WO2014007544A1 - 폴리아믹산 고분자 복합체 및 이의 제조방법 - Google Patents
폴리아믹산 고분자 복합체 및 이의 제조방법 Download PDFInfo
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- WO2014007544A1 WO2014007544A1 PCT/KR2013/005907 KR2013005907W WO2014007544A1 WO 2014007544 A1 WO2014007544 A1 WO 2014007544A1 KR 2013005907 W KR2013005907 W KR 2013005907W WO 2014007544 A1 WO2014007544 A1 WO 2014007544A1
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- polyamic acid
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- UFWIBTONFRDIAS-UHFFFAOYSA-N c1cc2ccccc2cc1 Chemical compound c1cc2ccccc2cc1 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Definitions
- the present invention relates to a polyamic acid polymer composite and a method for producing the same, and more particularly, to a polyamic acid polymer composite and a method for manufacturing the same, which have high transparency and low thermal expansion property and are applicable to display substrate manufacturing.
- polyimide film Since polyimide film is excellent in mechanical properties, heat resistance, chemical resistance, electrical insulation, etc., it is widely used for various electronic devices and optical waveguide films such as an interlayer insulating film for semiconductors, a buffer coat, and a liquid crystal aligning film for a flexible printed wiring circuit board. It is becoming.
- PEN Polyethylene naphthalate
- PES polyether sulfone
- properties such as high transparency, low thermal expansion, and high glass transition temperature.
- the thermal expansion coefficient is 20 ppm / in the range of 100 to 300 ° C. It is required that it is C or less and glass transition temperature is 350 degreeC or more.
- the film obtained from such a total fluorinated polyimide has a relatively high light transmittance as the light transmittance of 400 nm is 85% at a film thickness of 20 ⁇ m, but the thermal expansion coefficient is 48 ppm / ° C., and thus the thermal expansion property is too high.
- An object of the present invention is to provide a polyamic acid polymer composite having a high level of transparency and low thermal expansion of glass, and applicable to a display substrate.
- Still another object of the present invention is to provide a polyimide polymer composite prepared using the polyamic acid polymer composite and a display substrate using the same.
- Polyamic acid polymer composite according to an aspect of the present invention 50 to 99% by weight of a polyamic acid polymer having a repeating unit of the formula (1), and 1 to 50% by weight of silica-based particles.
- R 1 is selected from the group consisting of aromatic, alicyclic, and aliphatic divalent organic groups
- R 2 is selected from the group consisting of aromatic, alicyclic, and aliphatic tetravalent organic groups
- R 3 is optionally And a divalent or higher organic group derived from an aromatic, alicyclic or aliphatic having a hydroxyl group
- n and m are each an integer of 1 or more.
- R 3 may be selected from the group consisting of divalent or more organic groups derived from aromatic, alicyclic or aliphatic having a hydroxyl group.
- At least one hydrogen atom in the organic group of R 1 of Formula 1 or at least one hydrogen atom in the organic group of R 3 may be substituted with a fluoroalkyl group.
- the silicon on the surface of the silica-based particles, and R 3 may be chemically bonded.
- the silica-based particles may be chemically bonded to R 3 of the repeating unit via a bond selected from the group consisting of ether bonds, amide bonds, and ester bonds.
- the silica-based particles may include -Si-O- bonds forming a network structure with each other.
- R 1 of Formula 1 is an aromatic divalent organic group represented by Formulas 2a to 2d, an alicyclic divalent organic group represented by Formula 2e, and an alicyclic divalent organic group including a cycloalkanediyl group having 4 to 18 carbon atoms. And it may be a divalent organic group selected from the group consisting of aliphatic divalent organic groups containing an alkanediyl group having 1 to 8 carbon atoms.
- R 11 to R 17 are each independently selected from the group consisting of an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, a sulfonic acid group, and a carboxylic acid group.
- A1, d1 and e1 are each independently an integer of 0 to 4, b1 is an integer of 0 to 6, c1 is an integer of 0 to 3, and f1 and g1 are each independently an integer of 0 to 10,
- R 1 of Formula 1 may be one selected from the group 2 is of the formula 3a to 3u to a group consisting of organic.
- R 2 of Formula 1 is an aliphatic tetravalent organic group having a structure of an aromatic tetravalent organic group of Formulas 4a to 4d, a cycloalkane having 3 to 12 carbon atoms, an alicyclic tetravalent organic group of Formula 4e And it may be a tetravalent organic group selected from the group consisting of aliphatic tetravalent organic groups having a branched alkane structure of 1 to 10 carbon atoms.
- R 21 to R 27 are each independently an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group having 1 to 10 carbon atoms
- a2 is an integer of 0 or 2
- b2 is an integer of 0 to 4
- c2 Is an integer of 0 to 8
- d2 and e2 are each independently an integer of 0 to 3
- f2 and g2 are each independently an integer of 0 to 9
- R is 28 and R 29 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluoroalkyl group having 1 to 10 carbon atoms.
- R 2 of Formula 1 may be a tetravalent organic group selected from the group consisting of tetravalent organic groups of the formula 5a to 5t.
- x is an integer of 1 to 3.
- R 3 of Formula 1 includes at least one divalent organic group selected from the group consisting of aromatic, alicyclic and aliphatic organic groups, and at least one of hydrogen atoms contained in the organic group is derived from a diamine substituted with a hydroxyl group. It may be an organic group.
- R 3 is 2,2-bis (3-amino-4-hydroxyphenyl) -hexafluoropropane, 3,3'-dihydroxy-4,4'-diaminobiphenyl,
- 2,2-bis (3-amino-4-hydroxyphenyl) sulfone can be a divalent or higher organic group derived from a compound selected from the group consisting of.
- a polyimide polymer composite comprising a polyimide polymer having a repeating unit of formula 6 and silica-based particles, which can be obtained by curing the polyamic acid composite.
- R 1 is selected from the group consisting of aromatic, alicyclic, and aliphatic divalent organic groups
- R 2 is selected from the group consisting of aromatic, alicyclic, and aliphatic tetravalent organic groups
- R 3 is optionally And a divalent or higher organic group derived from an aromatic, alicyclic or aliphatic having a hydroxyl group
- n and m are each an integer of 1 or more.
- the silica-based particles may include -Si-O- bonds forming a network structure with each other.
- the silicon atom on the surface of the silica-based particles, and the R 3 may be chemically bonded.
- the polyimide polymer composite may be processed into a film and used for a display substrate.
- the display substrate has a light transmittance of 80% or more for light having a wavelength of 550 nm in a thickness range of 10 to 30 ⁇ m, a thermal expansion coefficient of 20 ppm / K or less and a glass transition temperature of 350 ° C. or more in a temperature range of 100 to 300 ° C. It may have a (Tg).
- a method for preparing a polyamic acid polymer composite including a repeating unit represented by Chemical Formula 1 may include reacting a diamine, tetracarboxylic dianhydride, and optionally a diamine having a hydroxyl group. Preparing a polyamic acid comprising a repeating unit of 7;
- the polyamic acid prepared above is reacted with a silane compound represented by Formula 8 to prepare a polyamic acid polymer, and then reacted with an alkoxysilane to form a repeating unit of Formula 1, an ether bond, an amide bond, and an ester bond. It may comprise the step of preparing a polyamic acid polymer composite comprising silica-based particles chemically bonded to R 3 of the repeating unit via the selected bond.
- R 1 is selected from the group consisting of aromatic, alicyclic, and aliphatic divalent organic groups
- R 2 is selected from the group consisting of aromatic, alicyclic, and aliphatic tetravalent organic groups
- R 3 Is optionally selected from the group consisting of an aromatic, cycloaliphatic and aliphatic divalent organic group having a hydroxyl group
- R is an alkyl group having 1 to 5 carbon atoms
- X is an aliphatic or aromatic monovalent organic group including an electrophile
- n and m are each an integer of 1 or more.
- the diamine may be a compound comprising a divalent organic group selected from the group comprising an aromatic, alicyclic, and aliphatic divalent organic group, and two amino groups bonded to the divalent organic group.
- the diamine having a hydroxyl group in the above may include a divalent organic group selected from the group comprising an aromatic, alicyclic, and aliphatic divalent organic group, and two amino groups bonded to the divalent organic group, wherein
- the compound may be a compound in which at least one hydrogen atom in the organic group is substituted with a hydroxyl group.
- the diamine or a diamine having a hydroxyl group may be one or more hydrogen atoms in the molecule is substituted with a fluoroalkyl group having 1 to 10 carbon atoms.
- the diamine having the hydroxyl group is 2,2-bis (3-amino-4-hydroxyphenyl) -hexafluoropropane, 3,3'-dihydroxy-4,4'-diaminobiphenyl, 2,2-bis (3-amino-4-hydroxyphenyl) sulfone and mixtures thereof.
- the diamine and the diamine having a hydroxyl group may be used in a mole ratio of 99: 1 to 60:40.
- electrophile of Chemical Formula 8 may be selected from the group consisting of an isocyanate group, an ester group, an epoxy group, and a combination thereof.
- the compound of Formula 8 may be isocyanato propyltriethoxysilane or 3-glycidyloxypropyl triethoxysilane.
- the alkoxysilane may be selected from the group consisting of monoalkoxysilanes, dialkoxysilanes, trialkoxysilanes, tetraalkoxysilanes, and mixtures thereof.
- a method of manufacturing a display substrate includes coating a composition including the polyamic acid polymer composite on a support, followed by curing to form a polyimide film, and separating the polyimide film from the support. It may include the step.
- the display substrate manufactured using the polyamic acid polymer composite according to the present invention may be applied to a flexible display having high transparency and low thermal expansion.
- substituted means that at least one hydrogen contained in the compound or functional group is a halogen atom, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, a cycloalkyl group having 3 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, and a hydroxy group And substituted with a substituent selected from the group consisting of alkoxy groups, carboxylic acid groups, aldehyde groups, epoxy groups, cyano groups, nitro groups, amino groups, sulfonic acid groups and derivatives thereof having 1 to 10 carbon atoms.
- the present invention provides a polyamic acid polymer composite including a polyamic acid polymer having a repeating unit of Formula 1 and silica particles.
- R 1 may be selected from the group consisting of aromatic, alicyclic, and aliphatic divalent organic groups
- R 2 may be selected from the group consisting of aromatic, alicyclic, and aliphatic tetravalent organic groups
- R 3 may be selected from the group consisting of divalent or more organic groups, optionally derived from an aromatic, alicyclic or aliphatic having a hydroxyl group
- n and m are each an integer of 1 or more.
- the present invention also provides a polyimide having a repeating unit represented by the following formula (6) and a chemically bonded or physically bonded to R 3 of the repeating unit via a bond selected from the group consisting of ether bonds, amide bonds and ester bonds. It provides a display substrate comprising a polyimide polymer composite and a film thereof comprising the silica-based particles.
- R 1 to R 3 , n and m are as defined above.
- the present invention comprises the steps of preparing a polyamic acid comprising a repeating unit of the formula (7) by reacting a diamine, tetracarboxylic dianhydride, and optionally a diamine having a hydroxyl group;
- the polyamic acid prepared above is reacted with a silane compound represented by Formula 8 to prepare a polyamic acid polymer, and then reacted with an alkoxysilane to form a repeating unit of Formula 1, an ether bond, an amide bond, and an ester bond. It provides a method for producing a polyamic acid polymer composite of Formula 1 comprising the step of preparing a polyamic acid polymer composite comprising silica-based particles chemically bonded to R 3 of the repeating unit via a selected bond. .
- R 1 to R 3 , n and m are the same as defined above, R 3 'may be selected from the group consisting of aromatic, alicyclic and aliphatic divalent organic groups optionally having a hydroxyl group, R may be an alkyl group having 1 to 5 carbon atoms, and X may be an aliphatic or aromatic monovalent organic group including an electrophile.
- the present invention comprises the step of coating the composition comprising the polyamic acid polymer composite on the support and curing to form a film of the polyimide polymer composite, and separating the polyimide polymer composite film from the support
- a method of manufacturing a display substrate Provided is a method of manufacturing a display substrate.
- a polyamic acid polymer composite comprising silica-based particles bonded to each other.
- R 1 may be selected from the group consisting of aromatic, alicyclic, and aliphatic divalent organic groups
- R 2 may be selected from the group consisting of aromatic, alicyclic, and aliphatic tetravalent organic groups
- R 3 may be selected from the group consisting of divalent or more organic groups derived from aromatic, alicyclic or aliphatic having a hydroxyl group
- n and m may each be an integer of 1 or more.
- R 1 is an aromatic, alicyclic, or aliphatic divalent organic group derived from a diamine-based compound, specifically, an aromatic divalent organic group represented by Formulas 2a to 2d; An alicyclic divalent organic group including a functional group represented by Formula 2e and a cycloalkanediyl group having 4 to 18 carbon atoms; And aliphatic divalent organic groups including alkanediyl groups having 1 to 8 carbon atoms.
- the cycloalkanediyl group and the alkanediyl group may be substituted with a substituent selected from the group consisting of an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, and a sulfonic acid group.
- R 11 to R 17 may be each independently selected from the group consisting of an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, a sulfonic acid group, and a carboxylic acid group,
- A1, d1, and e1 may be each independently an integer of 0 to 4
- b1 may be an integer of 0 to 6
- c1 may be an integer of 0 to 3
- f1 and g1 may be each independently an integer of 0 to 10
- R 1 of Formula 1 may be a divalent organic group selected from the group consisting of Formulas 3a to 3u:
- At least one hydrogen atom in the divalent functional group of Formulas 3a to 3u is selected from the group consisting of an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, a sulfonic acid group and a carboxylic acid group It may be substituted by a substituent.
- R 1 of Chemical Formula 1 may be selected from divalent organic groups of Chemical Formulas 3c to 3e.
- R 1 is derived from any one compound selected from the group consisting of diphenyl ether, biphenyl, methylenedianiline, and 2,2'-bis (trifluoromethyl) biphenyl It may be a divalent organic group.
- At least one hydrogen atom in the divalent organic group of R 1 may be substituted with a fluoroalkyl group having 1 to 10 carbon atoms.
- R 2 of Formula 1 is an aromatic, alicyclic, or aliphatic tetravalent organic group derived from dione hydride, specifically, R 2 is an aromatic tetravalent organic group of Formulas 4a to 4d; Alicyclic tetravalent organic group containing a structure of a cycloalkane having 3 to 12 carbon atoms; An alicyclic tetravalent organic group of formula (4e); And it may be selected from the group consisting of aliphatic tetravalent organic groups having a branched alkane structure of 1 to 10 carbon atoms.
- R 21 to R 27 may be each independently an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group having 1 to 10 carbon atoms,
- A2 is an integer of 0 or 2
- b2 is an integer of 0 to 4
- c2 is an integer of 0 to 8
- d2 and e2 are each independently an integer of 0 to 3
- f2 and g2 are each independently an integer of 0 to 9 Can, and
- a 21 and A 22 are each independently a single bond, —O—, —CR 28 R 29 —, —C ( ⁇ O) —, —C ( ⁇ O) NH—, —S—, —SO 2 —, It may be selected from the group consisting of a phenylene group and combinations thereof, wherein R 28 and R 29 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluoroalkyl group having 1 to 10 carbon atoms It may be.
- R 2 of Formula 1 may be selected from the group consisting of tetravalent organic groups of Formulas 5a to 5t:
- x is an integer of 1 to 3.
- the tetravalent organic group of Chemical Formulas 5a to 5t may be substituted with a substituent by one or more hydrogen atoms present in the tetravalent organic group or an alkyl group having 1 to 10 carbon atoms or a fluoroalkyl group having 1 to 10 carbon atoms.
- R 3 of Formula 1 includes an aromatic, alicyclic or aliphatic divalent organic group, wherein the divalent or organic group is aromatic, alicyclic derived from a diamine-based compound in which at least one of the hydrogen atoms in the organic group is substituted with a hydroxyl group or a divalent aliphatic or more, preferably 2 is an organic group of at least 10 or less, and the above substituents R 1 except that any of the substituted hydroxyl group may be groups reactive to participate in the bonding to the silica particles May be selected from the structures described for the divalent organic group.
- substitution of one or more hydrogen atoms in the organic group of R 3 with a fluoroalkyl group having 1 to 10 carbon atoms is preferable because it can exhibit an improved effect in terms of transparency.
- n and n represent the number of repeating units included in the polymer, and m and n each independently represent an integer of 1 or more, and an upper limit thereof may be adjusted as necessary, and thus has no special meaning.
- the polyamic acid polymer composite according to the present invention has a structure in which silica-based particles are physically or chemically bound in a polyamic acid including the repeating structure of Chemical Formula 1.
- the silica-based particle has a hydroxyl group in R 3 in the repeating unit of Formula 1
- oxygen in the hydroxyl group acts as a nucleophile and reacts with an electrophile in a silane compound including an electrophile. It may be bonded to R 3 of the polyamic acid polymer via an ether bond, an amide bond, or an ester bond.
- silica-based particles may be physically bonded by affinity with a fluoroalkyl group substituted with R 1 or R 3 in Formula 1.
- the silica-based particles may include -Si-O- bonds that form a network structure with each other, and silicon on the surface of the silica-based particles may be chemically bonded to R 3 .
- the silica-based particles may be included in 1 to 50% by weight, preferably 3 to 40% by weight, more preferably 5 to 30% by weight based on the total weight of the polyamic acid polymer composite solids. If the content of the silica-based particles contained in the polyamic acid polymer composite is too low, the effect of the present invention is insignificant, whereas if the content of the silica-based particles is too high, the physical properties of the polyimide film produced using the polyamic acid polymer composite For example, since transparency etc. may fall, it is preferable to be contained in the said content.
- the introduction of the inorganic particles of the silica-based particles into the polyamic acid polymer enables the polyamic acid polymer composite to have high transparency and glass-level thermal expansion when manufactured by a polyimide film through imidization. It can be useful as a substrate.
- the polyamic acid prepared above is reacted with a silane compound represented by Formula 8 to prepare a polyamic acid polymer, and then reacted with an alkoxysilane to form a repeating unit of Formula 1, an ether bond, an amide bond, and an ester bond.
- a method for preparing a polyamic acid polymer composite of Chemical Formula 1 is provided, including preparing a polyamic acid polymer composite including silica-based particles chemically bonded to R 3 of the repeating unit via a selected bond.
- R 1 , R 2 , m and n are the same as defined above,
- R 3 ′ may be selected from the group consisting of an aromatic, alicyclic and aliphatic divalent organic group optionally having a hydroxyl group, wherein the aromatic, alicyclic and aliphatic divalent organic groups are the same as described above,
- R may be an alkyl group having 1 to 5 carbon atoms
- X may be an aliphatic or aromatic monovalent organic group including an electrophile.
- Step 1 is a step of preparing a polyamic acid comprising a repeating unit represented by Chemical Formula 7 by reacting diamine, tetracarboxylic dianhydride and optionally diamine having a hydroxyl group.
- the diamine usable in the preparation of the polyamic acid is a compound containing an aromatic, alicyclic, or aliphatic divalent organic group together with two amino groups, wherein the aromatic, alicyclic, or aliphatic divalent organic group has been described above. same.
- the tetracarboxylic dianhydride may be specifically used tetracarboxylic dianhydride containing an aromatic, alicyclic, or aliphatic tetravalent organic group.
- the aromatic, alicyclic, or aliphatic tetravalent organic group is the same as described above.
- the dianhydride is butanetetracarboxylic dione hydride, pentanetetracarboxylic dione hydride, hexanetetracarboxylic dione hydride, cyclopentanetetracarboxylic dione hydride, bicyclopentane tetracarbide.
- Cyclic Dione Hydride Cyclopropanetetracarboxylic Dione Hydride, Methylcyclohexanetetracarboxylic Dione Hydride, 3,3 ', 4,4'-Benzophenonetetracarboxylic Dione Hydride, 3,4 , 9,10-perylenetetracarboxylic dione hydride, 4,4'-sulfonyldiphthalic dione hydride, 3,3 ', 4,4'-biphenyltetracarboxylic dione hydride, 1, 2,5,6-naphthalenetetracarboxylic dionehydride, 2,3,6,7-naphthalenetetracarboxylic dionehydride, 1,4,5,8-naphthalenetetraca Cyclic Dione Hydride, 2,3,5,6, -Pyridine Tetracarboxylic Dione Hydride, m-terphenyl-3,3 ', 4,4'-Tetracarboxylic Dione Hydride, p
- the diamine having a hydroxyl group is a compound having at least one hydroxyl group together with two amino groups in the molecule, specifically, in a diamine containing an aromatic, alicyclic, or aliphatic divalent organic group, the aromatic, Diamine in which at least one hydrogen atom in an alicyclic or aliphatic divalent organic group is substituted with a hydroxyl group can be used.
- the aromatic, alicyclic, or aliphatic divalent organic group is the same as described above.
- the diamine having a hydroxyl group is 2,2-bis (3-amino-4-hydroxyphenyl) -hexafluoropropane, 3,3'-dihydroxy-4,4'-diaminobiphenyl And 2,2-bis (3-amino-4-hydroxyphenyl) sulfone.
- the diamine having a diamine or a hydroxyl group may be preferable that the substitution of one or more hydrogen atoms in the molecule with a fluoroalkyl group having 1 to 10 carbon atoms such as trifluoromethyl group can exhibit an improved effect in terms of transparency have.
- the method for producing a polyamic acid through the reaction of the diamine, dione hydride and the diamine having a hydroxyl group can be carried out according to a conventional polyamic acid polymerization production method such as solution polymerization.
- the diamine having a diamine and a hydroxyl group is dissolved in an organic solvent such as N, N-dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), and the like, and then, It can be prepared by adding a hydride and polymerizing.
- the reaction may be carried out in anhydrous conditions, the temperature during the polymerization reaction may be carried out at 25 to 50 °C, preferably 40 to 45 °C.
- the diamine used in the polyamic acid polymerization reaction and the diamine having a hydroxyl group may be used in a mole ratio of 99: 1 to 60:40. If the content of the diamine having a hydroxyl group out of the mixing ratio range is too low, the content of the bonding site with the silane-based compound is low to obtain the effect according to the present invention, if the content of the diamine having a hydroxyl group is too high, the effect of the heat resistance characteristics May be lowered, but when used in the molar ratio, a polyamic acid including the repeating unit represented by Chemical Formula 7 may be prepared without the above concern.
- Step 2 is a step of preparing a polyamic acid polymer by reacting a polyamic acid comprising a repeating unit of Formula 7 prepared above with silica-based particles or by reacting with a silane compound of Formula 8.
