DE60217610D1 - Elektronische Anordnung mit einer Elektrode und ihre Herstellung - Google Patents
Elektronische Anordnung mit einer Elektrode und ihre HerstellungInfo
- Publication number
- DE60217610D1 DE60217610D1 DE60217610T DE60217610T DE60217610D1 DE 60217610 D1 DE60217610 D1 DE 60217610D1 DE 60217610 T DE60217610 T DE 60217610T DE 60217610 T DE60217610 T DE 60217610T DE 60217610 D1 DE60217610 D1 DE 60217610D1
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- manufacture
- electronic assembly
- electronic
- assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
- H10B53/30—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
- H01L28/56—Capacitors with a dielectric comprising a perovskite structure material the dielectric comprising two or more layers, e.g. comprising buffer layers, seed layers, gradient layers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Semiconductor Memories (AREA)
- Ceramic Capacitors (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001329688 | 2001-10-26 | ||
JP2001329688A JP2003133531A (ja) | 2001-10-26 | 2001-10-26 | 電子装置とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60217610D1 true DE60217610D1 (de) | 2007-03-08 |
DE60217610T2 DE60217610T2 (de) | 2007-10-25 |
Family
ID=19145544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60217610T Expired - Fee Related DE60217610T2 (de) | 2001-10-26 | 2002-03-27 | Elektronische Anordnung mit einer Elektrode und ihre Herstellung |
Country Status (7)
Country | Link |
---|---|
US (2) | US6744085B2 (de) |
EP (1) | EP1306889B1 (de) |
JP (1) | JP2003133531A (de) |
KR (1) | KR20030035761A (de) |
CN (1) | CN1212665C (de) |
DE (1) | DE60217610T2 (de) |
TW (1) | TW535179B (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7494927B2 (en) * | 2000-05-15 | 2009-02-24 | Asm International N.V. | Method of growing electrical conductors |
JP2004356313A (ja) * | 2003-05-28 | 2004-12-16 | Seiko Epson Corp | 半導体装置及びその製造方法 |
CN100420024C (zh) * | 2003-06-06 | 2008-09-17 | 富士通株式会社 | 半导体器件的制造方法 |
US7884403B2 (en) | 2004-03-12 | 2011-02-08 | Japan Science And Technology Agency | Magnetic tunnel junction device and memory device including the same |
JP2006073648A (ja) | 2004-08-31 | 2006-03-16 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US7666773B2 (en) | 2005-03-15 | 2010-02-23 | Asm International N.V. | Selective deposition of noble metal thin films |
US8025922B2 (en) | 2005-03-15 | 2011-09-27 | Asm International N.V. | Enhanced deposition of noble metals |
KR100725081B1 (ko) * | 2005-06-14 | 2007-06-08 | 후지쯔 가부시끼가이샤 | 반도체 장치의 제조 방법 |
US20070014919A1 (en) * | 2005-07-15 | 2007-01-18 | Jani Hamalainen | Atomic layer deposition of noble metal oxides |
JP5211558B2 (ja) * | 2007-06-18 | 2013-06-12 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
US20090087339A1 (en) * | 2007-09-28 | 2009-04-02 | Asm Japan K.K. | METHOD FOR FORMING RUTHENIUM COMPLEX FILM USING Beta-DIKETONE-COORDINATED RUTHENIUM PRECURSOR |
JP4888418B2 (ja) * | 2008-02-29 | 2012-02-29 | ソニー株式会社 | 可変容量素子とその制御方法、電子デバイス及び通信モバイル機器 |
WO2009122497A1 (ja) | 2008-03-31 | 2009-10-08 | 富士通マイクロエレクトロニクス株式会社 | 強誘電体メモリとその製造方法、及び強誘電体キャパシタの製造方法 |
US8084104B2 (en) * | 2008-08-29 | 2011-12-27 | Asm Japan K.K. | Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition |
US8133555B2 (en) | 2008-10-14 | 2012-03-13 | Asm Japan K.K. | Method for forming metal film by ALD using beta-diketone metal complex |
US9379011B2 (en) | 2008-12-19 | 2016-06-28 | Asm International N.V. | Methods for depositing nickel films and for making nickel silicide and nickel germanide |
US20110020546A1 (en) * | 2009-05-15 | 2011-01-27 | Asm International N.V. | Low Temperature ALD of Noble Metals |
KR200458200Y1 (ko) * | 2010-04-06 | 2012-01-30 | 오길식 | 분해가 어려운 커버 유동식 엘이디 천정등 |
CN102151526A (zh) * | 2010-07-23 | 2011-08-17 | 兰州理工大学 | 调控钙钛矿锰氧化物铁磁转变温度的方法 |
US8871617B2 (en) | 2011-04-22 | 2014-10-28 | Asm Ip Holding B.V. | Deposition and reduction of mixed metal oxide thin films |
US8866367B2 (en) | 2011-10-17 | 2014-10-21 | The United States Of America As Represented By The Secretary Of The Army | Thermally oxidized seed layers for the production of {001} textured electrodes and PZT devices and method of making |
