固化聚酰亚胺涂料
WO2014007544A1 (ko) * 2012-07-03 2014-01-09 주식회사 엘지화학 폴리아믹산 고분자 복합체 및 이의 제조방법
KR101382170B1 (ko) 2012-07-03 2014-04-07 주식회사 엘지화학 폴리아믹산 고분자 복합체 및 이의 제조방법
TWI472578B (zh) * 2012-12-11 2015-02-11 Chi Mei Corp Liquid crystal aligning agent and its application
US10189203B2 (en) 2013-10-18 2019-01-29 National Institute Of Advanced Industrial Science And Technology Method for forming micropattern of polyimide using imprinting
JP6274498B2 (ja) * 2013-11-08 2018-02-07 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
CN107003608B (zh) * 2014-10-24 2020-09-25 飞利斯有限公司 可光图案化组合物及使用其制造晶体管器件的方法
JP6629544B2 (ja) * 2015-08-10 2020-01-15 本田技研工業株式会社 パネル構造
CN110028670A (zh) * 2019-04-11 2019-07-19 明士新材料有限公司 低介电损耗负性光敏聚酰胺酸酯树脂、树脂组合物、其制备方法及应用
CN111440115B (zh) * 2020-04-29 2022-03-29 中山大学 光敏性功能联苯二胺的制备方法
CN112048063B (zh) * 2020-09-04 2022-10-04 吉林奥来德光电材料股份有限公司 一种高性能透明聚酰亚胺薄膜及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE58908012D1 (de) * 1989-03-20 1994-08-11 Siemens Ag Lichtempfindliches Gemisch.
US5233018A (en) * 1990-09-28 1993-08-03 Nippon Telegraph And Telephone Corporation Perfluorinated polyimide, perfluorinated poly(amic acid), starting compounds therefor, and methods for preparing them
US5317082A (en) * 1992-12-22 1994-05-31 Amoco Corporation Photodefinable optical waveguides
US5719253A (en) * 1994-10-07 1998-02-17 Unitika Ltd. Poly(amic acid) solution and polyimide film or polymide-coated material obtained therefrom
JPH10221549A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd プラスチック製光導波路およびそれを用いた光スイッチ
KR100330595B1 (ko) * 1999-04-19 2002-03-29 윤종용 광도파로
EP1103855A1 (de) * 1999-11-26 2001-05-30 Nitto Denko Corporation Lichtempfindliche Harzzusammensetzung, poröses Harz, Leiterplatte, und drahtlose Leiterplatte
KR100820221B1 (ko) * 2000-06-16 2008-04-07 유니티카 가부시끼가이샤 플렉시블프린트 배선판용 기판의 제조방법 및플렉시블프린트 배선판용 기판
JP2002090559A (ja) * 2000-09-13 2002-03-27 Minolta Co Ltd ポリイミド光導波路
JP2002148804A (ja) 2000-11-08 2002-05-22 Nitto Denko Corp 感光性樹脂組成物および回路基板
JP4799764B2 (ja) * 2001-05-31 2011-10-26 日東電工株式会社 光導波路用感光性ポリイミド前駆体組成物およびその光導波路用感光性ポリイミド組成物ならびにそれを用いた光導波路
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
JP3987787B2 (ja) * 2002-11-25 2007-10-10 日東電工株式会社 三次元ポリイミド光導波路の製造方法
JP3947457B2 (ja) * 2002-11-29 2007-07-18 日東電工株式会社 ポリイミド光導波路の製造方法
KR100944310B1 (ko) * 2003-01-24 2010-02-24 닛토덴코 가부시키가이샤 광 도파로의 제조 방법 및 광 디바이스의 접속 구조물

Also Published As

Publication number Publication date
US20040013953A1 (en) 2004-01-22
EP1382644A1 (de) 2004-01-21
US7037637B2 (en) 2006-05-02
CN1282713C (zh) 2006-11-01
DE60316228T2 (de) 2008-01-03
CN1468907A (zh) 2004-01-21
KR20040008073A (ko) 2004-01-28
EP1382644B1 (de) 2007-09-12

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