DE602004021750D1 - Zweistrahlsystem - Google Patents

Zweistrahlsystem

Info

Publication number
DE602004021750D1
DE602004021750D1 DE602004021750T DE602004021750T DE602004021750D1 DE 602004021750 D1 DE602004021750 D1 DE 602004021750D1 DE 602004021750 T DE602004021750 T DE 602004021750T DE 602004021750 T DE602004021750 T DE 602004021750T DE 602004021750 D1 DE602004021750 D1 DE 602004021750D1
Authority
DE
Germany
Prior art keywords
beam system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004021750T
Other languages
English (en)
Inventor
Ray Hill
Colin Sanford
Mark Dimanna
Michael Tanguay
Lawrence Scipioni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of DE602004021750D1 publication Critical patent/DE602004021750D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0042—Deflection of neutralising particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0805—Liquid metal sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam
DE602004021750T 2003-07-14 2004-07-01 Zweistrahlsystem Active DE602004021750D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48779203P 2003-07-14 2003-07-14

Publications (1)

Publication Number Publication Date
DE602004021750D1 true DE602004021750D1 (de) 2009-08-13

Family

ID=34135083

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004021750T Active DE602004021750D1 (de) 2003-07-14 2004-07-01 Zweistrahlsystem

Country Status (4)

Country Link
US (4) US7161159B2 (de)
EP (1) EP1501115B1 (de)
JP (2) JP2005038853A (de)
DE (1) DE602004021750D1 (de)

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DE602004021750D1 (de) * 2003-07-14 2009-08-13 Fei Co Zweistrahlsystem
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US7623625B2 (en) * 2007-04-11 2009-11-24 Searete Llc Compton scattered X-ray visualization, imaging, or information provider with scattering event locating
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US20080253526A1 (en) * 2007-04-11 2008-10-16 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Geometric compton scattered x-ray visualizing, imaging, or information providing
US8041006B2 (en) * 2007-04-11 2011-10-18 The Invention Science Fund I Llc Aspects of compton scattered X-ray visualization, imaging, or information providing
US20080253627A1 (en) * 2007-04-11 2008-10-16 Searete LLC, a limited liability corporation of Compton scattered X-ray visualization, imaging, or information provider using image combining
US7711089B2 (en) 2007-04-11 2010-05-04 The Invention Science Fund I, Llc Scintillator aspects of compton scattered X-ray visualization, imaging, or information providing
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US20090006842A1 (en) * 2007-06-26 2009-01-01 John Gordon Ross Sealing Electronic Data Associated With Multiple Electronic Documents
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DE102010024625A1 (de) * 2010-06-22 2011-12-22 Carl Zeiss Nts Gmbh Verfahren zum Bearbeiten eines Objekts
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JP2013178876A (ja) * 2012-02-28 2013-09-09 Hitachi High-Technologies Corp 荷電粒子線装置
CN102636505B (zh) * 2012-03-20 2013-11-13 中国科学院合肥物质科学研究院 单离子束双路信号同步探测方法
JP5969233B2 (ja) * 2012-03-22 2016-08-17 株式会社日立ハイテクサイエンス 断面加工観察方法及び装置
DE112013001373B4 (de) * 2012-04-03 2019-08-08 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung
CN102629541B (zh) * 2012-04-25 2016-02-17 中微半导体设备(上海)有限公司 喷淋头及其形成方法
US8859982B2 (en) * 2012-09-14 2014-10-14 Kla-Tencor Corporation Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
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TWI686837B (zh) 2012-12-31 2020-03-01 美商Fei公司 用於具有一帶電粒子束之傾斜或偏斜研磨操作之基準設計
KR102101350B1 (ko) 2013-03-15 2020-04-17 삼성전자주식회사 파티클 카운터 및 그를 구비한 임멀젼 노광 설비
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US10056228B2 (en) * 2014-07-29 2018-08-21 Applied Materials Israel Ltd. Charged particle beam specimen inspection system and method for operation thereof
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Also Published As

Publication number Publication date
JP5432220B2 (ja) 2014-03-05
EP1501115A2 (de) 2005-01-26
US7601976B2 (en) 2009-10-13
EP1501115B1 (de) 2009-07-01
US20100025578A1 (en) 2010-02-04
US8013311B2 (en) 2011-09-06
JP2011210740A (ja) 2011-10-20
US20080035860A1 (en) 2008-02-14
US20110309263A1 (en) 2011-12-22
US8399864B2 (en) 2013-03-19
JP2005038853A (ja) 2005-02-10
EP1501115A3 (de) 2007-09-05
US7161159B2 (en) 2007-01-09
US20050035291A1 (en) 2005-02-17

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