US9761785B2 (en) | 2011-10-17 | 2017-09-12 | The United States Of America As Represented By The Secretary Of The Army | Stylo-epitaxial piezoelectric and ferroelectric devices and method of manufacturing |
US9607842B1 (en) | 2015-10-02 | 2017-03-28 | Asm Ip Holding B.V. | Methods of forming metal silicides |
US9876018B2 (en) * | 2015-12-03 | 2018-01-23 | Micron Technology, Inc. | Ferroelectric capacitor, ferroelectric field effect transistor, and method used in forming an electronic component comprising conductive material and ferroelectric material |
US10896950B2 (en) * | 2017-02-27 | 2021-01-19 | Nxp Usa, Inc. | Method and apparatus for a thin film dielectric stack |
US10923286B2 (en) | 2018-02-21 | 2021-02-16 | Nxp Usa, Inc. | Method and apparatus for compensating for high thermal expansion coefficient mismatch of a stacked device |
CN115959905B (zh) * | 2022-12-07 | 2023-08-18 | 南京航空航天大学 | 一种钛锆酸铅与氧化镁垂直自组装纳米复合介电储能薄膜及其制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5192723A (en) * | 1990-09-04 | 1993-03-09 | Nikon Corporation | Method of phase transition, method for producing lead niobate-based complex oxide utilizing said phase transition method, and lead niobate-based complex oxide produced by said method |
DE69326944T2 (de) * | 1992-04-13 | 2000-03-30 | Virginia Tech Intell Prop | Stapelelektroden für ferroelektrische vorrichtungen |
US5514484A (en) * | 1992-11-05 | 1996-05-07 | Fuji Xerox Co., Ltd. | Oriented ferroelectric thin film |
JPH07153643A (ja) | 1993-11-29 | 1995-06-16 | Nissin Electric Co Ltd | 積層誘電体素子 |
JP3460095B2 (ja) * | 1994-06-01 | 2003-10-27 | 富士通株式会社 | 強誘電体メモリ |
DE4421007A1 (de) * | 1994-06-18 | 1995-12-21 | Philips Patentverwaltung | Elektronisches Bauteil und Verfahren zu seiner Herstellung |
JPH098243A (ja) | 1995-06-20 | 1997-01-10 | Matsushita Electron Corp | セラミック薄膜と金属電極の接合構造と半導体装置およびその製造方法 |
KR100199095B1 (ko) * | 1995-12-27 | 1999-06-15 | 구본준 | 반도체 메모리 셀의 캐패시터 구조 및 그 제조방법 |
JP3435966B2 (ja) * | 1996-03-13 | 2003-08-11 | 株式会社日立製作所 | 強誘電体素子とその製造方法 |
CN1234137A (zh) * | 1996-08-20 | 1999-11-03 | 株式会社日立制作所 | 氧化物电介质元件的制造方法、采用该元件的存储器及半导体装置 |
JPH10189887A (ja) * | 1996-12-27 | 1998-07-21 | Sanyo Electric Co Ltd | 強誘電体用電極及びそれを使用した強誘電体デバイス |
JP3974697B2 (ja) * | 1997-11-28 | 2007-09-12 | ローム株式会社 | キャパシタおよびその製法 |
US6432793B1 (en) * | 1997-12-12 | 2002-08-13 | Micron Technology, Inc. | Oxidative conditioning method for metal oxide layer and applications thereof |
US6117689A (en) * | 1997-12-24 | 2000-09-12 | Texas Instruments Incorporated | Stable high-dielectric-constant material electrode and method |
US6258459B1 (en) * | 1998-04-28 | 2001-07-10 | Tdk Corporation | Multilayer thin film |
US6815219B2 (en) * | 1999-12-27 | 2004-11-09 | Hynix Semiconductor Inc. | Fabrication method and structure for ferroelectric nonvolatile memory field effect transistor |
-
2001
- 2001-10-26 JP JP2001329688A patent/JP2003133531A/ja active Pending
-
2002
- 2002-02-19 US US10/076,349 patent/US6744085B2/en not_active Expired - Fee Related
- 2002-03-05 TW TW091104016A patent/TW535179B/zh not_active IP Right Cessation
- 2002-03-15 KR KR1020020014011A patent/KR20030035761A/ko active IP Right Grant
- 2002-03-27 EP EP02252255A patent/EP1306889B1/de not_active Expired - Fee Related
- 2002-03-27 DE DE60217610T patent/DE60217610T2/de not_active Expired - Fee Related
- 2002-03-28 CN CNB021083045A patent/CN1212665C/zh not_active Expired - Fee Related
-
2004
- 2004-04-12 US US10/821,841 patent/US7153705B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW535179B (en) | 2003-06-01 |
EP1306889B1 (de) | 2007-01-17 |
CN1212665C (zh) | 2005-07-27 |
JP2003133531A (ja) | 2003-05-09 |
US6744085B2 (en) | 2004-06-01 |
DE60217610T2 (de) | 2007-10-25 |
EP1306889A2 (de) | 2003-05-02 |
KR20030035761A (ko) | 2003-05-09 |
US20030080363A1 (en) | 2003-05-01 |
EP1306889A3 (de) | 2004-08-18 |
CN1414636A (zh) | 2003-04-30 |
US7153705B2 (en) | 2006-12-26 |
US20040195605A1 (en) | 2004-10-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |