DE60315205T2 - Epoxidharzzusammensetzung, Verfahren zur Oberflächenbehandlung, Flüssigkeitsstrahlaufzeichnungskopf und ein Flüssigkeitsstrahlaufzeichnungsgerät - Google Patents
Epoxidharzzusammensetzung, Verfahren zur Oberflächenbehandlung, Flüssigkeitsstrahlaufzeichnungskopf und ein Flüssigkeitsstrahlaufzeichnungsgerät Download PDFInfo
- Publication number
- DE60315205T2 DE60315205T2 DE60315205T DE60315205T DE60315205T2 DE 60315205 T2 DE60315205 T2 DE 60315205T2 DE 60315205 T DE60315205 T DE 60315205T DE 60315205 T DE60315205 T DE 60315205T DE 60315205 T2 DE60315205 T2 DE 60315205T2
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- Prior art keywords
- epoxy resin
- resin composition
- film
- ink
- jet recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 82
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 82
- 239000000203 mixture Substances 0.000 title claims abstract description 60
- 239000007788 liquid Substances 0.000 title claims description 37
- 238000000034 method Methods 0.000 title claims description 34
- 238000004381 surface treatment Methods 0.000 title claims description 16
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 15
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 14
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 14
- 125000005376 alkyl siloxane group Chemical group 0.000 claims abstract description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 11
- 239000002685 polymerization catalyst Substances 0.000 claims abstract description 7
- 238000010538 cationic polymerization reaction Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 29
- 150000001875 compounds Chemical class 0.000 claims description 18
- 230000005855 radiation Effects 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 8
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- 239000002841 Lewis acid Substances 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 150000007517 lewis acids Chemical class 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 3
- 125000002560 nitrile group Chemical group 0.000 claims description 2
- 239000000976 ink Substances 0.000 description 76
- 239000011342 resin composition Substances 0.000 description 38
- 239000005871 repellent Substances 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 239000000463 material Substances 0.000 description 20
- 230000002940 repellent Effects 0.000 description 19
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 239000002904 solvent Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 10
- -1 perfluoro groups Chemical group 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- 230000005499 meniscus Effects 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 239000003495 polar organic solvent Substances 0.000 description 7
- 230000001678 irradiating effect Effects 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000011417 postcuring Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- IEMNEAVSEGLTHB-UHFFFAOYSA-N 2-[[4-[1,1,1,3,3,3-hexafluoro-2-[4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenoxy]methyl]oxirane Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C(F)(F)F)(C(F)(F)F)C(C=C1)=CC=C1OCC1CO1 IEMNEAVSEGLTHB-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- YTJDSANDEZLYOU-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoro-2-[4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound FC(F)(F)C(C(F)(F)F)(O)C1=CC=C(C(O)(C(F)(F)F)C(F)(F)F)C=C1 YTJDSANDEZLYOU-UHFFFAOYSA-N 0.000 description 1
- OGKXDOHOOONBIR-UHFFFAOYSA-N 2-[[1,1,1,3,3,3-hexafluoro-2-[3-[1,1,1,3,3,3-hexafluoro-2-(oxiran-2-ylmethoxy)propan-2-yl]phenyl]propan-2-yl]oxymethyl]oxirane Chemical compound C=1C=CC(C(OCC2OC2)(C(F)(F)F)C(F)(F)F)=CC=1C(C(F)(F)F)(C(F)(F)F)OCC1CO1 OGKXDOHOOONBIR-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 0 C*CCCC(CC(CC1)Sc(cc2)ccc2S(*)(C(CCC2[*+])CC2C2=*(C)C2)c2ccc(*)cc2)[C@@]1S(*)(C1CCC(*)CC1)c1ccc(*)cc1 Chemical compound C*CCCC(CC(CC1)Sc(cc2)ccc2S(*)(C(CCC2[*+])CC2C2=*(C)C2)c2ccc(*)cc2)[C@@]1S(*)(C1CCC(*)CC1)c1ccc(*)cc1 0.000 description 1
- 101100116570 Caenorhabditis elegans cup-2 gene Proteins 0.000 description 1
- 101100116572 Drosophila melanogaster Der-1 gene Proteins 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241001295925 Gegenes Species 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- DNFSNYQTQMVTOK-UHFFFAOYSA-N bis(4-tert-butylphenyl)iodanium Chemical class C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 DNFSNYQTQMVTOK-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 235000019241 carbon black Nutrition 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000001042 pigment based ink Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000003578 releasing effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002008439 | 2002-01-17 | ||
| JP2002008439 | 2002-01-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60315205D1 DE60315205D1 (de) | 2007-09-13 |
| DE60315205T2 true DE60315205T2 (de) | 2008-05-08 |
Family
ID=19191421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60315205T Expired - Lifetime DE60315205T2 (de) | 2002-01-17 | 2003-01-16 | Epoxidharzzusammensetzung, Verfahren zur Oberflächenbehandlung, Flüssigkeitsstrahlaufzeichnungskopf und ein Flüssigkeitsstrahlaufzeichnungsgerät |
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Families Citing this family (26)
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| CN1208388C (zh) * | 2002-01-17 | 2005-06-29 | 佳能株式会社 | 环氧树脂组合物、表面处理方法、液体喷射记录头和液体喷射记录装置 |
| ES2316877T3 (es) * | 2003-07-22 | 2009-04-16 | Leibniz-Institut Fur Neue Materialien Gemeinnutzige Gmbh | Composicion de recubrimiento repelente a liquidos conresistencia a los alcalis y recubrimiento que se pueda usar en procedimientos de formacacion de patrones. |
| AU2003254564A1 (en) * | 2003-07-22 | 2005-02-25 | Canon Kabushiki Kaisha | Liquid-repellent coating composition and coating having high alkali resistance |
| CN101068845B (zh) * | 2004-12-03 | 2010-05-26 | 三菱化学株式会社 | 组合物、固化物和物品 |
| DE102005002960A1 (de) * | 2005-01-21 | 2006-08-03 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität |
| EP1801142B1 (en) | 2005-12-16 | 2016-02-24 | Canon Kabushiki Kaisha | Resin composition,resin cured product, and liquid discharge head |
| CN100556954C (zh) * | 2006-06-05 | 2009-11-04 | 中国科学院化学研究所 | 发光二级管封装用耐紫外和高温老化的有机硅环氧树脂组合物 |
| WO2008000680A1 (en) * | 2006-06-27 | 2008-01-03 | Clariant International Ltd | Fluorous telomeric compounds and polymers containing same |
| DE102006033280A1 (de) * | 2006-07-18 | 2008-01-24 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Kompositzusammensetzung für mikrostrukturierte Schichten |
| JP4865473B2 (ja) * | 2006-09-25 | 2012-02-01 | 富士フイルム株式会社 | 成形印刷物の製造方法、及び、成形印刷物 |
| KR20080067925A (ko) * | 2007-01-17 | 2008-07-22 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| JP2009143048A (ja) * | 2007-12-12 | 2009-07-02 | Tdk Corp | ハードコート層および光透過層を有する積層体およびその製造方法 |
| JP5315681B2 (ja) * | 2007-12-12 | 2013-10-16 | Ｔｄｋ株式会社 | ハードコート用組成物、ハードコート層を有する物体およびその製造方法 |
| US8563115B2 (en) * | 2008-08-12 | 2013-10-22 | Xerox Corporation | Protective coatings for solid inkjet applications |
| US8191992B2 (en) * | 2008-12-15 | 2012-06-05 | Xerox Corporation | Protective coatings for solid inkjet applications |
| JP5726181B2 (ja) * | 2010-05-27 | 2015-05-27 | 昭和電工株式会社 | フッ素及びエポキシ基含有共重合体及びその製造方法 |
| JP5783854B2 (ja) * | 2011-09-01 | 2015-09-24 | キヤノン株式会社 | 液体吐出ヘッドの製造方法、および液体吐出ヘッド |
| KR101482687B1 (ko) * | 2013-02-20 | 2015-01-16 | 한국과학기술원 | 투명 플렉시블 하드코팅 필름, 및 이의 제조 방법 |
| US10246606B2 (en) | 2013-02-20 | 2019-04-02 | Korea Advanced Institute Of Science And Technology | Transparent flexible hard coated film and method of producing the same |
| US20140303284A1 (en) * | 2013-03-15 | 2014-10-09 | The Sherwin-Williams Company | Expoxyfluorosilicones and modified polyacrylic resins for coating compositions |
| USD728577S1 (en) * | 2014-07-01 | 2015-05-05 | Google Inc. | Mobile device module |