- the silane compound of Formula 8 is a silane compound including an aliphatic monovalent organic group including an electrophile together with an alkoxy group.
- X is an isocyanate group, an ester group, an epoxy group, and a combination thereof. It may be a chain alkyl group having 1 to 20 carbon atoms containing an electrophile selected from the group, R may be an alkyl group having 1 to 5 carbon atoms.
- the silane compound of the formula (8) may be a silane to the isocyanato propyl triethoxysilane, or 3-glycidyloxy propyl tree.
- the silane compound of Formula 8 may be used in the same amount as the hydroxyl group in the diamine having a hydroxyl group in step 1.
- reaction is preferably carried out at a temperature of 30 to 60 °C.
- the oxygen atom in the hydroxyl group contained in the functional group R 3 in the polyamic acid containing the repeating unit of formula (7) acts as a nucleophile
- the electrophile in the silane compound of formula (8) A reaction may occur to attack aliphatic chains, including.
- an ether bond, an amide bond, or an ester bond may be formed, and these bonds may produce a polyamic acid polymer including an alkoxysilane chemically bonded to R 3 of the repeating unit of Formula 7. have.
- Step 3 is a step of preparing a polyamic acid polymer composite by reacting the polyamic acid polymer and alkoxysilane prepared above.
- the alkoxysilane is not particularly limited, but may be selected from the group consisting of monoalkoxysilanes, dialkoxysilanes, trialkoxysilanes, and tetraalkoxysilanes, preferably tetraalkoxysilanes alone, and tetraalkoxysilanes. One or more of the remaining mono, di and trialkoxysilanes may be used together.
- the alkoxysilane during the reaction, the total content of SiO 2 generated from the silane compound of Formula 5 and the alkoxysilane compound in the step 2 is 1 to 50% by weight, preferably 3 to 40% by weight of the total solids, More preferably 5 to 30% by weight.
- reaction between the polyamic acid polymer and the alkoxysilane may be performed under acid catalyst conditions such as hydrochloric acid (HCl).
- acid catalyst conditions such as hydrochloric acid (HCl).
- Scheme 1 below schematically shows an example of a reaction for producing a polyamic acid polymer composite according to the present invention.
- Scheme 1 below is for the purpose of illustrating the present invention, but the present invention is not limited thereto.
- R 1 to R 3 , R 3 ′, X, m and n are as defined above, and Z represents an ether bond, an amide bond or an ester bond as a linking group.
- the Si in the silane compound is the polya as a result of the reaction between the hydroxyl group and the electrophile included in R 3 of the polyamic acid.
- the micro acid is bonded to the mixed acid through a Z linking group, and then silica particles may be formed by treatment with tetraethylorthosilicate (TEOS).
- TEOS tetraethylorthosilicate
- according to the present invention provides a method for manufacturing a display substrate through a curing process for the polyamic acid polymer composite comprising a repeating unit of the formula (1).
- the step of coating a composition comprising a polyamic acid polymer composite comprising a repeating unit of Formula 1 on a support and curing to form a polyimide film, and separating the polyimide film from the support It provides a method of manufacturing a display substrate comprising.
- composition comprising the polyamic acid polymer composite includes an organic solvent together with the polyamic acid polymer composite, wherein the organic solvent may be the same as described above.
- the content of the polyamic acid polymer composite included in the composition is not particularly limited, but may be included in an amount to have a viscosity of 5,000 to 50,000 cP in consideration of a coating process.
- the support can be used without particular limitations, such as glass, metal substrates, plastic substrates, among these, excellent in thermal and chemical stability during the curing process for the polyamic acid polymer composite, and the poly formed after curing, without a separate release agent treatment It may be desirable to use a glass substrate that can be easily separated without damage to the mid film.
- the coating process may be carried out according to a conventional coating method, specifically, spin coating method, bar coating method, roll coating method, air-knife method, gravure method, reverse roll method, kiss roll method, doctor blade method, spray Law, dipping or brushing may be used.
- the coating amount of the composition containing the polyamic acid polymer composite during the coating process may be coated on the support in a thickness range such that the final film has a thickness suitable for the display substrate, specifically 10 to 30 ⁇ m It may be coated in an amount to be thick.
- the curing process may be carried out by heat treatment at a temperature of 80 to 400 °C, it may also proceed to a multi-stage heat treatment at various temperatures within the temperature range.
- the imidation reaction occurs in the polyamic acid polymer composite to produce a polyimide polymer composite.
- Such a polyimide polymer composite is chemically or physically bonded to R 3 of the repeating unit through a linkage unit selected from the group consisting of a repeating unit represented by the following formula (6), an ether bond, an amide bond, and an ester bond. It has a structure containing the silica-based particles.
- R 1 to R 3 , m and n are the same as defined above.
- a display substrate manufactured by the above manufacturing method can be provided.
- the display substrate is chemically or physically bonded to R 3 of the repeating unit through a linkage selected from the group consisting of the repeating unit represented by Chemical Formula 6, and an ether bond, an amide bond, and an ester bond. It includes a polyimide polymer composite comprising a silica-based particles.
- the display substrate may include a polyimide polymer composite in which silica particles are chemically or physically bonded to the polyimide polymer, and thus may be applied to a flexible display having high transparency and a glass-level thermal expansion property.
- the display substrate has a light transmittance of 80% or more for light having a wavelength of 550 nm in a substrate thickness range of 10 to 30 ⁇ m without haze, and a thermal expansion coefficient of 20 ppm / K or less in a temperature range of 100 to 300 ° C. (Coeficient of Thermal Expansion, CTE), and may indicate a glass transition temperature (Tg) of 350 ° C. or more.
- BPDA-TFMB-BisApAf solution was heated to 50 ° C., and 1.683 g of isocyanatopropyltriethoxysilane (ICTEOS) was added and stirred for 2 hours.
- ICTEOS isocyanatopropyltriethoxysilane
- the resultant polyamic acid polymer-containing solution was heated to 60 ° C., and then 13.045 g of tetraethylorthosilicate (TEOS) and 8.342 g of 0.1N HCl were stirred for 4 hours to prepare a solution containing the polyamic acid polymer composite. It was. The total content of SiO 2 produced from ICTEOS and TEOS was adjusted to 5% by weight of the total solids.
- TEOS tetraethylorthosilicate
- silica nanoparticles (SiO 2 , 20 nm) dispersed in DMAc was added to the polyamic acid solution, compared to the polyamic acid solids, and stirred for 4 hours to prepare a solution including the polyamic acid polymer composite.
- silica nanoparticles (SiO 2 , 20 nm) dispersed in DMAc 30 wt% of silica nanoparticles (SiO 2 , 20 nm) dispersed in DMAc was added to the polyamic acid solution, which was dispersed in DMAc, and stirred for 4 hours to prepare a solution including the polyamic acid polymer composite.
- TFMB 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl
- ODPA 4,4'-oxydiphthalic anhydride
- a solution containing a polyamic acid polymer composite was added to the polyamic acid solution by adding 15 wt% of silica nanoparticles (SiO 2 , 20 nm) dispersed in DMAc to the polyamic acid solids and stirring for 4 hours.
- SiO 2 , 20 nm silica nanoparticles
- the components used to prepare the polyamic acid solution prepared in Examples 1 to 5 and Comparative Examples 1 to 7 are as follows.
- the prepared solutions were each spin coated onto glass substrates each having a thickness of 20 ⁇ m.
- the glass substrates coated with the solutions of Examples 1 to 3 and Comparative Examples 1 to 4 were placed in an oven and heated at a rate of 2 ° C./min, 15 minutes at 80 ° C., 30 minutes at 150 ° C., and 30 minutes at 220 ° C. 1 hour was maintained at 350 degreeC, and the hardening process was advanced.
- the glass substrate was placed in water, the film formed on the glass substrate was removed, and dried at 100 ° C. in an oven.
- the prepared solutions were each spin coated onto glass substrates each having a thickness of 20 ⁇ m.
- the glass substrates coated with the solutions of Examples 4 to 5 and Comparative Examples 5 to 7 were placed in an oven and heated at a rate of 2 ° C./min, 15 minutes at 80 ° C., 30 minutes at 150 ° C., and 30 minutes at 220 ° C. 1 hour at 300 degreeC was hold
- the glass substrate was placed in water, the film formed on the glass substrate was removed, and dried at 100 ° C. in an oven.
- the transmittances at 400, 450 and 550 nm of the polyimide films prepared according to the above preparation were measured.
- the transmittance was measured in the range of 300 to 800 nm using a UV spectrometer (G1103A, manufactured by Agilent).
- the polyimide films prepared according to the above preparation examples were each cut to a size of 15 ⁇ 5 mm, heated at 150 ° C. for 5 minutes, cooled to 30 ° C., and heated at a rate of 10 ° C./min, and thermal expansion property was applied by applying a force of 0.05 N. Measured. Thermal expansion was measured in the range of 100 to 300 ° C using TMA (SDTA840, manufactured by TA Instrument). The measurement results are shown in Table 3 below.
- the polyimide film prepared by using the polyamic acid polymer composite according to the present invention was found to have high transparency and thermal expansion of 20 ppm or less.
- the display substrate manufactured using the polyamic acid polymer composite according to the present invention may be applied to a flexible display having high transparency and low thermal expansion.
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Abstract
Description
구분 | 다이아민 | 무수물 | 실리카 첨가 |
실시예 1 | TFMB/ BisApAf | BPDA | Sol-gel 반응으로 5wt% 첨가 |
실시예 2 | TFMB/ BisApAf | BPDA | Sol-gel 반응으로 5wt% 첨가 |
실시예 3 | TFMB/ BisApAf | BPDA | Sol-gel 반응으로 5wt% 첨가 |
실시예 4 | TFMB | ODPA | 20wt% 첨가 |
실시예 5 | TFMB | ODPA | 30wt% 첨가 |
비교예 1 | TFMB | BPDA | 안함 |
비교예 2 | TFMB/ BisApAf | BPDA | 안함 |
비교예 3 | TFMB/ DHB | BPDA | 안함 |
비교예 4 | TFMB | ODPA | 안함 |
비교예 5 | MEMCHA | ODPA | 안함 |
비교예 6 | MEMCHA | ODPA | 5wt% 첨가 |
비교예 7 | MEMCHA | ODPA | 15wt% 첨가 |
구 분 | 두께(㎛) | 투과도(%) | ||
450nm | 550nm | |||
제조 예1 | 실시예 1 | 20 | 76.8 | 88.2 |
실시예 2 | 20 | 78 | 88 | |
실시예 3 | 19 | 79 | 88 | |
비교예 1 | 18 | 80.8 | 90.6 | |
비교예 2 | 20 | 76.6 | 87.3 | |
비교예 3 | 20 | 44.1 | 74.8 | |
비교예 4 | 20 | 84.9 | 87.9 | |
제조 예2 | 실시예 4 | 20 | 82 | 88 |
실시예 5 | 20 | 81 | 88.3 | |
비교예 5 | 20 | 85 | 89 | |
비교예 6 | - | 용액응집 | 용액응집 | |
비교예 7 | - | 용액응집 | 용액응집 | |
유리(0.7T) | 700 | 90.0 | 90.0 |
구분 | 두께(㎛) | CTE(ppm/K) | Tg(℃) | |
100~300℃ | ||||
제조예1 | 실시예 1 | 20 | 5.79 | 450< |
실시예 2 | 20 | 26.0 | 355 | |
실시예 3 | 19 | 14.5 | 450< | |
비교예 1 | 18 | 23.8 | 357 | |
비교예 2 | 20 | 19.4 | 388 | |
비교예 3 | 20 | 18 | 360 | |
비교예 4 | 20 | 51 | 293 | |
제조예2 | 실시예 4 | 20 | 20.0 | 350 |
실시예 5 | 20 | 18.0 | 350 | |
비교예 5 | 20 | 41.6 | 305 | |
비교예 6 | - | 용액응집 | 용액응집 | |
비교예 7 | - | 용액응집 | 용액응집 | |
유리 | 700 | 3.7 | - |
Claims (26)
- 제1항에 있어서,상기 R3는 수산화기를 갖는 방향족, 지환족 또는 지방족으로부터 유도되는 2가 이상의 유기기인 폴리아믹산 고분자 복합체.
- 제1항에 있어서, 상기 화학식 1의 상기 R1의 유기기내 1 이상의 수소원자 또는 상기 R3의 유기기내 1 이상의 수소원자가 탄소수 1 내지 10의 플루오로알킬기로 치환된 것인 폴리아믹산 고분자 복합체.
- 제1항에 있어서, 상기 실리카계 입자 표면의 실리콘 원자와, 상기 R3이 화학적으로 결합되어 있는 폴리아믹산 고분자 복합체.
- 제1항에 있어서, 상기 실리카계 입자는 에테르 결합, 아미드 결합, 및 에스터 결합으로 이루어지는 군으로부터 선택되는 결합을 매개로, 상기 반복 단위의 R3에 화학적으로 결합된 것인 폴리아믹산 고분자 복합체.
- 제4항에 있어서, 상기 실리카계 입자는 서로 망상 구조를 이루고 있는 -Si-O- 결합들을 포함하는 폴리아믹산 고분자 복합체.
- 제1항에 있어서, 상기 화학식 1의 R1은 하기 화학식 2a 내지 2d의 방향족 2가 유기기, 하기 화학식 2e의 지환족 2가 유기기, 탄소수 4 내지 18의 사이클로알칸디일기를 포함하는 지환족 2가 유기기, 및 탄소수 1 내지 8의 알칸디일기를 포함하는 지방족 2가 유기기로 이루어진 군으로부터 선택되는 2가 유기기인 폴리아믹산 고분자 복합체.[화학식 2a][화학식 2b][화학식 2c][화학식 2d][화학식 2e]상기 화학식 2a 내지 2e에서,R11내지 R17는 각각 독립적으로 탄소수 1 내지 10의 알킬기, 탄소수 1 내지 10의 플루오로알킬기, 탄소수 6 내지 12의 아릴기, 술폰산기 및 카르복실산기로 이루어진 군에서 선택되는 것이고,a1, d1 및 e1은 각각 독립적으로 0 내지 4의 정수, b1은 0 내지 6의 정수, c1은 0 내지 3의 정수, 그리고 f1 및 g1은 각각 독립적으로 0 내지 10의 정수이며, 그리고A11및 A12는 각각 독립적으로 단일결합, -O-, -CR18R19-, -C(=O)-, -C(=O)NH-, -S-, -SO2-, 페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되며, 이때 R18및 R19는 각각 독립적으로 수소원자, 탄소수 1 내지 10의 알킬기 및 탄소수 1 내지 10의 플루오로알킬기로 이루어진 군으로부터 선택되는 것이다.
- 제1항에 있어서, 상기 화학식 1의 R2는 하기 화학식 4a 내지 4d의 방향족 4가 유기기, 탄소수 3 내지 12의 사이클로알칸의 구조를 포함하는 지환족 4가 유기기, 하기 화학식 4e의 지환족 4가 유기기, 및 탄소수 1 내지 10의 분지상 알칸 구조를 갖는 지방족 4가 유기기로 이루어진 군에서 선택되는 것인 폴리아믹산 고분자 복합체:[화학식 4a][화학식 4b][화학식 4c][화학식 4d][화학식 4e]상기 화학식 4a 내지 4e에서,R21내지 R27는 각각 독립적으로 탄소수 1 내지 10의 알킬기 또는 탄소수 1 내지 10의 플루오로알킬기이고,a2는 0 또는 2의 정수, b2는 0 내지 4의 정수, c2는 0 내지 8의 정수, d2 및 e2는 각각 독립적으로 0 내지 3의 정수, f2 및 g2는 각각 독립적으로 0 내지 9의 정수이며, 그리고A21및 A22는 각각 독립적으로 단일결합, -O-, -CR28R29-,-C(=O)-,-C(=O)NH-,-S-,-SO2-,페닐렌기 및 이들의 조합으로 이루어진 군에서 선택되며, 이때 상기 R28및 R29는 각각 독립적으로 수소원자, 탄소수 1 내지 10의 알킬기 및 탄소수 1 내지 10의 플루오로알킬기로 이루어진 군으로부터 선택되는 것이다.
- 제1항에 있어서, 상기 화학식 1의 R3는, 방향족, 지환족 및 지방족 2가 유기기로 이루어진 군에서 선택되는 2가 유기기를 포함하고 상기 2가 유기기에 포함된 수소원자 중 적어도 하나가 수산화기로 치환된 다이아민으로부터 유도된 것인 폴리아믹산 고분자 복합체.
- 제1항에 있어서, 상기 화학식 1의 R3는 2,2-비스(3-아미노-4-하이드록시페닐)-헥사플루오로프로판, 3,3’-다이하이드록시-4,4’-다이아미노바이페닐, 및 2,2-비스(3-아미노-4-하이드록시페닐)설폰으로 이루어진 군으로부터 선택되는 화합물로부터 유도된 유기기인 폴리아믹산 고분자 복합체.