| USD730906S1 (en) * | 2014-07-01 | 2015-06-02 | Google Inc. | Mobile device module |
| JP6991806B2 (ja) * | 2017-09-14 | 2022-01-13 | 東芝テック株式会社 | インクジェットヘッド及びインクジェットプリンタ |
| JP2019051636A (ja) * | 2017-09-14 | 2019-04-04 | 東芝テック株式会社 | インクジェットヘッド及びインクジェットプリンタ |
| JP7098350B2 (ja) | 2018-02-28 | 2022-07-11 | キヤノン株式会社 | 接着シートを用いたインクジェット記録ヘッド及び製造方法 |
| JP7077774B2 (ja) * | 2018-05-23 | 2022-05-31 | 信越化学工業株式会社 | 活性エネルギー線硬化性組成物 |
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| JPH0233053B2 (ja) | 1985-04-30 | 1990-07-25 | Osaka City | Azokiganjuhorishirokisanamido |
| US4688052A (en) * | 1985-07-13 | 1987-08-18 | Canon Kabushiki Kaisha | Liquid jet recording head having a layer of a resin composition curable with an active energy ray |
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| IT1199770B (it) | 1986-12-16 | 1988-12-30 | Ausimont Spa | Resine epossidiche ottenute mediante coreticolazione di prepolimeri epossidici fluorurati e prepolimeri epossidici non fluorurati |
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| JP3274031B2 (ja) * | 1993-10-13 | 2002-04-15 | キヤノン株式会社 | インクジェットヘッドおよび該インクジェットヘッドを備えたインクジェット装置 |
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| WO1996041835A1 (fr) * | 1995-06-13 | 1996-12-27 | Canon Kabushiki Kaisha | Composition de resine epoxyde a base de fluor tres soluble dans des solvants |
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| JPH09239992A (ja) * | 1996-03-12 | 1997-09-16 | Canon Inc | 液体噴射記録ヘッド、その製造方法、及び該ヘッドを有する液体噴射記録装置 |
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| US6409931B1 (en) * | 1998-01-26 | 2002-06-25 | Canon Kabushiki Kaisha | Method of producing ink jet recording head and ink jet recording head |
| US6472129B2 (en) | 1998-03-10 | 2002-10-29 | Canon Kabushiki Kaisha | Fluorine-containing epoxy resin composition, and surface modification process, ink jet recording head and ink jet recording apparatus making use of the same |
| US6139920A (en) * | 1998-12-21 | 2000-10-31 | Xerox Corporation | Photoresist compositions |
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| JP4033286B2 (ja) * | 2001-03-19 | 2008-01-16 | 日本板硝子株式会社 | 高屈折率誘電体膜とその製造方法 |
| US6750290B2 (en) * | 2001-04-19 | 2004-06-15 | Canon Kabushiki Kaisha | Epoxy resin composition, method of improving surface of substrate, ink jet recording head and ink jet recording apparatus |
| US6846520B2 (en) * | 2002-01-17 | 2005-01-25 | Canon Kabushiki Kaisha | Epoxy resin composition, surface treatment method, liquid-jet recording head and liquid-jet recording apparatus |
| CN1208388C (zh) * | 2002-01-17 | 2005-06-29 | 佳能株式会社 | 环氧树脂组合物、表面处理方法、液体喷射记录头和液体喷射记录装置 |
| US6869541B2 (en) * | 2002-02-21 | 2005-03-22 | Canon Kabushiki Kaisha | Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus |
-
2003
- 2003-01-13 US US10/340,708 patent/US6992117B2/en not_active Expired - Fee Related
- 2003-01-14 CN CNB031004423A patent/CN1208389C/zh not_active Expired - Fee Related
- 2003-01-16 AT AT03000968T patent/ATE368697T1/de not_active IP Right Cessation
- 2003-01-16 ES ES03000968T patent/ES2287366T3/es not_active Expired - Lifetime
- 2003-01-16 EP EP03000968A patent/EP1333046B1/en not_active Expired - Lifetime
- 2003-01-16 DE DE60315205T patent/DE60315205T2/de not_active Expired - Lifetime
- 2003-01-16 KR KR1020030002999A patent/KR100626782B1/ko not_active IP Right Cessation
-
2005
- 2005-06-27 US US11/166,124 patent/US7399502B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1333046A3 (en) | 2004-09-08 |
| KR100626782B1 (ko) | 2006-09-22 |
| DE60315205D1 (de) | 2007-09-13 |
| KR20030063165A (ko) | 2003-07-28 |
| EP1333046B1 (en) | 2007-08-01 |
| CN1208389C (zh) | 2005-06-29 |
| US20050267265A1 (en) | 2005-12-01 |
| EP1333046A2 (en) | 2003-08-06 |
| US6992117B2 (en) | 2006-01-31 |
| US7399502B2 (en) | 2008-07-15 |
| ATE368697T1 (de) | 2007-08-15 |
| CN1432601A (zh) | 2003-07-30 |
| ES2287366T3 (es) | 2007-12-16 |
| US20030169313A1 (en) | 2003-09-11 |
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