- 제13항의 폴리이미드 고분자 복합체의 필름을 포함하는 디스플레이 기판.
- 제14항에 있어서, 상기 디스플레이 기판은 10 내지 30㎛의 두께 범위에서 550nm의 파장의 빛에 대한 광투과도가 80% 이상이고, 100 내지 300℃의 온도범위에서 20ppm/K 이하의 열팽창계수 및 350℃ 이상의 유리전이온도(Tg)를 갖는 것인 디스플레이 기판.
- 다이아민, 테트라카르복실산 다이언하이드라이드, 및 선택적으로 수산화기를 갖는 다이아민을 반응시켜 하기 화학식 7의 반복단위를 포함하는 폴리아믹산을 제조하는 단계;상기 제조된 폴리아믹산과 실리카계 입자를 혼합한 후 반응시켜 화학식 1의 반복단위를 갖는 폴리아믹산 고분자와 실리카계 입자를 포함하는 복합체를 제조하거나, 또는상기 제조된 폴리아믹산과 하기 화학식 8로 표시되는 실란 화합물을 반응시켜 폴리아믹산 고분자를 제조한 다음 알콕시실란을 반응시켜 하기 화학식 1의 반복단위와, 에테르 결합, 아미드 결합, 및 에스터 결합으로 이루어지는 군으로부터 선택되는 결합을 매개로, 상기 반복 단위의 R3에 화학적으로 결합된 실리카계 입자를 포함하는 폴리아믹산 고분자 복합체를 제조하는, 폴리아믹산 고분자 복합체의 제조방법:[화학식 1][화학식 7][화학식 8]상기 화학식 1, 7 및 8에서,R1은 방향족, 지환족, 및 지방족의 2가 유기기로 이루어진 군으로부터 선택되고,R2는 방향족, 지환족, 및 지방족 4가 유기기로 이루어진 군으로부터 선택되며,R3은 선택적으로 수산화기를 갖는 방향족, 지환족 또는 지방족으로부터 유도되는 2가 이상의 유기기로 이루어진 군으로부터 선택되고,R3’는 선택적으로 수산화기를 갖는 방향족, 지환족 및 지방족의 2가 유기기로 이루어진 군에서 선택되며,R은 탄소수 1 내지 5의 알킬기이며,X는 친전자체를 포함하는 지방족 또는 방향족 1가 유기기이고, 그리고n 및 m은 각각 1 이상의 정수이다.
- 제16항에 있어서, 상기 R3는 수산화기를 갖는 방향족, 지환족 또는 지방족으로부터 유도되는 2가 이상의 유기기로 이루어진 군으로부터 선택되고,상기 R3’는 수산화기를 갖는 방향족, 지환족 및 지방족의 2가 유기기로 이루어진 군으로부터 선택되는, 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 다이아민은 방향족, 지환족, 및 지방족 2가 유기기를 포함하는 군으로부터 선택되는 2가 유기기, 및 상기 2가 유기기에 결합하는 2개의 아미노기를 포함하는 화합물인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 수산화기를 갖는 다이아민은, 방향족, 지환족, 및 지방족 2가 유기기를 포함하는 군으로부터 선택되는 2가 유기기, 및 상기 2가 유기기에 결합하는 2개의 아미노기를 포함하며, 상기 2가 유기기 내의 1 이상의 수소원자가 수산화기로 치환된 화합물인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 다이아민 또는 수산화기를 갖는 다이아민은 분자내 1개 이상의 수소원자가 플루오로알킬기로 치환된 것인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 수산화기를 갖는 다이아민은 2,2-비스(3-아미노-4-하이드록시페닐)-헥사플루오로프로판, 3,3’-다이하이드록시-4,4’-다이아미노바이페닐, 2,2-비스(3-아미노-4-하이드록시페닐)설폰 및 이들의 혼합물로 이루어진 군으로부터 선택되는 것인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 다이아민과 수산화기를 갖는 다이아민은 99:1 내지 60:40의 몰(mol)비로 반응하는 것인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 화학식 8의 친전자체는 이소시아네이트기, 에스터기, 에폭시기 및 이들의 조합으로 이루어진 군으로부터 선택되는 것인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 화학식 8의 화합물은 이소시아네이토 프로필트리에톡시실란 또는 3-글리시딜록시프로필 트리에톡시실란인 폴리아믹산 고분자 복합체의 제조방법.
- 제16항에 있어서, 상기 알콕시실란은 모노알콕시실란, 디알콕시실란, 트리알콕시실란, 테트라알콕시실란 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 것인 폴리아믹산 고분자 복합체의 제조방법.
- 제1항 내지 제12항 중 어느 한 항의 폴리아믹산 고분자 복합체를 포함하는 조성물을 지지체에 코팅한 후 경화하여 폴리이미드 고분자 복합체 필름을 형성하는 단계; 그리고상기 폴리이미드 고분자 복합체 필름을 지지체로부터 분리하는 단계를 포함하는 디스플레이 기판의 제조방법.
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US14/354,849 US9278488B2 (en) | 2012-07-03 | 2013-07-03 | Polyamic acid polymer composite and preparation method thereof |
JP2014540984A JP5971736B2 (ja) | 2012-07-03 | 2013-07-03 | ポリアミック酸高分子複合体及びこの製造方法{polyamicacidpolymercompositeandmethodforproducingsame} |
CN201380003871.2A CN103930489B (zh) | 2012-07-03 | 2013-07-03 | 聚酰胺酸高分子复合物及其制备方法 |
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KR1020130077439A KR101382170B1 (ko) | 2012-07-03 | 2013-07-02 | 폴리아믹산 고분자 복합체 및 이의 제조방법 |
KR10-2013-0077439 | 2013-07-02 |
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